| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 04/29/2003 | US6556364 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system |
| 04/29/2003 | US6556361 Projection imaging system with a non-circular aperture and a method thereof |
| 04/29/2003 | US6556353 Projection optical system, projection exposure apparatus, and projection exposure method |
| 04/29/2003 | US6556294 Method of and apparatus for article inspection including speckle reduction |
| 04/29/2003 | US6556286 Inspection system for the pupil of a lithographic tool |
| 04/29/2003 | US6556281 For supporting a substrate during lithographic processing, capable of flexing and thereby altering surface topography; semiconductors |
| 04/29/2003 | US6556280 For generating an interferometric pattern of light, wherein positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal |
| 04/29/2003 | US6556279 Motion compensation system and method for lithography |
| 04/29/2003 | US6556278 Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted |
| 04/29/2003 | US6556277 Photolithographic apparatus |
| 04/29/2003 | US6556232 Base structure, processing device, and image forming device |
| 04/29/2003 | US6555936 Flatmotor device and exposure device |
| 04/29/2003 | US6555834 Gas flushing system for use in lithographic apparatus |
| 04/29/2003 | US6555833 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 04/29/2003 | US6555790 Semiconductor manufacturing apparatus, method for cleaning the semiconductor manufacturing apparatus, and light source unit |
| 04/29/2003 | US6555607 Resin, a crosslinking agent, and surface active agents; photoresists |
| 04/29/2003 | US6555594 Photo-curable electrically conductive composition and plasma display panel having electrodes formed by use of the same |
| 04/29/2003 | US6555593 Photopolymerization compositions including maleimides and processes for using the same |
| 04/29/2003 | US6555592 Epoxidized novolak phenolic resin modified with an unsaturated monobasic carboxylic acid, a dibasic acid, and an acid anhydride, a photopolymerizable monomer, photoinitiator and an epoxy novolak resin; use as solder mask |
| 04/29/2003 | US6555449 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication |
| 04/29/2003 | US6555298 Method and apparatus for uniformly baking substrates such as photomasks |
| 04/29/2003 | US6555295 Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed |
| 04/29/2003 | US6555292 Liquid photopolymer useful in fabricating printing plates which are resistant to solvent based ink |
| 04/29/2003 | US6555291 Thermal digital lithographic printing plate |
| 04/29/2003 | US6555290 A blends comprising a binder polymer having carboxyl groups, a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group and a triazine trione group in the molecule, and a photoinitiator |
| 04/29/2003 | US6555289 Positive photoresist composition |
| 04/29/2003 | US6555288 A light transmissive perfluoropolymer core composition comprising octafluorohexanediol di-acrylate compound and acrylated polyether; photopolymerizable |
| 04/29/2003 | US6555287 Non-subliming, difunctionalized ultraviolet dyes for use in anti-reflective coatings |
| 04/29/2003 | US6555286 Positive type actinic-ray-curable dry film and pattern-forming method by use of the same |
| 04/29/2003 | US6555283 Comprising a photosensitive composition which became insoluble upon absorption of actinic radiation, a cyanine dye inhibitor activated by heat or radiation to retard the insolubility of the photosensitive composition |
| 04/29/2003 | US6555276 Substrate coating and semiconductor processing method of improving uniformity of liquid deposition |
| 04/29/2003 | US6555275 Using two stage exposure; resolution |
| 04/29/2003 | US6555274 Integrated circuit for and a method of correcting pupil errors |
| 04/29/2003 | US6555234 Barrier of silicon dioxide or silicon nitride adjacent to the first side of the photoresist and is translucent to the radiation |
| 04/29/2003 | US6554912 A cleaning formulation for the removal of polymeric material from a substrate comprising one or more polyol compounds selected from alkanediols, triols and substituted alkentriols, glycol ethers; water and a fluoride salt |
| 04/29/2003 | US6554507 Pattern formation method and apparatus |
| 04/29/2003 | US6554420 Color filter and process for producing the same |
| 04/29/2003 | US6554004 Method for removing etch residue resulting from a process for forming a via |
| 04/29/2003 | US6553908 Web fanout control system |
| 04/29/2003 | US6553792 Resist stripping method and apparatus |
| 04/25/2003 | CA2405206A1 Method of exposing a printing form |
| 04/24/2003 | WO2003034476A1 Pattern drawing method, mask, and mask manufacturing method |
| 04/24/2003 | WO2003034154A1 A method of photoresist removal in the presence of a dielectric layer having a low k-value |
| 04/24/2003 | WO2003034153A2 Lithographic apparatus and device manufacturing method |
| 04/24/2003 | WO2003034152A1 Composition for forming antireflection film for lithography |
| 04/24/2003 | WO2003034151A1 Photoresist composition having a high heat resistance |
| 04/24/2003 | WO2003034150A1 Aqueous developable photoimageable thick film compositions with photospeed enhancer |
| 04/24/2003 | WO2003034149A1 Process and materials for formation of patterned films of functional materials |
| 04/24/2003 | WO2003033500A1 Photoactivable nitrogen bases |
| 04/24/2003 | WO2003033127A2 Methods of patterning a monolayer |
| 04/24/2003 | WO2002069050A3 Polarization vector alignment for interference lithography patterning |
| 04/24/2003 | WO2002025373A3 Method of design and fabrication of integrated circuits using regular arrays and gratings |
| 04/24/2003 | US20030078682 Simulation apparatus and simulation method |
| 04/24/2003 | US20030078354 Novel beta-oxo compounds and their use in photoresist |
| 04/24/2003 | US20030078352 To produce polymers that have high transparency in a wide wavelength region from vacuum; improved adhesion to the substrate, and improved film forming property; reflection preventive material, optical device material or resist |
| 04/24/2003 | US20030078313 Having photoinitiation activity with minimal or no adverse hazardous characteristics |
| 04/24/2003 | US20030078174 Resist and etching by-product removing composition and resist removing method using the same |
| 04/24/2003 | US20030078173 Post chemical mechanical polishing cleaning formulation of an organic amine, a fluoride source and 70-98% water |
| 04/24/2003 | US20030077916 Method of eliminating photoresist poisoning in damascene applications |
| 04/24/2003 | US20030077912 Semiconductor manufacturing apparatus and method |
| 04/24/2003 | US20030077899 Method for creating an intergrated circuit stage wherein fine and large patterns coexist |
| 04/24/2003 | US20030077729 Novel secretion factors for gram-positive micoorganisms, genes encoding them and methods of using it |
| 04/24/2003 | US20030077545 Photoresists which enable worked patterns each having a different height to be concurrently and collectively formed while delivering viscous abrasive fluid to the surface |
| 04/24/2003 | US20030077544 Cups are configured to reduce beam displacements caused by eddy currents; semiconductors; microelectronics |
| 04/24/2003 | US20030077543 Positive resist composition |
| 04/24/2003 | US20030077542 Photopolymerizable composition, recording material and image forming method |
| 04/24/2003 | US20030077541 Storage stability; workability; for lithographic printing plate which is highly sensitive to short oscillation wavelengths of semiconductor laser |
| 04/24/2003 | US20030077540 Microlithography; ultraviolet light sources; for production of integrated circuits, semiconductors |
| 04/24/2003 | US20030077539 Comprises polyvinylacetal polymer, water soluble photoactive compound (sulfonium salt), and crosslinking agent; for microlithography |
| 04/24/2003 | US20030077530 Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-partical-beam microlithography apparatus |
| 04/24/2003 | US20030077529 Preetching; exposure of photoresist, calibration; automatic optics detection |
| 04/24/2003 | US20030077527 Determiantion adjustment defects in integrated circuits; lithography calibration |
| 04/24/2003 | US20030077526 Miniaturization; photolithography patterns; phase shifting; applying photosensitive material to semiconductor; exposure to electromagnetic waves |
| 04/24/2003 | US20030077523 Lithography; spreading using centrifugal force; removal photoresists from edges; forming semiconductors |
| 04/24/2003 | US20030077421 Process of producing optical element and optical element |
| 04/24/2003 | US20030077089 Exposure device and method for compensating optical defects |
| 04/24/2003 | US20030077083 Apparatus and method for development |
| 04/24/2003 | US20030077039 Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a bragg grating, and dispersion compensating device using the optical fiber |
| 04/24/2003 | US20030076679 Advanced illumination system for use in microlithography |
| 04/24/2003 | US20030076607 Multi mirror system for an illumination system |
| 04/24/2003 | US20030076602 Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
| 04/24/2003 | US20030076594 Novel surface-relief diffraction grating |
| 04/24/2003 | US20030076590 Diffraction grating-based wavelength selection unit |
| 04/24/2003 | US20030076589 Transfer of optical element patterns on a same side of a substrate already having a feature thereon |
| 04/24/2003 | US20030076583 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 04/24/2003 | US20030076483 Imaging optical system and exposure apparatus |
| 04/24/2003 | US20030076482 Two stage method |
| 04/24/2003 | US20030076452 Contact for semiconductor and display devices |
| 04/24/2003 | US20030076404 Optical recorder and method thereof |
| 04/24/2003 | US20030075871 Differential pumping seal apparatus |
| 04/24/2003 | US20030075708 Positive radiation-sensitive composition |
| 04/24/2003 | US20030075696 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system |
| 04/24/2003 | US20030075691 Charged particle beam apparatus, pattern measuring method and pattern writing method |
| 04/24/2003 | US20030075690 Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
| 04/24/2003 | US20030075524 Method of photoresist removal in the presence of a dielectric layer having a low k-value |
| 04/24/2003 | US20030075103 Deposition method, deposition apparatus, and pressure-reduction drying apparatus |
| 04/24/2003 | US20030075066 Lithographic printing plate precursor |
| 04/23/2003 | EP1304727A2 Wafer handling system and method for use in lithography patterning |
| 04/23/2003 | EP1304596A2 Control system and semiconductor exposure apparatus |
| 04/23/2003 | EP1304595A1 System and method for laser beam expansion |