Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2013
11/27/2013CN101470358B Method of placing substrate, method of transferring substrate, support system and lithographic projection apparatus
11/27/2013CN101398615B Resin composition for laser engraving and resin printing plate precursor for laser engraving
11/27/2013CN101278236B Photosensitive resin composition and photosensitive element using same
11/27/2013CN101078814B Polarizing transforming element, optical lighting device, exposure device and exposure method
11/27/2013CN101078812B Polarizing transforming element, optical lighting device, exposure device and exposure method
11/26/2013US8593618 Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
11/26/2013US8592940 Topography based patterning
11/26/2013US8592622 Polymerizable fluorine-containing compound
11/26/2013US8592540 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same
11/26/2013US8592137 Methods for small trench patterning using chemical amplified photoresist compositions
11/26/2013US8592136 Methods for producing codes for microparticles
11/26/2013US8592135 Method of manufacturing printed circuit board
11/26/2013US8592134 Composition for forming base film for lithography and method for forming multilayer resist pattern
11/26/2013US8592133 Resist composition and patterning process
11/26/2013US8592132 Resist composition and method for producing resist pattern
11/26/2013US8592131 Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same
11/26/2013US8592130 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board
11/26/2013US8592129 Resin, resist composition and method for producing resist pattern
11/26/2013US8592128 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
11/26/2013CA2602808C Process for the formation of miniaturized getter deposits and getter deposits so obtained
11/25/2013DE202010018040U1 Festkörperoberfläche mit einer Hartstoff-Beschichtung mit mindestens einem strukturierten Bereich und Vorrichtung zur Strukturierung Solid body surface with a hard material coating having at least one structured region and apparatus for structuring
11/21/2013WO2013173738A1 Composition and process for stripping photoresist from a surface including titanium nitride
11/21/2013WO2013173468A2 Method and device for using substrate geometry to determine substrate analysis sampling
11/21/2013WO2013173285A1 Process sequence for reducing pattern roughness and deformity
11/21/2013WO2013173249A1 Forming patterns using block copolymers and articles
11/21/2013WO2013172470A1 Colored radiation-sensitive compositions, and color filters using them
11/21/2013WO2013172469A1 Radiation-sensitive compositions, color filters, and processes for preparing color filters
11/21/2013WO2013172466A1 Method for forming negative pattern, method for producing electronic device, electronic device and actinic ray-sensitive or radiation-sensitive resin composition
11/21/2013WO2013172435A1 Alkaline-developable thermosetting resin composition and printed circuit board
11/21/2013WO2013172434A1 Liquid-developable maleimide composition and printed circuit board
11/21/2013WO2013172432A1 Alkaline-developable thermosetting resin composition and printed circuit board
11/21/2013WO2013172302A1 Photosensitive resin composition, photosensitive element, method for forming partition wall of image display device, method for manufacturing image display device, and image display device
11/21/2013WO2013172267A1 Roller mold manufacturing device and manufacturing method
11/21/2013WO2013172239A1 Acid diffusion control agent, radiation-sensitive resin composition, method for forming resist pattern, compound, and method for producing compound
11/21/2013WO2013172163A1 Exposure apparatus
11/21/2013WO2013172048A1 Substrate processing apparatus
11/21/2013WO2013171888A1 Alkali-development-type thermoset resin composition and printed circuit board
11/21/2013WO2013171420A1 Method for texturing a substrate having a large surface area
11/21/2013WO2013171071A1 Illumination optical unit for euv projection lithography
11/21/2013WO2013171013A1 Thermal conditioning unit, lithographic apparatus and device manufacturing method
11/21/2013WO2013170725A1 Fabrication method for semiconductor device and semiconductor device
11/21/2013WO2013170722A1 Fabrication method for flash memory
11/21/2013WO2013170581A1 Organic light-emitting diode display panel and manufacturing method thereof
11/21/2013WO2013170403A1 Method for testing mask articles
11/21/2013US20130310514 Resist underlayer film-forming composition
11/21/2013US20130309615 Process sequence for reducing pattern roughness and deformity
11/21/2013US20130309614 Resist composition, method of forming resist pattern, polymeric compound and compound
11/21/2013US20130309612 Enhanced scanner throughput system and method
11/21/2013US20130309611 Immersion Lithography Watermark Reduction
11/21/2013US20130309610 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
11/21/2013US20130309609 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
11/21/2013US20130309607 Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition
11/21/2013US20130309606 Resist composition, patterning process, monomer, and copolymer
11/21/2013US20130309605 Methods for forming resist features, patterns in a resist, and arrays of aligned, elongate resist features
11/21/2013US20130309599 Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
11/21/2013US20130309462 Optical lithography using graphene contrast enhancement layer
11/21/2013US20130308219 Polymerizable composition comprising an oxime sulfonate as thermal curing agent
11/21/2013US20130308116 Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
11/21/2013US20130308115 Illumination system of a microlithographic projection exposure apparatus
11/21/2013US20130308114 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
11/21/2013US20130308113 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
11/21/2013US20130308112 Method and system for printing high-resolution periodic patterns
11/21/2013US20130308111 Exposure device
11/21/2013US20130308110 Lithographic apparatus and device manufacturing method
11/21/2013US20130308109 Measuring method, stage apparatus, and exposure apparatus
11/21/2013US20130308108 Measuring method, stage apparatus, and exposure apparatus
11/21/2013US20130308107 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/21/2013US20130306970 Positive photosensitive resin composition and uses thereof
11/21/2013US20130306918 Photosensitive Resin Composition for Color Filter and Color Filter Using Same
11/21/2013US20130306598 Sidewall image transfer method for low aspect ratio patterns
11/21/2013DE102013103956A1 System und Verfahren für einen verbesserten Scannerdurchsatz System and method for improved scanner throughput
11/21/2013DE102012223669A1 Method for correcting wavefront reflected from mirror for microlithography projection exposure system having projection optics, involves correcting wavefront by removing layer of multi-layer coating in one selected portion
11/21/2013DE102012208064A1 Beleuchtungsoptik für die EUV-Projektionslithographie Illumination optics for EUV projection lithography
11/21/2013DE102007022895B9 Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat An apparatus for transmitting provided in a mask structures onto a substrate
11/20/2013EP2665141A1 Line narrowing module
11/20/2013EP2664963A1 Blank for imprinting mold production and method for manufacturing imprinting mold
11/20/2013EP2664629A1 Functionalised photoinitiators
11/20/2013EP2664430A1 Method for producing mold for fine pattern transfer, method for producing diffraction grating using same, and method for manufacturing organic el element which comprises the diffraction grating
11/20/2013EP2663898A2 Method and system for printing high-resolution periodic patterns
11/20/2013EP2433927B1 Ketoxime ester photoinitiator
11/20/2013EP2388650B1 Illumination system for illuminating a mask in a microlithographic exposure apparatus
11/20/2013EP2311888B1 Deprotection method of protected polymer
11/20/2013EP2284611B1 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method
11/20/2013EP2270595B1 Radiation-sensitive resin composition
11/20/2013EP2003161B1 Multifunctional oxetanyl group-containing ultraviolet-curable resin composition
11/20/2013EP1779197B1 Display panel includidng patterned spacer
11/20/2013EP1710093B1 Photosensitive resin composition for laser engravable printing substrate
11/20/2013EP1632799B2 Optical element holding device, lens barrel, exposing device, and device producing method
11/20/2013CN203300612U Inflatable seat of reticle SMIF pod
11/20/2013CN203293634U Optical focus temperature compensating device
11/20/2013CN1729431B Dual hemispherical collectors
11/20/2013CN103403623A Process of producing lithographic printing plate
11/20/2013CN103403622A Photosensitive resin laminate and thermal processing of the same
11/20/2013CN103403621A System and method for production of nanostructures over large areas
11/20/2013CN103403620A Method and apparatus for printing periodic patterns
11/20/2013CN103403619A Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern formation method, and printed substrate
11/20/2013CN103403582A Curable coloring composition, color filter and manufacturing method for same, liquid crystal display device, solid-state image-capturing device, and dye compound.
11/20/2013CN103403101A Process of preparing product based on copper phthalocyanine (CuPc) particles
11/20/2013CN103400761A Substrate processing method
11/20/2013CN103400758A Method for manufacturing grid lines with high uniformity through double exposure
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