Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/02/2003EP1015878A4 Methods for fabricating enclosed microchannel structures
05/02/2003EP0910816B1 Composite relief image printing plates and methods for preparing same
05/02/2003EP0744044B1 Masks for lithographic patterning using off-axis illumination
05/01/2003WO2003036767A2 Parallel, individually addressable probes for nanolithography
05/01/2003WO2003036728A1 Contact portion of semiconductor device and method for manufacturing the same, and thin film transistor array panel for display device including the contact portion and method for manufacturing the same
05/01/2003WO2003036696A1 Method and instrument for measuring concentration, method and unit for exposure to light, and method for manufacturing device
05/01/2003WO2003036695A1 Method for feeding purge gas to exposure apparatus, exposure apparatus, and method for manufacturing device
05/01/2003WO2003036686A2 Method of patterning electrically conductive polymers
05/01/2003WO2003036516A2 Photocuring system database
05/01/2003WO2003036390A1 Method of forming fine pattern
05/01/2003WO2003036389A1 Holographic recording material and method for creating a light-resistant hologram
05/01/2003WO2003036388A1 Photosnesitive resin composition comprising quinonediazide sulfate ester compound
05/01/2003WO2003036387A2 Method of forming a pattern of sub-micron broad features
05/01/2003WO2003036386A2 Method for forming elliptical and rounded mask features using beam shaping
05/01/2003WO2003036361A1 Projection optical system and exposure apparatus having the projection optical system
05/01/2003WO2003036359A2 Optical element with an optical axis
05/01/2003WO2003036339A2 Transfer of optical element patterns on a same side of a substrate already having feature thereon
05/01/2003WO2003035932A1 Method for forming a micro-pattern on a substrate by using capillary force
05/01/2003WO2003035815A1 Composition for cleaning
05/01/2003WO2003035814A2 Improved post plasma ashing wafer cleaning formulation
05/01/2003WO2003035797A1 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
05/01/2003WO2003035777A1 Intaglio printing process using radically curable printing inks
05/01/2003WO2003035770A2 Process for making green pigment compositions useful for colour filters and lcd's
05/01/2003WO2003035766A1 Photo-curable and thermosetting resin composition
05/01/2003WO2003035637A1 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
05/01/2003WO2003035411A2 Laser-transfer film for permanently labeling components
05/01/2003WO2002075793A3 System and method of providing mask defect printability analysis
05/01/2003WO2002073258A3 Refractive index grating manufacturing process
05/01/2003WO2002044845A3 Protecting groups in polymers, photoresists and processes for microlithography
05/01/2003WO2002042846A3 Fabrication of integrated circuit
05/01/2003US20030084422 Non-synchronous control of laser diode
05/01/2003US20030084420 Method for evaluating a mask pattern on a substrate
05/01/2003US20030083753 Photocuring system database
05/01/2003US20030083429 Colored articles and compositions and methods for their fabrication
05/01/2003US20030083395 Optical article comprising a polymer and phosphine oxide photoinitiator having maximum absorption at UV wavelength of 400-490 nm, and improved refractive index contrast adjusted sensitivity; for recording with blue laser
05/01/2003US20030083215 Solvent mixture comprising water and an organic solvent, an amine compound, a transition metal-removing material
05/01/2003US20030082926 Pattern formation method
05/01/2003US20030082925 Resin composition, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof
05/01/2003US20030082916 Method for reducing dimensions between patterns on a photoresist
05/01/2003US20030082912 Detergent composition
05/01/2003US20030082831 Apparatus for use in the synthesis of preferential biopolymers
05/01/2003US20030082489 Measuring alkalinity of electroconductive developers, then adding water, bases and suppressors
05/01/2003US20030082488 Thin film photoresists; concurrent development, hydrosilation
05/01/2003US20030082487 Multilayer building materials; efficient binding; photopolymerization
05/01/2003US20030082486 Amplified photoresist; radiation with ultraviolet radiation
05/01/2003US20030082485 Methods for patterning using liquid embossing
05/01/2003US20030082483 Chemically amplified photoresist and process for structuring substrates having resist copolymers with enhanced transparency resulting from fluorinating the photochemically cleavable leaving groups and being applicable to 157 nm photolithography
05/01/2003US20030082481 Blocking acid generation during photolithography
05/01/2003US20030082480 Photoresist based on polycondensates and having an increased resolution for use in 157 nanometer lithography
05/01/2003US20030082479 Polymers, resist compositions and patterning process
05/01/2003US20030082478 Recording using infrared laser; lithography printing plates; relief images; development mixture containing nonionic surfactant
05/01/2003US20030082477 Photoresist composition
05/01/2003US20030082476 UV-sensitive imaging element for making lithographic printing plates
05/01/2003US20030082474 Printing plate patterns; mixture of acid, acid generator and acid curable compound
05/01/2003US20030082467 Semiconductor design for improved detection of out-of-focus conditions
05/01/2003US20030082466 Wafer handling system and method for use in lithography patterning
05/01/2003US20030082464 UV Absorbent and preparation method thereof, compositions and image forming method
05/01/2003US20030082463 Generating photolithography masks; calibration patterns
05/01/2003US20030082461 Forming semiconductors; photoresist patterns; smooth edges
05/01/2003US20030082355 Photopoilymerization; anhydride crosslinked phenolic resin
05/01/2003US20030082329 High density recording
05/01/2003US20030082030 System and method for reticle protection and transport
05/01/2003US20030081722 Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations
05/01/2003US20030081717 Image-based inspection system including positioning compensation for non-planar targets
05/01/2003US20030081643 Oscillation method and device of fluorine molecular laser
05/01/2003US20030081316 Diffractive optical element for extreme ultraviolet wavefront control
05/01/2003US20030081303 Method and apparatus using an SLM
05/01/2003US20030081213 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
05/01/2003US20030081210 Optical apparatus
05/01/2003US20030081195 Device for exposing a face of a panel
05/01/2003US20030081193 Holder, system, and process for improving overlay in lithography
05/01/2003US20030081192 Exposure apparatus and method using light having a wavelength less than 200 nm
05/01/2003US20030081191 Exposure apparatus and method
05/01/2003US20030081190 Device for step-and -repeat exposure of a substrate
05/01/2003US20030081189 Apparatus and method for exposure
05/01/2003US20030081188 That allows easy determination of the alignment marks when the mask is positioned to the workpiece, as well as an increase in the production rate capacity of the stepper without using an exposure device by which a fine pattern is formed
05/01/2003US20030080631 Sheet coils and linear motors comprising same, and stage units and microlithography apparatus comprising said linear motors
05/01/2003US20030080472 Lithographic method with bonded release layer for molding small patterns
05/01/2003US20030080471 Lithographic method for molding pattern with nanoscale features
05/01/2003US20030080302 Method and apparatus for elimination of high energy ion from EUV radiating device
05/01/2003US20030080287 Carrier device
05/01/2003US20030079989 Enables use of electrophoretic resists in the microfabrication industry for production of microelectronic devices and is of sufficiently high quality to be used as a replacement for, or supplement to, current photoresist deposition technology
05/01/2003US20030079687 Method and system for coating and developing
05/01/2003CA2458687A1 Process for making green pigment compositions useful for colour filters and lcd's
04/2003
04/30/2003CN1415082A Laser imaged printing plates comprising multi-layer slip film
04/30/2003CN1414610A Method and equipment of removing organic film
04/30/2003CN1414548A Blank disk and direct die press and its manufacture method
04/30/2003CN1414430A Method of improving resolution ratio limit of exposure machine
04/30/2003CN1414428A Identification method of new edition optical cover
04/30/2003CN1413992A 5-methylene-1,3,-dioxolane-4-one inducer, doubling body, chemical amplification type anti-corrosion composition and forming method
04/30/2003CN1107342C Pattern forming method
04/30/2003CN1107341C Method for pattering insulator film by electron beam irradiation
04/30/2003CN1106949C 文字信息处理装置 Character information processing apparatus
04/30/2003CA2410328A1 A device for exposing a face of a panel
04/29/2003US6557163 Method of photolithographic critical dimension control by using reticle measurements in a control algorithm
04/29/2003US6557162 Method for high yield reticle formation
04/29/2003US6556702 Method and apparatus that determines charged particle beam shape codes
04/29/2003US6556648 Lithographic apparatus, device manufacturing method, and device manufactured thereby
04/29/2003US6556612 Line narrowed laser with spatial filter
04/29/2003US6556600 Injection seeded F2 laser with centerline wavelength control
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