Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/07/2003EP1309234A2 Method and apparatus for elimination of high energy ions from EUV radiating device
05/07/2003EP1308991A1 Flare measuring method and flare measuring device, exposure method and exposure system, method of adjusting exposure system
05/07/2003EP1308985A1 System and method for wafer mounting and evacuation in an electron beam irradiation device
05/07/2003EP1308789A2 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
05/07/2003EP1308788A2 Device for the alignment of masks in the photolithography
05/07/2003EP1308787A1 Aqueous surfactant solution for developing coating film layer
05/07/2003EP1308786A1 Exposure device
05/07/2003EP1308785A2 Technique for making deep microstructures in photoresist
05/07/2003EP1308784A2 System and method for forming features on a semiconductor substrate
05/07/2003EP1308783A2 Resist coating-developing apparatus
05/07/2003EP1308782A1 Resist composition and patterning process
05/07/2003EP1308781A2 Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them
05/07/2003EP1308780A2 Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques
05/07/2003EP1308717A1 X-ray measuring and testing system
05/07/2003EP1307902A2 Process for photoresist descumming and stripping in semiconductor applications by nh3 plasma
05/07/2003EP1307786A1 Method and composition for removing sodium-containing material from microcircuit substrates
05/07/2003EP1307785A2 Process for manufacturing a microelectronic device
05/07/2003EP1307784A2 Method of laminating a photoresist sheet to a substrate
05/07/2003EP1307783A2 Photoinitiated reactions
05/07/2003EP1307777A2 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
05/07/2003EP1307768A2 Diffraction spectral filter for use in extreme-uv lithography condenser
05/07/2003EP1307513A2 Modified pigment products, dispersions thereof, and compositions comprising the same
05/07/2003EP1286387A9 Method to reduce photoresist contamination from silicon carbide films
05/07/2003EP1220879B1 Modified pigments having steric and amphiphilic groups
05/07/2003EP1034456B1 Uv optical system with reduced ageing
05/07/2003EP0992093B1 Wavelength system for an excimer laser
05/07/2003EP0803778B1 Use of a treating fluid for making waterless lithographic plate
05/07/2003CN2549478Y Micro-array relief integrator
05/07/2003CN1416454A Curable compsn. contg. reactive melamine derivative, cured product, and laminate
05/07/2003CN1416452A Resin compon, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof
05/07/2003CN1416020A Double-bulb exposure device
05/07/2003CN1416019A 曝光方法和曝光装置 Exposure method and exposure apparatus
05/07/2003CN1416017A Exposure system as well as exposure method applied in color light filter
05/07/2003CN1416016A Declining lug structure on surface of reflector and its mfg method
05/07/2003CN1415999A Method for preparing LCK in mode of switching at same plane
05/07/2003CN1107884C Squaric acid dye/iodate salt composite and its use
05/06/2003USRE38114 Non-stick photoresist laminate
05/06/2003USRE38113 Semiconductor element, a liquid crystal display element, a thin film magnetic head
05/06/2003US6560768 Circuit pattern design method, circuit pattern design system, and recording medium
05/06/2003US6560767 Process for making photomask pattern data and photomask
05/06/2003US6560263 Discharge laser having electrodes with sputter cavities and discharge peaks
05/06/2003US6560248 System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation
05/06/2003US6560044 Illumination optical system in exposure apparatus
05/06/2003US6560039 Double mirror catadioptric objective lens system with three optical surface multifunction component
05/06/2003US6560031 Optical projection lens system
05/06/2003US6560020 Surface-relief diffraction grating
05/06/2003US6560011 High NA system for multiple mode imaging
05/06/2003US6559952 System for interferometric distortion measurements that define an optical path
05/06/2003US6559930 Image exposure apparatus
05/06/2003US6559928 Substrate supporting apparatus, substrate transfer apparatus and the transfer method, method of holding the substrate, exposure apparatus and the method of manufacturing the apparatus
05/06/2003US6559927 Gap adjusting method in exposure apparatus
05/06/2003US6559926 Pattern forming apparatus and pattern forming method
05/06/2003US6559925 Projection exposure apparatus and method
05/06/2003US6559922 Method and apparatus for a non-contact scavenging seal
05/06/2003US6559880 Scan-exposure device
05/06/2003US6559465 Surface position detecting method having a detection timing determination
05/06/2003US6559438 Multiple parallel source scanning device
05/06/2003US6559337 Containing C17-23 divalent hydrocarbon group containing a bridged cyclic hydrocarbon group, as well as an acid decompsable group
05/06/2003US6559245 Photoimageable, aqueous acid soluble polyimide polymers
05/06/2003US6559228 Vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer
05/06/2003US6559072 Develop processing method of a resist surface of a substrate for reduced processing time and reduced defect density
05/06/2003US6559067 Method for patterning an organic antireflection layer
05/06/2003US6559064 Method and apparatus for removing photoresist on semiconductor wafer
05/06/2003US6559063 Method for manufacturing semiconductor wafer having resist mask with measurement marks for measuring the accuracy of overlay of a photomask
05/06/2003US6559057 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances
05/06/2003US6558965 Measuring BARC thickness using scatterometry
05/06/2003US6558904 Method for producing structured, self-organized molecular monolayers of individual molecular species, in particular substance libraries
05/06/2003US6558883 Apparatus and method for patterning a semiconductor wafer
05/06/2003US6558882 Laser working method
05/06/2003US6558881 Resolution; lithography; semiconductors
05/06/2003US6558879 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
05/06/2003US6558878 Microlens manufacturing method
05/06/2003US6558877 Jet coating method for semiconductor processing
05/06/2003US6558876 Flexographic element having an infrared radiation ablatable layer capable of being selectively removed by a laser beam
05/06/2003US6558875 Method for treating photosensitive lithographic printing plate
05/06/2003US6558874 For forming an electrode arrangement for a plasma display panel device
05/06/2003US6558873 Lithographic printing plate precursor
05/06/2003US6558872 Relation to the manufacture of masks and electronic parts
05/06/2003US6558871 Photopolymerization initiator comprising at least one of diaryliodonium salt
05/06/2003US6558869 Heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a developer resistance means for increasing the resistance of non-heated areas
05/06/2003US6558868 Applying a layer of negative photoresist sensitive to ultraviolet radiation on a substrate, reists is formed by a lacquer containing polyfunctional epoxy, a photoinitiator triacrylsulfonium salt, and a solvent; heating and exposing
05/06/2003US6558867 Lift-off resist compositions
05/06/2003US6558858 For producing color liquid- crystal displays having excellent display quality and high reliability
05/06/2003US6558856 Subresolution grating for attenuated phase shifting mask fabrication
05/06/2003US6558855 For semiconductor device, integrated circuit device, a superconductor device, micromachine, and electronic devices, in particular suitable for forming very fine patterns
05/06/2003US6558853 Method for manufacturing exposure mask, exposure apparatus and semiconductor device
05/06/2003US6558852 Exposure method, reticle, and method of manufacturing semiconductor device
05/02/2003EP1306726A1 Development defect preventing process and material
05/02/2003EP1306699A2 Process of producing optical element and optical element
05/02/2003EP1306698A1 Multilayer reflective mirrors for EUV, wavefront-aberration-correction methods for the same, and EUV optical systems comprising the same
05/02/2003EP1306665A2 Optical apparatus
05/02/2003EP1306592A2 Differential pressure seal apparatus with pumped fluid
05/02/2003EP1306213A2 Method and apparatus for detection of an edge of a printing plate mounted on a drum imaging system
05/02/2003EP1305984A1 Method and apparatus for generating x-ray or euv radiation
05/02/2003EP1305824A1 Method of making electronic materials
05/02/2003EP1305817A1 Methods to predict and correct resist heating during lithography
05/02/2003EP1305813A1 Plasma focus light source with active and buffer gas control
05/02/2003EP1305673A1 Prioritizing the application of resolution enhancement techniques
05/02/2003EP1305672A2 Process for making a periodic profile
05/02/2003EP1088328B1 Method and device for correcting proximity effects
1 ... 828 829 830 831 832 833 834 835 836 837 838 839 840 841 842 843 844 845 846 847 848 ... 1272