Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/13/2003US6563125 Charged-particle-beam microlithography apparatus and methods for preventing coulomb effects using the hollow-beam technique
05/13/2003US6562925 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
05/13/2003US6562726 Acid blend for removing etch residue
05/13/2003US6562661 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same
05/13/2003US6562644 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method
05/13/2003US6562639 Utilizing electrical performance data to predict CD variations across stepper field
05/13/2003US6562555 Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
05/13/2003US6562554 Photoresist compositions with cyclic olefin polymers and hydrophobic non-steroidal multi-alicyclic additives
05/13/2003US6562553 Lithographic printing method using a low surface energy layer
05/13/2003US6562550 Preparation of optical disk master
05/13/2003US6562546 Method for forming cross-linking photoresist and structures formed thereby
05/13/2003US6562544 Method and apparatus for improving accuracy in photolithographic processing of substrates
05/13/2003US6562543 Stabilizer for organic borate salts and photosensitive composition containing the same
05/13/2003US6562528 Especially for use with a scanning-type exposure apparatus.
05/13/2003US6562527 Imaged members and method of preparation thereof
05/13/2003US6562525 Photo mask to be used for photolithography, method of inspecting pattern defect, and method of manufacturing semiconductor device through use of the mask
05/13/2003US6562465 Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film
05/13/2003US6562464 Utilization of phenylglyoxalic acid esters as photoinitiators
05/13/2003US6562253 Method of producing an optical element having a multiple-level step-like structure through lithography
05/13/2003US6562188 Resist mask for measuring the accuracy of overlaid layers
05/13/2003US6562094 Reticle storage and retrieval system
05/13/2003US6561706 A system for monitoring a latent image exposed in a photo resist during semiconductor manufacture is provided
05/13/2003US6561510 Sheet material fixing device using suction holes with shut off
05/13/2003US6561097 Sheet material positioning method and apparatus
05/08/2003WO2003038875A2 Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is deposited by means of a plasma method
05/08/2003WO2003038858A2 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor
05/08/2003WO2003038529A1 Method for releasing resist
05/08/2003WO2003038528A1 Method for the production of a semiconductor device
05/08/2003WO2003038527A1 Uv curable powder suitable for use as photoresist
05/08/2003WO2003038526A1 Photosensitive resin composition and photosensitive films and laminates made by using the same
05/08/2003WO2003038525A1 Positive photoresist composition for liquid crystal device
05/08/2003WO2003038524A1 Methods of producing photosensitive ceramic composition and multi-layer substrate using it
05/08/2003WO2003038523A2 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
05/08/2003WO2003038518A1 Advanced exposure techniques for programmable lithography
05/08/2003WO2003038479A2 Structures and methods for reducing aberration in optical systems
05/08/2003WO2003038386A2 Real-time component monitoring and replenishment system for multicomponent fluids
05/08/2003WO2003037972A1 Stabilized imageable coating composition and printing plate precursor
05/08/2003WO2003037953A1 Resin composition
05/08/2003WO2003037606A1 Method for producing three-dimensional bodies or three-dimensional surfaces by laser radiation
05/08/2003WO2002093255A3 Photosensitive coloring compositon, color filter using the compositon and method of producing the same
05/08/2003WO2002063664B1 Exposure system and exposure method, and device production method
05/08/2003US20030088847 Method of incorporating lens aberration information into various process flows
05/08/2003US20030088115 Norbornene and dimethanonaphthalenes substituted with a branched or cyclic tertiary alkoxycarbonyl hydrocarbyleneoxycarbonyl group
05/08/2003US20030088024 Hyperbranched polymers with latent functionality and methods of making same
05/08/2003US20030087535 Film coating formation method
05/08/2003US20030087524 Cleaning method, method for fabricating semiconductor device and cleaning solution
05/08/2003US20030087205 Overcoating silicon substrate with dielectrics; masking; etching
05/08/2003US20030087203 Method of producing biocompatible structures and biocompatible microchip
05/08/2003US20030087202 Overcoating with etchable layer; spinning on photoresist; oxidation
05/08/2003US20030087200 Transmisison laser light through radiation transparent substrate to photoresist; uniformity thickness
05/08/2003US20030087199 Method of manufacturing monolithic ink-jet printhead
05/08/2003US20030087198 Three-dimensional polymer nano/micro molding by sacrificial layer technique
05/08/2003US20030087197 Biocompatibility protective coating; dielectrics; prevent current leakage
05/08/2003US20030087196 Resist pattern hardening method
05/08/2003US20030087195 Applying electroconductive polymer; masking; exposure to radiation; etching
05/08/2003US20030087194 Pattern formation method
05/08/2003US20030087193 Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography
05/08/2003US20030087191 Applying photosensitive layer to substrate; electron beam exposure; contacting developers
05/08/2003US20030087190 Photosensitive formulation for buffer coatings, film including the formulation, and method for manufacturing electronics using the formulation
05/08/2003US20030087189 Photosensitive resin composition
05/08/2003US20030087188 Organic anti-reflective coating material and preparation thereof
05/08/2003US20030087187 Thick film photoresist layer laminate, method of manufacturing thick film resist pattern, and method of manufacturing connecting terminal
05/08/2003US20030087186 Molding optics; exposure to laser radiation
05/08/2003US20030087185 Organometallic precursor for forming metal pattern and method of forming metal pattern using the same
05/08/2003US20030087184 Mixture containing acid generator and polymer
05/08/2003US20030087183 Fine patterns; photolithography; applying photoresist to substrate, exposure to high energy radiation, development
05/08/2003US20030087182 Photoresists with reaction anchos for chemical consolidation of resist structures for exposures at 157 nm
05/08/2003US20030087181 Polymers, resist compositions and patterning process
05/08/2003US20030087180 Photoresist composition for deep UV radiation containing an additive
05/08/2003US20030087179 Using mixture of alkaline phenolic resin and 1,2-quinoneidazide compound
05/08/2003US20030087178 Mixture containing elastomer, binder, photoinitiator, acid generator and leuco dyes
05/08/2003US20030087177 Preheating, development using alkali soluble resin
05/08/2003US20030087170 Fine particle sizes; silver particles overcoated with surfactant in binder
05/08/2003US20030087166 Reticle and a method for manufacturing a semiconductor device using the same
05/08/2003US20030087165 Exhaustion, removal of air from photomask and substrate
05/08/2003US20030087163 Volume type hologram recording photosensitive composition, volume type hologram recording medium using the same and method of producing volume type hologram
05/08/2003US20030087109 Marking substrates
05/08/2003US20030087104 Holography; polyurethane coating; waterproofing
05/08/2003US20030087094 Colored articles and compositions and methods for their fabrication
05/08/2003US20030087032 Method for reducing pattern dimension in photoresist layer
05/08/2003US20030086524 Illumination system particularly for microlithography
05/08/2003US20030086183 Projection exposure apparatus for microlithography
05/08/2003US20030086171 Methods for reducing aberration in optical systems
05/08/2003US20030086158 Polarization beam splitter for photolithography
05/08/2003US20030086157 Reducing aberration in optical systems comprising cubic crystalline optical elements
05/08/2003US20030086156 Structures and methods for reducing aberration in optical systems
05/08/2003US20030086081 Reticle design inspection system
05/08/2003US20030086078 Projection exposure apparatus and aberration measurement method
05/08/2003US20030086071 Structures and methods for reducing aberration in integrated circuit fabrication systems
05/08/2003US20030086070 Single aperture optical system for photolithography systems
05/08/2003US20030086069 Device for aligning masks in photolithography
05/08/2003US20030085987 Image recording apparatus using the grating light valve
05/08/2003US20030085985 Method for correcting the beam intensity in an image recording apparatus using a multi-channel light modulator
05/08/2003US20030085365 Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system
05/08/2003US20030085363 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same
05/08/2003US20030085197 Etching method and apparatus
05/08/2003US20030085195 Apparatus for etching or stripping substrate of liquid crystal display device and method thereof
05/08/2003US20030084808 Lithography system, exposure apparatus and their control method, and device manufacturing method
05/08/2003US20030084807 Support for lithographic printing plate and presensitized plate
05/08/2003US20030084806 Fine particles containing a radical polymerizable encapsulated by microcapsules
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