Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/15/2003WO2003040785A1 Optical element, method of manufacturing the optical element, optical system, exposure device, and method of manufacturing micro device
05/15/2003WO2003040781A1 Processes using gray scale exposure processes to make microoptical elements and corresponding molds
05/15/2003WO2003040648A1 Interferometric cyclic error compensation
05/15/2003WO2003040090A1 Hybrid onium salt
05/15/2003WO2003040076A2 Novel difunctional photoinitiators
05/15/2003WO2003007077A3 Molecular transfer lithography
05/15/2003WO2002102908A3 Marking substrates
05/15/2003WO2002084401A3 Photoresist compositions comprising solvents for short wavelength imaging
05/15/2003US20030093767 Method for fabrication of patterns and semiconductor devices
05/15/2003US20030092281 Method for organic barc and photoresist trimming process
05/15/2003US20030091942 Thinner for rinsing photoresist and method of treating photoresist layer
05/15/2003US20030091941 Forming a resist film with a chemical amplified fluorine containing base polymer, irradiating with a xenon, fluorine, krypton, or argon laser beam and developing
05/15/2003US20030091940 Transferring a bright line pattern to a photosensitive material through a photomask
05/15/2003US20030091939 Exposure device and method of fabricating liquid crystal display panel using the same
05/15/2003US20030091936 Applying a resist film to a substrate, producing a resist structure with webs having sidewall structures chemically amplified in a dry etching resistance and removing unamplified sections
05/15/2003US20030091935 Solventless, resistless, direct dielectric patterning
05/15/2003US20030091934 Fluorides of alkaline earth cations having different optical polarizabilities to produce an overall isotropic polarizability
05/15/2003US20030091933 Monomers having an alpha -hetero- substituted methylacryl group
05/15/2003US20030091930 Pattern formation material and pattern formation method
05/15/2003US20030091929 (meth)acrylic acid adamantane or norbornane ester derivatives
05/15/2003US20030091928 10-90 mol % of an alkyl vinyl ether monomer and 10-90 mol % of acrylate, methacrylate, fumarate and 4-hydroxystyrene derivatives
05/15/2003US20030091927 Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion
05/15/2003US20030091926 Glass transition temperature above room temperature; tack free
05/15/2003US20030091925 Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
05/15/2003US20030091916 Determining a dimension of a semiconductor second layer alignment target's pitch; target projection by optical lithography techniques; a projection imaging systems, light diffraction patterns
05/15/2003US20030091914 Reducing the misalignment failure rate of producing wafer
05/15/2003US20030091913 Aberration measuring method and projection exposure apparatus
05/15/2003US20030091908 A photosensitive binder comprising one alkali-soluble resin and a monomer both having polymerizable unsaturated bonds and colors; sensitive to light of a wavelength longer than 405 nm; photolithography; flat panel displays, semiconductors
05/15/2003US20030091844 Crosslinked elastic polymer in a photo- or thermally-polymerizable resin
05/15/2003US20030091802 Photosensitive resin laminate for sign boards
05/15/2003US20030091752 Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
05/15/2003US20030091732 Aqueous surfactant solution for developing coating film layer
05/15/2003US20030091277 Flattened laser scanning system
05/15/2003US20030091087 Lithography laser system with in-place alignment tool
05/15/2003US20030090786 Exposure apparatus and method
05/15/2003US20030090675 Interferometric methods and apparatus for determining object position while taking into account rotational displacements and warping of interferometer mirrors on the object
05/15/2003US20030090662 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same
05/15/2003US20030090661 Focusing method, position-measuring method, exposure method, method for producing device, and exposure apparatus
05/15/2003US20030090645 Vibration damping apparatus, control method therefor, exposure apparatus having the vibration damping apparatus, maintenance method therefor, semiconductor device fabrication method, and semiconductor fabrication factory
05/15/2003US20030090644 Mask and exposure apparatus
05/15/2003US20030090643 Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
05/15/2003US20030090642 Alignment system and projection exposure apparatus
05/15/2003US20030090641 Lithographic apparatus and device manufacturing method
05/15/2003US20030090640 Exposure method and apparatus
05/15/2003US20030090639 Method for applying a scale to a carrier
05/15/2003US20030090638 Zoom system for an illumination device
05/15/2003US20030090562 Radiation welding and imaging apparatus and method for using the same
05/15/2003US20030090193 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same
05/15/2003US20030090173 Method of forming electrode pattern of surface acoustic wave device
05/15/2003US20030089685 Electronic beam drawing apparatus, method of regulating electronic beam drawing apparatus, and electronic beam drawing method
05/15/2003US20030089669 Method for reuse of loaded developer
05/15/2003US20030089307 Method and device for growing large-volume oriented monocrystals
05/15/2003US20030089299 Optical member and method of producing the same, and projection aligner
05/15/2003CA2411629A1 Imagesetting device
05/15/2003CA2410018A1 Minimization of ablation in thermally imageable elements
05/14/2003EP1311108A2 Method for correcting the beam intensity in an image recording apparatus using a multi-channel light modulator
05/14/2003EP1311007A1 Piezoelectric actuator, lithographic apparatus and device manufacturing method
05/14/2003EP1310987A1 Method of producing semiconductor integrated circuit device and method of producing multi-chip module
05/14/2003EP1310829A1 Lithographic apparatus and device manufacturing method
05/14/2003EP1310828A1 Lithographic apparatus and device manufacturing method
05/14/2003EP1310827A2 Photomask with dust-proofing device and exposure method using the same
05/14/2003EP1310818A2 Projection optical system
05/14/2003EP1310458A2 Method of assaying fluorite sample and method of producing fluorite crystal
05/14/2003EP1310375A1 Image recording apparatus using the grating light valve
05/14/2003EP1310022A2 Laser wavelength control unit with piezoelectric driver
05/14/2003EP1309991A2 A method for producing a metal film, a thin film device having such metal film and a liquid crystal display device having such thin film device
05/14/2003EP1309990A1 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
05/14/2003EP1309983A2 Spatial light modulator driven photocathode source electron beam pattern generator
05/14/2003EP1309971A1 Method of manufacturing an optically scannable information carrier
05/14/2003EP1309898A2 Antireflective coating compositions
05/14/2003EP1309897A2 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
05/14/2003EP1309875A2 Device and method for optical inspection of semiconductor wafer
05/14/2003EP1309437A2 Differentially cured materials and process for forming same
05/14/2003CN1418330A Method and composition for removing sodium-containing material from microcircuit substrates
05/14/2003CN1418329A Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board
05/14/2003CN1418322A ultra high resolution imaging devices
05/14/2003CN1418127A Method for producing microcapsules having improved wall characteristics
05/14/2003CN1417843A Pottern forming method
05/14/2003CN1417646A Method of checking exposure device, correcting focus position and manfacturing semiconductor device
05/14/2003CN1417645A Panel surface exposing device
05/14/2003CN1417644A Object-exposing equipment and method
05/14/2003CN1417643A Method of reducing size of pattern interval of opening
05/14/2003CN1417610A Projection optical system, explosure device and making process of equipment
05/14/2003CN1417033A Manufacture process of single ink jet head
05/14/2003CN1108541C Corrosion inhibitor stripping liquid control device
05/14/2003CN1108327C Fractionated novolak resin and photoresist composition therefrom
05/14/2003CN1108326C Fractionated novolak resin from cresol-formaldehyde reaction mixture and photo-resist composition therefrom
05/13/2003US6563907 Radiation source with shaped emission
05/13/2003US6563853 Gas performance control system for gas discharge lasers
05/13/2003US6563652 Lens barrel and projection aligner
05/13/2003US6563594 Mark position detecting system and method for detecting mark position
05/13/2003US6563573 Method of evaluating imaging performance
05/13/2003US6563568 Multiple image reticle for forming layers
05/13/2003US6563567 Method and apparatus for illuminating a surface using a projection imaging apparatus
05/13/2003US6563566 System and method for printing semiconductor patterns using an optimized illumination and reticle
05/13/2003US6563565 Apparatus and method for projection exposure
05/13/2003US6563564 Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
05/13/2003US6563320 Mask alignment structure for IC layers
05/13/2003US6563128 Base stabilization system
05/13/2003US6563127 Optical proximity correction with rectangular contact
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