Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/22/2003US20030095252 Method and apparatus for defect analysis of wafers
05/22/2003US20030095247 provided with a substrate, a plurality of measurement patterns, a light blocking film and a plurality of reference patterns
05/22/2003US20030095245 Structure for attaching a pellicle to a photo-mask
05/22/2003US20030095244 Wafer holder
05/22/2003US20030095243 Variable transmission focal mask for lens heating compensation
05/22/2003US20030095242 Semiconductor manufacturing apparatus
05/22/2003US20030095240 Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
05/22/2003US20030095175 Laser beam pattern generator having rotating scanner compensator and method
05/22/2003US20030094904 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp
05/22/2003US20030094901 Short arc type mercury lamp
05/22/2003US20030094705 Semiconductor device and method of manufacturing the same
05/22/2003US20030094584 Charged-particle beam exposure apparatus and device manufacturing method using the same
05/22/2003US20030094137 Coating a resist on the substrate, and placing in a vapor atmosphere
05/22/2003US20030094129 Below 160NM optical lithography crystal materials and methods of making
05/22/2003US20030094059 Slide apparatus and its stage mechanism for use in vacuum
05/22/2003US20030093894 Double layer patterning and technique for making a magnetic recording head
05/21/2003EP1312985A2 Semiconductor manufacturing apparatus
05/21/2003EP1312984A2 Lithographic projection apparatus and device manufacturing method
05/21/2003EP1312983A2 Photocleaning
05/21/2003EP1312982A1 Radiation-sensitive composition, insulating film and organic el display element
05/21/2003EP1312965A1 Optical element holding device
05/21/2003EP1312586A1 Optical coating for UV applications
05/21/2003EP1312484A2 Adhesion promoting polymeric materials and planographic printing elements containing them
05/21/2003EP1312483A2 Minimization of ablation in thermally imageable elements
05/21/2003EP1312474A1 Printing method and printing apparatus, and packing sheet material for printing plate material
05/21/2003EP1312473A2 On-press developing method of lithographic printing plate precursor
05/21/2003EP1312108A2 Integrated shallow trench isolation process
05/21/2003EP1311909A1 Method for producing organically developable, photopolymerizable flexographic printing elements on flexible metallic supports
05/21/2003EP1311908A2 Photoresist composition for deep uv and process thereof
05/21/2003EP1311907A1 Photosensitive composition for making photoresist
05/21/2003EP1311906A1 Process for preparing flexographic printing plates
05/21/2003EP1311627A2 Process for producing coatings using surface-active photoinitiators
05/21/2003EP1311563A1 Photosensitive resin compositions for color filter applications
05/21/2003EP1311394A1 Thermal digital lithographic printing plate
05/21/2003EP1189974B1 Polybenzoxazole precursors
05/21/2003CN1419663A Abbe error correction system and method
05/21/2003CN1419661A Device for homogeneous heating of an object
05/21/2003CN1419275A Marked location detector
05/21/2003CN1419270A Dry method photoresist removing technology used after Z3 MS etching
05/21/2003CN1419267A Focusing, position measuring, exposure and element making method and exposure device
05/21/2003CN1419266A Exposure device, exposure method and element making method
05/21/2003CN1419166A Development device of organic light emitted pixel definition layer
05/21/2003CN1109361C Preparation for structuralized protection layer and insulation layer
05/21/2003CN1109354C Method of producing thin film transistor
05/21/2003CN1109273C Developer for photoresist layers
05/21/2003CN1109272C Color scanner
05/21/2003CN1109260C Making process of great-angle Y-branch silicon luminous-power distributor
05/21/2003CN1108933C Technology for making matel plane decorative exquisite photograph and scripts and paintings
05/20/2003US6567972 Method and apparatus for correcting mask pattern, mask having corrected mask pattern, and storage medium storing program for executing the method for correcting mask pattern
05/20/2003US6567719 Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
05/20/2003US6567588 Method for fabricating chirped fiber bragg gratings
05/20/2003US6567540 Method and apparatus for providing a bioinformatics database
05/20/2003US6567499 Star pinch X-ray and extreme ultraviolet photon source
05/20/2003US6567450 Very narrow band, two chamber, high rep rate gas discharge laser system
05/20/2003US6567205 Exposure device
05/20/2003US6567168 Inspection method, apparatus and system for circuit pattern
05/20/2003US6567155 Method for improved resolution of patterning using binary masks with pupil filters
05/20/2003US6567154 Step and scan projection exposure apparatus, maintenance method therefor, and semiconductor device manufacturing method and semiconductor manufacturing factory using the apparatus
05/20/2003US6567153 Multiple image photolithography system and method
05/20/2003US6566668 Plasma focus light source with tandem ellipsoidal mirror units
05/20/2003US6566667 Plasma focus light source with improved pulse power system
05/20/2003US6566666 Method and apparatus for pyroelectric lithography using patterned emitter
05/20/2003US6566665 Method and apparatus for linking and/or patterning self-assembled objects
05/20/2003US6566662 Charged beam exposure system
05/20/2003US6566495 Biosynthesis of preferential biopolymers; provide substrate, electrically activate preferential positions, bind monomer, repeat, recover biopolymers
05/20/2003US6566315 Also containing an orgamic amine and a nitrogen-containing carboxylic acid or imine
05/20/2003US6566280 Forming polymer features on a substrate
05/20/2003US6566276 Method of making electronic materials
05/20/2003US6566275 Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the same
05/20/2003US6566274 Lithography process for transparent substrates
05/20/2003US6566146 Method for double-sided patterning of high temperature superconducting circuits
05/20/2003US6566041 Forming plurality of exposure openings; overcoating with photoresist; patterning
05/20/2003US6566040 Method of manufacturing a semiconductor device and semiconductor device manufactured by the method
05/20/2003US6566039 Variable data lithographic printing device and method
05/20/2003US6566038 Micropatterning using electron beams or ultraviolet rays
05/20/2003US6566037 Polymer, resist composition and patterning process
05/20/2003US6566036 Chemically amplified resist
05/20/2003US6566035 Negative-type image recording material and precursor for negative-type lithographic printing plate
05/20/2003US6566031 Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern
05/20/2003US6566030 Using chemically amplified photoresist comprising mixture of polymeric resin, photoacid generator, pH-dependent fluorophore
05/20/2003US6566023 Phase shifting circuit manufacture method and apparatus
05/20/2003US6566016 Apparatus and method for compensating critical dimension deviations across photomask
05/20/2003US6565704 Process for the removal of resist material
05/20/2003US6565656 Coating processing apparatus
05/20/2003US6565419 Method of removing particles from stage and cleaning plate
05/20/2003US6564812 Used for removing photoresist or other residue from a substrate, such as an integrated circuit
05/20/2003US6564421 Multi functional cleaning module of manufacturing apparatus for flat panel display and cleaning apparatus using the same
05/15/2003WO2003041465A1 Photoimageable dielectric material for circuit protection
05/15/2003WO2003041136A1 Electron beam exposure device
05/15/2003WO2003041134A1 Illumination optical device, exposure device, and exposure method
05/15/2003WO2003041070A1 Method for manufacturing stamper for information medium and device for manufacturing stamper for information medium
05/15/2003WO2003040832A1 Agent for forming coating for narrowing pattern and method for forming fine pattern using the same
05/15/2003WO2003040831A1 Method for forming fine pattern
05/15/2003WO2003040830A2 Optical spot grid array printer
05/15/2003WO2003040829A2 Maskless printer using photoelectric conversion of a light beam array
05/15/2003WO2003040828A2 Real-time prediction of and correction of proximity resist heating in raster scan particle beam lithography
05/15/2003WO2003040827A1 Fluorinated polymers having ester groups and photoresists for microlithography
05/15/2003WO2003040826A1 Photoresist composition for deep uv radiation containing an additive
05/15/2003WO2003040825A1 Method and apparatus for producing identification cards using photosensitive media employing microcapsules
05/15/2003WO2003040796A1 Tilting mirror
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