Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2003
05/28/2003CN1420982A Method and apparatus for measurement, and method and apparatus for exposure
05/28/2003CN1420898A Resins curable with actinic radiation, process for production thereof, and photo- and thermo-setting resin composition
05/28/2003CN1420531A Wet resist removing process after silk etching
05/28/2003CN1420525A Read-only code mask and use method thereof
05/28/2003CN1420392A Optical amplification regulating system and projection exposure apparatus
05/28/2003CN1420391A Double-layer photoetching process
05/28/2003CN1420384A Method for mfg. black base board, black base board and color filter
05/28/2003CN1420019A Minimization of ablation in element capable of thermally image forming
05/28/2003CN1110231C Method for producing circuit substrate
05/28/2003CN1110066C Semiconductor device mfg. method
05/28/2003CN1109927C Chemically amplified photoresist
05/28/2003CN1109926C Photoimageable composition contg. photopolymerizable urethane oligomers and dibenzoate plasticizers
05/28/2003CN1109925C 光刻胶组合物 Photoresist composition
05/28/2003CN1109924C Photomask and method for producing same
05/28/2003CN1109917C Apparatus and method for illuminating light-sensitive medium
05/28/2003CN1109607C Seal mfg. apparatus
05/27/2003USRE38126 Improved reticle and method of using it to expose layers of wafers for large integrated circuits
05/27/2003US6571384 Method of forming fine patterns on semiconductor device
05/27/2003US6571371 Using latency time between processes for improving wafer-to-wafer uniformity.
05/27/2003US6571057 Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices
05/27/2003US6570752 Wafer chucks and the like including substrate-adhesion detection and adhesion correction
05/27/2003US6570713 Method and apparatus for optimizing the output beam characteristics of a laser
05/27/2003US6570645 Stage system and stage driving method for use in exposure apparatus
05/27/2003US6570644 Connection assembly of wafer stage chamber
05/27/2003US6570643 Semiconductor device, manufacturing method thereof and semiconductor manufacturing system
05/27/2003US6570641 Projection exposure apparatus
05/27/2003US6570254 Electrical mask identification of memory modules
05/27/2003US6570174 Connecting zones; calibration
05/27/2003US6570168 Illumination system with a plurality of light sources
05/27/2003US6570157 Multi-pitch and line calibration for mask and wafer CD-SEM system
05/27/2003US6570155 Bi-directional electron beam scanning apparatus
05/27/2003US6569971 Polymers for photoresist and photoresist compositions using the same
05/27/2003US6569778 Method for forming fine pattern in semiconductor device
05/27/2003US6569761 In semiconductor processes by an over-exposure to a photosensitive layer to form a patterned photosensitive layer on a substrate by using a patterned reticle
05/27/2003US6569696 Device and method for manufacturing semiconductor
05/27/2003US6569692 Automated method of controlling photoresist develop time to control critical dimensions, and system for accomplishing same
05/27/2003US6569671 Selective exposure of photosensitive material with light emitted from multiple vertical cavity surface emitting laser sources aligned as an array; use for low cost production of DNA or protein arrays
05/27/2003US6569609 Process for developing exposed radiation-sensitive printing plate precursors
05/27/2003US6569608 Method of manufacturing an element with multiple-level surface
05/27/2003US6569607 Overcoating substrate with photoresists; exposure; development
05/27/2003US6569606 Method of reducing photoresist shadowing during angled implants
05/27/2003US6569605 Exposing photoresist films to light, then etching barrier layers and baking to form electrical ane electronic apparatus such as random acess memory computers
05/27/2003US6569603 Light-sensitive composition and method for forming relief image using said composition
05/27/2003US6569602 Radiation curable mixtures comprising monomers, curing agents, sensitizers, binders and/or fillers used for lithography, stereolithography, photoresists and ceramics
05/27/2003US6569599 High contrast ratio
05/27/2003US6569598 Photoresist films comprising aromatic polyamides that are stable and impervious to solvents used as barrier layers for preferential solid-phase synthesis with micron-scale resolution
05/27/2003US6569597 Lithography printing plates
05/27/2003US6569596 Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors
05/27/2003US6569595 Method of forming a pattern
05/27/2003US6569579 Exposure apparatus for a semiconductor wafer; photomask alignment
05/27/2003US6569578 Method for forming photo-mask
05/27/2003US6569577 Phase-shift photo mask blank comprising half-tone phase-shift film, having specified phase difference and transmittance at specified wavelengths and consisting of two layers in which refractive index of upper layer is smaller than that of lower
05/27/2003US6569575 Light coupling structure used as mask for exposure of resist, comprising protrusions guiding light towards end having lateral shape of structures to be exposed, where it is coupled directly into resist, and connections which block light
05/27/2003US6569251 Contacting resist with cleaning composition comprising a homogeneous solution of propylene glycol alkyl ether acetate and at least one alcohol having an alkyl group of 2 to 3 carbon atoms
05/27/2003US6569241 Substrate spinning apparatus
05/27/2003US6568408 Method and apparatus for removing a liquid from a surface of a rotating substrate
05/27/2003CA2412712A1 Lift truck and lift truck operating method
05/22/2003WO2003043075A1 Method and apparatus for the production of process sensitive lithographic features
05/22/2003WO2003043065A1 Mask and its manufacturing method, and method for manufacturing semiconductor device
05/22/2003WO2003043064A1 Substrate inspecting device, coating/developing device and substrate inspecting method
05/22/2003WO2003042762A1 Chemical rinse composition
05/22/2003WO2003042761A1 Method for reuse of loaded developer
05/22/2003WO2003042760A2 Lithography using achromatic fresnel optics
05/22/2003WO2003042759A2 Manufacture of optical devices
05/22/2003WO2003042758A1 Photosensitive resin composition and applications thereof
05/22/2003WO2003042748A1 Surface plasmon optic devices and radiating surface plasmon sources for photolithography
05/22/2003WO2003042728A2 Achromatic fresnel optics for ultraviolet and x-ray radiation
05/22/2003WO2003042629A1 Focus masking structures, focus patterns and measurements thereof
05/22/2003WO2003042328A1 Triazine ring based polymers for photoinduced liquid crystal alignment, liquid crystal alignment layer containing the same, liquid crystal element using the alignment layer and method of manufacturing the same
05/22/2003WO2003041962A1 High speed negative working thermal printing plates
05/22/2003WO2003041937A1 Composite kinematic coupling
05/22/2003WO2003024186A3 Methods and apparatus for patterning a surface
05/22/2003US20030097205 Control scheme and system for active vibration isolation
05/22/2003US20030097008 Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
05/22/2003US20030096903 Method for reducing pattern dimension in photoresist layer
05/22/2003US20030096489 Processing amorphous silicon with excimer laser pulsation, and translating positioning of sample with respect to slit patterned beamlets
05/22/2003US20030096200 A patterning mask is shifted a predetermined distance in a horizontal direction, to define second line patterns that overlap the first line patterns
05/22/2003US20030096199 Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment
05/22/2003US20030096198 Manufacturing method and structure of slanting diffusive reflector
05/22/2003US20030096196 Process for curing of a resist which has been applied to a large substrate, and device for carrying out of the process
05/22/2003US20030096195 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate
05/22/2003US20030096194 Consolidation; amplification; lithography
05/22/2003US20030096193 Lithographic projection apparatus, device manufacturing method and device manufactured thereby
05/22/2003US20030096191 Comprises phenolic resin and polysiloxane; excellent adhesion to metal substrate
05/22/2003US20030096190 Chemically amplified photoresist and process for structuring substituents using transparency enhancement of resist copolymers for 157 NM photolithography through the use of fluorinated cinnamic acid derivatives
05/22/2003US20030096189 Onium salts and positive resist materials using the same
05/22/2003US20030096188 Planographic printing plate material and method of preparing planographic printing plate
05/22/2003US20030096187 Comprises developer and microcapsules containing photohardenable (via actinic radiation) composition and color former which are ruptured, forming latent image
05/22/2003US20030096179 Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system
05/22/2003US20030096176 Photomask, microstructure, manufacturing method of photomask, and aligner
05/22/2003US20030096175 Manufacturing method for photomask
05/22/2003US20030096172 Hologram recording material composition and hologram recording medium
05/22/2003US20030095623 Illumination system that suppresses debris from a ligh source
05/22/2003US20030095622 Illumination system particularly for microlithography
05/22/2003US20030095580 Beam delivery system for lithographic exposure radiation source
05/22/2003US20030095472 Chemical concentration control device for semiconductor processing apparatus
05/22/2003US20030095345 Optical unit, exposure unit and optical devices
05/22/2003US20030095342 Optical magnification adjustment system and projection exposure device
05/22/2003US20030095267 Focus masking structures, focus patterns and measurements thereof
05/22/2003US20030095265 Interferometric cyclic error compensation
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