| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/03/2003 | US6574524 Method of aligning dies of wafer(s) with exposure equipment in the fabricating of semiconductor devices |
| 06/03/2003 | US6574250 Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulse widths |
| 06/03/2003 | US6574053 Kinematic alignment structure for placement between components axially aligned in a cylindrical body |
| 06/03/2003 | US6574039 Optical element with multilayer thin film and exposure apparatus with the element |
| 06/03/2003 | US6573997 Hybrid shearing and phase-shifting point diffraction interferometer |
| 06/03/2003 | US6573996 Method and apparatus for enhanced precision interferometric distance measurement |
| 06/03/2003 | US6573986 a first set of reticle alignment attributes in a pattern with a constant pitch selected to indicate the intra field distortion of a projection system; and a second set of reticle alignment attributes that are complementary to the |
| 06/03/2003 | US6573980 Removable optical pellicle |
| 06/03/2003 | US6573979 Cleaning method for use in exposure apparatus |
| 06/03/2003 | US6573978 EUV condenser with non-imaging optics |
| 06/03/2003 | US6573977 Exposure control method, exposure apparatus and device manufacturing method |
| 06/03/2003 | US6573976 Exposure apparatus, exposure method, and semiconductor device manufacturing method |
| 06/03/2003 | US6573975 DUV scanner linewidth control by mask error factor compensation |
| 06/03/2003 | US6573959 Optical element, a method of making a display device and a display device comprising an optical element |
| 06/03/2003 | US6573658 Mercury lamp of the short arc type and UV emission device |
| 06/03/2003 | US6573554 Localized masking for semiconductor structure development |
| 06/03/2003 | US6573520 Electron beam lithography system |
| 06/03/2003 | US6573519 Electron beam exposure apparatus, adjusting method, and block mask for adjustment |
| 06/03/2003 | US6573515 Charged-particle-beam projection-exposure apparatus and methods exhibiting improved alignment and registration of projected pattern portions |
| 06/03/2003 | US6573514 Method for aligning electron beam projection lithography tool |
| 06/03/2003 | US6573511 Electron beam irradiation system and electron beam irradiation method |
| 06/03/2003 | US6573508 Electron beam exposing method |
| 06/03/2003 | US6573499 Microstructured pattern inspection method |
| 06/03/2003 | US6573473 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 06/03/2003 | US6573196 Method of depositing organosilicate layers |
| 06/03/2003 | US6573177 Protection layer to prevent under-layer damage during deposition |
| 06/03/2003 | US6573031 Apparatus and method of thermal processing and method of pattern formation |
| 06/03/2003 | US6573027 Forming pattern having narrow spacings with no thinning |
| 06/03/2003 | US6573024 Ammonium salt of organic acid and resist composition containing the same |
| 06/03/2003 | US6573023 Masking, screen printing; for field emission display in electronics/semiconductors |
| 06/03/2003 | US6573022 Planographic printing plate; roughened aluminum layered with alkali soluble resins, light absorbing heat generating com-pound and a sulfone; developmental latitude |
| 06/03/2003 | US6573020 Method for producing small and micro-sized ceramic parts |
| 06/03/2003 | US6573015 Automatic realization of best focus position quickly and accurately |
| 06/03/2003 | US6573014 Dividing patterns |
| 06/03/2003 | US6573012 Derived from dienes having protected hydroxyl groups; dur-ability, etching resistance, reproducibility, adhesiveness, resolution; deep ultraviolet light lithography |
| 06/03/2003 | US6572963 Process of forming a pattern on a substrate |
| 06/03/2003 | US6572701 System for separating and recovering waste fluid and spin coater |
| 06/03/2003 | US6572285 Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method |
| 05/30/2003 | WO2003044602A2 Laser beam pattern generator with compensation of rotational scan errors |
| 05/30/2003 | WO2003044601A1 Method for improving sensitometric response of photosensitive imaging media employing microcapsules |
| 05/30/2003 | WO2003044600A1 Spin-on anti-reflective coatings for photolithography |
| 05/30/2003 | WO2003044598A1 Compensating for effects of variations in gas refractivity in interferometers |
| 05/30/2003 | WO2003044597A1 Method and apparatus for exposing photoresists using programmable masks |
| 05/30/2003 | WO2003044079A1 Spin-on-glass anti-reflective coatings for photolithography |
| 05/30/2003 | WO2003044078A1 Anti-reflective coatings for photolithography and methods of preparation thereof |
| 05/30/2003 | WO2003044077A1 Spin-on-glass anti-reflective coatings for photolithography |
| 05/30/2003 | WO2003044030A1 Multimer forms of acylphosphines and their derivatives |
| 05/30/2003 | WO2003043944A1 Below 160nm optical lithography crystal materials and methods of making |
| 05/30/2003 | WO2002069049A3 Simultaneous imaging of two reticles |
| 05/30/2003 | CA2467576A1 Multimer forms of acylphosphines and their derivatives |
| 05/29/2003 | US20030101421 Photomask designing mehod, a photomask designing apparatus, a computer readable storage medium, a photomask, a photoresist, photosensitive resin, a base plate, a microlens, and an optical element. |
| 05/29/2003 | US20030100791 Novel ester compounds |
| 05/29/2003 | US20030100695 Organic polymer for organic anti-reflective coating layer and preparation thereof |
| 05/29/2003 | US20030100630 Curable composition, cured product, and laminate |
| 05/29/2003 | US20030100459 To remove photoresists during semiconductor device manufacturing |
| 05/29/2003 | US20030099983 Synthesis of cyclic polymer; obtain chemical monmers, incubate with substrate, synthesize, recover cyclic polymers |
| 05/29/2003 | US20030099909 To produce presensitized plate for use in making a lithographic printing plate which is directly imageable by scanning an infrared (IR) laser on the basis of digital signals through computer, etc. |
| 05/29/2003 | US20030099908 Photoresist stripping solution and a method of stripping photoresists using the same |
| 05/29/2003 | US20030099906 Applying a chemically amplified photoresist to a substrate; drying; structuring; applying an amplification agent; removing excess amplification agent |
| 05/29/2003 | US20030099905 Forming a coating including a photosensitive formulation containing carboxylic acid structure; irradiating coating in a predetermined pattern to convert portion of carboxylic acid structure that is irradiated into a lactone structure |
| 05/29/2003 | US20030099904 Photosensitive formulation for buffer coatings, film containing the photosensitive formulation, and method for fabricating electronics with the photosensitive formulation |
| 05/29/2003 | US20030099902 Capable of being imagewise recorded by scanning exposure with an infrared laser beam based on digital signals, can be mounted on a printing machine without being subjected to a conventional developing |
| 05/29/2003 | US20030099901 Chemically amplified resist compositions and patterning process |
| 05/29/2003 | US20030099900 Chemical amplification type positive resist composition |
| 05/29/2003 | US20030099899 Photoimageable composition |
| 05/29/2003 | US20030099897 Surface modified encapsulated inorganic resist |
| 05/29/2003 | US20030099888 Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| 05/29/2003 | US20030099814 Castellation technique for improved lift-off of photoresist in thin-film device processing and a thin-film device made thereby |
| 05/29/2003 | US20030099776 Film forming method and film forming apparatus |
| 05/29/2003 | US20030099324 X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device |
| 05/29/2003 | US20030099269 Timing control for two-chamber gas discharge laser system |
| 05/29/2003 | US20030099047 Correction of birefringence in cubic crystalline optical systems |
| 05/29/2003 | US20030099040 Illumination system with a plurality of individual gratings |
| 05/29/2003 | US20030099038 Thin film filter for optical multiplexer/demultiplexer |
| 05/29/2003 | US20030099034 Reflective projection lens for EUV-photolithography |
| 05/29/2003 | US20030099026 Defective pixel compensation method |
| 05/29/2003 | US20030098977 Alignment measuring method of photolithography process |
| 05/29/2003 | US20030098970 Method and apparatus for detecting aberrations in a projection lens utilized for projection optics |
| 05/29/2003 | US20030098966 Stage system and stage driving method for use in exposure apparatus |
| 05/29/2003 | US20030098965 System and method for supporting a device holder with separate components |
| 05/29/2003 | US20030098964 System and method for holding a device with minimal deformation |
| 05/29/2003 | US20030098961 Stage apparatus and exposure apparatus |
| 05/29/2003 | US20030098960 Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses |
| 05/29/2003 | US20030098959 Exposure method and exposure apparatus, light source unit and adjustment method of light source unit, and device manufacturing method |
| 05/29/2003 | US20030098464 Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same |
| 05/29/2003 | US20030098442 Liquid crystal composition, selectively reflective film and liquid crystal color filter |
| 05/29/2003 | US20030098424 System to reduce heat-induced distortion of photomasks during lithography |
| 05/28/2003 | EP1315045A1 Lithographic gap-filler forming composition |
| 05/28/2003 | EP1315044A1 Resist composition and method for manufacturing a semiconductor device using the resist composition |
| 05/28/2003 | EP1315043A1 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof |
| 05/28/2003 | EP1315005A1 Method of forming optical thin film and optical element provided with optical thin film |
| 05/28/2003 | EP1314975A1 Method and apparatus for wafer defect inspection |
| 05/28/2003 | EP1314725A1 Sulfonium salt compound |
| 05/28/2003 | EP1314573A2 Solid particle dispersions and their use in the preparation of laser thermal media |
| 05/28/2003 | EP1314552A2 Photosensitive resin composition |
| 05/28/2003 | EP1314198A1 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 05/28/2003 | EP1314193A2 Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices |
| 05/28/2003 | EP1313620A2 Pretreated sheet product for lithographic plates |
| 05/28/2003 | EP0894050B1 Laser addressable thermal transfer imaging element with an interlayer |
| 05/28/2003 | CN1420998A Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with same |