Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2003
06/10/2003US6576382 Photosensitive cationically polymerizable epoxy based system does not contain bromine; useful as a solder mask
06/10/2003US6576381 Semiconductor device
06/10/2003US6576380 Extreme ultraviolet soft x-ray projection lithographic method and mask devices
06/10/2003US6576379 Phaseshift mask and manufacturing the same
06/10/2003US6576378 Photomask and exposure method for large scaled LCD device
06/10/2003US6576377 Photo mask pattern designing method, resist pattern fabricating method and semiconductor device manufacturing method
06/10/2003US6576374 Mask blank and method of fabricating phase shift mask from the same
06/10/2003US6576091 Multi-layer deflection member and process for making same
06/10/2003US6576090 Deflection member having suspended portions and process for making same
06/10/2003US6576066 Supercritical drying method and supercritical drying apparatus
06/10/2003US6576055 Method and apparatus for controlling air over a spinning microelectronic substrate
06/10/2003US6575687 Wafer transport system
06/10/2003US6575645 Method and apparatus for improving resist pattern developing
06/10/2003US6575035 Apparatus and method for measuring internal stress of reticle membrane
06/05/2003WO2003046963A1 Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same
06/05/2003WO2003046962A1 Evaluating method and method for manufacturing exposure apparatus
06/05/2003WO2003046961A2 Photolithographic method for forming a structure in a semiconductor substrate
06/05/2003WO2003046666A1 Developing solvent for photopolymerizable printing plates
06/05/2003WO2003046665A1 Defective pixel compensation method
06/05/2003WO2003046664A2 Lithography process for transparent substrates
06/05/2003WO2003046663A2 Characterization of the illumination angle distribution of a projection lighting system
06/05/2003WO2003046662A1 Imaging apparatus
06/05/2003WO2003046661A1 Printed uv cured optical films
06/05/2003WO2003046660A1 Method for dynamic relief forming in functional layer
06/05/2003WO2003046658A1 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist
06/05/2003WO2003046634A1 Projection optical system, exposure device, and exposure method
06/05/2003WO2003046628A1 Method for fabricating chirped fiber bragg gratings
06/05/2003WO2003046530A1 Inspection device and inspection method for pattern profile, exposure system
06/05/2003WO2003046042A1 Radiation curable resin composition for making colored three dimensional objects
06/05/2003WO2003046017A1 Curable mixtures comprising uv-absorber acylphosphinoxide and hydroxy ketone photoinitiator
06/05/2003WO2003045915A1 Bisimide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition
06/05/2003WO2003045617A1 Device and method for optical processing for processing inorganic transparent material by optical patterning
06/05/2003WO2002091449A3 Etching a substrate in a process zone
06/05/2003WO2002069039A3 Photoacid generator systems for short wavelength imaging
06/05/2003US20030106037 Method for fabricating a semiconductor device
06/05/2003US20030105321 Substituted phthalocyanine
06/05/2003US20030105264 Organosiloxanes
06/05/2003US20030104704 Method for fabricating semiconductor device
06/05/2003US20030104640 Method for improving substrate alignment
06/05/2003US20030104411 Microarray for use in analysis and classification of biological samples
06/05/2003US20030104322 Developing solution for photoresist
06/05/2003US20030104320 Solvent free photoresist strip and residue removal processing for post etching of low-k films
06/05/2003US20030104319 Of sub-micron dimensions; ratio of hole-diameter to hole-distance is narrowed to an optimum range of off axis illumination.
06/05/2003US20030104318 Photolithographic element blank calcium strontium fluoride UV transmitting mixed fluoride crystal with minimized spatial dispersion
06/05/2003US20030104317 Method of developing photosensitive planographic printing plate
06/05/2003US20030104316 Polystyrene as a resist for making patterned media
06/05/2003US20030104315 Developing solvent for photopolymerizable printing plates
06/05/2003US20030104314 Thermal switchable composition and imaging member containing complex oxonol IR dye and methods of imaging and printing
06/05/2003US20030104313 Radiation-curable resin composition and rapid prototyping process using the same
06/05/2003US20030104312 Positive resist composition
06/05/2003US20030104311 At least one of the hydroxy groups carries a tert-alkoxycarbonyl group; reacted with dicarboxylic acids to form polyamides; cyclization
06/05/2003US20030104310 Photosensitive dissolution inhibitors and resists based on onium salt carboxylates
06/05/2003US20030104309 Laser transfer film for durable inscription on components
06/05/2003US20030104307 Multi-layer thermally imageable element
06/05/2003US20030104306 Aggregating a hydrophobizing precursor mingled in a fountain solution or adding a coagulant to the solution and removing the precursor by filtration
06/05/2003US20030104292 Semiconductor device and fabrication method therefor
06/05/2003US20030104291 Improve the quality of the liquid crystal display panel by using a double-exposure for spacer fabrication.
06/05/2003US20030104290 Resist openings are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation.
06/05/2003US20030104289 Resist openings are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation.
06/05/2003US20030104286 Hole printing by packing and unpacking using alternating phase-shifting masks
06/05/2003US20030103196 Exposure method and exposure apparatus
06/05/2003US20030103195 Mask for proximity field optical exposure, exposure apparatus and method therefor
06/05/2003US20030103189 Characterizing aberrations in an imaging lens and applications to visual testing and integrated circuit mask analysis
06/05/2003US20030103176 Reflection type liquid crystal display device and process for producing the same
06/05/2003US20030102723 Linear motor, stage apparatus, and exposure apparatus
06/05/2003US20030102721 Moving coil type planar motor control
06/05/2003US20030102444 Determinating shape of surface; stamp for transferring electricity charging; fine geometric shapes
06/05/2003US20030102443 Esposure method, electron beam exposure apparatus and fabrication method of electronic device
06/05/2003US20030102440 Method of aligning a wafer in a photolithography process
06/05/2003US20030102438 Magnetic shunt assembly for an exposure apparatus
06/05/2003US20030102385 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
06/05/2003US20030102285 Resist pattern thickening material, resist pattern and forming method thereof, and semiconductor device and manufacturing method thereof
06/05/2003CA2468239A1 Developing solvent for photopolymerizable printing plates
06/04/2003EP1316851A2 Multiple exposure method with reduction of printed assist features
06/04/2003EP1316850A1 Lithographic apparatus and device manufacturing method
06/04/2003EP1316849A2 Method of removing color centers from film coated fluoride optical elements
06/04/2003EP1316848A2 Optical member for photolithography and method for evaluating the same
06/04/2003EP1316847A1 "Machine for the uv exposure of flexographic plates"
06/04/2003EP1316832A1 Relay image optical system, and illuminating optical device and exposure system provided with the optical system
06/04/2003EP1316245A1 Electromagnetic radiation generation using a laser produced plasma
06/04/2003EP1315998A1 On-press development of thermosensitive lithographic plates
06/04/2003EP1315997A1 Resist pattern swelling material, and method for patterning using same
06/04/2003EP1315996A1 A method of illuminating a photomask using chevron illumination
06/04/2003EP1116421B1 Method for producing etched circuits
06/04/2003EP0895706B1 Method and apparatus for generating x-ray or euv radiation
06/04/2003EP0834100B1 Photolithographic apparatus
06/04/2003CN2553999Y Exposure structure of photosensitive stamping machine
06/04/2003CN1422394A Liquid, radiation-curable composition, especially for stereolithography
06/04/2003CN1422393A Self-contained imaging assembly having improved pecl strength
06/04/2003CN1421898A Superposed mark and its usage
06/04/2003CN1421746A 曝光方法 Exposure method
06/04/2003CN1421745A Method of forming photoresist pattern
06/04/2003CN1421744A Resist pattern thickening material, resist pattern and its forming process, semiconductor device and its producing process
06/04/2003CN1421743A Resist pattern thickening material, resist pattern and its forming method, semiconductor device and producing method thereof
06/04/2003CN1421741A Method for producing photomask
06/04/2003CN1421711A Reflector with lug on its inclined surface and its making process
06/04/2003CN1421398A Waste slushing compound exfoliative liquid regenerating apparatus and method
06/04/2003CN1110840C Photomask and its exposure method
06/04/2003CN1110722C Chemically reinforced resist
06/03/2003US6574789 Exposing method and apparatus for semiconductor integrated circuits
1 ... 822 823 824 825 826 827 828 829 830 831 832 833 834 835 836 837 838 839 840 841 842 ... 1272