Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2003
06/12/2003US20030108823 Use of ethylene carbonate and/or propylene carbonate treatment using ozone, for the stripping and removal of resist films
06/12/2003US20030108822 A positive-working photoresist containing a quinone diazide group containing photosensitizer and an alkali soluble novolak resin developed by a developer using a quaternary ammonium hydroxide
06/12/2003US20030108821 Microlens array fabrication
06/12/2003US20030108819 Resist patterning process
06/12/2003US20030108818 Method and apparatus for modification of chemically amplified photoresist by electron beam exposure
06/12/2003US20030108817 Minimization of ablation in thermally imageable elements
06/12/2003US20030108816 Positive type actinic ray-curable dry film and pattern-forming method by use of the same
06/12/2003US20030108815 Amine contamination-protecting top-coating formulation for photoresist containing (a) a water soluble solvent and a water soluble organic resin; (b) and a basic compound
06/12/2003US20030108814 Recording layer contains an infrared ray absorbent, an alkali-soluble resin and a quaternary ammonium salt as inhibitor of inhibiting the alkali-soluble resin from dissolving in an alkali aqueous solution upon irridation
06/12/2003US20030108812 Copolymer of a polysiloxane and unsaturated carbon that includes acid-labile groups
06/12/2003US20030108811 Positive resist composition
06/12/2003US20030108810 Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators
06/12/2003US20030108809 An acrylate ester resin that increases a solubility rate in an alkali developing solution by the action of a photoacid generator
06/12/2003US20030108806 Substrate exposure apparatus and method
06/12/2003US20030108665 Fabricating fluoride crystal materials such as calcium fluoride, magnesium fluoride, suitable for optical elements, lenses, window materials, prisms, employed in a wide wavelength range
06/12/2003US20030108349 Substrate processing apparatus
06/12/2003US20030108148 Method of optimized stitching for digital micro-mirror device
06/12/2003US20030107818 Optical thin film and manufacturing method thereof
06/12/2003US20030107802 Display screen and method of manufacture therefor
06/12/2003US20030107720 Adjusting light exposure; photosensitive layer on semiconductor wafer
06/12/2003US20030107719 Correction of leveling tilt induced by asymmetrical semiconductor patterns
06/12/2003US20030107717 Exposure method and apparatus, and device manufacturing method
06/12/2003US20030107059 Substrate exposure apparatus
06/12/2003US20030107009 Electron beam exposure apparatus and electron beam exposure method
06/12/2003US20030107008 Lithographic method using variable-area electron-beam lithography machine
06/12/2003US20030106999 Process conditions change monitoring systems that use electron beams, and related monitoring methods
06/12/2003US20030106984 Scan line to scan line feedforward in an autofocus system of an imaging system
06/12/2003US20030106642 Semiconductor processing module with integrated feedback/feed forward metrology
06/12/2003US20030106573 Using a remover including carbon dioxide (CO2), an additive for removing the residues and a cosolvent for dissolving the additive in CO2 at a pressurized fluid condition; for removing resist from semiconductor
06/12/2003US20030106572 System and method for ozonated water cleaning
06/12/2003US20030106459 Dampening water composition for lithographic printing plate and lithographic printing process
06/12/2003US20030106449 Device for removing image recording material
06/12/2003US20030106448 Image-recording apparatus and method
06/12/2003CA2468743A1 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
06/11/2003EP1318705A2 Optical detection module for measuring the cross-scan position of a moving optical beam in a scanning apparatus
06/11/2003EP1318660A2 Image-recording apparatus and method
06/11/2003EP1318432A1 Photoresist residue removing liquid composition
06/11/2003EP1318431A1 Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element
06/11/2003EP1318430A2 Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposure
06/11/2003EP1318425A2 Catadioptric optical system and exposure apparatus equipped with the same
06/11/2003EP1318424A2 Non-contacting holding device for an optical component
06/11/2003EP1318158A1 Photopolymerizable resin composition for optical recording media and optical recording media
06/11/2003EP1317875A1 Method for producing an electrically conductive structure on a non-planar surface and the use of said method
06/11/2003EP1317692A2 Method for improving image quality and for increasing writing speed during exposure of light-sensitive layers
06/11/2003EP1317691A2 Photosensitive composition, cured article thereof, and printed circuit board using the same
06/11/2003EP1317498A2 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
06/11/2003EP1317337A2 Printing plate
06/11/2003EP1144197B1 Thermal Transfer Method.
06/11/2003EP1086403B1 Liquid, radiation-curable composition, especially for stereolithography
06/11/2003EP1023643A4 Volume phase hologram and method for producing the same
06/11/2003EP0992053B1 Gated photocathode for controlled single and multiple electron beam emission
06/11/2003EP0974078B1 Ternary photoinitiator system for curing of epoxy/polyol resin compositions
06/11/2003EP0883835B1 Protective overcoat useful for enhancing the resistance of a printing plate precursor to ambient humidity
06/11/2003CN2555525Y Photoetching machine for producing microcurrent controlled chip
06/11/2003CN1423835A Inhibition of titanium corrosion
06/11/2003CN1423831A Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice
06/11/2003CN1423760A Chemically amplified resist and a resist composition
06/11/2003CN1423172A Liquid composition for removing residue of photo-corrosion-inhibitor
06/11/2003CN1423171A Diluent for washing photo-sensitive resin
06/11/2003CN1423170A Pattern transfer method
06/11/2003CN1423169A Photosensitive resin composition, dry type film and processing component using same
06/11/2003CN1423168A Light mask and making method thereof
06/11/2003CN1423147A Projection optical system and exposure device with same
06/10/2003US6578188 Method and apparatus for a network-based mask defect printability analysis system
06/10/2003US6577457 Catadioptric lens barrel structure having a kinematic alignment structure and method for aligning two planar surfaces
06/10/2003US6577447 Multi-lens array of a wavefront sensor for reducing optical interference and method thereof
06/10/2003US6577443 Reduction objective for extreme ultraviolet lithography
06/10/2003US6577442 Reflective spectral filtering of high power extreme ultra-violet radiation
06/10/2003US6577406 Changing shape of line-ends in process control targets can influence sensitivity of detection of dose or focus shifts; changing the bias of line-ends to either increase or decrease sensitivity to focus or dose
06/10/2003US6577400 Interferometer
06/10/2003US6577382 Substrate transport apparatus and method
06/10/2003US6577381 Projection exposure apparatus, and device manufacturing method using the same
06/10/2003US6577379 Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate
06/10/2003US6576919 Method of determining movement sequence and apparatus for realizing it
06/10/2003US6576917 Adjustable bore capillary discharge
06/10/2003US6576912 Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
06/10/2003US6576873 Semiconductor manufacturing apparatus for photolithographic process
06/10/2003US6576684 Ammonium, phosphonium or sulfonium containing oligomers or polymers; controlled molecular weight, low polydispersity and a vinyl or dienyl end group; polymeric precursors and addi-tives
06/10/2003US6576681 Antireflective porogens
06/10/2003US6576561 Gas assisted method for applying resist stripper and gas-resist stripper combinations
06/10/2003US6576529 Method of forming an alignment feature in or on a multilayered semiconductor structure
06/10/2003US6576520 Amorphous carbon layer for improved adhesion of photoresist and method of fabrication
06/10/2003US6576424 Solid support for use in the determination, classification and mapping of biopolymer sequences
06/10/2003US6576409 Photosensitive resin composition and method for formation of resist pattern by use thereof
06/10/2003US6576408 Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose
06/10/2003US6576407 Method of improving astigmatism of a photoresist layer
06/10/2003US6576406 Resist material on filamentary substrate includes a hollow, energy transparent tube
06/10/2003US6576405 High aspect ratio photolithographic method for high energy implantation
06/10/2003US6576402 Method for producing wiring configurations having coarse conductor structures and at least one region having fine conductor structures
06/10/2003US6576400 Positive-working radiation-sensitive composition and process for forming a pattern
06/10/2003US6576399 Primer layer is a mixture of an unmodified epoxy resin, an organic polymer having hydroxy or carboxyl functional groups and a crosslinking agent; silicone layer
06/10/2003US6576398 Pattern formation material and method
06/10/2003US6576397 Digital infrared laser scanning; computer-to-plate; handling in a bright room; alkali soluble polymer having addition polymerizable unsaturated bonds; initiator; water soluble polyvinyl alcohol overcoat
06/10/2003US6576396 Stable pigment dispersion and photosensitive recording material prepared therewith
06/10/2003US6576394 Negative-acting chemically amplified photoresist composition
06/10/2003US6576393 Composition for resist underlayer film and method for producing the same
06/10/2003US6576392 Positive photoresist composition
06/10/2003US6576391 Photosensitive paste a plasma display, and a method for the production thereof
06/10/2003US6576385 Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness
06/10/2003US6576384 The pattern images in the mask middle part-a slit shifts in a first direction and simultaneously, a workpiece comprising a photoresist coated silicon semiconductor wafer is shifted synchronously in the opposite direction
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