Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2003
06/19/2003US20030113666 Lithographic printing plate precursor
06/19/2003US20030113663 Negative photosensitive resin composition and display device using the same
06/19/2003US20030113662 Photo-curable resin composition, patterning process, and substrate protecting film
06/19/2003US20030113661 Chemical amplification type positive resist composition
06/19/2003US20030113660 Dihalomethyl sulfonyloxime compounds; for example, 2,2-difluoro-2-methylacetophenone-O-methylsulfonyloxime; heat stability and storage stability; sensitive to far ultraviolet radiation or electron beams; resists
06/19/2003US20030113659 Resist compositions and patterning process
06/19/2003US20030113658 Contains fluoroalkyl groups; for use in a chemically amplified radiation-sensitive resin mixture, gives high transparency, no bioaccumulation, high acidity of produced acid, high boiling point, short diffusion length
06/19/2003US20030113657 Exposing and then developing, wherein the exposed radiation sensitive polysilazane coating film is subjected to moistening treatment and then developed; use as finely patterned interlayer dielectric
06/19/2003US20030113655 Acid curable composition of an acid generator; an infrared absorber; and optional colorant
06/19/2003US20030113653 Imaging member containing carbon black and methods of imaging and printing
06/19/2003US20030113641 Method and system for determining overlay tolerance
06/19/2003US20030113640 Containing a photopolymerizable binder, a silica coated metal oxide pigment, a silane coupling agent, a free radical photointiator, and a azo-metal complex dye dissolved or dispersed in a solvent system
06/19/2003US20030113638 Lithographic template and method of formation and use
06/19/2003US20030113437 Metered application of imageable media
06/19/2003US20030113043 X-Y stage apparatus capable of reducing the number of drive sources
06/19/2003US20030112502 Device for exposing theremosensitive media
06/19/2003US20030112501 Optical member for photolithography and method for evaluating the same
06/19/2003US20030112421 Apparatus and method of image enhancement through spatial filtering
06/19/2003US20030112323 Laser drawing apparatus and laser drawing method
06/19/2003US20030111912 Following stage planar motor
06/19/2003US20030111771 Polymer casting method and apparatus
06/19/2003US20030111619 Electron beam exposure apparatus and exposing method using an electron beam
06/19/2003US20030111618 Methods and devices for detecting a distribution of charged-particle density of a charged-particle beam in charged-particle-beam microlithography systems
06/19/2003US20030111458 Temperature adjusting system in exposure apparatus
06/19/2003US20030111098 An additional antifoaming agent supplying unit is operatively associated with the stripper storing unit for dispensing an antifoam agent
06/18/2003EP1319988A2 High luminosity source for EUV lithography
06/18/2003EP1319987A2 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
06/18/2003EP1319986A1 A litographic apparatus and a device manufacturing method
06/18/2003EP1319985A2 Reticle
06/18/2003EP1319984A2 Lithography exposure device
06/18/2003EP1319983A2 Advanced illumination system for use in microlithography
06/18/2003EP1319982A1 Lithographic apparatus , device manufacturing method, and computer program
06/18/2003EP1319981A2 Positive resist composition
06/18/2003EP1319974A2 Aligner
06/18/2003EP1319616A2 Device for removing image recording material
06/18/2003EP1319247A2 Correction of overlay offset between inspection layers in integrated circuits
06/18/2003EP1319199A2 Pinhole defect repair by resist flow
06/18/2003EP1319198A1 Machine for the treatment of printing plates
06/18/2003EP1319197A2 Antireflective composition
06/18/2003EP1319170A1 Position measuring device
06/18/2003EP1066252B1 A process of controlling particle size of naphthoquinone diazide esters
06/18/2003EP1012783B1 Data-conversion method for a multibeam laser writer for very complex microlithographic patterns
06/18/2003EP0973808B1 Non-toxic initiators, resins with cross-linkable organofunctional groups containing same, and use for preparing stable and non-toxic polymers
06/18/2003CN1425147A Self-alignment hybridization process and component
06/18/2003CN1424743A Mask pattern forming method, computer programme product and optical mask production
06/18/2003CN1424742A Chemicals feeder
06/18/2003CN1424627A Exposure method and device
06/18/2003CN1424626A Forming method for photoresist design and its laminating products
06/18/2003CN1424625A Chemical amplitude increased positive corrosionproof agent composition
06/18/2003CN1424624A Photosensitive composition
06/18/2003CN1424594A Method for forming gratings by laser direct writing device
06/18/2003CN1424355A Polyimide/clay photosensitive nano composite material preparation
06/18/2003CN1111760C Antireflective coating for photoresist compositions
06/18/2003CN1111759C Liquid antireflective coating for photoresist compositions
06/18/2003CN1111758C Photosensitive resin composition and photosensitive element using resin composition
06/18/2003CN1111547C Light-absorbing polymers and application thereof to antireflection film
06/17/2003US6581193 Apparatus and methods for modeling process effects and imaging effects in scanning electron microscopy
06/17/2003US6580505 Overlay alignment mark design
06/17/2003US6580494 Method and system of distortion compensation in a projection imaging expose system
06/17/2003US6580493 Method and apparatus for exposing semiconductor wafers in a manner that promotes radial processing uniformity
06/17/2003US6580492 Reticle system for measurement of effective coherence factors
06/17/2003US6580491 Apparatus and method for compensating for distortion of a printed circuit workpiece substrate
06/17/2003US6580172 Providing transparent substrate; forming patterning layer on substrate; forming a patterned resist layer on surface of patterning layer; etching patterning layer, thereby defining an etched patterning layer; removing patterned resist layer
06/17/2003US6579917 Smoothes surface of stereolithography model by filling the stair-steppings; epoxy photocurable resin, microparticles
06/17/2003US6579810 Method of removing a photoresist layer on a semiconductor wafer
06/17/2003US6579805 In situ chemical generator and method
06/17/2003US6579668 Photoresist remover composition
06/17/2003US6579664 High performance, photoimageable resin compositions and printing plates prepared therefrom
06/17/2003US6579663 Organometallic monoacylarylphosphines
06/17/2003US6579662 Thermal switchable composition and imaging member containing complex oxonol IR dye and methods of imaging and printing
06/17/2003US6579661 Photopolymerizable composition for the production of flexographic printing forms for corrugated board printing
06/17/2003US6579660 Process for direct digital printing of circuit boards
06/17/2003US6579659 Chemically amplified positive resist composition
06/17/2003US6579658 Polymers, resist compositions and patterning process
06/17/2003US6579657 Composite comprising layer comprising crosslinked fine pattern-forming material comprising water soluble resin, mixture, or copolymer and crosslinking agent formed on photosensitive resist pattern made of acid-containing material
06/17/2003US6579651 Modification of mask layout data to improve mask fidelity
06/17/2003US6579471 Coating semiconductor wafer via dispensing slow-evaporation solvent on the wafer, spinning to distribute solvent, dispensing photoresist solution, and spinning to distribute photoresist; resuces surface tension and amount of resist
06/17/2003US6579371 Exhaust flow control system
06/17/2003US6579370 Apparatus and method for coating treatment
06/17/2003US6578853 Chuck assembly for use in a spin, rinse, and dry module and methods for making and implementing the same
06/17/2003US6578772 Removes air bubbles by filtering the resist solution to prevent the occurrence of air bubbles
06/12/2003WO2003049241A1 Timing control for two-chamber gas discharge laser system
06/12/2003WO2003049167A1 Method of high pressure treatment
06/12/2003WO2003049134A1 Electron emitter, cold-cathode field electron emitter, and method for manufacturing cold-cathode field electron emission display
06/12/2003WO2003048866A1 Composition for releasing a resist and method for manufacturing semiconductor device using the same
06/12/2003WO2003048865A1 Method for forming fine resist pattern
06/12/2003WO2003048863A1 Positive resist composition and method of forming resist pattern
06/12/2003WO2003048862A1 Positive resist composition and method of forming resist pattern
06/12/2003WO2003048861A1 Positive resist composition and method of forming resist pattern from the same
06/12/2003WO2003048860A1 Photosensitive composition and production processes for photosensitive film and printed wiring board
06/12/2003WO2003048857A1 Photolithographic critical dimension control using reticle measurements
06/12/2003WO2003048839A1 Homogenizer
06/12/2003WO2003048314A2 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
06/12/2003WO2003048235A1 Heat-curable resin composition
06/12/2003WO2003048234A1 Resin composition
06/12/2003US20030110465 Method and apparatus for controlling rippling during optical proximity correction
06/12/2003US20030109393 Method of ashing semiconductor device having metal interconnection
06/12/2003US20030109126 Method of producing semiconductor integrated circuit device and method of producing multi-chip module
06/12/2003US20030109098 Method for making semiconductor device
06/12/2003US20030108899 Detection hybrids; masking biosynthesis; photosensitive blocking agents; determination accumulated fluorescence radiation
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