G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2013
12/04/2013	CN102203676B Scatterometer and lithographic apparatus
12/04/2013	CN102096327B Exposure device, exposure method and producing method of display panel substrate
12/04/2013	CN101923294B Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof
12/04/2013	CN101866058B Polarization conversion device
12/04/2013	CN101825843B Photosensitive resin composition, method for forming interlayer organic insultion film between TFT-LCD and TFT-LCD
12/04/2013	CN101617274B Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method
12/04/2013	CN101609256B Ray-sensing resin composition for forming protective film and method for forming protective film
12/04/2013	CN101419410B Direct image exposure device
12/03/2013	US8599488 Optical arrangement of autofocus elements for use with immersion lithography
12/03/2013	US8599360 Reflective reticle chuck, reflective illumination system including the same, method of controlling flatness of reflective reticle using the chuck, and method of manufacturing semiconductor device using the chuck
12/03/2013	US8599357 Photolithography system
12/03/2013	US8598552 System and method to optimize extreme ultraviolet light generation
12/03/2013	US8598551 EUV radiation source comprising a droplet accelerator and lithographic apparatus
12/03/2013	US8598292 Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition
12/03/2013	US8597873 Method for pattern formation
12/03/2013	US8597872 Method for production of a medical marker
12/03/2013	US8597871 Three-dimensional direct-write lithography
12/03/2013	US8597870 TARC material for immersion watermark reduction
12/03/2013	US8597869 Sulfonium salt, resist composition, and patterning process
12/03/2013	US8597868 Negative resist composition and patterning process
12/03/2013	US8597867 Lactone copolymer and radiation-sensitive resin composition
12/02/2013	DE202010018039U1 Masken und/oder Blenden für eine Laseranlage zur Erzeugung von Mikrostrukturen auf einer Festkörperoberfläche, Mikrostruktur und Vorrichtung zur Herstellung dieser Masken und/oder Blenden sowie dieser Mikrostruktur Masks and / or diaphragms for a laser system for producing microstructures on a solid body surface, microstructure and apparatus for producing these masks and / or diaphragms and this microstructure
11/2013
11/28/2013	WO2013176797A1 Liquid platemaking process
11/28/2013	WO2013176517A1 Photosensitive resin composition, pattern formed using same and display panel comprising same
11/28/2013	WO2013176383A1 Triarylmethane blue dye compound, blue resin composition for color filter including same, and color filter using same
11/28/2013	WO2013176294A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
11/28/2013	WO2013176178A1 Exposure device, exposure method, and method for manufacturing device
11/28/2013	WO2013176063A1 Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device
11/28/2013	WO2013176029A1 Patterned roll and manufacturing method therefor
11/28/2013	WO2013175882A1 Cutting mechanism, joining mechanism, substrate processing system, substrate processing device, and substrate processing method
11/28/2013	WO2013175835A1 Reflector, projection optical system, exposure apparatus, and device manufacturing method
11/28/2013	WO2013175127A1 Surface preparation method
11/28/2013	WO2013174686A1 Imaging optical system and projection exposure installation
11/28/2013	WO2013174680A2 Adjustment device and mask inspection device with such an adjustment device
11/28/2013	WO2013174656A2 Lithographic apparatus
11/28/2013	WO2013174646A1 Lithographic apparatus and device manufacturing method
11/28/2013	WO2013174644A1 Facet mirror
11/28/2013	WO2013174539A1 Sensor, lithographic apparatus and device manufacturing method
11/28/2013	WO2013174522A1 Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof
11/28/2013	WO2013174398A1 Reticle, reticle-chuck, reticle positioning system and optical system
11/28/2013	WO2013174215A1 Photoresist stripping method after being etched by polyimide in manufacturing process of micromotor system
11/28/2013	WO2013174107A1 Prebaking device and exhaust method thereof
11/28/2013	US20130316510 Method of forming a resist pattern with multiple post exposure baking steps
11/28/2013	US20130316290 Liquid Platemaking Process
11/28/2013	US20130316288 Charged particle beam lithography apparatus and charged particle beam pattern writing method
11/28/2013	US20130316287 Photoresist composition
11/28/2013	US20130316286 Acrylic acid ester derivative, polymer compound and photoresist composition
11/28/2013	US20130316285 Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound
11/28/2013	US20130316274 Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof
11/28/2013	US20130316154 Stereolithography resin compositions and three-dimensional objects made therefrom
11/28/2013	US20130316152 Photoimaging
11/28/2013	US20130314710 Methods and Systems for Determining a Critical Dimension and Overlay of a Specimen
11/28/2013	US20130314686 Mask support frame and mask assembly having the same
11/28/2013	US20130314685 Mask
11/28/2013	US20130314684 Lithographic Apparatus and Device Manufacturing Method
11/28/2013	US20130314681 Arrangement for mounting an optical element
11/28/2013	US20130314679 Projection optical system, exposure apparatus, and exposure method
11/28/2013	US20130312628 Lithographic printing plate precursor
11/28/2013	DE102013201805A1 Lithography system has cooling element which is spaced apart and in surface contact with optical element in first and second actuator positions of actuator
11/28/2013	DE102012208793A1 Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik The imaging optics and projection exposure apparatus for projection lithography with such imaging optics
11/28/2013	DE102012208514A1 Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung Adjusting device and mask inspection apparatus having such adjustment device
11/28/2013	DE102012010093A1 Facettenspiegel Facet mirror
11/27/2013	EP2667254A1 Method of removing negative acting photoresists
11/27/2013	EP2667253A1 Environmental system including vacuum scavenge for an immersion lithography apparatus
11/27/2013	EP2667252A1 Environmental system including vacuum scavenge for an immersion lithography apparatus
11/27/2013	EP2667251A1 Original plate for direct-pattern waterless planographic printing plate
11/27/2013	EP2666057A1 Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
11/27/2013	EP2666056A1 Systems and methods for micro-contact stamping
11/27/2013	CN203311159U Main exposure equipment for platemaking of flexible printed board
11/27/2013	CN103415812A Electrostatic clamp, lithographic apparatus, and device manufacturing method
11/27/2013	CN103415811A Electrostatic clamp apparatus and lithographic apparatus
11/27/2013	CN103415810A 曝光装置 Exposure device
11/27/2013	CN103415809A Resist underlayer film formation composition and method for forming resist pattern using same
11/27/2013	CN103415808A Lithographic printing master plate and method for manufacturing lithographic printing plate
11/27/2013	CN103415540A Photosensitive composition, cured article, and method for producing actinically cured article
11/27/2013	CN103415498A Benzylidene substituted 2,4-pentanedione compounds and use thereof as stabilizers
11/27/2013	CN103412468A Splicing exposing method for photo-etched large-size CCD (Charge Coupled Device) chip
11/27/2013	CN103412467A Device for uniformity compensation along scan direction and uniformity compensation method utilizing the device
11/27/2013	CN103412466A 曝光装置和曝光方法 Exposure apparatus and exposure method
11/27/2013	CN103412465A Illuminating system of step scanning projection mask aligner
11/27/2013	CN103412464A Colored composition, color filter and display element
11/27/2013	CN102707582B Light source-mask synchronous optimization based on Abbe vector imaging model
11/27/2013	CN102707577B Servo-controlling system of macro-micro mechanism and control method thereof
11/27/2013	CN102621816B Method of adopting gray scale mode in write-through photoetching system to improve exposure graph quality
11/27/2013	CN102569538B Stripping method for use during manufacturing of light-emitting diode chip electrode
11/27/2013	CN102566288B Exposure method and system
11/27/2013	CN102486616B Exposure method
11/27/2013	CN102445158B Method for manufacturing high-temperature speckles
11/27/2013	CN102194654B Device and method for forming protective film on mini-camera chip
11/27/2013	CN102163000B Lithographic apparatus and device manufacturing method
11/27/2013	CN102144191B Radiation source and lithographic apparatus
11/27/2013	CN102046616B Polymer, resist composition, and process for producing semiconductor using resist composition
11/27/2013	CN102023481B Coloring composition, color filter and color liquid crystal display device
11/27/2013	CN101960384B Method for operating illumination system of microlithographic projection exposure apparatus
11/27/2013	CN101946212B Microlithographic projection exposure apparatus
11/27/2013	CN101918496B Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution by kneading
11/27/2013	CN101852983B Method for inspecting and judging photomask blank or intermediate thereof
11/27/2013	CN101681116B Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
11/27/2013	CN101644900B Exposure apparatus, method for manufacturing device
11/27/2013	CN101561638B Stage system calibration method, stage system and lithographic apparatus comprising such stage system

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