| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/25/2003 | EP1321824A2 Lithographic apparatus and integrated circuit device manufacturing method |
| 06/25/2003 | EP1321823A2 Lithographic apparatus and device manufacturing method |
| 06/25/2003 | EP1321822A1 Lithographic apparatus and device manufacturing method |
| 06/25/2003 | EP1321821A1 Photoresist composition for forming insulation film, insulation film for organic electroluminescence element and method for its formation |
| 06/25/2003 | EP1321510A2 Cleaning composition and method |
| 06/25/2003 | EP1321448A1 Method for reversibly changing the hydrophilic properties of a ceramic oxide or an oxidic ceramic |
| 06/25/2003 | EP1321440A2 Glass ceramic product and process of its manufacture |
| 06/25/2003 | EP1320913A1 High-peak-power laser device and application to the generation of light in the extreme ultraviolet |
| 06/25/2003 | EP1320857A2 Illumination system particularly for microlithography |
| 06/25/2003 | EP1320856A2 Illumination system particularly for microlithography |
| 06/25/2003 | EP1320855A2 Illumination system particularly for microlithography |
| 06/25/2003 | EP1320854A2 Illumination system particularly for microlithography |
| 06/25/2003 | EP1320853A2 Illumination system particularly for microlithography |
| 06/25/2003 | EP1320785A2 Oxime derivatives and the use thereof as latent acids |
| 06/25/2003 | EP1320784A1 Method for high yield reticle formation |
| 06/25/2003 | EP1198344B1 Method for producing microcomponents |
| 06/25/2003 | EP1149328A4 Method and assembly for producing printing plates |
| 06/25/2003 | EP1075642B1 Position coordinate measuring device for measuring structures on a transparent substrate |
| 06/25/2003 | CN1426544A Light carving rubber stripper composition |
| 06/25/2003 | CN1426452A 洗涤剂组合物 Detergent composition |
| 06/25/2003 | CN1426089A Drying method for microfine structure body and microfine structure body produced by said method |
| 06/25/2003 | CN1425958A Method for fixing biological macro molecule pattern on polymer active surface by micro transfer technology |
| 06/25/2003 | CN1425928A Colored light sensitive resin composition |
| 06/25/2003 | CN1425531A Laser processor |
| 06/25/2003 | CN1112603C Copolymer, its preparing process and device composition containing said copolymer and preparation for said device |
| 06/25/2003 | CN1112602C Low temperature metalization process of preparing thick film photoetching glue |
| 06/25/2003 | CN1112601C Technique for making X-ray mask |
| 06/24/2003 | USRE38153 Two-dimensional beam deflector |
| 06/24/2003 | US6584168 X-ray projection exposure apparatus and a device manufacturing method |
| 06/24/2003 | US6584132 Spinodal copper alloy electrodes |
| 06/24/2003 | US6583937 Illuminating system of a microlithographic projection exposure arrangement |
| 06/24/2003 | US6583934 Diffraction grating-based wavelength selection unit |
| 06/24/2003 | US6583931 Projection optical system, production method thereof, and projection exposure apparatus using it |
| 06/24/2003 | US6583881 Lithography using quantum entangled particles |
| 06/24/2003 | US6583859 Stage device, an exposure apparatus and a device manufacturing method using the same |
| 06/24/2003 | US6583858 Substrate holder for lithographic apparatus |
| 06/24/2003 | US6583857 Exposure apparatus and its making method, and device manufacturing method |
| 06/24/2003 | US6583856 Exposure apparatus and fabrication method of semiconductor device using the same |
| 06/24/2003 | US6583855 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/24/2003 | US6583854 Method and apparatus for the manufacture of circuits for a large display device using stitch exposure |
| 06/24/2003 | US6583853 Method of measuring exposure condition in projection exposure apparatus |
| 06/24/2003 | US6583850 Easy to implement compensation element for variable astig-matism |
| 06/24/2003 | US6583597 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same |
| 06/24/2003 | US6583431 Charged particle beam lithography apparatus for forming pattern on semi-conductor |
| 06/24/2003 | US6583430 Electron beam exposure method and apparatus |
| 06/24/2003 | US6583198 A photocurable resin consists of an acid modified vinyl group containing epoxy resin, an elastomer, a photopolymerization initiator, a diluent and a curing agent, can give high performance cured film |
| 06/24/2003 | US6583144 Piperazine substituted isoquinoline, 1,3-benzoxazine, or 1,3-benzothiazine derivatives; inhibitors against the biosynthesis of triglycerides and secretion of apolipoprotein b and treatment of hyperlipidemia |
| 06/24/2003 | US6583037 Method for fabricating gate of semiconductor device |
| 06/24/2003 | US6582978 Position detection mark and position detection method |
| 06/24/2003 | US6582908 Oligonucleotides |
| 06/24/2003 | US6582891 Process for reducing edge roughness in patterned photoresist |
| 06/24/2003 | US6582890 Multiple wavelength photolithography for preparing multilayer microstructures |
| 06/24/2003 | US6582889 A two layer structure resist pattern with a T-shaped cross section, overhang portions is heat treated so that it inclines downward |
| 06/24/2003 | US6582888 Two layers with different solubilities in solvents |
| 06/24/2003 | US6582886 Methyl ester; flexography |
| 06/24/2003 | US6582885 Polyimides, process for producing the same and photosensitive composition containing the same |
| 06/24/2003 | US6582883 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof |
| 06/24/2003 | US6582882 Imageable element comprising graft polymer |
| 06/24/2003 | US6582880 Polymers, resist compositions and patterning process |
| 06/24/2003 | US6582879 Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor |
| 06/24/2003 | US6582878 Coating on substrate chemical amplification resist comprising alkali-soluble base resin, photoacid generator and dissolution inhibitor, exposing coating to patterning radiation to decompose dissolution inhibitor, developing with aqueous base |
| 06/24/2003 | US6582877 Laser addressable thermal transfer imaging element with an interlayer |
| 06/24/2003 | US6582876 Thermal transfer element and process for forming organic electroluminescent devices |
| 06/24/2003 | US6582863 Method of controlling photolithography processes based upon scatterometric measurements of sub-nominal grating structures |
| 06/24/2003 | US6582862 Curable resin comprising polymer having main chain comprising constitutional unit having acid group and one having hydroxyl group, wherein isocyanate compound containing radical polymerizable group is bonded with acid and/or hydroxy groups |
| 06/24/2003 | US6582861 Etching using gaseous oxygen plasma; process control |
| 06/24/2003 | US6582860 Transferring the images of openings onto photoresists |
| 06/24/2003 | US6582496 Hollow fiber membrane contactor |
| 06/21/2003 | CA2414760A1 Radiation sensitive refractive index changing composition and refractive index changing method |
| 06/19/2003 | WO2003050857A1 Reflective illuminating optical element, reflective illuminating optical system, and duv to euv exposure device |
| 06/19/2003 | WO2003050856A1 Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method |
| 06/19/2003 | WO2003050622A1 Multi-tone photomask and method for manufacturing the same |
| 06/19/2003 | WO2003050621A1 Continuously adjustable neutral density filter |
| 06/19/2003 | WO2003050620A1 Image forming material |
| 06/19/2003 | WO2003050619A2 A method for producing a mask for high resolution lithography, a mask obtained thereby and a multi-layer element for high resolution lithography |
| 06/19/2003 | WO2003050617A2 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 06/19/2003 | WO2003050615A2 Photomask and method for qualifying the same with a prototype specification |
| 06/19/2003 | WO2003050614A2 System and method for reducing photoresist photo-oxidative degradation in 193 nm photolithography |
| 06/19/2003 | WO2003050613A2 Method and apparatus for modification of chemically amplified photoresist by electron beam exposure |
| 06/19/2003 | WO2003050587A2 Catadioptrical reduction lens |
| 06/19/2003 | WO2003050586A2 Mirror facet and facetted mirror |
| 06/19/2003 | WO2003050573A1 Microlens array fabrication |
| 06/19/2003 | WO2003050221A1 Compositions containing 1,3-dicarbonyl chelating agents for stripping residues from semiconductors |
| 06/19/2003 | WO2003050158A1 Polymeric compositions and uses therefor |
| 06/19/2003 | WO2003049868A1 Nozzle device, and substrate treating apparatus having the device |
| 06/19/2003 | WO2003032087A3 Aqueous developable photoimageable thick film compositions |
| 06/19/2003 | WO2002004233A8 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 06/19/2003 | US20030115556 Feed-forward lithographic overlay offset method and system |
| 06/19/2003 | US20030115005 System and method for controlling critical dimension in a semiconductor manufacturing process |
| 06/19/2003 | US20030114589 Novolak resin, a resin insoluble or poorly soluble itself in an alkali aqueous solution but becoming soluble by the action of an acid and an acid generator |
| 06/19/2003 | US20030114014 Photoresist stripping solution and a method of stripping photoresists using the same |
| 06/19/2003 | US20030114012 Method for forming pattern using argon fluoride photolithography |
| 06/19/2003 | US20030114010 Method of dry cleaning photoresist strips after via contact etching |
| 06/19/2003 | US20030114002 Methods and apparatus for patterning a surface |
| 06/19/2003 | US20030113674 At least one exposure is conducted through a regular mask, and at least one exposure through modified mask with a clear region overlapping the position of a non-clear region of the first mask |
| 06/19/2003 | US20030113673 Photoresist stripper compositions |
| 06/19/2003 | US20030113672 Used to flow photoresist under the high pressure in the sealed oven during a resist flow process |
| 06/19/2003 | US20030113670 Pattern formation material and pattern formation method |
| 06/19/2003 | US20030113668 Developer for alkaline-developable lithographic printing plates |
| 06/19/2003 | US20030113667 Method of preparing planographic printing plate |