Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2003
07/01/2003US6586162 Protective coating for silicon nitride spacer
07/01/2003US6586160 Method for patterning resist
07/01/2003US6586158 Anti-charging layer for beam lithography and mask fabrication
07/01/2003US6586157 Ester compounds, polymers, resist compositions and patterning process
07/01/2003US6586156 Etch improved resist systems containing acrylate (or methacrylate) silane monomers
07/01/2003US6586155 Forming electroconductive film pattern
07/01/2003US6586154 Photoresist polymer of following formula 1, and a photoresist composition comprising photoresist composition has excellent transparency in deep ultraviolet region, etching resistance and heat resistance, and can form a good pattern without
07/01/2003US6586153 Multilayer devices formed by multilayer thermal transfer
07/01/2003US6586152 Agent for reducing substrate dependence
07/01/2003US6586146 Exposure energy is calculated according to a critical dimension (CD) of an exposing layer. A first CD deviation is obtained from a layer before the exposing layer. From the first CD deviation, a first energy compensation is
07/01/2003US6586144 Lithography; screen printing, curing
07/01/2003US6586143 Chemical mechanical polishing (CMP) process and automatically compensating for alignment of a wafer stepper based on the position checking is described. A wafer is provided having an alignment mark thereon for the purpose of aligning a reticle
07/01/2003US6586142 Correct distortions due to optical proximity effects is described. A two reticle per pattern approach is used. The first, or primary, reticle contains the image that is to be transferred to the photoresist. The two overlap all line ends
07/01/2003US6585847 Actinic activation article shaping system
07/01/2003US6585837 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board
07/01/2003US6585825 Metal ion free solution containing base, silicate, stabilizer and water; removing photoresist residues and other metallic and organic contaminates from semiconductor wafers without damaging
07/01/2003US6585430 System and method for coating and developing
06/2003
06/26/2003WO2003052804A1 Substrate holding apparatus, exposure apparatus, and device manufacturing method
06/26/2003WO2003052790A2 Lens array with a laterally movable optical axis for corpuscular rays
06/26/2003WO2003052519A1 Developing solution for photoresist
06/26/2003WO2003052518A1 Developing solution for photoresist
06/26/2003WO2003052517A2 Photolithography overlay control using feedforward overlay information
06/26/2003WO2003052516A1 Method and apparatus for patterning a workpiece
06/26/2003WO2003052515A1 Method of forming optical images, diffraction element for use with this method, apparatus for carrying out this method
06/26/2003WO2003052514A2 Patterning of solid state features by direct write nanolithographic printing
06/26/2003WO2003052513A2 Lithographic template
06/26/2003WO2003052512A1 Mask pattern correction apparatus, mask pattern correction method, mask manufacturing method, and semiconductor device manufacturing method
06/26/2003WO2003052511A2 Imaging device in a projection exposure facility
06/26/2003WO2003052482A1 Imaging optical system and projection aligner
06/26/2003WO2003052462A2 Catadioptric reduction lens
06/26/2003WO2003051777A1 Method and apparatus for treating waste ozone water and apparatus for treatment with ozone
06/26/2003WO2003051631A1 Photosensitive composition and photosensitive planographic printing plate
06/26/2003WO2003017342A3 Method for the production of a self-adjusted structure on a semiconductor wafer
06/26/2003WO2002093201A3 Preferred crystal orientation optical elements from cubic materials
06/26/2003WO2002066262A3 Forming a mark on a gemstone or industrial diamond
06/26/2003US20030121023 Method and apparatus for reference distribution aerial image formation
06/26/2003US20030121022 Method and its apparatus for manufacturing simiconductor device
06/26/2003US20030121014 Design method for integrated circuit chips
06/26/2003US20030120018 Spin-on-glass anti-reflective coatings for photolithography
06/26/2003US20030120009 Polymer, resist composition and patterning process
06/26/2003US20030119980 High-solids coating composition which comprises (A) a compound which has at least one radically polymerizable unsaturated group per molecule, (B) a hydroxyl group-containing ester compound which is obtained by ester-forming addition reaction
06/26/2003US20030119957 Resist composition
06/26/2003US20030119931 Photopolymerizable mixtures of a vinyl ether, photoinitiator system of an iodonium salt, a visible light sensitizer, and electron donor compound, and optional spiroorthocarbonates, epoxides, polyols; e.g. dental composites
06/26/2003US20030119649 Exposure apparatus including silica glass for photolithography
06/26/2003US20030119333 Method and system for coating and developing
06/26/2003US20030119330 Bi-layer photoresist method for forming high resolution semiconductor features
06/26/2003US20030119318 Substrate processing method and substrate processing apparatus
06/26/2003US20030119286 Method for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
06/26/2003US20030119285 Method of manufacturing semiconductor device
06/26/2003US20030119216 Simulation-based feed forward process control
06/26/2003US20030119011 Arrays for detecting nucleic acids
06/26/2003US20030119008 Nucleotides and analogs having photoremovable protecting groups
06/26/2003US20030118951 Mixture containing silicate and alcohol compound
06/26/2003US20030118949 Negative working image forming; flooding exposure using actinic radiation
06/26/2003US20030118948 Method of etching semiconductor material to achieve structure suitable for optics
06/26/2003US20030118946 Photopolymerization
06/26/2003US20030118945 Method for making lithographic printing plate
06/26/2003US20030118944 Addition polymer; crosslinking
06/26/2003US20030118943 Frequency modulation screening; image-wise exposure; zone of ink receivers, ink repellents
06/26/2003US20030118942 Lithographic printing plate for infrared laser
06/26/2003US20030118941 Photocurable composition, cured product and process for producing the same
06/26/2003US20030118940 Multilayer ink jet print heads; crosslinked polymer
06/26/2003US20030118939 Heat sensitive elements; addition polymer; photopolymerization
06/26/2003US20030118935 Resist material and exposure method
06/26/2003US20030118934 Resist composition and patterning process
06/26/2003US20030118933 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same
06/26/2003US20030118925 Scanning projection exposure apparatus and aligning method therefor
06/26/2003US20030118923 High molecular weight crosslinked elastomer; shrinkage inhibition, crosslinking, softness, flexibility
06/26/2003US20030118922 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
06/26/2003US20030118920 Multi-tone photomask and method for manufacturing the same
06/26/2003US20030118919 Mask set for use in phase shift photolithography technique which is suitable to form random patterns
06/26/2003US20030118918 Photomask, production method of semiconductor laser element, and semiconductor laser element
06/26/2003US20030118743 Nanostructured and nanoporous film compositions, structures, and methods for making the same
06/26/2003US20030118740 Method of forming film and apparatus thereof
06/26/2003US20030118736 Organic polymer for anti-reflective coating layer and preparation thereof
06/26/2003US20030118341 Apparatus for developing substrate
06/26/2003US20030118072 Four KHz gas discharge laser system
06/26/2003US20030117680 Reflective diffraction of radiation beams for image registration
06/26/2003US20030117627 Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device
06/26/2003US20030117609 Device manufacturing-related apparatus, gas purge method, and device manufacturing method
06/26/2003US20030117608 Ultraviolet radiation exposure; shrinkage inhibition; semiconductor, integrated circuits
06/26/2003US20030117607 Projection aligner
06/26/2003US20030117606 System and method for laser beam expansion
06/26/2003US20030117605 Apparatus and method for contact hole exposure
06/26/2003US20030117604 Projection aligner
06/26/2003US20030117603 Projection aligner
06/26/2003US20030117602 Projection aligner
06/26/2003US20030117601 Pulse-width extending optical systems, projection-exposure apparatus comprising same, and manufacturing methods using same
06/26/2003US20030117600 Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
06/26/2003US20030117599 Exposing method
06/26/2003US20030117598 Method and apparatus for exposing photoresists using programmable masks
06/26/2003US20030117597 Device for exposure of a peripheral area
06/26/2003US20030117596 Exposure apparatus, substrate processing system, and device meanufacturing method
06/26/2003US20030117026 Moving-magnet linear motor, aligner and apparatus provided therewith, and method for manufacturing devices using the same
06/26/2003US20030116726 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site
06/26/2003US20030116721 Electron beam drawing apparatus
06/26/2003US20030116718 System and method for electron beam irradiation
06/26/2003US20030116529 Device for x-ray lithography
06/25/2003EP1322027A1 Moving-magnet linear motor, aligner and apparatus provided therewith, and method for manufacturing devices using the same
06/25/2003EP1321972A2 Trimming process for a structure of photoresist and organic antireflective layer
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