| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/03/2003 | WO2003054630A2 Device and method for modifying the surface of a workpiece using photonic radiation |
| 07/03/2003 | WO2003054629A1 Method of patterning a layer and method of manufacturing an electronic device |
| 07/03/2003 | WO2003054628A1 A low-cost lithography |
| 07/03/2003 | WO2003054590A1 Fluoride crystal material for optical device used for photolithographic apparatus and its manufacturing method |
| 07/03/2003 | WO2003054475A2 Parametric profiling using optical spectroscopic systems |
| 07/03/2003 | WO2003053882A1 Method for reversibly changing the hydrophilic properties of a ceramic oxide or an oxidic ceramic |
| 07/03/2003 | WO2003053845A2 Chemical functionalization nanolithography |
| 07/03/2003 | WO2003036686A3 Method of patterning electrically conductive polymers |
| 07/03/2003 | WO2003031096A3 Patterned structure reproduction using nonsticking mold |
| 07/03/2003 | US20030126582 Pattern correction method and manufacturing method of semiconductor device |
| 07/03/2003 | US20030126581 User interface for a network-based mask defect printability analysis system |
| 07/03/2003 | US20030125882 Method and apparatus for providing a bioinformatics database |
| 07/03/2003 | US20030125511 For semiconductors; high transmittance; improved dry etching resistance, adhesiveness, and wettability |
| 07/03/2003 | US20030125225 Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical |
| 07/03/2003 | US20030125184 Glass ceramic product with variably adjustable zero crossing of the CTE-T curve |
| 07/03/2003 | US20030124868 Pattern forming method |
| 07/03/2003 | US20030124865 Method for forming pattern using printing process |
| 07/03/2003 | US20030124759 Photo mask and semiconductor device manufacturing method |
| 07/03/2003 | US20030124757 Method of forming pattern |
| 07/03/2003 | US20030124470 A film, such as a layer of photoresist, is disposed on a first surface of a substrate while a second surface is exposed to a liquid bath. The liquid bath is maintained at a pre-selected temperature. Exposure of the substrate to the liquid bath |
| 07/03/2003 | US20030124469 Method and apparatus for uniformly baking substrates such as photomasks |
| 07/03/2003 | US20030124468 Amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist. The isocyanate group or the |
| 07/03/2003 | US20030124463 An optical exposure method and a device are used for forming patterns on a printed board wiring or semiconductor board. A single exposing region of a surface to be exposed is irradiated with a plurality of optical beams having different |
| 07/03/2003 | US20030124462 Removing sacrificial layers during the process of fabricating micro-mechanical devices with a solution of super- critical carbon dioxide. A mixture of super-critical carbon dioxide with other solvents, co-solvents and surfactants is used for |
| 07/03/2003 | US20030124461 Finely divided particles of inorganic material comprising conductive particles selected from RuO2, ruthenium- based polynary oxides or mixtures thereof; inorganic binder having a glass transition temperature in the range of from 325 to 600 |
| 07/03/2003 | US20030124460 Imageable elements useful as lithographic printing plate precursors and methods for their use are disclosed. The elements have a substrate, a layer of imageable composition over the substrate, and, optionally, an overcoat layer over |
| 07/03/2003 | US20030124457 Organic metal precursor for use in forming metal containing patterned films |
| 07/03/2003 | US20030124456 Negative resist composition |
| 07/03/2003 | US20030124455 Image recording material |
| 07/03/2003 | US20030124454 Process for making thermal negative printing plate |
| 07/03/2003 | US20030124453 Positive resist compositions containing non-polymeric silicon aditives |
| 07/03/2003 | US20030124451 Identification (ID) cards using a photosensitive imaging system employing microcapsules is described. In accordance with one aspect of the invention, ID cards are produced by translating an image containing identifying indicia into a |
| 07/03/2003 | US20030124443 Display devices formed as a plurality of unit panels on a large-sized sheet of glass using a stepper includes the steps of recording benchmark measurements of the large-sized sheet of glass, determining a change in dimension of the large-sized |
| 07/03/2003 | US20030124442 Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof |
| 07/03/2003 | US20030124439 Exposure positioning in photolithography |
| 07/03/2003 | US20030124437 Exposure method and apparatus for producing a hologram mask and recording method using the hologram mask |
| 07/03/2003 | US20030124249 Spin coating of a flat plate, such as an optical disc, using an inner guide member, which is placed in the hole, while the flat plate is placed on a stage such that the inner guide member is adjacent to an inner peripheral side |
| 07/03/2003 | US20030123152 Homogenizer |
| 07/03/2003 | US20030123042 Method and apparatus for a reticle with purged pellicle-to-reticle gap |
| 07/03/2003 | US20030123041 Stage device and exposure apparatus |
| 07/03/2003 | US20030123040 Optical spot grid array printer |
| 07/03/2003 | US20030123039 Photolithography process with multiple exposures |
| 07/03/2003 | US20030123038 Projection aligner, aberration estimating mask pattern,aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 07/03/2003 | US20030123037 Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element |
| 07/03/2003 | US20030123036 Piezoelectric actuator and a lithographic apparatus and a device manufacturing method |
| 07/03/2003 | US20030123035 Lithographic apparatus and device manufacturing method |
| 07/03/2003 | US20030123034 Method and apparatus of wafer exposure with correction feedback |
| 07/03/2003 | US20030123020 Method of dividing an exposing region |
| 07/03/2003 | US20030122143 Master base for fabrication and method for manufacturing the same |
| 07/03/2003 | US20030122105 Liquid crystal composition, selectively reflective film and method for producing the same |
| 07/03/2003 | US20030122091 Maskless photon-electron spot-grid array printer |
| 07/03/2003 | US20030122087 Exposure apparatus, control method thereof, and device manufacturing method |
| 07/03/2003 | US20030121799 Process control; monitoring concentration of hydrogen peroxide, hydroxylamine |
| 07/03/2003 | US20030121604 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board |
| 07/03/2003 | US20030121438 Apparatus and method for supporting and feeding printing plates in an imaging system |
| 07/03/2003 | US20030121437 Presensitized plate for preparing lithographic printing plate |
| 07/03/2003 | DE19937995C2 Verfahren zur Strukturierung einer organischen Antireflexionsschicht Method for structuring an organic anti-reflective layer |
| 07/02/2003 | EP1324138A2 Lithographic apparatus and device manufacturing method |
| 07/02/2003 | EP1324137A2 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor |
| 07/02/2003 | EP1324136A1 Lithographic projection apparatus and device manufacturing method |
| 07/02/2003 | EP1324135A1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition |
| 07/02/2003 | EP1324134A2 Resist composition and patterning process |
| 07/02/2003 | EP1324133A1 Photoresist compositions for short wavelength imaging |
| 07/02/2003 | EP1324093A1 Device for storing and transporting of optical elements |
| 07/02/2003 | EP1323742A2 Radiation sensitive refractive index changing composition and refractive index changing method |
| 07/02/2003 | EP1323721A2 Organic metal precursor for use in forming metal-containing patterned films |
| 07/02/2003 | EP1323216A1 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 07/02/2003 | EP1323004A1 Photosensitive resin composition for flexographic printing plates |
| 07/02/2003 | EP1228402A4 Composite relief image printing elements |
| 07/02/2003 | EP0980364B1 Process for preparing coumarin sulphonates |
| 07/02/2003 | EP0900150B1 Application to fabric of heat-activated transfers |
| 07/02/2003 | CN1427962A Nanostructures |
| 07/02/2003 | CN1427452A Method of forming patterned photoresist |
| 07/02/2003 | CN1427309A Substrate holder, exposure device and apparatus mfg. method |
| 07/02/2003 | CN1427308A Improved type exposure table main lens |
| 07/02/2003 | CN1427307A Photo-corrosion-resisting agent composition |
| 07/02/2003 | CN1427306A Radiation sensitive refractivity change composition and method for changing refractivity |
| 07/02/2003 | CN1427072A Liquid detergent for removing photoresist |
| 07/02/2003 | CN1427022A Poly-imide precursor, its preparing process and resin composition using same |
| 07/02/2003 | CN1113408C Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation |
| 07/02/2003 | CN1113273C Positive type photosensitive resin composition and semiconductor device using same |
| 07/02/2003 | CN1113253C Amplitude mask, and apparatus and method for mfg. long period grating filter using same |
| 07/02/2003 | CN1113084C Pigment composition, dispersion liquid containing same and color protective film for color filter |
| 07/01/2003 | US6587262 Light wavelength not more than 250 nm, difference between maximum and minimum value of transmittance (%/cm) per cm in thickness for the light in a predetermined direction within a plane perpendicular to optical axis not more than 2.0 %/cm. |
| 07/01/2003 | US6587194 Method of and apparatus for article inspection including speckle reduction |
| 07/01/2003 | US6587182 Illumination apparatus |
| 07/01/2003 | US6587181 One optical member of silica glass having sustantially no chlorine (1 ppm or less) and another of fluorine content of 0.01 to 0.5 wt %; semiconductor mask pattern using an excimer laser |
| 07/01/2003 | US6587178 Device structure that combines insulating materials for alignment posts and optical interference layers |
| 07/01/2003 | US6586816 Semiconductor structures formed using redeposition of an etchable layer |
| 07/01/2003 | US6586757 Plasma focus light source with active and buffer gas control |
| 07/01/2003 | US6586754 Servo control, and its application in a lithographic projection apparatus |
| 07/01/2003 | US6586753 Electron beam apparatus and electron beam adjusting method |
| 07/01/2003 | US6586619 5-norbornene-2-carboxylic acid-3-hydroxyethyl carboxylate for example; far ultraviolet photolithography |
| 07/01/2003 | US6586339 Silicon barrier layer to prevent resist poisoning |
| 07/01/2003 | US6586263 Correction of overlay offset between inspection layers in integrated circuits |
| 07/01/2003 | US6586211 Parallel synthesis of oligomeric building blocks; detaching from the support and bringing them in contact to synthesize DNA; directly converting genetic information into nucleic acids without using nucleic acid fragments already present |
| 07/01/2003 | US6586169 Forming structures in photosensitive layer |
| 07/01/2003 | US6586168 Exposure method based on multiple exposure process |
| 07/01/2003 | US6586164 Mixture containing alkylene carbonate |
| 07/01/2003 | US6586163 Method of forming fine pattern |