Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2003
07/10/2003US20030129509 Forming photoresist on semiconductor; exposure, development pattern
07/10/2003US20030129508 Apparatus and method for repairing resist latent images
07/10/2003US20030129506 Heat sensititve element on substrate
07/10/2003US20030129505 Photo mask
07/10/2003US20030129504 Photosensitive resin compositon, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof
07/10/2003US20030129503 Mask shaping using temporal and spatial coherence in ultra high resolution lithography
07/10/2003US20030129501 Exposure photosensitive media to optics intensity pattern; heating; controlling temperature; prevention variations in refractive index
07/10/2003US20030129051 Method and apparatus for transferring and loading a reticle with a robotic reticle end-effector
07/10/2003US20030128929 Method for fabricating chirped fiber Bragg gratings
07/10/2003US20030128870 System and method for aerial image sensing
07/10/2003US20030128803 X-ray mask and method for providing same
07/10/2003US20030128802 Resist material and exposure method
07/10/2003US20030128350 Stage device and exposure apparatus
07/10/2003US20030128349 Projection optical system and projection exposure apparatus having the same
07/10/2003US20030128348 Stage apparatus, scanning type exposure apparatus, and device produced with the same
07/10/2003US20030128347 Advanced exposure techniques for programmable lithography
07/10/2003US20030128346 Projection exposure apparatus
07/10/2003US20030128345 Scanning type exposure apparatus and a device manufacturing method using the same
07/10/2003US20030128344 Exposure method, exposure apparatus, method for adjusting the exposure apparatus, and device manufacturing method
07/10/2003US20030128308 Chuck for exposure apparatus
07/10/2003US20030127671 Semiconductor device having align key for defining active region and method for manufacturing the same
07/10/2003US20030127607 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
07/10/2003US20030127605 Substrate holding unit, exposure apparatus, and device manufacturing method
07/10/2003US20030127580 Mold for nano imprinting
07/10/2003US20030127116 Resist stripping method and apparatus
07/10/2003US20030127048 Coating apparatus, method for producing color filter substrate by use of the coating apparatus, and liquid-crystal display apparatus using the color filter substrate produced by the method
07/10/2003US20030127007 Nano-imprinting method, magnetic printing method and recording medium
07/10/2003US20030127002 Multilayer architechture for microcontact printing stamps
07/09/2003EP1326140A1 Resist development process
07/09/2003EP1326139A2 Exposure apparatus and device manufacturing method
07/09/2003EP1326138A1 Negative photosensitive polyimide composition and method of forming image from the same
07/09/2003EP1326137A1 Photosensitive insulating paste and thick-film multi-layer circuit substrate
07/09/2003EP1326136A1 Process of forming a micro-pattern of a metal or a metal oxide
07/09/2003EP1326114A1 Optical element holding device
07/09/2003EP1325810A2 Image recording material
07/09/2003EP1325513A1 Fluid pressure imprint lithography
07/09/2003EP1325388A2 Aqueous developer for negative working lithographic printing plates
07/09/2003EP1325387A2 Dissolution inhibitors in photoresist compositions for microlithography
07/09/2003EP1325386A1 Silica-based light-weight euv lithography stages
07/09/2003EP1324875A1 Seamless master and method of making same
07/09/2003EP0968459B1 Ternary photoinitiator system for curing of epoxy resins
07/09/2003EP0963552B1 System for detecting amine and other basic molecular contamination in a gas
07/09/2003EP0909311B1 Post clean treatment
07/09/2003CN1429353A Exposure controlling photomask and production method therefor
07/09/2003CN1429285A Fluoride crystalline optical lithography lens element blank
07/09/2003CN1428819A Method for detecting corrected accuracy of oplical cover machine table
07/09/2003CN1428659A Stripping liquid for photoresist and photoresist stripping method using said stripping liguid
07/09/2003CN1428658A Developing device and method
07/09/2003CN1428657A Method for detecting corrected accuracy of optical cover machine table
07/09/2003CN1428656A Exposure method and device for forming pattern on printing wiring board
07/09/2003CN1428655A Exposure method for making full image optical cover
07/09/2003CN1428654A Photosensitive ray composition and pattern forming method and method for mfg. semiconductor device
07/09/2003CN1428653A Photoresisting agent composition
07/09/2003CN1428652A Optical mask structure and its manufacture method
07/09/2003CN1428470A Length-measuring staying device for weft
07/09/2003CN1428358A Method for mfg. water alkaline-soluble resin, photosensitive resin composition, optical mask and electronic device
07/08/2003USRE38176 Scanning exposure method
07/08/2003US6591412 Methods for dividing a pattern in a segmented reticle for charged-particle-beam microlithography
07/08/2003US6591207 Semiconductor production system
07/08/2003US6590959 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses
07/08/2003US6590922 Injection seeded F2 laser with line selection and discrimination
07/08/2003US6590921 Narrow beam ArF excimer laser device
07/08/2003US6590718 Projection exposure system having a reflective reticle
07/08/2003US6590715 Optical projection system
07/08/2003US6590702 Multilayer antireflection film, optical member, and reduction projection exposure apparatus
07/08/2003US6590698 Ultraviolet laser apparatus and exposure apparatus using same
07/08/2003US6590656 Spectroscopic scatterometer system
07/08/2003US6590639 Active vibration isolation system having pressure control
07/08/2003US6590637 Exposure apparatus and method
07/08/2003US6590636 Projection exposure method and apparatus
07/08/2003US6590635 For imaging integrated circuit and flat panel displays uses a thermoresist instead of photoresist
07/08/2003US6590634 Exposure apparatus and method
07/08/2003US6590633 Stage apparatus and method for producing circuit device utilizing the same
07/08/2003US6590631 Exposure apparatus and device manufacturing method using the same
07/08/2003US6590355 Linear motor device, stage device, and exposure apparatus
07/08/2003US6590219 Apparatus and method for forming photoresist pattern with target critical dimension
07/08/2003US6590218 Projection-exposure methods and apparatus exhibiting increased throughput
07/08/2003US6590216 Servo control for high emittance electron source
07/08/2003US6590010 Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating
07/08/2003US6590009 Initiated by alkali metal aromatic boron salt
07/08/2003US6589889 Contact planarization using nanoporous silica materials
07/08/2003US6589880 Fine pattern formation method and semiconductor device or liquid crystal device manufacturing method employing this method
07/08/2003US6589719 Photoresist stripper compositions
07/08/2003US6589718 Forming a resist layer on a target layer and patterning the resist layer to form original openings and a slit in the resist layer, reflowing resist layer patterned under heat to cause deformation of original openings and the slit
07/08/2003US6589716 Coating a surface of a substrate with a photoresist; positioning a patterning mask above the photoresist; exposing photoresist to collimated beam of radiation; repeating positioning and exposing at least once before development
07/08/2003US6589715 The plasma polymerized organosilicon film having an upper stratum overlying a lower stratum wherein the upper stratum is more photosensitive to ultraviolet radiation than is the lower stratum
07/08/2003US6589713 Process for reducing the pitch of contact holes, vias, and trench structures in integrated circuits
07/08/2003US6589710 Comprises hydrophobic polymer particles in aqueous medium, substance for converting light into heat, and inorganic salt; for offset printing at long run lengths on lower quality paper in the presence of set-off powdersubstance for converting
07/08/2003US6589707 Photoresist acrylate and norbornene-type monomers having a 1,3,5,7-tetrasilacycloctanyl moiety attached; oxygen etch resistance; high contrast ratio; semiconductors
07/08/2003US6589705 For use in the production of semiconductor integrated circuit element, mask for the production of integrated circuit, printed-wiring board, liquid crystal panel, etc.
07/08/2003US6589439 Hydroxylammonium salt
07/08/2003US6589385 Resist mask for measuring the accuracy of overlaid layers
07/08/2003US6589354 Method and apparatus for in-situ lithography mask cleaning
07/08/2003US6588927 Purified developer producing equipment and method
07/08/2003US6588122 Minimal distance between ultraviolet radiator and substrate while irradiating in translational or rotational movement achieves intense and uniform illumination
07/08/2003CA2231011C Lithographic printing system with reusable support surfaces and lithographic constructions for use therewith
07/03/2003WO2003054936A1 Gas purging method and exposure system, and device production method
07/03/2003WO2003054749A1 Scaling method for a digital photolithography system
07/03/2003WO2003054632A1 Method and apparatus for image formation
07/03/2003WO2003054631A1 Method for optimizing the imaging characteristics of at least two optical elements and photolithographic production process
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