Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2003
07/17/2003US20030133088 Scanning exposure apparatus
07/17/2003US20030133087 Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method
07/17/2003US20030132818 Manufacturing method of semiconductor device
07/17/2003US20030132401 Surface position detecting method
07/17/2003US20030132400 Lithographic apparatus and device manufacturing method
07/17/2003US20030132382 System and method for inspecting a mask
07/17/2003US20030132197 Reducing photoresist shrinkage via plasma treatment
07/17/2003US20030131902 Vacuum load lock, system including vacuum load lock, and associated methods
07/17/2003CA2472315A1 Method for the production of a flexographic plate and flexographic plate obtained according to said method
07/17/2003CA2469095A1 Multiphoton photosensitization system
07/16/2003EP1327913A2 Method and apparatus for transferring and loading a reticle with a robotic reticle end-effector
07/16/2003EP1327912A1 Lithographic apparatus and device manufacturing method
07/16/2003EP1327911A1 Liquid, radiation-curable composition, especially for stereolithography
07/16/2003EP1327705A1 Method for producing metal mask and metal mask
07/16/2003EP1327642A1 Carboxylated photosensitive resin, alkali-developable photocurable/heat-curable composition containing the same, and cured article obtained therefrom
07/16/2003EP1327594A1 Apparatus and Method for Supporting and Feeding Printing Plates in an Imaging System
07/16/2003EP1327172A1 8-mirrored microlithographic projector lens
07/16/2003EP1326951A1 Stabilized alkaline compositions for cleaning microelectronic substrates
07/16/2003EP1326906A2 Fractionation of resins using a static mixer and a liquid-liquid centrifuge
07/16/2003EP1326903A2 Compositions for microlithography
07/16/2003EP0772801B1 A positioning device with a reference frame for a measuring system
07/16/2003CN1430790A Method for forming bottom anti-reflective coating using rapid thermal anneal with oxidizing gas
07/16/2003CN1430658A Water-based coating composition curable with actinicenergy ray, coated metallic material with cured film of the composition, production process, and method of bonding coated matellic material
07/16/2003CN1430244A Micropattern manufacturing process with multiexposing steps
07/16/2003CN1430101A Light source generator and exposure method of contact hole
07/16/2003CN1430100A Regnlatable polarized light reaction photoresist and microimage teohnology using said photoresist
07/16/2003CN1430099A Manufacturing method of micro-pipeline
07/16/2003CN1429664A Applying method of liquid and its resin coating forming method
07/16/2003CN1114841C Photoimageable compositions
07/15/2003US6594817 Reticle exposure matrix
07/15/2003US6594334 Exposure method and exposure apparatus
07/15/2003US6594093 Adjusting apparatus for an optical element in a lens system
07/15/2003US6594079 Image screen and method of forming anti-reflective layer thereon
07/15/2003US6594034 Method and apparatus for modifying raster data
07/15/2003US6594012 Exposure apparatus
07/15/2003US6593998 Projection exposure system
07/15/2003US6593997 Stage assembly including a reaction assembly
07/15/2003US6593686 Electron gun and electron beam drawing apparatus using the same
07/15/2003US6593585 Optical apparatus comprising lenses, masking and substrate holders, light sources and mirrors for shaping and focusing radiation beams
07/15/2003US6593583 Ion beam processing position correction method
07/15/2003US6593446 Copolymer comprising styrene and 3,3-alkoxypropene derivative monomers; light absorber; semiconductors
07/15/2003US6593441 Photosensitive polymer and chemically amplified photoresist composition containing the same
07/15/2003US6593216 Method for producing semiconductor device
07/15/2003US6593214 Method of manufacturing semiconductor device
07/15/2003US6593067 Selectively exposing a portion of a photosensitive material to the high energy light source; and performing a heat-treatment for melting and deforming only an upper portion of the exposed portion of the photosensitive material
07/15/2003US6593066 Method and apparatus for printing patterns on substrates
07/15/2003US6593065 Method of fabricating nanometer-scale flowchannels and trenches with self-aligned electrodes and the structures formed by the same
07/15/2003US6593064 High resolution optical stepper
07/15/2003US6593063 Method of manufacturing a semiconductor device having an improved fine structure
07/15/2003US6593060 High image quality capable of reproducing, with the same texture as in printed matters, the special colors which cannot be reproduced by organic pigments
07/15/2003US6593059 Heat sensitive elements; graft polymer
07/15/2003US6593058 Photoresists, polymers and processes for microlithography
07/15/2003US6593057 Heat-sensitive lithographic printing plate precursor
07/15/2003US6593056 Chemically amplified positive resist composition and patterning method
07/15/2003US6593055 Useful as lithographic printing plate precursors, that can be thermally imaged and processed with aqueous alkaline developers
07/15/2003US6593054 Comprises diazo resin, photopolymerizable resin, or photocrosslinkable resin; for increasing adhesion to aluminum substrate
07/15/2003US6593043 Composition of positive photosensitive resin precursor, and display device thereof
07/15/2003US6592939 System for and method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption
07/15/2003US6592936 Spin coating method and coating apparatus
07/15/2003US6592932 Nozzle arm movement for resist development
07/10/2003WO2003056611A2 Resistless lithography method for producing fine structures
07/10/2003WO2003056476A1 Design driven inspection or measurement
07/10/2003WO2003056393A1 Coating material for pattern fineness enhancement and method of forming fine pattern with the same
07/10/2003WO2003056392A1 Determining the aberrations of an imaging system
07/10/2003WO2003056391A1 Radiation-sensitive resin composition and process for formation of patterns
07/10/2003WO2003032086A3 Carl for bioelectronics: substrate linkage using a conductive layer
07/10/2003WO2002088843A3 Exposure method and apparatus
07/10/2003WO2002066263A3 Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof
07/10/2003US20030130482 Coating a novolac resin with average molecular weight of 1000-3000 amu and that has been fractionated to remove molecules < 350 amu and (non)fluorinated hydrocarbons onto a substrate and heating; smokeless
07/10/2003US20030130475 Active energy ray-curable polyimide resin composition
07/10/2003US20030130409 Resist composition
07/10/2003US20030130371 An aqueous radiation-curable blend of an acrylated resin having a phosphate group, an unsaturated phosphate compound and an unsaturated resin; high solvent resistance and adhesion to metal surface material; weldable joints
07/10/2003US20030130370 Photoinitiators for acrylic esters; reacting an acyl halide with a metal benzoyl phosphine; cable coatings, screen printing stencils, resist materials, colour filters, electrical encapsulation
07/10/2003US20030130342 Such as anticoagulant 3-(6-(4-(aminoiminomethyl)phenyl methoxy)-2-methyl-2H-1-benzopyran-2-yl)propanoic acid hydrochloride
07/10/2003US20030130149 Sulfoxide pyrolid(in)one alkanolamine cleaner composition
07/10/2003US20030130148 Aqueous solution containing surfactant; exposure photoresist pattern to development; removal residues
07/10/2003US20030130147 Stripping composition
07/10/2003US20030130146 Aqueous stripping and cleaning composition
07/10/2003US20030129818 Masking member for forming fine electrode and manufacturing method therefor, method for forming electrode, and field effect transistor
07/10/2003US20030129816 Plasma enhanced method for increasing silicon-containing photoresist selectivity
07/10/2003US20030129788 Compound semiconductor device
07/10/2003US20030129548 Photoresist masking; exposure to solvent vapors; reducing thickness; semiconductor wafer
07/10/2003US20030129547 Process for producing an image using a first minimum bottom antireflective coating composition
07/10/2003US20030129545 Method and apparatus for use of plasmon printing in near-field lithography
07/10/2003US20030129544 Supplying nozzle for rinsing liquids; applying ultrasonic vibrations; amplification; lithography
07/10/2003US20030129543 Multilayer; patterned photoresists; stacks forming aperture pattern; etching; calibration masking
07/10/2003US20030129540 Method of forming a self-aligned twin well structrue with a single mask
07/10/2003US20030129539 Bi-layer photoresist dry development and reactive ion etch method
07/10/2003US20030129538 Forming patterned photoresists; resolution enhancement lithography assisted chemical strinkage
07/10/2003US20030129537 Method of treating photoresists using electrodeless UV lamps
07/10/2003US20030129536 Method of fabricating circuitized structures
07/10/2003US20030129535 Photopolymerizable epoxy resin
07/10/2003US20030129534 Overcoating substrate with photoresist , acid generator and antireflective coating
07/10/2003US20030129531 Positive-working photoimageable bottom antireflective coating
07/10/2003US20030129529 Modified pigment products and black matrixes comprising same
07/10/2003US20030129527 Negative deep ultraviolet photoresist
07/10/2003US20030129526 Two-layer imageable composition including non-volatile acid in bottom layer
07/10/2003US20030129524 Negative working lithography printing plates
07/10/2003US20030129523 Photopolymerizable composition and recording material using the same
07/10/2003US20030129521 Multicolor recording
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