Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2003
07/23/2003EP1328404A2 Aqueous developer for lithographic printing plates
07/23/2003EP0983151B1 Planographic printing
07/23/2003EP0981936A4 Plasma focus high energy photon source
07/23/2003EP0974076B1 Method of producing an optical element and optical element therefrom
07/23/2003EP0946900B1 Lithographic pneumatic support device with controlled gas supply
07/23/2003EP0911698B1 Photosensitive composition and method of pattern formation
07/23/2003CN2561582Y Safety photosensitive seal device
07/23/2003CN1432190A Enhanced resist strip in dielectric ethcher using downstream plasma
07/23/2003CN1432142A 多光束图案生成器 The multi-beam pattern generator
07/23/2003CN1432141A Photosensitive resin compsn., photosensitive element, prodn. method for resist pattern and prodn. method for printed circuit board
07/23/2003CN1432140A Solid imaging compsns. for preparing polypropylene-like articles
07/23/2003CN1432029A Photoionizable solidified compsns. solidified body and its mfg. process
07/23/2003CN1431851A Mask and its mfg. method, electroluminance device and its mfg. method and electronic machine
07/23/2003CN1431687A Method for removing photoresistive layer in mfg. process of inserting metals
07/23/2003CN1431680A Method for forming structure of fine sizes
07/23/2003CN1431561A Method of removing conformation layer from lower layer via counterflow
07/23/2003CN1431560A Automatic feedback modified exposure method and system
07/23/2003CN1431559A PS printing plate with steel base
07/23/2003CN1431558A Method for modifying charactristie pattern of regular polygon mask by use optical proximity effect
07/23/2003CN1431103A Method for engraving calligraphy and painting on plate of hard material and engraved products
07/23/2003CN1115714C Device and method for jet-coating photoresit
07/23/2003CN1115595C Liquid photosensitive compsn.
07/23/2003CN1115594C Reproduction method
07/23/2003CN1115189C Method of separating organic solutions when preparing printed circcuit board
07/22/2003USRE38199 Method for preparation of lithographic printing plate and lithographic printing plate prepared thereby
07/22/2003US6598185 Pattern data inspection method and storage medium
07/22/2003US6597511 Microlithographic illuminating system and microlithographic projection exposure arrangement incorporating said system
07/22/2003US6597498 Optical system for the vacuum ultraviolet
07/22/2003US6597459 Data age adjustments
07/22/2003US6597447 Method and apparatus for periodic correction of metrology data
07/22/2003US6597440 Wavefront measuring method and projection exposure apparatus
07/22/2003US6597435 Reticle stage with reaction force cancellation
07/22/2003US6597434 Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/22/2003US6597433 Multi-stage drive arrangements and their application in lithographic projection apparatuses
07/22/2003US6597432 Board-stage for an aligner
07/22/2003US6597431 Lithographic projection apparatus and device manufacturing method
07/22/2003US6597430 Exposure method, illuminating device, and exposure system
07/22/2003US6597429 Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/22/2003US6597003 Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers
07/22/2003US6597002 Scanning exposure apparatus and its making method, and device manufacturing method
07/22/2003US6597001 Method of electron-beam exposure and mask and electron-beam exposure system used therein
07/22/2003US6596830 With acid generators for microlithography, argon fluoride lithography, and electron beam lithography
07/22/2003US6596656 Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM
07/22/2003US6596603 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method
07/22/2003US6596469 Using a heat sensitive coating of a polymer where aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by delivery of heat
07/22/2003US6596468 Liftoff mask is used for both the trench formation and the filling processes
07/22/2003US6596463 Ester compounds, polymers, resist compositions and patterning process
07/22/2003US6596459 Photosensitive polymer and resist composition containing the same
07/22/2003US6596458 Positive-working photoresist composition
07/22/2003US6596457 Positive photosensitive lithographic printing plate responsive to near infrared rays; method of producing it and method for forming a positive image
07/22/2003US6596456 Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
07/22/2003US6596448 Alternating phase shift pattern on the peripheries of an alternating phase shift mask and a modification pattern on the peripheries of a modification pattern.
07/22/2003US6596446 Used in in printing inks
07/22/2003US6596445 Initiators for photopolymerization of radically polymerizable compounds
07/22/2003US6596443 Mask for patterning devices
07/22/2003US6596405 Antireflective porogens
07/22/2003US6596346 Activating the surface of polysiloxane or polycarbosilane stamp by oxygen plasma or photoactive crosslinker, reacting activated surface with a hydrophilic polymer
07/22/2003US6596141 Field emission display having matrix material
07/22/2003US6595787 Low cost integrated out-of-plane micro-device structures and method of making
07/17/2003WO2003058687A1 Method of detecting, identifying and correcting process performance
07/17/2003WO2003058681A2 Differential detector coupled with defocus for improved phase defect sensitivity
07/17/2003WO2003058665A2 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp
07/17/2003WO2003058350A1 A cleaning agent composition for a positive or a negative photoresist
07/17/2003WO2003058349A2 Method for the production of a flexographic plate and flexographic plate obtained according to said method
07/17/2003WO2003058348A1 Process for producing an image using a first minimum bottom antireflective coating composition
07/17/2003WO2003058347A1 Negative deep ultraviolet photoresist
07/17/2003WO2003058346A1 Multiphoton photosensitization system
07/17/2003WO2003058345A2 Negative-working photoimageable bottom antireflective coating
07/17/2003WO2003058344A2 System and method for aerial image sensing
07/17/2003WO2003057811A1 Supercritical fluid cleaning of semiconductor substrates
07/17/2003WO2003057784A2 Modified pigment products and black matrixes comprising same
07/17/2003WO2003057678A1 Positive-working photoimageable bottom antireflective coating
07/17/2003WO2003057484A1 Laminated film
07/17/2003WO2003057352A1 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
07/17/2003WO2003057343A1 Liquid medicine supplying device and mwthod for supplying liquid medicine
07/17/2003WO2003030228A3 Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
07/17/2003US20030135045 Glycoprotein IIb/IIIa antagonists
07/17/2003US20030134936 Stabilized imageable coating composition and printing plate precursor
07/17/2003US20030134931 Radiation curable aqueous compositions
07/17/2003US20030134518 System for removal of photoresist using sparger
07/17/2003US20030134234 Photoresist stripping solution and a method of stripping photoresists using the same
07/17/2003US20030134232 Radiation-sensitive composition and method for forming patterns and fabricating semiconductor devices
07/17/2003US20030134231 Bi-layer photoresist dry development and reactive ion etch method
07/17/2003US20030134230 An offset plate sensitive to UV or visible light, prepared simply and imaged digitally therewith in a CTP method, and also processed in a simple manner. The plate is provided as a photopolymer plate with increased sensitivity, and is used in
07/17/2003US20030134228 A scintillating structure for aligning an electron or ion beam using a detector while exposing a wafer, which may be a wafer or mask, is described. The structure is formed by a resist including a polymer with carboxylic acid groups,
07/17/2003US20030134227 New photoacid generator compounds ("PAGs") are provided and photoresist compositions that comprise such compounds. In particular, cyclic sulfonium and sulfoxonium PAGs are provided. PAGs of the invention are particularly useful as
07/17/2003US20030134226 High-temperature-stable polybenzoxazoles are formed from novel poly-o-hydroxyamides. The novel poly-o-hydroxyamides have low dielectric constants, are suitable for exposure at 248 nm or shorter wavelengths, and have hydroxyl groups at
07/17/2003US20030134225 Positive resist composition
07/17/2003US20030134224 Resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation.
07/17/2003US20030134223 Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
07/17/2003US20030134222 Photoresist composition and method of forming pattern using the same
07/17/2003US20030134221 Positive resist composition
07/17/2003US20030134208 Method for producing a semiconductor device
07/17/2003US20030134205 Producing a photomask for semiconductor photolithography processing
07/17/2003US20030134053 Method and apparatus for linking and/or patterning self-assembled objects
07/17/2003US20030134044 Film forming apparatus, film forming method and tray for substrate
07/17/2003US20030133125 Alignment stage, exposure apparatus, and semiconductor device manufacturing method
07/17/2003US20030133115 Method of measuring photoresist and bump misalignment
07/17/2003US20030133104 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes
07/17/2003US20030133099 Reticle and optical characteristic measuring method
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