| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/29/2003 | US6599829 Method for photoresist strip, sidewall polymer removal and passivation for aluminum metallization |
| 07/29/2003 | US6599766 Method for determining an anti reflective coating thickness for patterning a thin film semiconductor layer |
| 07/29/2003 | US6599687 Applying a solution of a photosensitive polyhydroxyamide or polyhydroxyimide to a substrate and drying |
| 07/29/2003 | US6599683 Photoresist developer with reduced resist toppling and method of using same |
| 07/29/2003 | US6599682 Controlling refractive index and light absorption coefficient of the antireflection coating film by appropriately selecting the types of compositions; films thickness very small |
| 07/29/2003 | US6599680 Method for forming cells array of mask read only memory |
| 07/29/2003 | US6599679 Photosensitive flexographic printing element having an IR-ablative layer comprising polyether-polyurethanes |
| 07/29/2003 | US6599678 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof |
| 07/29/2003 | US6599677 Forming relief images; transferring image |
| 07/29/2003 | US6599676 Patterning composition layer on a substrate, said patterning composition comprising: at least one acid generator which is sensitive to UV radiation; at least one cross-linking resin or compound; at least one binder resin comprising a polymer |
| 07/29/2003 | US6599675 Useful for application of photoresist, as an insulation film; heat resistance, mechanical properties and adhesion property |
| 07/29/2003 | US6599670 For photoresist films |
| 07/29/2003 | US6599665 Empolying differing radiation dosages to expose photoresist; using dummy features to eliminate loading effect of etch rate at marginal areas |
| 07/29/2003 | US6599605 Digital versatile disc high density recording layer |
| 07/29/2003 | US6599587 Silver, gold, copper, palladium, nickel or platinum complexed with one or two imidazolylidene compounds and optionally abetadiketone; photopatterning without a resist |
| 07/29/2003 | US6599571 Spin coating methods |
| 07/29/2003 | US6599438 Process for ashing organic materials from substrates |
| 07/29/2003 | US6599437 Method of etching organic antireflection coating (ARC) layers |
| 07/29/2003 | US6599370 For stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants |
| 07/29/2003 | US6598789 Substrate managing system and substrate storing system |
| 07/29/2003 | US6598526 Lithographic printing plates for use with laser imaging apparatus |
| 07/29/2003 | CA2016919C Photosensitive resin compositions |
| 07/24/2003 | WO2003061354A2 System and methods for conveying and transporting levitated articles |
| 07/24/2003 | WO2003060961A1 High-performance non-contact support platforms |
| 07/24/2003 | WO2003060610A1 Methods and systems for microscopic imaging |
| 07/24/2003 | WO2003060600A1 Method for forming pattern on substrate and method for fabricating liquid crystal display using the same |
| 07/24/2003 | WO2003060045A1 Aqueous stripping and cleaning composition |
| 07/24/2003 | WO2003060010A1 Solvent-soluble block copolyimide composition and process for producing the same |
| 07/24/2003 | WO2003059975A1 Photosensitive resin composition and printed wiring boards |
| 07/24/2003 | WO2003059486A1 Liquid medicine supplying device and method for venting air from liquid medicine supplying device |
| 07/24/2003 | WO2003035770A3 Process for making green pigment compositions useful for colour filters and lcd's |
| 07/24/2003 | WO2002091084A3 Resist with reduced line edge roughness |
| 07/24/2003 | WO2002071150A3 Lithographic template |
| 07/24/2003 | WO2002014078A3 Deformable stamp for patterning three-dimensional surfaces |
| 07/24/2003 | US20030140330 Method for correcting a mask pattern, a computer program product, a method for producing a photomask, and method for manufacturing a semiconductor device |
| 07/24/2003 | US20030140329 Method for forming exposure pattern and exposure pattern |
| 07/24/2003 | US20030139847 Visually enhanced intelligent article tracking system |
| 07/24/2003 | US20030139833 Methods and apparatus for determining optimum exposure threshold for a given photolithographic model |
| 07/24/2003 | US20030139613 Esterification to get cyclic acrylate compounds; used as raw material for functional polymers, pharmaceuticals, pesticides, semiconductor lithography |
| 07/24/2003 | US20030139499 Photo-cured and stabilized coatings |
| 07/24/2003 | US20030139486 Radiation sensitive refractive index changing composition and refractive index changing method |
| 07/24/2003 | US20030139485 Organometallic monoacylalkylphosphines |
| 07/24/2003 | US20030139484 Photoinitiators |
| 07/24/2003 | US20030139063 Method of forming coating film, method of manufacturing semiconductor device and coating solution |
| 07/24/2003 | US20030139057 Process and apparatus for removal of photoresist from semiconductor wafers |
| 07/24/2003 | US20030139055 Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device |
| 07/24/2003 | US20030139054 Pattern formation method |
| 07/24/2003 | US20030139044 Moving apparatus and control method therefor, and device manufacturing method |
| 07/24/2003 | US20030139042 Method in connection with the production of a template and the template thus produced |
| 07/24/2003 | US20030138842 Forming functionally organized, spatially patterned, alternating current mediated, self supporting, organic polymer-microparticle thin films/hydrogels |
| 07/24/2003 | US20030138742 Exposure method and exposure apparatus |
| 07/24/2003 | US20030138741 A patterned, multi-transmissive mask is used during patterning of resists to control exposure at areas of the resist at which features having different detail are desired |
| 07/24/2003 | US20030138737 Photoresist stripping solution and a method of stripping photoresists using the same |
| 07/24/2003 | US20030138736 Method for decreasing surface defects of patterned resist layer |
| 07/24/2003 | US20030138735 Exposing surface of underlying antireflective film containing silicon oxynitride to plasma (oxygen) for amplification/development |
| 07/24/2003 | US20030138734 Comprises array of configurable pixels, radiation source, and projection system for geometric patterning; electronics, semiconductors |
| 07/24/2003 | US20030138733 Comprises acrylic acid-acrylonitrile-butadiene terpolymer binder; for protective/passivative coatings, defect repair in ceramic and thin film products within printed circuits; solvent-free |
| 07/24/2003 | US20030138732 Method for preparing lithographic printing plate |
| 07/24/2003 | US20030138731 Photoresist formulation for high aspect ratio plating |
| 07/24/2003 | US20030138727 Positive photosensitive resin composition |
| 07/24/2003 | US20030138726 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices |
| 07/24/2003 | US20030138725 Comprises alkali-soluble polymer (polyvinylphenol), photoacid generator (triphenyl sulfonium trifluoromethanesulfonic acid), and adamantyl alcohol capable of dehydration bonding with polymer; antiswelling; improved resolution |
| 07/24/2003 | US20030138724 Comprises alkali soluble polymer (polyvinylphenol), photoacid generator (triphenyl sulfonium trifluoromethanesulfonate), and adamantyl alcohol capable of dehydration bonding with polymer; antiswelling; improved resolution |
| 07/24/2003 | US20030138723 Hydrogen bonding between hydrophobic groups of matrix comprising degradable methyacrylate-methoxyethylcyanoacrylate and nondegradable methacrylate-methyl methacrylate copolymer improves retention of infrared-absorbing material |
| 07/24/2003 | US20030138719 Thermal transfer film, thermal transfer recording medium, and method for image formation using the same |
| 07/24/2003 | US20030138710 Comparing an analysis of the purity of stripper composition with that of the reference and then replacing or delivering to the next station; automatic; semiconductor, semiconductor device or a liquid crystal display device |
| 07/24/2003 | US20030138709 Using an imaging system to capture a digital image of the wafer below the surface of the obscuring layer; the reflected image of the alignment marks below differs from the reflected image; scanning electron microscope; accuracy; semiconductors |
| 07/24/2003 | US20030138708 Aqueous developable photoimageable thick film compositions with photospeed enhancer |
| 07/24/2003 | US20030138704 Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features |
| 07/24/2003 | US20030138607 Transferable image receiving sheet and imaging process by use thereof |
| 07/24/2003 | US20030138589 Stamper, manufacturing method therefor and optical device manufactured therewith |
| 07/24/2003 | US20030138363 Device for chemical and biochemical reactions using photo-generated reagents |
| 07/24/2003 | US20030137749 Projection exposure apparatus and method |
| 07/24/2003 | US20030137745 Projection optical system |
| 07/24/2003 | US20030137733 Objective with lenses made of a crystalline material |
| 07/24/2003 | US20030137654 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparautus, and method for manufacturing micro device |
| 07/24/2003 | US20030137644 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 07/24/2003 | US20030137643 Lithographic apparatus and device manufacturing method |
| 07/24/2003 | US20030137632 Cholesteric liquid crystal color filter and process for producing the same |
| 07/24/2003 | US20030137626 Method of making a passive patterned retarder and retarder made by such a method |
| 07/24/2003 | US20030137551 Device, method and computer program for transmitting data |
| 07/24/2003 | US20030137314 Annular illumination method for charged particle projection optics |
| 07/24/2003 | US20030136923 Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines |
| 07/24/2003 | US20030136922 Projection-exposure methods and apparatus exhibiting increased throughput |
| 07/24/2003 | US20030136769 Laser ablation technique using in IC etching process |
| 07/24/2003 | US20030136763 Processing solution preparation and supply method and apparatus |
| 07/24/2003 | US20030136514 Method of supercritical processing of a workpiece |
| 07/24/2003 | US20030136512 Device manufacturing-related apparatus, reticle, and device manufacturing method |
| 07/24/2003 | US20030136334 Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles |
| 07/24/2003 | US20030135979 Three-dimensional structure; process control |
| 07/23/2003 | EP1329937A2 Annular illumination method for charged particle projection optics |
| 07/23/2003 | EP1329773A2 Lithographic apparatus, apparatus cleaning method, and device manufacturing method |
| 07/23/2003 | EP1329772A2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
| 07/23/2003 | EP1329771A2 Method of two dimensional feature model calibration and optimization |
| 07/23/2003 | EP1329770A1 Lithographic apparatus and device manufacturing method |
| 07/23/2003 | EP1329769A1 Positive photosensitive polyimide resin composition |
| 07/23/2003 | EP1329311A1 Lithographic printing plate precursor |
| 07/23/2003 | EP1328847A1 Fabrication of nanoelectronic circuits |
| 07/23/2003 | EP1328846A2 Edge bead remover for thick film photoresists |
| 07/23/2003 | EP1328675A2 Fibrous structure having increased surface area and process for making same |