Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2003
07/31/2003US20030144760 Personalized hardware
07/31/2003US20030144567 A camphor derivative photoresist monomers, having norbornane ring; a homo- or copolycarbons/other/ polymers with acid labile groups; photolithography semiconductors
07/31/2003US20030144162 Composition and method for removing copper-compatible resist
07/31/2003US20030143859 Patterning methods for fabricating semiconductor devices
07/31/2003US20030143824 Pattern formation method
07/31/2003US20030143496 Executing a multiple exposure to a first layer on a substrate, by use of a plurality of first masks; executing a multiple exposure to a second layer on the substrate, by use of plurality of second masks
07/31/2003US20030143495 For removing photoresist residues after dry etching without attacking the wiring material or the interlayer insulating film
07/31/2003US20030143494 Performing pattern exposure by selectively irradiating resist film with extreme UV of a wavelength of a 1 nm through 30 nm band at exposure energy of 5 mJ/cm2 or less; forming a resist pattern by developing resist film after pattern exposure
07/31/2003US20030143491 Compact, easily to be maintained, and operable efficiently to reduce the running cost
07/31/2003US20030143490 Capable of efficiently forming a resist pattern reduced in thickness
07/31/2003US20030143489 Method of inhibiting pattern collapse using a relacs material
07/31/2003US20030143487 Method for making lithographic printing plate
07/31/2003US20030143486 Photoreactive resin composition and Method of manufacturing circuit board and ceramic multilayer substrate using the resin composition
07/31/2003US20030143484 Resist for photolithography having reactive groups for subsequent modification of the resist structures
07/31/2003US20030143483 Etching resistance
07/31/2003US20030143482 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
07/31/2003US20030143481 Image forming material and ammonium compound
07/31/2003US20030143480 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board
07/31/2003US20030143479 Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
07/31/2003US20030143473 Photosensitive transfer material and color filter
07/31/2003US20030143471 For use in flexographic printing plate, does not require treatments with chemicals, resolution by etching with laser beam
07/31/2003US20030143470 Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools
07/31/2003US20030143468 Multiple photolithographic exposures with different non-clear patterns
07/31/2003US20030143131 Device for chemical and biochemical reactions using photo-generated reagents
07/31/2003US20030142785 X-ray-reflective mirrors exhibiting reduced thermal stress, and X-ray optical systems comprising same
07/31/2003US20030142410 Exposure apparatus, control method thereof, and device manufacturing method using the same
07/31/2003US20030142322 Wavefront splitting element for EUV light and phase measuring apparatus using the same
07/31/2003US20030142321 Positioning stage device
07/31/2003US20030142313 Position detection apparatus and exposure apparatus
07/31/2003US20030142286 Exposing pattern on a semiconductor substrate in a shape adjusted with a first degree of freedom; exposing exposing a second pattern, while second pattern is aligned with first pattern, in a shape adjusted with a second degree of freedom
07/31/2003US20030142284 Optical lithographic exposure apparatus; suitable for double-exposure procedures in the manufacture of integrated circuits
07/31/2003US20030142283 EUV condenser with non-imaging optics
07/31/2003US20030142282 Pattern forming method
07/31/2003US20030142281 Exposure method and apparatus
07/31/2003US20030142280 Lithographic apparatus and device manufacturing method
07/31/2003US20030142198 Plasma light source apparatus, exposure apparatus and its control method and device fabrication method
07/31/2003US20030142194 Imaging apparatus, imaging method, and printing apparatus
07/31/2003US20030141769 Linear motor, stage apparatus, exposure apparatus, and device manufacturing apparatus
07/31/2003US20030141656 Recording plate or film loading device
07/31/2003US20030141606 For use in manufacturing semiconductor device
07/31/2003US20030141461 Simplified reticle stage removal system for an electron beam system
07/31/2003US20030141314 Chemical treating apparatus
07/31/2003US20030141291 Device for homogeneous heating of an object
07/31/2003US20030141276 Nano-size imprinting stamp using spacer technique
07/31/2003US20030141246 Regenerating apparatus and method for resist stripping waste liquids
07/31/2003US20030140806 Multi-beam pattern generator
07/31/2003CA2415612A1 Method of determining the relative position of a first and second imagesetting device with respect to each other
07/30/2003EP1331646A2 X-ray-reflective mirrors exhibiting reduced thermal stress, and X-ray optical systems comprising same
07/30/2003EP1331519A2 Exposure control
07/30/2003EP1331518A2 Radiation sensitive composition for forming an insulating film, insulating film and display device
07/30/2003EP1331517A1 Positive photosensitive resin composition, process for its preparation, and semiconductor devices
07/30/2003EP1331516A2 Method and mask for fabricating features in a polymer layer
07/30/2003EP1331216A1 Monomers having electron-withdrawing groups and processes for preparing the same
07/30/2003EP1331186A2 Recording plate or film loading device
07/30/2003EP1330861A1 Annealed copper alloy electrodes for fluorine containing gas discharge lasers
07/30/2003EP1330860A1 Anode with porous insulating layer for discharge lasers
07/30/2003EP1330859A1 Smart laser with fast deformable grating
07/30/2003EP1330834A2 Parallel plate development with the application of a differential voltage
07/30/2003EP1330681A1 System and method for facilitating wafer alignment by mitigating effects of reticle rotation on overlay
07/30/2003EP1330680A1 Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
07/30/2003EP1330679A1 Photolithography methods and systems
07/30/2003EP1330665A1 Optical lithography and a method of inducing transmission in optical lithography preforms
07/30/2003EP1330364A1 Use of electronically active primer layers in thermal patterning of materials
07/30/2003EP1054726B1 Apparatus for chemical and biochemical reactions using photo-generated reagents
07/30/2003EP0822229B1 Polyimide resin composition
07/30/2003CN2563607Y Transport device for circuit board etching machine
07/30/2003CN1433567A Post chemical-mechanical planarization (CMP) cleaning composition
07/30/2003CN1433532A Photosensitive resin composition
07/30/2003CN1433531A Lithography device which uses source of radiation in the extreme ultraviolet range and multi-layered mirrors with broad spectral band in this range
07/30/2003CN1433052A Pattern forming method
07/30/2003CN1433051A Protective film pattern sorming method and semiconductor device manufacturing process
07/30/2003CN1433049A Processing liquid compounding and supplying method and device
07/30/2003CN1432876A Method of eliminating contour distortion in planar printing process with chemical contraction for raising definition
07/30/2003CN1432875A Photoetching equipment and device making process
07/30/2003CN1432874A Exposure device and method
07/30/2003CN1432873A Acid generating agent, sulfonic acid, sulfonic acid and radiation-sensitive resin composition
07/30/2003CN1432872A Photoresist composite and pattern forming process with it
07/30/2003CN1432871A Photoresist composite and pattern forming process with it
07/30/2003CN1432870A Production process of photoresist composite and production process of semiconductor element with the composite
07/30/2003CN1432869A Photoresist composite for short wavelength purpose
07/30/2003CN1432828A Method of making patterned passive delay and thus made delay
07/30/2003CN1116695C Method for forming fine inter-pattern space in semiconductor device
07/30/2003CN1116613C Method and apparatus for probing, testing, burning, repairing and programming of integrated circuits in closed environment using single apparatus
07/29/2003US6600965 Method and apparatus for production of high resolution three-dimensional objects by stereolithography
07/29/2003US6600608 Catadioptric objective comprising two intermediate images
07/29/2003US6600606 Projection optical system with diffractive optical element
07/29/2003US6600580 Hologram print system and holographic stereogram
07/29/2003US6600561 Overlappingly formed on semiconductor; alignment reference mark
07/29/2003US6600552 Microlithography reduction objective and projection exposure apparatus
07/29/2003US6600551 Programmable photolithographic mask system and method
07/29/2003US6600550 Exposure apparatus, a photolithography method, and a device manufactured by the same
07/29/2003US6600547 Sliding seal
07/29/2003US6600166 Scanning exposure method
07/29/2003US6600162 Method and device for exposing a substrate to light
07/29/2003US6600053 Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress
07/29/2003US6600031 Methods of making nucleic acid or oligonucleotide arrays
07/29/2003US6600006 Polyamic ester prepared by partially substituting hydrogen atoms of carboxylic groups of a polyamic acid with acid labile groups, the polyamic ester comprising one or more repeating units represented by Formula 1, and each of at least one
07/29/2003US6599951 Antireflective porogens
07/29/2003US6599870 In aqueous solution containing amine
07/29/2003US6599844 Overcoating with photoresist patterns
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