Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2003
08/07/2003US20030147131 Reflection type projection optical system, exposure apparatus and device fabrication method using the same
08/07/2003US20030147130 Cataoptric projection optical system, exposure apparatus and device fabrication method using the same
08/07/2003US20030147128 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
08/07/2003US20030147107 Cylindrical outer surface scanning apparatus
08/07/2003US20030147083 Optical storage system based on scanning interferometric near-field confocal microscopy
08/07/2003US20030147082 Interferometric patterning for lithography
08/07/2003US20030147063 Storage containers for lithography mask and method of use
08/07/2003US20030147062 Stage control apparatus, exposure apparatus, and device manufacturing method
08/07/2003US20030147061 Projection exposure methods and apparatus, and projection optical systems
08/07/2003US20030147060 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method
08/07/2003US20030147059 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method
08/07/2003US20030147032 Ultraviolet irradiating device and method of manufacturing liquid crystal display device using the same
08/07/2003US20030146475 Pixel structure
08/07/2003US20030146416 Antireflectivity coating
08/07/2003US20030146398 Method for generating extreme ultraviolet radiation based on a radiation-emitting plasma
08/07/2003US20030146396 Gas flushing system with recovery system for use in lithographic apparatus
08/07/2003US20030145791 Thermal processing apparatus
08/07/2003US20030145749 Method for making a lithographic printing plate
08/06/2003EP1333468A2 Stage device and angle detecting device
08/06/2003EP1333466A2 Exposure apparatus, control method thereof, and device manufacturing method
08/06/2003EP1333329A1 Lithographic apparatus and device manufacturing method
08/06/2003EP1333328A2 Plasma light source apparatus, exposure apparatus and its control method and device fabrication method
08/06/2003EP1333327A2 Stage system
08/06/2003EP1333325A1 Optical element for forming an arc-shaped illumination field
08/06/2003EP1333324A2 Nano-size imprinting stamp
08/06/2003EP1333315A1 Method of producing a colour filter array element using an embossed surface
08/06/2003EP1333260A2 Phase measuring method and apparatus
08/06/2003EP1332803A1 Chemical treating apparatus
08/06/2003EP1332649A1 Method and apparatus for generating x-ray or euv radiation
08/06/2003EP1332407A1 Method for exposing a semiconductor wafer
08/06/2003EP1332406A2 Photoacid generators in photoresist compositions for microlithography
08/06/2003EP1332330A1 Determination of center of focus by diffraction signature analysis
08/06/2003EP1332196A1 Blends of quinone alkide and nitroxyl compounds as polymerization inhibitors
08/06/2003EP1123166A4 Method of removing organic materials from substrates
08/06/2003EP1023637B1 Fractionated novolak resin copolymer and photoresist composition therefrom
08/06/2003EP0951664B1 Positioning device with h-drive
08/06/2003CN1434931A Photoresist remover composition
08/06/2003CN1434930A Method in connection with the production of template and the template thus produced
08/06/2003CN1434834A Photocurable composition and mfg. method, photocurable pressure-sensitive adhesive sheet and mfg. and bonding method
08/06/2003CN1434833A Photocurable/thermoseting composition for forming matte film
08/06/2003CN1434769A Chemical imaging of a lithographic printing plate
08/06/2003CN1434481A Substrate treating device and method thereof
08/06/2003CN1434443A Method for copying gradation recording type read only CD
08/06/2003CN1434351A Photoetch instrument and method for making device fo same
08/06/2003CN1434350A Photoreactive resin composition and circuit board and method for making multilayer ceramic base material
08/06/2003CN1434349A Photo-mechanical characteristic making containing micrometer and submicrometer characteristic for semiconductor device
08/06/2003CN1434328A Back board structure for silicon base liquid srystal
08/06/2003CN1434319A System and method for laser beam gathering
08/06/2003CN1434060A Borate photoinitiator obtained from polyborane
08/06/2003CN1433940A Method and device for conveying and installing feeding board using executor in end of feeding board of robot
08/06/2003CN1433849A Coating film drying method, coating film forming method and coating film forming apparatus
08/06/2003CN1117285C Holographic grating and cathode grating and duplicating grating
08/06/2003CN1116934C Trace metal ion reduction by ion exchange equipment
08/05/2003US6604234 Method of designing/manufacturing semiconductor integrated circuit device using combined exposure pattern and semiconductor integrated circuit device
08/05/2003US6604233 Method for optimizing the integrated circuit chip size for efficient manufacturing
08/05/2003US6604011 Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same
08/05/2003US6603875 Pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided.
08/05/2003US6603833 X-ray exposure apparatus
08/05/2003US6603562 Two-dimensional positioning apparatus and method for measuring laser light from the apparatus
08/05/2003US6603533 Irradiation control method and apparatus for pulsed light source used in exposure apparatus
08/05/2003US6603532 Illuminance measurement apparatus, exposure apparatus, and exposure method
08/05/2003US6603531 Stage assembly including a reaction assembly that is connected by actuators
08/05/2003US6603530 Exposure apparatus that illuminates a mark and causes light from the mark to be incident on a projection optical system
08/05/2003US6603529 Monitoring apparatus and method particularly useful in photolithographically processing substrates
08/05/2003US6603131 Charged-particle-beam optical systems and microlithography apparatus comprising a non-absorbing shaping aperture
08/05/2003US6603130 Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses
08/05/2003US6603128 Charged-particle beam exposure apparatus and device manufacturing method
08/05/2003US6603120 Test method of mask for electron-beam exposure and method of electron-beam exposure
08/05/2003US6603103 Circuit for machine-vision system
08/05/2003US6603101 Heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to
08/05/2003US6603037 Ester compounds
08/05/2003US6602946 Photosensitive insulating paste and thick film multi-layer circuit substrate
08/05/2003US6602794 Silylation process for forming contacts
08/05/2003US6602728 Method for generating a proximity model based on proximity rules
08/05/2003US6602654 Wettability and dissolution selectivity to alicyclic compound-based resists; does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns
08/05/2003US6602652 Light absorbing, crosslinking; for short wavelength imaging; photoresists; semiconductors
08/05/2003US6602651 Water-based solder resist composition
08/05/2003US6602650 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof
08/05/2003US6602649 Photolithography; using ultraviolet radiation
08/05/2003US6602648 Photosensitivity, antisoilants
08/05/2003US6602647 Sulfonium salt compound and resist composition and pattern forming method using the same
08/05/2003US6602646 Positive-working resist composition
08/05/2003US6602643 Ultraviolet-curable resin composition
08/05/2003US6602642 Optical proximity correction verification mask
08/05/2003US6602641 Wafer's zero-layer and alignment mark print without mask when using scanner
08/05/2003US6602602 Prepared by suspension polymerization; chromatographic columns; narrow particle size distribution
08/05/2003US6602382 Solution processing apparatus
08/05/2003US6601297 Method for producing micro-openings
07/2003
07/31/2003WO2003063221A1 Method and apparatus for reming photoresist using sparger
07/31/2003WO2003063212A1 Stage device and exposure device
07/31/2003WO2003062926A2 Method for constructing an optical beam guide system
07/31/2003WO2003062925A1 Positively photosensitive insulating resin composition and cured object obtained therefrom
07/31/2003WO2003062924A1 Photosensitive composition and photosensitive planographic printing plate
07/31/2003WO2003062921A2 Process and appratus for removal of photoresist from semiconductor wafers using spray nozzles
07/31/2003WO2003062919A1 Lacquer layer deposition
07/31/2003WO2003062739A2 Method and apparatus for compensation of time-varying optical properties of gas in interferometry
07/31/2003WO2003005123A3 Method for the production of microstructures and nanostructures using imprint lithography
07/31/2003WO2002093201A9 Preferred crystal orientation optical elements from cubic materials
07/31/2003WO2002069051A3 Interference lithography using holey fibers
07/31/2003US20030144819 Phase measuring method and apparatus
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