| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/05/2013 | WO2013178404A2 A method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system |
| 12/05/2013 | WO2013178277A1 Optical imaging arrangement with multiple metrology support units |
| 12/05/2013 | WO2013177874A1 Alignment identifier and method using alignment identifier to manufacture workpiece in exposure process |
| 12/05/2013 | WO2013177821A1 Method for manufacturing color filter |
| 12/05/2013 | WO2013144693A3 Laser apparatus and its manufacturing method, comprising frames joined together|with a bolt-based system |
| 12/05/2013 | WO2013139553A3 Lithographic apparatus, sensor and lithographic method |
| 12/05/2013 | WO2013110384A3 Method for producing a structured multi-layer system using a processing beam capable of natural interference |
| 12/05/2013 | US20130323924 Methods of forming a pattern in a material and methods of forming openings in a material to be patterned |
| 12/05/2013 | US20130323653 Resist pattern-forming method |
| 12/05/2013 | US20130323652 Method of fabricating patterned functional substrates |
| 12/05/2013 | US20130323651 System and method for production of nanostructures over large areas |
| 12/05/2013 | US20130323649 High Heat Load Optics with Vibration Isolated Hoses in an Extreme Ultraviolet Lithography System |
| 12/05/2013 | US20130323648 Smart subfield method for e-beam lithography |
| 12/05/2013 | US20130323647 Polymer, resist composition and patterning process |
| 12/05/2013 | US20130323646 Resist composition and patterning process |
| 12/05/2013 | US20130323645 Resist composition, method of forming resist pattern, and compound |
| 12/05/2013 | US20130323644 Norbornene-type polymers, compositions thereof and lithographic process using such compositions |
| 12/05/2013 | US20130323643 Negative-working lithographic printing plate precursors |
| 12/05/2013 | US20130323642 Photoinduced Alkyne-Azide Click Reactions |
| 12/05/2013 | US20130323641 Photosenstive material and method of lithography |
| 12/05/2013 | US20130323640 Preparation of Norbornane-based PAC Ballasts |
| 12/05/2013 | US20130323631 Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part |
| 12/05/2013 | US20130323628 Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns |
| 12/05/2013 | US20130323627 Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A Substrate |
| 12/05/2013 | US20130323442 Window with selectively writable image(s) and method of making same |
| 12/05/2013 | US20130321789 Mask data generation method |
| 12/05/2013 | US20130321788 Lithographic Apparatus and Device Manufacturing Method |
| 12/05/2013 | US20130321787 Mask |
| 12/05/2013 | US20130321785 Exposure apparatus and device fabricating method |
| 12/05/2013 | US20130321784 Development processing apparatus |
| 12/05/2013 | US20130319466 Cleaning method for euv light generation apparatus |
| 12/05/2013 | US20130319465 Method and system for rapid mixing of process chemicals using an injection nozzle |
| 12/05/2013 | DE102013210045A1 Multigeladener Teilchenstrahl-Schreibverfahren und multigeladener Teilchenstrahl-Schreibvorrichtung Multi-Charged particle beam writing method and multi-charged particle beam writing device |
| 12/05/2013 | DE102013008814A1 Großformatige katadioptrische Einheitsvergrößerungsoptiken für die Mikrolithographie Large format catadioptric unit magnification optics for microlithography |
| 12/05/2013 | DE102012213368A1 Illumination optical unit for projection exposure system, has pupil facet mirror that is provided such that number of pupil facets in inner group is set different from number of pupil facets in outer group |
| 12/05/2013 | DE102012209412A1 Optical method for measuring angular position of facet of facet mirror for extreme UV (EUV) lithography, involves detecting actual angular positions of facets in preset spectrum of angular positions with respect to reference axis |
| 12/05/2013 | DE102012209309A1 Lithographievorrichtung und Verfahren zur Herstellung einer Spiegelanordnung A lithographic apparatus and method of producing a mirror assembly |
| 12/05/2013 | DE102012209132A1 Beleuchtungsoptik für die Projektionslithographie Illumination optics for projection lithography |
| 12/05/2013 | DE102012209047A1 Lithography apparatus for manufacturing integrated circuit, has phase shift mask arranged to be penetrable by two light beams, where phase shift mask includes areas that cause different phase shifts of light beams |
| 12/05/2013 | DE102012011315A1 Mikroskop und Verfahren zur Charakterisierung von Strukturen auf einem Objekt Microscope and method for characterization of structures on an object |
| 12/04/2013 | EP2669931A1 Driving system and driving method, light exposure device and light exposure method, and driving system designing method |
| 12/04/2013 | EP2669738A1 Method and apparatus for forming pattern |
| 12/04/2013 | EP2669737A1 Composition for forming resist underlayer films, containing silicon that bears diketone-structure-containing organic group |
| 12/04/2013 | EP2668536A1 Magnifying imaging optical unit and metrology system comprising such an imaging optical unit |
| 12/04/2013 | EP2668248A1 Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm |
| 12/04/2013 | EP2668226A1 Separating fluid, method and installation for separating multilayer systems |
| 12/04/2013 | EP2492752B1 Lithographic printing plate precursor and plate making method thereof |
| 12/04/2013 | CN203324649U 半导体晶片显影装置 Semiconductor wafer developing device |
| 12/04/2013 | CN203324648U Two-side alignment exposure device for semiconductor chip |
| 12/04/2013 | CN203323542U High-temperature mold drying oven and pneumatic locking device thereof |
| 12/04/2013 | CN103430345A Multilayered protective layer, organic opto-electric device and method of manufacturing the same |
| 12/04/2013 | CN103430102A Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less |
| 12/04/2013 | CN103430101A Measurement of the position of a radiation beam spot in lithography |
| 12/04/2013 | CN103430100A Photosensitive resin composition, photoresist film using same, resist pattern forming method, and conductor pattern forming method |
| 12/04/2013 | CN103430099A Colored resin composition, color filter, liquid crystal display device, organic el display device |
| 12/04/2013 | CN103430098A Positive-working lithographic printing plate precursor and method for preparing same |
| 12/04/2013 | CN103430097A Photosensitive conductive paste and method of manufacturing conductive pattern |
| 12/04/2013 | CN103430096A Lithographic printing plate precursor, plate making method thereof and polyvalent isocyanate compound |
| 12/04/2013 | CN103429639A Noble polyamic acid, photosensitive resin composition, dry film, and circuit board |
| 12/04/2013 | CN103429206A Method of producing color change in substrate |
| 12/04/2013 | CN103427316A 激光脉冲拉伸装置 Laser pulse stretching device |
| 12/04/2013 | CN103426980A Process for manufacturing patterning sapphire substrate |
| 12/04/2013 | CN103426820A Method for avoiding short circuit of metal wires in organic light emitting diode display device |
| 12/04/2013 | CN103425006A Aligning signal processing device used for photolithographic equipment, and aligning device used for photolithographic equipment |
| 12/04/2013 | CN103425005A Light-source-modulation-based mask pre-aligning system and pre-aligning method |
| 12/04/2013 | CN103425003A 抗蚀剂剥离剂 Resist stripping agent |
| 12/04/2013 | CN103425002A 抗蚀剂剥离剂 Resist stripping agent |
| 12/04/2013 | CN103425001A Resist membrane cleaning composition |
| 12/04/2013 | CN103425000A Method for removing negative acting photoresists |
| 12/04/2013 | CN103424999A Resist stripper composition and method for manufacturing TFT array substrate using the same |
| 12/04/2013 | CN103424998A Photoresist removing method after polyimides are photoetched in micro-electromechanical system manufacturing process |
| 12/04/2013 | CN103424997A Developing method of photo-etching technology |
| 12/04/2013 | CN103424996A Optical processing system and method |
| 12/04/2013 | CN103424995A Optimization method for photoresist layer of guide mode resonance optical filter |
| 12/04/2013 | CN103424994A Image space marker bearing apparatus and method for manufacturing the bearing apparatus |
| 12/04/2013 | CN103424993A Photoetching key dimension measurement mark |
| 12/04/2013 | CN103424992A Stereo photomask, preparation method thereof, and manufacturing method of stereo surface patterning |
| 12/04/2013 | CN103424991A Silicon wafer linear exchange device and method |
| 12/04/2013 | CN103424990A Photo-curing polysiloxane composition, protecting film and element containing said protecting film |
| 12/04/2013 | CN103424989A Positive photosensitive resin composition and uses thereof |
| 12/04/2013 | CN103424988A Red coloring composition for color filter |
| 12/04/2013 | CN103424987A Coloring composition for color filter, and color filter |
| 12/04/2013 | CN103424986A Blank for mold production and method for manufacturing mold |
| 12/04/2013 | CN103424795A Reflection type beam splitting raster and interference photolithographic system |
| 12/04/2013 | CN103424794A Transmission-type spectro-grating and interference lithography system |
| 12/04/2013 | CN103421403A 固化性树脂组合物 The curable resin composition of the |
| 12/04/2013 | CN102841503B Photolithographic electronic silver paste composition for touch screen and preparation thereof |
| 12/04/2013 | CN102819183B Mask plate, method for manufacturing array substrate by utilizing mask plate, and array substrate |
| 12/04/2013 | CN102649343B Lithographic printing plate precursor and plate making method thereof |
| 12/04/2013 | CN102621818B Immersion control device for lithography machine |
| 12/04/2013 | CN102591154B Coating compositions for use with an overcoated photoresist |
| 12/04/2013 | CN102591153B Light-sensitive resin as well as preparation method and application thereof |
| 12/04/2013 | CN102591145B Photoresists comprising multi-amide component |
| 12/04/2013 | CN102479688B Method of wafer surface photoresistance edge removal |
| 12/04/2013 | CN102479682B Method of lift off and manufacturing method of TFT array substrate |
| 12/04/2013 | CN102455592B Preparation method of film |
| 12/04/2013 | CN102446712B Method for increasing double patterning process windows |
| 12/04/2013 | CN102420153B Method for judging whether hole depth and aperture morphology are normal or not |
| 12/04/2013 | CN102331596B Colored resin composition and method for forming multicolor optical filter |
| 12/04/2013 | CN102308379B Colored ceramic vacuum chuck and manufacturing method thereof |