Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2003
08/20/2003CN1437073A Etching method for anti-reflecting coating layer on organic substrate
08/20/2003CN1437072A Method for raising processing range with eliminating auxiliary characteristic
08/20/2003CN1437071A Method for producing offset printing apparatus and device
08/20/2003CN1437070A Semiconductor element pattern transferring method
08/20/2003CN1437069A Photomask for off-axis illumination and its producing method
08/20/2003CN1437050A Ultravioletray irradiating device and method for producing liquid crystal display with the same device
08/20/2003CN1118866C Method for producing semiconductor device
08/20/2003CN1118827C Bit line pattern in DRAM for reducing optical close range effect
08/19/2003US6608920 Target acquisition technique for CD measurement machine
08/19/2003US6608691 Generation of exposure data having hierarchical structure
08/19/2003US6608681 Exposure method and apparatus
08/19/2003US6608667 Exposure apparatus and device manufacturing method
08/19/2003US6608666 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
08/19/2003US6608665 Scanning exposure apparatus having adjustable illumination area and methods related thereto
08/19/2003US6608317 Charged-particle-beam (CPB)-optical systems with improved shielding against stray magnetic fields, and CPB microlithography apparatus comprising same
08/19/2003US6608313 Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system
08/19/2003US6608158 High transparency at 193 nm wavelength, provides increased etching resistance; formed without 5-norbonen-2-carboxylate monomers which do not have offensive odors of the free acid
08/19/2003US6607992 Used to prevent the exposure light for exposing the resist from reflecting at a film lying under the resist
08/19/2003US6607989 Heat treatment redistributes Cu particles segregated in the Al-Cu alloy layer during the O2-plasma pretreatment, preventing occurrence of a short-circuit failure.
08/19/2003US6607984 Removable inorganic anti-reflection coating process
08/19/2003US6607926 Method and apparatus for performing run-to-run control in a batch manufacturing environment
08/19/2003US6607870 Radiation sensitive compositions comprising complexing polar compound and methods of use thereof
08/19/2003US6607868 Photoresist monomers, polymers thereof, and photoresist compositions containing the same
08/19/2003US6607867 Silicon wafer coatings comprising addition terpolymers and photosensitive acid generators having high aspect ratio, contrast and resolution
08/19/2003US6607866 Lithographic printing plate support and lithographic printing plate precursor using the same
08/19/2003US6607865 Positive photosensitive resin composition
08/19/2003US6607863 Exposure method of production of density filter
08/19/2003US6607380 Substrate conveying system and device manufacturing method using the same
08/19/2003US6607192 Sheet feeder and sheet feeding method for plate-shaped members
08/14/2003WO2003067651A1 Test wafer and method for investigating elecrostatic discharge induced wafer defects
08/14/2003WO2003067636A1 Surface treating device and surface treating method
08/14/2003WO2003067631A2 Improved semiconductor stress buffer coating edge bead removal compositions and method for their use
08/14/2003WO2003067334A2 Polarisation-optimised illumination system
08/14/2003WO2003067333A1 Photo-sensitive composition
08/14/2003WO2003067332A2 Sulfonate derivatives and the use therof as latent acids
08/14/2003WO2003067329A1 Organic anti-reflective coating compositions for advanced microlithography
08/14/2003WO2003067304A1 Multi-faceted mirror
08/14/2003WO2003067182A1 Shearing interference measuring method and shearing interferometer, production method of projection optical system, projection optical system, and projection exposure system
08/14/2003WO2003067109A1 Bearing arrangement for linear slide
08/14/2003WO2003066341A1 Plate material for printing and printing machine
08/14/2003WO2003066340A2 Device for positioning a curing radiation source on an engraving cylinder or an engraving plate holder
08/14/2003WO2003066338A1 On-press developable ir sensitive printing plates
08/14/2003WO2003066326A2 Method and composition for making ceramic parts by stereolithophotography and use in dentistry
08/14/2003WO2003066238A1 Coating device and coating method
08/14/2003WO2003027630A3 Device and method for optically scanning a substrate disk
08/14/2003WO2002044815A3 Multilayer elements containing photoresist compositions and their use in microlithography
08/14/2003US20030154461 High yield reticle with proximity effect
08/14/2003US20030154460 Apparatus for evaluating lithography process margin simulating layout pattern of semiconductor device
08/14/2003US20030153723 Reaction of a dioxetane compound, an unsaturated monocarboxylic acid, and a polybasic anhydride with a primary hydroxyl group
08/14/2003US20030153706 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by -(CH2)m-m=1 to 8 used as monomer; polymer is sensitive to high energy radiation excellent resolution, and etching resistance
08/14/2003US20030153190 Semiconductor processing method using photoresist and an antireflective coating
08/14/2003US20030153186 Apparatus and method using a remote RF energized plasma for processing semiconductor wafers
08/14/2003US20030153126 Mask and method for patterning a semiconductor wafer
08/14/2003US20030153114 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
08/14/2003US20030153092 Method of fabricating coded particles
08/14/2003US20030152875 Method for applying a photoresist layer to a substrate having a preexisting topology
08/14/2003US20030152874 Photoresist stripping composition and process for stripping resist
08/14/2003US20030152873 Fabrication method of semiconductor integrated circuit device
08/14/2003US20030152872 Stacking layers on substrate; patterning; forming apertures;depositing photosensitive materials; radiation
08/14/2003US20030152871 Multilayer; dielectric substrate, spacers and masking layer; etching patterns
08/14/2003US20030152870 Liquid photopolymer useful in fabricating printing plates which are resistant to solvent based ink
08/14/2003US20030152865 Mixture containing acid generator, addition polymer
08/14/2003US20030152864 Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
08/14/2003US20030152863 Photostructured paste
08/14/2003US20030152862 Deodorizing agent for sulfur- or nitrogen-containing initiators
08/14/2003US20030152861 Positive photoresist composition
08/14/2003US20030152860 Method for producing microcapsules having improved wall characteristics
08/14/2003US20030152851 System, method and computer program product for instructing allocation of a plurality of exposure units
08/14/2003US20030152849 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
08/14/2003US20030152848 Adjust pattern using optics; calibration adjustment substrate; forming semiconductors
08/14/2003US20030152845 Mask blank, protective film therefor and method of patterning mask blank
08/14/2003US20030152842 Data storage medium comprising colloidal metal and preparation process thereof
08/14/2003US20030152841 Nano-lithography using squeezed atomic and molecular states
08/14/2003US20030152703 Multilayer thin films; for electronics
08/14/2003US20030152691 Aperture mask patterns; elongated web of flexible film; integrated circuits
08/14/2003US20030152190 Exposing method and semiconductor device fabricated by the exposing method
08/14/2003US20030152013 Optical recording medium, master disc for manufacturing optical recording medium, and device and method for manufacturing master disc for manufacturing optical recording medium
08/14/2003US20030151750 Compensating for effects of variations in gas refractivity in interferometers
08/14/2003US20030151748 Scanning exposure method and apparatus, and device manufacturing method using the same
08/14/2003US20030151730 Exposure apparatus and method, and device fabricating method using the same
08/14/2003US20030151728 Projection exposure apparatus
08/14/2003US20030151421 Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
08/14/2003US20030151321 3-ring magnetic anti-gravity support
08/14/2003US20030150737 Illuminating an inorganic negative tone resist layer on an electroplating base layer by a beam (EB), which is able to cure the resist to a pattern; removing non-illuminated portions and electroplating between cured layers
08/14/2003US20030150559 Apparatus for supercritical processing of a workpiece
08/14/2003US20030150384 Aperture masks for circuit fabrication
08/14/2003US20030150329 Inert gas purge method and apparatus, exposure apparatus, recticle stocker, reticle inspection apparatus, reticle transfer box, and device manufacturing method
08/14/2003CA2474532A1 Sulfonate derivatives and the use therof as latent acids
08/13/2003EP1335640A2 Plasma-type X-ray source encased in vacuum chamber exhibiting reduced heating of interior components, and microlithography systems comprising same
08/13/2003EP1335248A1 Lithographic apparatus and device manufacturing method
08/13/2003EP1335247A2 Light sensitive composition, light sensitive planographic printing plate precursor, and image formation method
08/13/2003EP1335246A1 Pattern formation method
08/13/2003EP1335245A2 Member for a mask film, process for producing a mask film using the member and process for producing a printing plate of a photosensitive resin using the mask
08/13/2003EP1335229A1 Reflection type projection optical system, exposure apparatus and device fabrication method using the same
08/13/2003EP1335228A1 Catoptric projection system, exposure apparatus and device fabrication method using the same
08/13/2003EP1335016A1 Cleaning composition
08/13/2003EP1334842A2 Printing plate precursor and printing plate
08/13/2003EP1334824A2 Image forming method
08/13/2003EP1334511A2 Amorphous carbon layer for improved adhesion of photoresist
08/13/2003EP1334408A1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
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