Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2003
08/26/2003US6611036 Microlens for surface mount products
08/26/2003US6610988 Charged particle beam drawing apparatus and charged particle beam drawing method
08/26/2003US6610791 Photosensitive compound and photosensitive resin
08/26/2003US6610638 High purity 1,3-propanediol derivative solvent, process for producing the same, and use thereof
08/26/2003US6610616 Method for forming micro-pattern of semiconductor device
08/26/2003US6610609 Compatibilization treatment
08/26/2003US6610482 Sequencing, fingerprinting and mapping biological macromolecules, typically biological polymers. The methods make use of a plurality of sequence specific recognition reagents which can also be used for classification of
08/26/2003US6610465 One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers
08/26/2003US6610464 Uniform thickness; amplificated photoresist; lithography pattern; inversion spinning
08/26/2003US6610463 Method of manufacturing structure having pores
08/26/2003US6610461 Reticle having accessory pattern divided into sub-patterns
08/26/2003US6610460 Exposure method
08/26/2003US6610459 Lamination; preventing premature tacking
08/26/2003US6610457 Organic polymers for bottom antireflective coating, process for preparing the same, and compositions containing the same
08/26/2003US6610456 Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions
08/26/2003US6610448 Multilayer; multiple adjustment marks; accuracy
08/26/2003US6610446 Information storage on masks for microlithographic tools
08/26/2003US6610168 Resist film removal apparatus and resist film removal method
08/26/2003US6610150 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
08/21/2003WO2003069888A1 Plate handling system
08/21/2003WO2003069733A1 Vibration control utilizing signal detrending
08/21/2003WO2003069413A1 A method for fabricating a structure for a microelectromechanical systems (mems) device
08/21/2003WO2003069412A1 Acid-degradable resin compositions containing ketene-aldehyde copolymer
08/21/2003WO2003069411A1 Visible radiation sensitive composition
08/21/2003WO2003069410A1 Radiation-sensitive resin composition
08/21/2003WO2003069409A1 Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists
08/21/2003WO2003069286A2 Method and apparatus to measure fiber optic pickup errors in interferometry systems
08/21/2003WO2003069274A1 Interferometer with dynamic beam steering element
08/21/2003WO2003069273A2 Separated beam multiple degree of freedom interferometer
08/21/2003WO2003069264A2 Characterization and compensation of non-cyclic errors in interferometry systems
08/21/2003WO2003069028A1 Method for generating an artificially patterned substrate
08/21/2003WO2003069016A2 In-line deposition processes for circuit fabrication
08/21/2003WO2003069015A2 Aperture masks for circuit fabrication
08/21/2003WO2003068784A2 Acyl- and bisacylphosphine derivatives
08/21/2003WO2003068783A1 Alkoxylated acyl- and bisacylphosphine derivatives
08/21/2003WO2003068645A1 Device and method for loading/unloading a drum exposure system
08/21/2003WO2003068524A1 Plate material for printing and method for regenerating/reusing plate material for printing and printing machine
08/21/2003WO2003050613A3 Method and apparatus for modification of chemically amplified photoresist by electron beam exposure
08/21/2003US20030159010 Method, device and computer program product for processing information in a memory
08/21/2003US20030158710 Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus
08/21/2003US20030158367 Radiation curable coating containing polyfluorooxetane
08/21/2003US20030158286 Active energy beam-curable composition
08/21/2003US20030158058 Used to remove photoresist during the manufacture of semiconductor devices such as large-scale integrated circuits (LSI), and very large-scale integrated circuits (VLSI)
08/21/2003US20030157808 Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts
08/21/2003US20030157806 Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition , and semiconductor substrate
08/21/2003US20030157801 Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
08/21/2003US20030157733 Method of molecular-scale pattern imprinting at surfaces
08/21/2003US20030157441 Thinner composition and method of stripping a photoresist using the same
08/21/2003US20030157440 Process of forming a micro-pattern of a metal or a metal oxide
08/21/2003US20030157439 Protective layer for corrosion prevention during lithography and etch
08/21/2003US20030157435 Use of a composition in stereolithography
08/21/2003US20030157433 Without requiring a preheat step or a separate development step
08/21/2003US20030157432 Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties
08/21/2003US20030157431 Photoresists useful in micro-lithography; for pattern formation on semiconductor wafers
08/21/2003US20030157430 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same
08/21/2003US20030157429 Method and equipment for using photo-or thermally imagable, negatively working patterning compositions
08/21/2003US20030157428 Photoresist compositions particularly suitable for short wavelength imaging
08/21/2003US20030157425 Donor sheet for thin-film formation, process for production thereof and organic electroluminescent device
08/21/2003US20030157424 Can form ultrafine resist patterns of not more than half a micron in photolithography
08/21/2003US20030157423 Copolymer, polymer mixture, and radiation-sensitive resin composition
08/21/2003US20030157415 Apparatus and method for compensating critical dimension deviations across photomask
08/21/2003US20030157414 Holographic medium and process for use thereof
08/21/2003US20030157271 Method and apparatus for pulse-position synchronization in miniature structures manufacturing processes
08/21/2003US20030157254 Providing a scanning probe microscope tip; coating the tip with a patterning compound; using coated tip to apply the compound to the substrate so as to produce a desired pattern
08/21/2003US20030157250 Hyrdrothermal treatment of nanostructured films
08/21/2003US20030156924 Plate handling system
08/21/2003US20030156791 Method and apparatus for writing apodized patterns
08/21/2003US20030156680 Arrangement for storing and transporting at least one optical component
08/21/2003US20030156271 Mask holder for irradiating UV-rays
08/21/2003US20030156270 Multiple degree of freedom substrate manipulator
08/21/2003US20030156269 Method and apparatus for illuminating a surface using a projection imaging apparatus
08/21/2003US20030156268 Exposure apparatus, exposure method and device production method
08/21/2003US20030156267 Method of photolithographic exposure dose control as a function of resist sensitivity
08/21/2003US20030156266 Method and apparatus for illuminating a surface using a projection imaging apparatus
08/21/2003US20030155882 Anti-gravity mount with air and magnets
08/21/2003US20030155821 Displacement device
08/21/2003US20030155820 Magnetically shielded linear motors, and stage apparatus comprising same
08/21/2003US20030155626 Photolithography process using multiple anti-reflective coatings
08/21/2003US20030155534 Maskless particle-beam system for exposing a pattern on a substrate
08/21/2003US20030155523 Quantum wells; etching, writing using electron beams; forming semiconductors
08/21/2003US20030155522 Electron beam generating apparatus and electron beam exposure apparatus
08/21/2003US20030155077 Substrate processing apparatus
08/21/2003CA2476441A1 Plate handling system
08/20/2003EP1336987A2 Protection layer to prevent under-layer damage during deposition
08/20/2003EP1336899A1 Lithographic apparatus, alignment method and device manufacturing method
08/20/2003EP1336898A2 Exposure apparatus and method, and device fabricating method using the same
08/20/2003EP1336887A1 Catadioptric system and exposure device having this system
08/20/2003EP1336671A1 Method for generating an artificially patterned substrate for stimulating the crystallization of a biomolecule thereon and method of stimulating the crystallization of biomolecules
08/20/2003EP1336630A2 Functionalized polymer
08/20/2003EP1336193A2 Bright field image reversal for contact hole patterning
08/20/2003EP1336132A2 Stamp, method, and apparatus
08/20/2003EP1336131A1 Optical recording materials
08/20/2003EP1216156B1 Thermal transfer element with a plasticizer-containing transfer layer and thermal transfer process
08/20/2003EP0989465B1 Method for one-shot removal of resist member and sidewall protection layer
08/20/2003EP0897136B1 Developing solution for photosensitive resin plate
08/20/2003CN1437716A Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board
08/20/2003CN1437715A A substrate for and a process in connection with the product of structures
08/20/2003CN1437714A Device for transferring a pattern to an object
08/20/2003CN1437713A A method for individualised marking of circuit boards
08/20/2003CN1437586A Triazine-based compound comprising functionalized alkylthio groups, and photo polymerization initiator
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