Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2003
08/28/2003WO2003070846A2 Drying resist with a solvent bath and supercritical co2
08/28/2003WO2003070809A2 Organosiloxanes and their use in dielectric films of semiconductors
08/28/2003WO2003070461A1 Method and device for printing wherein a hydrophilic layer is produced and structured
08/28/2003WO2003058681A3 Differential detector coupled with defocus for improved phase defect sensitivity
08/28/2003WO2003048314A3 Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
08/28/2003WO2003024171A3 Method of treating photoresists using electrodeless uv lamps
08/28/2003WO2003021354A3 Non-mechanical fabrication of carbon-containing work pieces
08/28/2003WO2003008404A3 Sulfonium salts as phtoinitiators for radiation curable systems
08/28/2003WO2003007365A3 Semiconductor processing module with integrated feedback/feed forward metrology
08/28/2003WO2002091081A3 Functionalising polymeric materials
08/28/2003US20030163794 Method and apparatus for prepareing patterns used for manufacture of semiconductor device
08/28/2003US20030162484 Devices and methods for holding an optical element with reduced stress in an optical column and while performing an out-of-column procedure on the element
08/28/2003US20030162411 Polymer material having a low glass transition temperature for use in chemically amplified photoresists for semiconductor production
08/28/2003US20030162407 Anisotropic etching of organic-containing insulating layers
08/28/2003US20030162329 Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer and structure thereof
08/28/2003US20030162135 Photolithographic exposing with two different wavelengths, the first wavelength is shorter than the second wavelength, achieve smaller resolution; polymerizing arylalkoxysilane compound to polysiloxanes
08/28/2003US20030162133 Coating a developer layer on a photoresist layer of wafer surface, removing the developer layer, repeat the procedure with three times; lamination, integrated circuits, Microelectronics
08/28/2003US20030162132 Method of producing pattern-formed structure and photomask used in the same
08/28/2003US20030162131 Thermal printing to form lithographic printing, shaping the laser energy into a narrow line, changing the physical property of the medium; photothermography, surface treatment
08/28/2003US20030162130 Process for photopolymerization of photosensitive lithographic printing plate
08/28/2003US20030162128 Photosensitive thick film composition
08/28/2003US20030162127 Lithographic printing plate precursor
08/28/2003US20030162125 Organic anti-reflective coating compositions for advanced microlithography
08/28/2003US20030162124 Compound which performs non-resonant two-photon absorption, non-resonant two-photon light-emitting compound and non-resonant two-photon absorption induction method and process for emitting light thereby, optical data recording medium and process for recording data thereon, and two-photon polymerizable composition and process for polymerization thereof
08/28/2003US20030162123 Main chain derived from polyerizable monomers and pendent functional groups derived from isocyanate terminated with alpha or beta ethylenically or acetylenically unsaturated groups
08/28/2003US20030162121 Image recording material
08/28/2003US20030162120 Compositions for anti-reflective light absorbing layer and method for forming patterns in semiconductor device using the same
08/28/2003US20030162107 Image forming method
08/28/2003US20030162106 Methods of forming patterns across photoresist and methods of forming radiation-patterning tools
08/28/2003US20030162105 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask
08/28/2003US20030162103 The serifs or pattern combine to produce an optical proximity correction that reduces corner rounding and increases edge straightness in the resist pattern
08/28/2003US20030162102 Critical dimension control using full phase and trim masks
08/28/2003US20030162101 A mask for use in a lithographic projection apparatus contains three brackets arranged on the circumference of the mask provide with grooves directed to a common imaginary point intend to cooperate with three pins of a gripper
08/28/2003US20030162004 Patterning of solid state features by direct write nanolithographic printing
08/28/2003US20030161940 Applied to a reflective liquid crystal display; invention uses exposing and developing process for only one time to form wave-shaped slit structures and bump structures simultaneously so as to simplify process and reduce costs
08/28/2003US20030161789 Containing enzyme; degradation layers
08/28/2003US20030161374 High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
08/28/2003US20030161373 Photolithographic molecular fluorine laser system
08/28/2003US20030160980 Graphics engine for high precision lithography
08/28/2003US20030160949 Method and apparatus for illuminating a surface using a projection imaging apparatus
08/28/2003US20030160948 Lithography exposure device
08/28/2003US20030160627 Correction of overlay offset between inspection layers
08/28/2003US20030160244 Thin-film semiconductor device, electro-optical device, methods for manufacturing the same, and reticle
08/28/2003US20030160217 Near-infrared-absorbing composition and optical material
08/28/2003US20030160195 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using said exposure apparatus
08/28/2003US20030160192 Charged particle beam exposure method and method for producing charged particle beam exposure data
08/28/2003US20030159712 Supplying fluid flow; then gas flow; ionization; extraction
08/28/2003US20030159710 Cleaning apparatus and method
08/28/2003US20030159608 Device and method in connection with the production of structures
08/28/2003US20030159586 Adsorption apparatus and methods
08/28/2003US20030159517 Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
08/28/2003US20030159288 Resist material and method of manufacturing inkjet recording head using the same
08/27/2003EP1339099A1 Optical device, exposure device and device manufacturing method
08/27/2003EP1339084A2 Electron beam irradiation apparatus and method
08/27/2003EP1339059A2 Method of producing master information carrier for magnetic transfer
08/27/2003EP1338923A1 Method for forming pattern and treating agent for use therein
08/27/2003EP1338922A2 Positive resist composition
08/27/2003EP1338921A2 Resist composition for electron beam, X-ray or EUV
08/27/2003EP1338913A1 Method of evaluating imaging performance
08/27/2003EP1338911A2 Device and methods for holding an optical element with reduced stress inside and outside an optical column
08/27/2003EP1338538A1 Method and device for loading / unloading a drum plotter
08/27/2003EP1338435A2 Lithographic printing plate precursor
08/27/2003EP1338431A2 Visible image receiving material having surface hydrophilicity
08/27/2003EP1338416A2 Method for making lithographic printing plate
08/27/2003EP1338415A2 Method for preparing lithographic printing plate
08/27/2003EP1337897A2 Photopatternable sorbent and functionalized films
08/27/2003EP1337894A2 Method of increasing the conductivity of a transparent conductive layer
08/27/2003EP1337470A1 Process for recovering onium hydroxides from solutions containing onium compounds
08/27/2003EP1240694A4 Line narrowed laser with bidirection beam expansion
08/27/2003EP1234358A4 High power gas discharge laser with helium purged line narrowing unit
08/27/2003EP1224497A4 Birefringence minimizing fluoride crystal optical vuv microlithography lens elements and optical blanks therefor
08/27/2003EP1218986A4 Narrow band laser with fine wavelength control
08/27/2003EP1163552B1 Method of forming a masking pattern on a surface
08/27/2003EP0830641B1 Photohardenable epoxy composition
08/27/2003CN1439236A Process for thick film circuit patterning
08/27/2003CN1439120A Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer
08/27/2003CN1439119A Development defect preventing process and material
08/27/2003CN1439117A Material and method for making an electroconductive pattern
08/27/2003CN1439060A Method for depositing metal and metal oxide films and patterned films
08/27/2003CN1439028A Insulating resin composition, adhesive resin composition and adhesive sheeting
08/27/2003CN1438831A Plasma treatment method and apparatus
08/27/2003CN1438680A Substrate making method and apparatus
08/27/2003CN1438679A Method for making semiconductor integrated circuit device
08/27/2003CN1438677A Method for forming semiconductor element fine figure
08/27/2003CN1438546A Exposing device and method, and making method for device using same
08/27/2003CN1438544A Method for deep etching multi-layer high depth-width-ratio silicon stairs
08/27/2003CN1438543A Ring sulfonium and sulfonium oxide and photoacid generator and photoetching glue
08/27/2003CN1438520A Film semiconductor device and photoelectric device, making method thereof and intermediate mask
08/27/2003CN1438506A Film wave-filter for optical multiplying device/demultiplying device
08/27/2003CN1437916A Method fo making arteria coronaria undercarriage
08/27/2003CN1119701C Photosensitive paste and plasma display production process
08/27/2003CN1119245C Inkjet print head containing radiation curable resin layer
08/27/2003CN1119187C Method of making etched golf club parts
08/26/2003US6611921 Input device with two input signal generating means having a power state where one input means is powered down and the other input means is cycled between a powered up state and a powered down state
08/26/2003US6611574 Illumination system with reduced heat load
08/26/2003US6611387 Adjustment of the partial coherence of the light energy in an imaging system
08/26/2003US6611376 Diffractive optical element and method of manufacturing the same
08/26/2003US6611327 Detection of contaminants on low wavelength masks
08/26/2003US6611317 Synthetic quartz glass optical member highly transparent in ultraviolet range and having a 3640 cm-1 SIOH stretching vibration absorption peak; fluorine laser fine patterning
08/26/2003US6611316 Method and system for dual reticle image exposure
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