| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/04/2003 | US20030166828 Polyamic-imide polymer |
| 09/04/2003 | US20030166750 Photographic binder; polyvinyl acetal |
| 09/04/2003 | US20030166746 Organic component comprises long-chain cycloaliphatic epoxy resin, short-chain cycloaliphatic epoxy resin, cyanate ester, lewis acid catalyst; useful in die attach adhesives, underfills, encapsulants, via fills, prepreg binders |
| 09/04/2003 | US20030166482 Composition for stripping resists |
| 09/04/2003 | US20030165781 Pattern forming method and display device manufactured using same |
| 09/04/2003 | US20030165779 Reacting phenolic resins or polyhydroxystyrene with indole dyes having labile halogens, to form infrared radiation absorbing polymers used in lithography printing plates |
| 09/04/2003 | US20030165777 Negative lithographic printing plate comprising a specific compound in the photosensitive layer |
| 09/04/2003 | US20030165776 Photoresists comprising mixtures of alkali soluble copolymers, curing agents and acid generators, having high sensitivity and resolution, for use in microstructure lithography |
| 09/04/2003 | US20030165774 Photosensitive superimposed multilayer coatings comprising phenolic resin binders, amino resins and dyes, for use on printing plates, color films or photoresists |
| 09/04/2003 | US20030165773 Polymers, resist compositions and patterning process |
| 09/04/2003 | US20030165772 Photoresist mixtures comprising acid generators, amino resins, phenolic alcohols, curing agents and solvents, having high sensitivity and resolution |
| 09/04/2003 | US20030165771 Blends of curable epoxy resins, polyepoxides, novolacs and photoinintiators, used to from films having high glass transition temperature and good flexibility used in printed circuits |
| 09/04/2003 | US20030165770 Photoresist composition and method of forming pattern using the same |
| 09/04/2003 | US20030165769 Block polymers such as polymethyl methacrylate/poly(t-butyl methacrylate), having end groups and acid generators, used to form films on silicon substrates; microelectronics having high resolution and contrast |
| 09/04/2003 | US20030165756 Controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution to reduce their adhesion to resist film |
| 09/04/2003 | US20030165755 Controlling critical dimensions (CDs) of features formed on the semiconductor substrate through feedback and fee-forward of information gathering during in-process inspection of the feature |
| 09/04/2003 | US20030165754 First mask is an opaque- field phase shift mask and the second mask is a single phase structure mask; optical lithography patterning |
| 09/04/2003 | US20030165752 A film-forming polymer obtained by copolymerization of a comonomer mixture, including at least one first comonomer having polymerizable carbon-carbon double bond and an anchor group |
| 09/04/2003 | US20030165751 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer |
| 09/04/2003 | US20030165749 Exposing the substrate using a mask containing gray-tone features |
| 09/04/2003 | US20030165748 Pattern mask with features to minimize the effect of aberrations |
| 09/04/2003 | US20030165265 Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method |
| 09/04/2003 | US20030165175 Flow shaping electrode with erosion pad for gas discharge laser |
| 09/04/2003 | US20030164949 Correction of localized shape errors on optical surfaces by altering the localized density of surface or near-surface layers |
| 09/04/2003 | US20030164948 Multiple degree of freedom interferometer |
| 09/04/2003 | US20030164934 Stage apparatus, exposure apparatus and method for exposing substrate plate |
| 09/04/2003 | US20030164933 Projection exposure apparatus |
| 09/04/2003 | US20030164932 Method and system for compensating exposure value for exposure process as well as exposure system and semiconductor manufacturing system |
| 09/04/2003 | US20030164931 Lithographic tool with dual isolation system and method for configuring the same |
| 09/04/2003 | US20030164930 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 09/04/2003 | US20030164929 Environmental-control method and apparatus for an exposure system |
| 09/04/2003 | US20030164871 Color filter and process for producing the same |
| 09/04/2003 | US20030164353 Method for manufacturing semiconductor device |
| 09/04/2003 | US20030164181 Substrate processing apparatus |
| 09/04/2003 | US20030164105 Fine particulate hydrophobicizing precursor and hydrophilic metallized binder polymer; image forming layer comprising light-heat converting substance and microcapsule encapsulating hydrophobic substance |
| 09/03/2003 | EP1341221A1 Aligner, aligning method and method for fabricating device |
| 09/03/2003 | EP1341211A2 Process and apparatus for light inducing chemical treatment of a workpiece |
| 09/03/2003 | EP1341168A2 Blank disc and direct stamper and its manufacturing method |
| 09/03/2003 | EP1341047A2 Apparatus and methods for development of resist patterns |
| 09/03/2003 | EP1341045A1 Method of transferring a mask or substrate |
| 09/03/2003 | EP1341044A2 Positioning device with a reference frame for a measuring system |
| 09/03/2003 | EP1341043A2 Evaluation and correction of optical aberrations of an imaging system |
| 09/03/2003 | EP1341042A2 System and method for using a two part cover for protecting a reticle |
| 09/03/2003 | EP1341041A2 Photoresist compositions |
| 09/03/2003 | EP1341040A1 Photopolymerizable composition |
| 09/03/2003 | EP1341039A1 Photocurable and thermosetting resin composition |
| 09/03/2003 | EP1341038A2 Photosensitive resin composition |
| 09/03/2003 | EP1340125A2 Protecting groups in polymers, photoresists and processes for microlithography |
| 09/03/2003 | EP1340124A2 Radiation curable compositions |
| 09/03/2003 | EP1340123A1 Systems and methods for exposing substrate periphery |
| 09/03/2003 | EP1340106A2 Protective overcoat for replicated diffraction gratings |
| 09/03/2003 | EP1339519A2 FOUR KHz GAS DISCHARGE LASER |
| 09/03/2003 | EP1006119B1 Novel crystalline ion-association substance, process for producing the same, and latent photopolymerization initiator |
| 09/03/2003 | EP0927380B1 Supporting device with gas bearing |
| 09/03/2003 | EP0831127B1 Stereolithographic resin composition and stereolithographic method |
| 09/03/2003 | CN1440551A Phase contrast variation of photo-induced refractive material |
| 09/03/2003 | CN1440518A Lithographic gap-filler forming composition |
| 09/03/2003 | CN1440517A Method of manufacturing integrated circuit |
| 09/03/2003 | CN1440512A Method and device for holding optical member, optical device, exposure apparatus and device manufacturing method |
| 09/03/2003 | CN1440051A Method for reducing and ensuring pattern gaps |
| 09/03/2003 | CN1439932A Composition for stripping photoresist |
| 09/03/2003 | CN1439916A Mask stand for ultraviolet exposure |
| 09/03/2003 | CN1120190C Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
| 09/03/2003 | CN1120185C Copolymer containing N-vinyllactam derivative preparation method and photoresist |
| 09/02/2003 | US6614597 Illumination apparatus and projection exposure apparatus |
| 09/02/2003 | US6614540 Method and apparatus for determining feature characteristics using scatterometry |
| 09/02/2003 | US6614535 Exposure apparatus with interferometer |
| 09/02/2003 | US6614508 Reversed, double-helical bellows seal |
| 09/02/2003 | US6614507 Apparatus for removing photoresist edge beads from thin film substrates |
| 09/02/2003 | US6614505 Lithographic projection apparatus, device manufacturing method, and device manufactured thereby |
| 09/02/2003 | US6614504 Used in manufacturing electronic devices such as semiconductor devices and liquid crystal displays by using photolithography |
| 09/02/2003 | US6614503 Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system |
| 09/02/2003 | US6614120 Semiconductor device |
| 09/02/2003 | US6614085 Metal silicon nitride, photoresist patterning |
| 09/02/2003 | US6614034 Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields |
| 09/02/2003 | US6613844 Styrene polymer, chemically amplified positive resist composition and patterning process |
| 09/02/2003 | US6613692 Substrate processing method and apparatus |
| 09/02/2003 | US6613589 Method for improving substrate alignment |
| 09/02/2003 | US6613500 Reducing resist residue defects in open area on patterned wafer using trim mask |
| 09/02/2003 | US6613499 Development method for manufacturing semiconductors |
| 09/02/2003 | US6613498 Exposure of photoresistive material by transmitting radiation through layer of absorber; development |
| 09/02/2003 | US6613497 Patterning with x-rays or vacuum ultraviolet radiation; replacement of hydrogen atoms of acrylic polymer, polysiloxane, and polyvinylphenol; alkylation |
| 09/02/2003 | US6613496 Method for forming a dampening-waterless lithographic plate and method for forming an image using a dampening-waterless lithographic plate |
| 09/02/2003 | US6613495 Negative photoimageable mixture of a triazine or oxadiazole type acid generator, a reactive oligomer with crosslinking groups and a resin binder |
| 09/02/2003 | US6613493 Photoresist polymer and composition having nitro groups |
| 09/02/2003 | US6613492 Prepared from acetoxystyrene and either 5-benzofuranonyl (meth)acrylate or 3-hydroxy-4-chromenon-6-yl (meth)acrylate |
| 09/02/2003 | US6613487 Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same |
| 09/02/2003 | US6613483 Calibration pattern |
| 09/02/2003 | US6613482 Oxidation resistant covering |
| 09/02/2003 | US6612797 Cassette buffering within a minienvironment |
| 09/02/2003 | US6612625 Case locking system |
| 09/02/2003 | US6612505 Spraying method of a dispense system |
| 09/02/2003 | US6612159 Overlay registration error measurement made simultaneously for more than two semiconductor wafer layers |
| 08/28/2003 | WO2003071587A1 Process for making photonic crystal circuits using an electron beam and ultraviolet lithography combination |
| 08/28/2003 | WO2003071471A1 Overlay metrology and control method |
| 08/28/2003 | WO2003071357A1 Composition for forming anti-reflection coating |
| 08/28/2003 | WO2003071356A1 Resist material and microfabrication method |
| 08/28/2003 | WO2003071355A2 Photosensitive composition, photosensitive planographic printing plate, and method for manufacturing planographic printing plate using the same |
| 08/28/2003 | WO2003071353A2 An image forming method and apparatus |
| 08/28/2003 | WO2003071155A1 Anti-gravity mount with air and magnets |