Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2003
09/11/2003US20030169517 Objective, in particular a projection lens for microlithography
09/11/2003US20030169502 Laser irradiation apparatus and exposure method using laser irradiation apparatus
09/11/2003US20030169423 Method and system for overlay measurement
09/11/2003US20030169412 Reaction frame for a wafer scanning stage with electromagnetic connections to ground
09/11/2003US20030169411 Exposure method and apparatus, method of making exposure apparatus, device and device manufacturing method
09/11/2003US20030169409 Stage system, exposure apparatus, and device manufacturing method
09/11/2003US20030169408 Exposure apparatus and manufacturing method using the same
09/11/2003US20030169407 Exposure apparatus and device manufacturing method
09/11/2003US20030169382 Semipermeable liquid crystal display device and manufacturing method thereof
09/11/2003US20030169328 Imaging method for printing forms
09/11/2003US20030168655 Semiconductor constructions; and methods of forming semiconductor constructions
09/11/2003US20030168617 A projection apparatus for projecting a pattern formed on a mark onto a substrate and a control method for a projection apparatus
09/11/2003US20030168616 Electron beam exposure apparatus
09/11/2003US20030168615 Lithographic projection apparatus with positioning system for use with reflectors
09/11/2003US20030168597 Compensator for radially symmetric birefringence
09/11/2003US20030168596 Microstructured pattern inspection method
09/11/2003US20030168574 Vibration isolation apparatus using magnetic levitation devices
09/11/2003US20030168396 Monolithic filter body and fabrication technique
09/11/2003US20030167950 Printing plate precursor and printing plate
09/11/2003CA2375959A1 Photosensitive material and method of making same
09/10/2003EP1343052A2 A resist pattern-improving material and a method for preparing a resist pattern by using the same
09/10/2003EP1343051A1 Microlithographic projection arrangement using device for producing radial polarisation
09/10/2003EP1343050A2 Device and system for improving phase shift mask imaging performance and associated methods
09/10/2003EP1343049A1 Improved water-developable photosensitive resin for flexography
09/10/2003EP1343048A2 Anthracene derivative and radiation-sensitive resin composition
09/10/2003EP1343047A2 Resist composition
09/10/2003EP1343046A2 Image recording material separating/removing device
09/10/2003EP1342585A1 Method of making an electroluminescent device
09/10/2003EP1342568A1 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
09/10/2003EP1342130A1 Assembly comprising a plurality of mask containers
09/10/2003EP1342129A2 Printing by active tiling
09/10/2003EP1342128A2 Projection system for euv lithography
09/10/2003EP1341823A1 Surface-active photoinitiators
09/10/2003EP1341672A2 Receiver element for adjusting the focus of an imaging laser
09/10/2003CN1441476A Desk rack positioning and its control and explosure device and method for producing semiconductor device
09/10/2003CN1441321A Development liquid supply device
09/10/2003CN1441320A Method of removing photosensitive resin and residual polymer
09/10/2003CN1441319A Residual polymer remover and its usage
09/10/2003CN1441318A Method for producing photoetching equipment and device
09/10/2003CN1441317A Method for producing photoetching device and equipment
09/10/2003CN1441316A Method for producing photo mask and method for producing semiconductor device using said photomask
09/10/2003CN1441264A Circular ring Dammar grating
09/10/2003CN1441236A Aberration evaluating method for imaging optical system and its regulating method
09/10/2003CN1441043A Composition for cleaning
09/10/2003CN1120991C Amplitude mask and apparatus for manufacturing long period grating filter using same
09/10/2003CN1120858C Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
09/09/2003US6618425 Virtual laser operator
09/09/2003US6618422 Preionization arrangement for a gas laser
09/09/2003US6618421 High repetition rate gas discharge laser with precise pulse timing control
09/09/2003US6618402 Device for generating a plurality of laser beams
09/09/2003US6618185 Defective pixel compensation method
09/09/2003US6618174 Combines the imaging function of a lens with the transmission properties of a standard amplitude mask, obviating the need for expensive projection optics.
09/09/2003US6618146 Oscillation mechanism in exposure apparatus
09/09/2003US6618122 Movable support in a vacuum chamber and its application in lithographic projection apparatuses
09/09/2003US6618120 Devices and methods for compensating for tilting of a leveling table in a microlithography apparatus
09/09/2003US6618119 Projection exposure method and apparatus
09/09/2003US6618118 Optical exposure method, device manufacturing method and lithographic projection apparatus
09/09/2003US6617674 Semiconductor package and method of preparing same
09/09/2003US6617595 Multi-lens type electrostatic lens, electron beam exposure apparatus and charged beam applied apparatus using the lens, and device manufacturing method using these apparatuses
09/09/2003US6617592 Charged particle beam system and chamber of charged particle beam system
09/09/2003US6617585 Optimized curvilinear variable axis lens doublet for charged particle beam projection system
09/09/2003US6617573 Carrier device having a carrier surface with an opening for connecting with grooves
09/09/2003US6617555 Imaging stabilization apparatus and method for high-performance optical systems
09/09/2003US6617413 With or without blocking, allophanate groups and free-radically polymerizable C=C double bonds in activated form by a carbonyl group attached directly or an oxygen atom in an ether function
09/09/2003US6617265 Photomask and method for manufacturing the same
09/09/2003US6617186 Patterning by photolithography
09/09/2003US6617172 Semiconductor device having identification number, manufacturing method thereof and electronic device
09/09/2003US6617098 Includes the application of a plurality of layers of masking material that are patterned to provide a plurality of etching masks; particularly making micro-machined movable structures.
09/09/2003US6617097 Using masking pattern
09/09/2003US6617095 Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern
09/09/2003US6617093 Can be used, for example, as a color filter black matrix or a thin film transistor black matrix to provide contrast and/or to separate adjacent electrically-conducting components.
09/09/2003US6617087 Use of scatterometry to measure pattern accuracy
09/09/2003US6617086 Forming a pattern of a negative photoresist
09/09/2003US6617084 Efficiency
09/09/2003US6617082 Microelectromechanical system mask
09/09/2003US6617080 Photomask, semiconductor device, and method for exposing through photomask
09/09/2003US6617079 Process and system for determining acceptibility of a fluid dispense
09/09/2003US6616898 Processing apparatus with pressure control and gas recirculation system
09/09/2003US6616773 Substrate treatment method
09/09/2003US6616762 Treatment solution supply apparatus and treatment solution supply method
09/09/2003US6616760 Film forming unit
09/09/2003US6615728 Printing press and printing press control method
09/09/2003US6615724 Input nip roller system for external drum imaging system
09/09/2003US6615481 Utilizes laser machining to provide high resolution, dense coil wire patterns on both sides of a ceramic vane substrate. A firing operation is first performed that eutectically bonds the copper to the ceramic.
09/09/2003US6615477 Method and apparatus for processing workpiece by using X-Y stage capable of improving position accuracy
09/08/2003CA2418294A1 Imaging method for printing forms
09/04/2003WO2003073169A2 Fluorinated molecules and methods of making and using same
09/04/2003WO2003073168A1 Photosensitive resin composition, process for forming photosensitive elements or resist patterns with the same, and process for production of printed wiring boards
09/04/2003WO2003073167A1 Photosensitive resin composition
09/04/2003WO2003073166A1 Critical dimension control using full phase and trim masks
09/04/2003WO2003073165A2 Self-aligned pattern formation using dual wavelengths
09/04/2003WO2003073164A2 Novel planarization method for multi-layer lithography processing
09/04/2003WO2003072967A1 Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device
09/04/2003WO2003072877A1 Lining board for lithographic plate and its manufacturing method, and protected lithographic plate and its stack
09/04/2003WO2003072614A2 Thiol compound, photopolymerization initiator composition and photosensitive composition
09/04/2003WO2003072568A1 Thioxanthone derivatives, and their use as cationic photoinitiators
09/04/2003WO2003072368A1 Printing process film, manufacturing method thereof, process film recycling method, and printer
09/04/2003WO2003072240A1 Apparatus for treatment of light-sensitive biopolymers
09/04/2003WO2003014833A8 Collector with fastening devices for fastening mirror shells
09/04/2003WO2002084400A3 Preparation of photomasks