| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 09/17/2003 | CN1443315A Photoresist composition for deep UV and process thereof |
| 09/17/2003 | CN1443218A Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
| 09/17/2003 | CN1442888A Method of manufacturing semiconductor device |
| 09/17/2003 | CN1442885A Manufacturing method of semiconductor device and manufacturing equipment of semiconductor device |
| 09/17/2003 | CN1442759A Method of improving photoresist etching selection ratio of dielectric reflection coating layer |
| 09/17/2003 | CN1442758A Liquid treatment method and liquid treatment device |
| 09/17/2003 | CN1442756A Inert gas displacement method and device, exposure device and graticule sheet device |
| 09/17/2003 | CN1442755A Photoetching apparatus and device manufacturing method |
| 09/17/2003 | CN1442754A Method of forming isolated line using multiple exposure |
| 09/17/2003 | CN1442753A Anticorrosion agent composition |
| 09/17/2003 | CN1442752A Anticorrosion image improved material and method of preparing anticorrosion image using said material |
| 09/17/2003 | CN1121710C Method for forming wiring pattern |
| 09/16/2003 | USRE38254 Positive resist composition |
| 09/16/2003 | USRE38251 Composition comprising photochemical acid progenitor and specific squarylium dye |
| 09/16/2003 | US6622061 Method and apparatus for run-to-run controlling of overlay registration |
| 09/16/2003 | US6622059 Automated process monitoring and analysis system for semiconductor processing |
| 09/16/2003 | US6621961 Masking and etching core to define waveguide, leaving mask in place during etching of alignment element, overcladding to define passive platform |
| 09/16/2003 | US6621847 Narrow-band excimer laser apparatus |
| 09/16/2003 | US6621846 Electric discharge laser with active wavelength chirp correction |
| 09/16/2003 | US6621558 Exposure apparatus and device manufacturing method using the same |
| 09/16/2003 | US6621557 Projection exposure apparatus and exposure methods |
| 09/16/2003 | US6621556 Projection exposure apparatus and manufacturing and adjusting methods thereof |
| 09/16/2003 | US6621555 Projection optical system and projection exposure apparatus with the same, and device manufacturing method |
| 09/16/2003 | US6621553 Apparatus and method for exposing substrates |
| 09/16/2003 | US6621090 Electron-beam sources exhibiting reduced spherical aberration, and microlithography apparatus comprising same |
| 09/16/2003 | US6621061 Exposure method and device manufacturing method using the same |
| 09/16/2003 | US6621044 Dual-beam materials-processing system |
| 09/16/2003 | US6620978 Positive photoresist composition and process for synthesizing polyphenol compound |
| 09/16/2003 | US6620716 Method for making semiconductor device |
| 09/16/2003 | US6620576 Creating a uniform layer of the photosensitive material on the substrate by spinning; partially but not fully drying the layer; heating to fully dry; producing relief pattern layer; developing exposed portions of the surface relief pattern |
| 09/16/2003 | US6620574 Method of treating photoresists using electrodeless UV lamps |
| 09/16/2003 | US6620572 A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor consists of an organometallic compound, with the exclusion of the metallocenes, an organic |
| 09/16/2003 | US6620571 Method for producing microcapsules having improved wall characteristics |
| 09/16/2003 | US6620565 Electron beam lithography apparatus focused through spherical aberration introduction |
| 09/16/2003 | US6620563 Lithography method for forming semiconductor devices on a wafer utilizing atomic force microscopy |
| 09/16/2003 | US6620561 Method for designing photolithographic reticle layout, reticle, and photolithographic process |
| 09/16/2003 | US6620559 Photomask, method of lithographically structuring a photoresist layer with the photomask, and method of producing magnetic memory elements |
| 09/16/2003 | US6620558 Strength, rigidity |
| 09/16/2003 | US6620557 A main object of the present invention is to provide a photo-mask improved to ensure dimension with high accuracy. An actual pattern is provided on a substrate. A monitor mark for ensuring dimension of the actual pattern is also provided on |
| 09/16/2003 | US6620554 Etching substrate material, etching process, and article obtained by etching |
| 09/16/2003 | US6620546 Ionic composition comprising salt having conductivity of greater than 10-5 S.cm-1 between -30 and 150 degrees C; cation is proton, hydronium, hydroxonium, nitrosonium, ammonium or metal cation; anion is carbanion containing fluorine |
| 09/16/2003 | US6620251 Substrate processing method and substrate processing apparatus |
| 09/16/2003 | US6620248 Coating apparatus and mixing apparatus |
| 09/16/2003 | US6620245 Liquid coating apparatus with temperature controlling manifold |
| 09/16/2003 | US6620244 Resist film forming method and resist coating apparatus |
| 09/16/2003 | US6619903 System and method for reticle protection and transport |
| 09/16/2003 | US6619359 Pellicle mounting apparatus |
| 09/16/2003 | US6619301 Ultrasonic processing device and electronic parts fabrication method using the same |
| 09/16/2003 | CA2385675C Formation of microstructures using a preformed photoresist sheet |
| 09/15/2003 | CA2422211A1 1,2-naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
| 09/15/2003 | CA2377081A1 Method of producing an etch-resistant polymer structure using electron beam lithography |
| 09/12/2003 | WO2003075328A1 Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method |
| 09/12/2003 | WO2003075327A1 Exposure equipment and device manufacturing method |
| 09/12/2003 | WO2003075099A2 Method and system for overlay measurement |
| 09/12/2003 | WO2003075098A2 Prevention of contamination of optical elements and cleaning said elements |
| 09/12/2003 | WO2003075097A2 Refractive projection lens with a middle part |
| 09/12/2003 | WO2003075096A2 Refractive projection lens |
| 09/12/2003 | WO2003075095A1 Photosensitive resin compositions |
| 09/12/2003 | WO2003075094A1 Fluorinated copolymers for microlithography |
| 09/12/2003 | WO2003075093A1 Halogenated anti-reflective coatings |
| 09/12/2003 | WO2003075092A2 Protecting group-containing polymers for lithographic resist compositions |
| 09/12/2003 | WO2003075068A1 Lighting system comprising a nested collector for annularly illuminating an exit pupil |
| 09/12/2003 | WO2003075049A2 Refractive projection objective |
| 09/12/2003 | WO2003075042A2 Optical measurements of patterned structures |
| 09/12/2003 | WO2003075041A2 Optical measurements of line edge roughness |
| 09/12/2003 | WO2003074509A1 Heterocycle-bearing onium salts |
| 09/12/2003 | WO2003029873A3 Method and device for reducing speckle in an optical system |
| 09/12/2003 | WO2003025679A3 Exposure mask device and method for orienting a plurality of substrates on an exposure mask |
| 09/12/2003 | WO2002103776A3 Method for relating photolithography overlay target damage and chemical mechanical planarization (cmp) fault detection to cmp tool identification |
| 09/12/2003 | WO2002044816A3 Antireflective layer for use in microlithography |
| 09/11/2003 | WO2003075342A2 Methodology for repeatable post etch cd in a production tool |
| 09/11/2003 | US20030172365 Chip arrangement determining apparatus and method |
| 09/11/2003 | US20030171490 Polymer blend and associated methods of preparation and use |
| 09/11/2003 | US20030171468 Mixture of decomposable organometallic compounds and organosilicon compounds |
| 09/11/2003 | US20030171203 A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1 x |
| 09/11/2003 | US20030171059 Method for eliminating materials, method for reclaiming base, method for manufacturing display, and electronic appliances comprising display manufactured by the manufacturing method |
| 09/11/2003 | US20030170996 Method and apparatus for high density nanostructures |
| 09/11/2003 | US20030170995 Method and apparatus for high density nanostructures |
| 09/11/2003 | US20030170993 Semiconductor device and method of manufacturing the same |
| 09/11/2003 | US20030170571 A curable protective coatings for reducing an edge roughness during forming a small and fine pattern |
| 09/11/2003 | US20030170570 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
| 09/11/2003 | US20030170569 Negative-type photosensitive resin composition |
| 09/11/2003 | US20030170568 UV curable powder suitable for use as a photoresist |
| 09/11/2003 | US20030170567 Radiation curable resin layer |
| 09/11/2003 | US20030170565 Method of removing assist features utilized to improve process latitude |
| 09/11/2003 | US20030170563 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 09/11/2003 | US20030170562 A polymer having a silicon atom in a side chain, which is insoluble in aqueous alkali solution and becomes soluble in aqueous alkali solution by the action of an acid, generated by acid generator on exposure to active light radiation |
| 09/11/2003 | US20030170561 An acid- dissociable group-containing polysiloxane and a photoacid generator containing a trifluoromethane sulfonic acid or other fluoroalkyl sulfonic acid compounds |
| 09/11/2003 | US20030170560 Decomposition resin are acrylic series polymers or norbornene series polymers, used to prepare photoresists |
| 09/11/2003 | US20030170559 Image forming layer containing a fluorine macromolecule having a structural unit derived from monomer containing a double bond, and a hydroxy group, and also contains a polyoxyalkylene acrylate or methacrylate monomer |
| 09/11/2003 | US20030170558 A temporary support coated with alkali-soluble photosensitive resin layer containing colorant; when support is peeled from adjacent layer provided between support and resin layer, each support/adjacent layer has specific surface potential |
| 09/11/2003 | US20030170552 While changing a focus position and a dose amount on the image plane by respective amounts, a mark including both measurement and reference pattern is transferred onto areas arranged in matrix of a wafer via projection optical system |
| 09/11/2003 | US20030170551 Proximity effect correction apparatus, proximity effect correction method, storage medium , and computer program product |
| 09/11/2003 | US20030170423 Method of producing pattern member, apparatus of producing pattern member, and pattern member |
| 09/11/2003 | US20030170153 Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface |
| 09/11/2003 | US20030170099 Image recording material separating/removing device |
| 09/11/2003 | US20030170053 Device for transferring a pattern to an object |
| 09/11/2003 | US20030169524 System and methods for imaging employing a levitating conveyor |
| 09/11/2003 | US20030169523 Containing green pigment, pigment yellow 138 and a resin |
| 09/11/2003 | US20030169520 Mirror assembly with thermal contour control |