| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 09/23/2003 | US6623909 Polymers, resist compositions and patterning process |
| 09/23/2003 | US6623908 Thermally sensitive ionomer and a photothermal conversion material that is a bis(aminoaryl) polymethine dye that is soluble in water or a water-miscible organic solvent, and that has a lambda max greater than 700 nm |
| 09/23/2003 | US6623907 Radiation-sensitive resin composition |
| 09/23/2003 | US6623906 Photosensitive glass paste and method for manufacturing multilayered interconnected circuit board using the same |
| 09/23/2003 | US6623905 Photoresists |
| 09/23/2003 | US6623904 Photosensitive transfer recording material |
| 09/23/2003 | US6623895 Optically transferring lithography patterns |
| 09/23/2003 | US6623183 Developer producing equipment and method |
| 09/23/2003 | US6622915 Pattern reading apparatus |
| 09/23/2003 | US6622547 System and method for facilitating selection of optimized optical proximity correction |
| 09/18/2003 | WO2003077291A1 Semiconductor manufacturing method and device thereof |
| 09/18/2003 | WO2003077243A1 Optical information medium |
| 09/18/2003 | WO2003077239A1 Processing method for photoresist master, production method for recording medium-use mater, production method for recording medium, photoresist master, recording medium-use master and recording medium |
| 09/18/2003 | WO2003077038A2 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae |
| 09/18/2003 | WO2003077037A1 Refractive projection objective for immersion lithography |
| 09/18/2003 | WO2003077036A1 High-aperture projection lens |
| 09/18/2003 | WO2003077035A1 Photosensitive resin composition and use thereof |
| 09/18/2003 | WO2003077034A2 Fluorine-containing compounds with high transparency in the vacuum ultraviolet |
| 09/18/2003 | WO2003077033A2 Photosensitive material and process of making same |
| 09/18/2003 | WO2003077032A1 Method of passivating of low dielectric materials in wafer processing |
| 09/18/2003 | WO2003077031A1 Lithography pattern shrink process and articles |
| 09/18/2003 | WO2003077030A2 Detection of position and estimation of surface shape |
| 09/18/2003 | WO2003077029A1 Negative photoresists for short wavelength imaging |
| 09/18/2003 | WO2003077011A1 Optical system with birefringent optical elements |
| 09/18/2003 | WO2003077007A2 Objective lens consisting of crystal lenses |
| 09/18/2003 | WO2003076978A2 Compensator for radially symmetric birefringence |
| 09/18/2003 | WO2003076891A2 Moiré method and measuring system for measuring the distortion of an optical imaging system |
| 09/18/2003 | WO2003076872A1 Shape measuring method, interference measuring device, porduction method for projection optical system, and porjectionj aligner |
| 09/18/2003 | WO2003076699A1 Method for making an oriented optical fluoride crystal blank |
| 09/18/2003 | WO2003076527A1 Treated pigment, use thereof, and compound for treating pigment |
| 09/18/2003 | WO2003076491A1 Accelerators for cationic photopolymerization |
| 09/18/2003 | WO2003076086A1 Method and device for the decontamination of optical surfaces |
| 09/18/2003 | WO2003069273A3 Separated beam multiple degree of freedom interferometer |
| 09/18/2003 | WO2003016781A3 Surface plasmon enhanced illumination system |
| 09/18/2003 | WO2003015121A3 Slit lens arrangement for particle beams |
| 09/18/2003 | WO2002093201B1 Preferred crystal orientation optical elements from cubic materials |
| 09/18/2003 | US20030177467 Opc mask manufacturing method, opc mask, and chip |
| 09/18/2003 | US20030176585 Insulating resin composition, adhesive resin composition and adhesive sheeting |
| 09/18/2003 | US20030176583 Polymeric compositions and uses therefor |
| 09/18/2003 | US20030176528 Photosensitive resin composition, dry film, and workpiece using the same |
| 09/18/2003 | US20030176525 For use in composite molding material, adhesives, coating material; curability |
| 09/18/2003 | US20030176519 Accelerators for cationic photopolymerizations |
| 09/18/2003 | US20030176079 Periodic clamping method and apparatus to reduce thermal stress in a wafer |
| 09/18/2003 | US20030176021 Tape stiffener, semiconductor device component assemblies including same, and stereolithographic methods for fabricating same |
| 09/18/2003 | US20030176014 Methods of forming patterns for semiconductor constructions; and molds configured to pattern masses associated with semiconductor constructions |
| 09/18/2003 | US20030175626 Using supercritical fluids; separation |
| 09/18/2003 | US20030175625 Method for individualised marketing of circuit boards |
| 09/18/2003 | US20030175624 Photolithography; miniaturized semiconductor |
| 09/18/2003 | US20030175623 Method for forming resist pattern |
| 09/18/2003 | US20030175622 Relief image printing plates; photopolymerization |
| 09/18/2003 | US20030175621 Photopolymerizable bonding agent; photoinitiator; controlling temperature; heating cycles |
| 09/18/2003 | US20030175620 Containing polyepoxide; semiconductors; lithography |
| 09/18/2003 | US20030175617 Exposure to ultraviolet radiation; forming photoresist patterns |
| 09/18/2003 | US20030175615 Photopolymerization; thermosetting resins |
| 09/18/2003 | US20030175613 Semiconductors, integrated circuits, liquid crystal display |
| 09/18/2003 | US20030175612 Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase |
| 09/18/2003 | US20030175600 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 09/18/2003 | US20030175599 Semiconductor substrate; adjustment of patterned mask; laser annealing |
| 09/18/2003 | US20030175506 Utilization of beam crosslinkable polymer compositions as data recording medium |
| 09/18/2003 | US20030175427 Contact printing; fine resolution; transfer layer with pattern stamping surface |
| 09/18/2003 | US20030175409 Printing molecular library arrays |
| 09/18/2003 | US20030175154 Forming electrical contacts to a molecular layer |
| 09/18/2003 | US20030174879 Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same |
| 09/18/2003 | US20030174876 Local bias map using line width measurements |
| 09/18/2003 | US20030174805 X-ray exposure method and semiconductor device manufactured using this X-ray exposure method as well as X-ray mask, X-ray exposure unit and resist material |
| 09/18/2003 | US20030174551 Method for producing organic light-emitting diodes |
| 09/18/2003 | US20030174408 Refractive projection objective for immersion lithography |
| 09/18/2003 | US20030174341 Characterization and compensation of non-cyclic errors in interferometry systems |
| 09/18/2003 | US20030174340 Method and apparatus to measure fiber optic pickup errors in interferometry systems |
| 09/18/2003 | US20030174304 Method, system, and apparatus for management of reaction loads in a lithography system |
| 09/18/2003 | US20030174303 Apparatus for generating partially coherent radiation |
| 09/18/2003 | US20030174302 Exposure method and apparatus |
| 09/18/2003 | US20030174301 Photolithography apparatus and exposure method |
| 09/18/2003 | US20030174300 Optical Member for Photolithography and Method of Evaluating the Same |
| 09/18/2003 | US20030174298 Exposure apparatus, semiconductor device manufacturing method, maintenance method of exposure apparatus, and semiconductor manufacturing factory |
| 09/18/2003 | US20030174297 Method of adjusting projection optical apparatus |
| 09/18/2003 | US20030173833 Wafer stage with magnetic bearings |
| 09/18/2003 | US20030173713 Maskless stereo lithography method and apparatus for freeform fabrication of 3-D objects |
| 09/18/2003 | US20030173690 Die for molding optical panel, process for production thereof, and use thereof |
| 09/18/2003 | US20030173556 Compensating for cable drag forces in high precision stages |
| 09/18/2003 | US20030173106 Employs a yellow light and etching technique to form a wiring structure on a single layer transparent conductive film that requires high transparency |
| 09/18/2003 | US20030172829 Rotating drum and image recording device |
| 09/18/2003 | US20030172828 Regenerative plate making and printing process, and plate making and printing apparatus |
| 09/18/2003 | CA2477135A1 Accelerators for cationic photopolymerization |
| 09/17/2003 | EP1345084A1 Lithographic apparatus and device manufacturing method |
| 09/17/2003 | EP1345083A2 Management of reaction forces in a lithography system |
| 09/17/2003 | EP1345082A1 Lithographic apparatus and device manufacturing method |
| 09/17/2003 | EP1345081A1 High-resolution photosensitive resin composition usable with i-line and method of forming pattern |
| 09/17/2003 | EP1345080A2 1,2-Naphthoquinone-2-Diazidesulfonate Ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
| 09/17/2003 | EP1345079A2 Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase |
| 09/17/2003 | EP1344783A1 Process for producing polymer compounds by elimination reaction |
| 09/17/2003 | EP1344113A2 Process for removal of photoresist after post ion implantation |
| 09/17/2003 | EP1344112A2 Projection lens |
| 09/17/2003 | EP1344111A1 Objective with at least one aspherical lens |
| 09/17/2003 | EP1344110A1 Mitigation of radiation induced surface contamination |
| 09/17/2003 | EP1344109A2 Onium salts and the use therof as latent acids |
| 09/17/2003 | EP1344108A1 Optical recording materials |
| 09/17/2003 | EP1344102A2 Dynamically stabilized contact lenses |
| 09/17/2003 | EP0755321B2 Process for producing a three-dimensional object |
| 09/17/2003 | CN2574075Y Cooling device for exposure apparatus |