Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2003
09/25/2003US20030180670 Surface treatment of a semiconductor wafer by photomasking, using a metal shields; materials handling
09/25/2003US20030180668 Forming reduced size openings, by flowing the photoresist layer to reduce the size of the opening images; materials handling
09/25/2003US20030180667 Development deffect preventing process and material
09/25/2003US20030180666 Method of forming patterned photoresist layer
09/25/2003US20030180665 Ionization radiation imageable photopolymer compositions
09/25/2003US20030180664 Photoimageable, aqueous acid soluble polyimide polymers
09/25/2003US20030180663 A blends comprising a partially etherified polyhydroxystyrene-p and a partially esterified polyhydroxystyrene-p with pivalic acid, an acid generators; photolithography activated by high-energy ultraviolet ray
09/25/2003US20030180662 A copolymer of (meth)acrylic acid ester of adamantane ring; etching resistance, soluble by irradiation, forming fine patterns
09/25/2003US20030180661 Polymer having butadiene sulfone repeating unit and resist composition comprising the same
09/25/2003US20030180659 Resist composition
09/25/2003US20030180658 A hydrophilic substrate coated with a radiation photosensitive thermoplastic resin, a converter substance capable of converting radiation into heat; thermography, printing/thermal/
09/25/2003US20030180657 A halogenated organic ammonium salt promoter, exposing and developing the photoresist layer to form a relief image, a microelectronic wafer coated with photoresist layer; enhancing lithographic performance
09/25/2003US20030180656 A cyclopentane with a fluorine atom, a trifluoromethyl group, or a difluoromethylene group compounds, used as reducing radiation absorbance of photoresist resins, improving ultra-fine process
09/25/2003US20030180655 Process for making a flexographic printing plate and a photosensitive element for use in the process
09/25/2003US20030180654 Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates
09/25/2003US20030180653 Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
09/25/2003US20030180639 Corrective force is determined and applied; for manufacturing integrated circuits
09/25/2003US20030180637 X/Y alignment vernier and method of fabricating same
09/25/2003US20030180636 Processless digitally imaged printing plate using microspheres
09/25/2003US20030180635 Visible radiation sensitive composition
09/25/2003US20030180634 For preparing reticle used in combination with exposure tool to image chemically amplified deep ultraviolet resist layer overlying semiconductor substrate
09/25/2003US20030180633 Laminating photoresist; for production of thin-film magnetic heads and semiconductor elements
09/25/2003US20030180632 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
09/25/2003US20030180628 Comprises controllable transmittance photomask vertically divided into regions having both transparent and dark blocks
09/25/2003US20030180627 Method of producing an etch-resistant polymer structure using electron beam lithography
09/25/2003US20030180559 Coating compositions for use with an overcoated photoresist
09/25/2003US20030180508 Method of forming a monolayer of particles having at least two different sizes, and products formed thereby
09/25/2003US20030179849 X-ray projection exposure device, x-ray projection exposure method, and semiconductor device
09/25/2003US20030179462 Optical projection lens system
09/25/2003US20030179458 Light exposure apparatus and light emitting device therefor
09/25/2003US20030179377 Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
09/25/2003US20030179370 Method and system for detecting defects
09/25/2003US20030179359 Stage system
09/25/2003US20030179358 Position measuring system with multiple bar mirrors
09/25/2003US20030179357 Lithographic apparatus and device manufacturing method
09/25/2003US20030179356 Projection objective having adjacently mounted aspheric lens surfaces
09/25/2003US20030179354 Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
09/25/2003US20030179353 Alignment device
09/25/2003US20030179352 Lithographic apparatus and device manufacturing method
09/25/2003US20030179282 Method of setting the image line width in an exposer
09/25/2003US20030179278 Imaging of printing forms using a laser diode bar which also includes non-activatable laser diodes
09/25/2003US20030178703 Patterning semiconductor layers using phase shifting and assist features
09/25/2003US20030178621 Electroluminescent element
09/25/2003US20030178583 Field emission photo-cathode array for lithography system and lithography system provided with such an array
09/25/2003US20030178581 Electron beam irradiation apparatus and electron beam irradiating method
09/25/2003US20030178579 Stage devices exhibiting reduced deformation, and microlithography systems comprising same
09/25/2003US20030178547 Forming relief images on substrate; overcoating with photoresists; forming patterned surface; smoothness
09/25/2003US20030178316 Electric microcontact printing method and apparatus
09/25/2003US20030178130 Method for producing organically developable, photopolymerizable flexographic printing elements on flexible metallic supports
09/25/2003DE29924533U1 Photolithography illumination of biological matter uses an elastic mirror surface with controlled distortion to give structured diffracted light for illuminated and unlit zones at the target surface
09/25/2003DE29924532U1 Photographic illumination apparatus for biological matter has a perforated mask between the light source and the DNA chip with micro shutters operated by electronic control
09/25/2003CA2477779A1 Photosensitive element for use as flexographic printing plate
09/24/2003EP1347501A1 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice
09/24/2003EP1347498A2 Stage alignment apparatus and control method therefor
09/24/2003EP1347468A1 Method for patterning electroconductive tin oxide film
09/24/2003EP1347461A1 Device for x-ray lithography
09/24/2003EP1347340A2 Exposure device
09/24/2003EP1347339A1 Photoresist residue remover composition
09/24/2003EP1347338A1 Exposure apparatus
09/24/2003EP1347337A2 Compensating for cable drag forces acting on a high precision stage
09/24/2003EP1347336A1 Interferometer system and lithographic apparatus comprising such a system
09/24/2003EP1347335A1 Positive resist composition
09/24/2003EP1347334A1 Photoresist compositions
09/24/2003EP1346843A1 Image forming method
09/24/2003EP1346261A1 Projection lithography using a phase shifting aperture
09/24/2003EP1346260A1 Substrate for material to be exposed
09/24/2003EP1345770A1 Method for obtaining a lithographic printing surface
09/24/2003EP1345769A1 Thermally convertible lithographic printing precursor
09/24/2003EP1099138B1 Stereolithographic compositions for preparing polyethylene-like articles
09/24/2003EP1012671B1 Photosensitive black matrix composition and process of making it
09/24/2003EP1003645B1 Method of making electronic parts
09/24/2003CN1444740A Method for improved developing process in wafer photolithography
09/24/2003CN1444494A Methods utilizing scanning probe microscope tips and products therefor or produced thereby
09/24/2003CN1444266A Photoetching programmed integrated circuit
09/24/2003CN1444103A Optical photoresist stripping composition and cleaning composition
09/24/2003CN1444102A Material removing method, substance reproducing method and method for making display device
09/24/2003CN1444101A Exosure method and device
09/24/2003CN1444100A Background exposure method and equipment using said method
09/24/2003CN1444099A Light source element, illuminating device, exposure device and method
09/24/2003CN1444098A Plate material for digital lithoprint direct printing plate
09/24/2003CN1444097A Mask element, method for preparing mask by using said element and method for preparing photosensitive resin printing plate by sing said mask
09/23/2003USRE38256 Safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound
09/23/2003US6625802 Method for modifying a chip layout to minimize within-die CD variations caused by flare variations in EUV lithography
09/23/2003US6625512 Method and apparatus for performing final critical dimension control
09/23/2003US6625497 Semiconductor processing module with integrated feedback/feed forward metrology
09/23/2003US6625251 Laser plasma x-ray generation apparatus
09/23/2003US6625191 Very narrow band, two chamber, high rep rate gas discharge laser system
09/23/2003US6624915 Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
09/23/2003US6624880 Method and apparatus for microlithography
09/23/2003US6624879 Exposure apparatus and method for photolithography
09/23/2003US6624878 Laser writer
09/23/2003US6624877 Method of and apparatus for recording image by exposure to light beams
09/23/2003US6624433 Method and apparatus for positioning substrate and the like
09/23/2003US6624431 High collection angle short wavelength radiation collimator and focusing optic
09/23/2003US6624430 Phase shifting using an apparatus having electron generators, focusing lenses and deflection controllers for adjustment of radiation beams
09/23/2003US6624335 Ether, polymer, resist composition and patterning process
09/23/2003US6624085 Semiconductor structure, capacitor, mask and methods of manufacture thereof
09/23/2003US6623912 Method to form the ring shape contact to cathode on wafer edge for electroplating in the bump process when using the negative type dry film photoresist
09/23/2003US6623911 Method to form code marks on mask ROM products
09/23/2003US6623910 Planographic printing plate precursor
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