| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/12/2013 | US20130330670 Electron Beam Lithography System and Method for Improving Throughput |
| 12/12/2013 | US20130330669 Photoresist composition |
| 12/12/2013 | US20130330668 Neutral layer polymer composition for directed self assembly and processes thereof |
| 12/12/2013 | US20130329210 Roll-printing apparatus and roll-printing method using the same |
| 12/12/2013 | US20130329208 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method |
| 12/12/2013 | US20130329207 Exposure apparatus and device manufacturing method |
| 12/12/2013 | US20130329206 Exposure apparatus, exposure method, and device manufacturing method |
| 12/12/2013 | US20130329205 Maskless lithography system |
| 12/12/2013 | US20130329204 Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method |
| 12/12/2013 | US20130329203 Method and apparatus for printing high-resolution two-dimensional periodic patterns |
| 12/12/2013 | US20130329201 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method |
| 12/12/2013 | US20130329200 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method |
| 12/12/2013 | US20130329199 Coating and developing apparatus |
| 12/12/2013 | DE102013003582A1 Method for determination and/or optimization of focus setting in optical arrangement i.e. measuring device, for measurement of structures of photomasks, involves determining parameter for determination of sharpness of image in image regions |
| 12/12/2013 | DE102012223034A1 Illumination system for extreme UV-projection exposure system used for projecting reflecting structures arranged on lower side in mask on photo resist, has solid body joint including three joint legs, which bend during deflecting rod |
| 12/12/2013 | DE102012011343A1 Vorrichtung und Verfahren zur Interferenzstrukturierung von Proben sowie dergestalt strukturierte Proben Apparatus and method for interference structuring of samples and such structured samples |
| 12/11/2013 | EP2672321A1 Device for positioning a waferchuck |
| 12/11/2013 | EP2672320A1 Method for producing three-dimensional metal micro-parts by growth in a mixed cavity and micro-parts obtained by the method |
| 12/11/2013 | EP2672319A1 Method for producing three-dimensional metal micro-parts by growth in a mixed cavity and micro-parts obtained by the method |
| 12/11/2013 | EP2672307A2 Projection optical system, exposure apparatus, and exposure method |
| 12/11/2013 | EP2671118A1 Chamber apparatus and extreme ultraviolet (euv) light generation apparatus including the chamber apparatus |
| 12/11/2013 | EP1849600B1 Bakeable radiation-sensitive elements with a high resistance to chemicals |
| 12/11/2013 | CN1758141B Coating compositions for use with an overcoated photoresist |
| 12/11/2013 | CN103443711A Composition for forming pattern reversal film, and method for forming reversal pattern |
| 12/11/2013 | CN103443710A Lithography rinsing fluid and pattern formation method using same |
| 12/11/2013 | CN103443709A Surface planarisation |
| 12/11/2013 | CN103443708A Negative photosensitive resin composition |
| 12/11/2013 | CN103443707A 树脂组合物和半导体元件基板 The resin composition and a semiconductor element substrate |
| 12/11/2013 | CN103443206A Water-insoluble coloring compound, ink, resist composition for color filter, and thermal transfer recording sheet |
| 12/11/2013 | CN103443161A Antireflective coating composition and process thereof |
| 12/11/2013 | CN103443155A Black resin composition, resin black matrix substrate, and touch panel |
| 12/11/2013 | CN103442900A Lithographic printing plate precursor and plate making method thereof |
| 12/11/2013 | CN103441708A Modularization moving-iron type six-freedom-degree maglev motion platform |
| 12/11/2013 | CN103441086A Method for detecting light resistance layer ion implantation stopping capacity |
| 12/11/2013 | CN103441071A Method for shrinking critical size in polysilicon gate dry etching |
| 12/11/2013 | CN103441067A Dual pattern forming method applied to grid line end cutting |
| 12/11/2013 | CN103439869A Method for measuring graphic density |
| 12/11/2013 | CN103439868A Device and method for measuring numerical aperture of projection objective |
| 12/11/2013 | CN103439867A Cable table for workpiece table of lithography machine |
| 12/11/2013 | CN103439866A VxWorks-based lithography machine double-workbench communication method and device |
| 12/11/2013 | CN103439865A Scanning slit device used in stepping scan lithography machine |
| 12/11/2013 | CN103439864A Environmental system including vaccum scavange for an immersion lithography apparatus |
| 12/11/2013 | CN103439863A Exposure device and exposure method, maintenance method, and device manufacturing method |
| 12/11/2013 | CN103439862A 栅极lele双重图形成型方法 Lele double gate patterning method |
| 12/11/2013 | CN103439861A Radiation-sensitive resin composition and compound |
| 12/11/2013 | CN103439762A Method for ruling and manufacturing concave blazed gratings |
| 12/11/2013 | CN103438926A Photosensitive wet film imaging point testing device for PCB (Printed circuit board) |
| 12/11/2013 | CN103437240A 纸芯片及其制备方法 Paper chip and its preparation method |
| 12/11/2013 | CN103436923A Method for increasing interfacial bonding strength between SU-8 photoresist and metal substrate by ultrasound |
| 12/11/2013 | CN103435722A Photoinitiators for UV-LED curable compositions and inks |
| 12/11/2013 | CN102736410B Method for machining large-area nanoimprint silicon die under multi-point contact mode |
| 12/11/2013 | CN102687071B Reflective-layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for producing reflective-layer-equipped substrate |
| 12/11/2013 | CN102636965B Super-resolution dry-method surface plasma photo-etching method |
| 12/11/2013 | CN102621668B Projection optical system |
| 12/11/2013 | CN102597116B Curable composition, method of coating a phototool, and coated phototool |
| 12/11/2013 | CN102540737B Photomask for photoetching machine testing and testing method of photoetching machine |
| 12/11/2013 | CN102540730B Positive image ultraviolet-computer-to-plate ((UV-CTP) planographic printing plate |
| 12/11/2013 | CN102193336B 光刻设备和方法 Lithographic apparatus and method |
| 12/11/2013 | CN102131766B New propanoates and processes for preparing the same |
| 12/11/2013 | CN102060980B Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same |
| 12/11/2013 | CN102037409B Orthogonal processing of organic materials used in electronic and electrical devices |
| 12/11/2013 | CN101943860B Processes for photolithography |
| 12/11/2013 | CN101884017B Method of producing a relief image arrangement |
| 12/11/2013 | CN101288028B Photopolymerizable silicone materials forming semipermeable membranes for sensor applications |
| 12/11/2013 | CN101261442B Device manufacturing method and lithographic apparatus |
| 12/11/2013 | CN101176041B Positive resist composition and method of forming resist pattern |
| 12/11/2013 | CN101030037B Coating compositions for use with an overcoated photoresist |
| 12/10/2013 | US8605257 Projection system with compensation of intensity variations and compensation element therefor |
| 12/10/2013 | US8605252 Exposure apparatus, exposure method, and method for producing device |
| 12/10/2013 | US8603733 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method |
| 12/10/2013 | US8603732 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process |
| 12/10/2013 | US8603731 Resist underlayer film forming composition for electron beam lithography |
| 12/10/2013 | US8603730 Photopolymerisable composition |
| 12/10/2013 | US8603729 Lithographic printing plate precursor and plate making method thereof |
| 12/10/2013 | US8603728 Polymer composition and photoresist comprising the polymer |
| 12/10/2013 | US8603727 Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same |
| 12/10/2013 | US8603726 Radiation-sensitive resin composition, polymer and compound |
| 12/10/2013 | US8603724 Negative resist composition and patterning process |
| 12/10/2013 | US8603708 Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device |
| 12/10/2013 | US8603619 Heat-resistant brittle label |
| 12/10/2013 | US8603383 Original and article manufacturing method using same |
| 12/05/2013 | WO2013181175A1 Silica-modified-fluoride broad angle anti-reflection coatings |
| 12/05/2013 | WO2013181107A1 Bioactive agent delivery devices and methods of making and using the same |
| 12/05/2013 | WO2013180419A1 Photoactive compound and light-sensitive resin composition comprising same |
| 12/05/2013 | WO2013180386A1 Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same |
| 12/05/2013 | WO2013180314A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing method of semiconductor device, and semiconductor device |
| 12/05/2013 | WO2013180187A1 Method and device for measuring wavefront, and exposure method and device |
| 12/05/2013 | WO2013180131A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing wiring board |
| 12/05/2013 | WO2013180035A1 Dispersion composition, polymerizable composition using same, light-blocking color filter, solid-state imaging element, liquid crystal display device, wafer-level lens, and imaging unit |
| 12/05/2013 | WO2013179977A1 Illumination device, processing device, and device manufacturing method |
| 12/05/2013 | WO2013179863A1 Photosensitive composition and printed circuit board having hardened layer thereof |
| 12/05/2013 | WO2013179237A1 Black colorant mixture |
| 12/05/2013 | WO2013178775A1 Determining position and curvature information directly from a surface of a patterning device. |
| 12/05/2013 | WO2013178695A1 Lithography apparatus and method for producing a mirror arrangement |
| 12/05/2013 | WO2013178484A1 Support apparatus, lithographic apparatus and device manufacturing method |
| 12/05/2013 | WO2013178459A1 Gradient-based pattern and evaluation point selection |
| 12/05/2013 | WO2013178438A1 Object holder and lithographic apparatus |
| 12/05/2013 | WO2013178432A1 Illumination optical unit for projection lithography |
| 12/05/2013 | WO2013178429A1 An assembly for modifying properties of a plurality of radiation beams, a lithography apparatus, a method of modifying properties of a plurality of radiation beams and a device manufacturing method |
| 12/05/2013 | WO2013178422A1 Metrology method and apparatus, substrate, lithographic system and device manufacturing method |