Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/08/2003CN1447844A Process for producing coatings using surface-active photoinitiators
10/08/2003CN1447754A Compsns. for cleaning organic and plasma etched residues for semiconductor devices
10/08/2003CN1447740A Differentaially cured materials and process for forming same
10/08/2003CN1447387A Method of forming slushing pattern
10/08/2003CN1447386A Fineness figure forming method
10/08/2003CN1447385A Method for improving microspur consistency
10/08/2003CN1447194A Monitoring, exposure, etching method, mfg. method of semiconductor device and exposure machine
10/08/2003CN1447193A Residue removing liquor compsn. of photo resist
10/08/2003CN1447192A Management method for reaction load in micro imaging system, its system and equipment
10/08/2003CN1447191A Vibration carving and writing method for optical probe scan IC in photoetching system
10/08/2003CN1447190A Method of making fluid jet equipments
10/08/2003CN1447189A Light mark, focusing monitoring method, light exposure monitoring method, and mfg. method of semiconductor device
10/08/2003CN1447188A Image recorder
10/08/2003CN1447187A Image recorder and image recording method
10/08/2003CN1447156A Wiring substrate for display device and its mfg. method
10/08/2003CN1446703A Method for forming fine patterns on surfaces of glass and glass products
10/08/2003CN1123590C Polybenzoxazole resin and its precursor
10/07/2003US6631511 Generating mask layout data for simulation of lithographic processes
10/07/2003US6631038 Catadioptric lens barrel structure having a plurality of connecting rods for positioning the lens barrel structure
10/07/2003US6631036 Catadioptric objective
10/07/2003US6631004 Single-pass and multi-pass interferometry systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion
10/07/2003US6630987 Rotational mask scanning exposure method and apparatus
10/07/2003US6630986 Scanning type exposure apparatus and a device manufacturing method using the same
10/07/2003US6630985 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components
10/07/2003US6630984 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/07/2003US6630365 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures
10/07/2003US6630308 Generating preferential amino acid sequences on substrate; obtain substrate, deblock, expose to amino acids, recover preferential particles
10/07/2003US6630290 Fine etching
10/07/2003US6630289 Photo-patterned light polarizing films
10/07/2003US6630288 Trimming the feature patterned on the photoresist layer to form a trimmed feature, where a vertical trim rate and a lateral trim rate are associated with the feature and the vertical trim rate is slower than that of the lateral
10/07/2003US6630287 Method for forming thick film pattern and photosensitive paste used therefor
10/07/2003US6630286 Process for preparing a printing plate
10/07/2003US6630285 Positive sensitive resin composition and a process for forming a resist pattern therewith
10/07/2003US6630282 Crosslinked positive-working photoresist composition
10/07/2003US6630281 Forming positive pattern
10/07/2003US6630280 Positive photoresist composition
10/07/2003US6630279 Positive photoresist composition
10/07/2003US6630274 Color filter and manufacturing method therefor
10/07/2003US6630117 Making a dispersion managing crystal
10/07/2003US6630064 Electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance, photoacid generator, a positive-type photosensitive polyimide
10/07/2003US6630009 For computerized production of three dimensional sintered bodies by solid freeform fabrication, including binding agent charged with metal powder
10/07/2003US6629471 X-Y stage apparatus capable of reducing the number of drive sources
10/07/2003US6629375 Apparatus for collecting ablated material
10/02/2003WO2003081712A2 Grating element for filtering wavelengths ≤ 100nm
10/02/2003WO2003081648A1 Exposure device, exposure method, and device manufacturing method
10/02/2003WO2003081344A1 Photopolymer composition for holographic recording material, holographic recording medium, and process for producing the same
10/02/2003WO2003081339A2 Patterning semiconductor layers using phase shifting and assist features
10/02/2003WO2003081338A1 Method and apparatus for printing large data flows
10/02/2003WO2003081337A2 Device for manipulation of the angular position of an object relative to a fixed structure
10/02/2003WO2003081298A1 Pigment-dispersed resist composition for color filters
10/02/2003WO2003080688A1 A novel process for producing anhydride-containing polymers for radiation sensitive compositions
10/02/2003WO2003080526A1 Synthetic quartz glass
10/02/2003WO2003080340A1 Compositions for positive heat sensitive lithographic printing plates
10/02/2003WO2003042760A3 Lithography using achromatic fresnel optics
10/02/2003WO2003035814A3 Improved post plasma ashing wafer cleaning formulation
10/02/2003WO2003032351A3 Method and device for aligning a charged particle beam column
10/02/2003WO2003010799A3 Plasma ashing process
10/02/2003WO2002099534A3 Lighting system with a plurality of individual grids
10/02/2003WO2002079880A3 Method for adjusting the overlay of two masking planes in a photolithographic process
10/02/2003US20030187840 Metrology diffraction signal adaptation for tool-to-tool matching
10/02/2003US20030187750 Photomask supply system with photomask production period shortened
10/02/2003US20030187119 Radiation-sensitive composition capable of having refractive index distribution
10/02/2003US20030187088 Photo-curable coating compostion for hard protective coat and coated article
10/02/2003US20030186547 Method for forming fine patterns in semiconductor device
10/02/2003US20030186427 Apparatus for selectively converting photogenerated reagent precursors to photogenerated reagents associated with parallel synthesis of molecular sequence arrays on solid surfaces
10/02/2003US20030186296 Microarray comprised of polynucleotide or polypeptide biopolymer substrate for use in cancer diagnosis
10/02/2003US20030186175 For use in fabricating circuits or forming electrodes on semiconductor devices for semiconductor integrated circuits or liquid crystal displays
10/02/2003US20030186174 Exposing a negative type image forming material to infrared laser imagewise, which image forming material comprises substrate and an image recording layer formed; developing the image forming material with an alkaline developer solution
10/02/2003US20030186171 Transparency to light with wavelengths in the deep ultraviolet region such as KrF or ArF laser light, and exhibits high sensitivity and definition
10/02/2003US20030186170 Method of forming resist pattern
10/02/2003US20030186166 Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
10/02/2003US20030186165 Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
10/02/2003US20030186163 Suitable for direct plate-making, which is capable of producing a printing plate directly by recording digital image signals formed by and output from computer with an infrared laser beam
10/02/2003US20030186161 For use in production of semiconductor devices
10/02/2003US20030186160 Copolymer for use in chemical amplification resists
10/02/2003US20030186142 Directing optical radiation on the optical medium; propagating a test beam; capturing and measuring a defined characteristic associated with initial grating; comparing; performing grating correction
10/02/2003US20030186141 Multi-exposure lithography method and system providing increased overlay accuracy
10/02/2003US20030186140 For creating microsensors and fluidic networks, molecular imprinted arrays, plastic circuits, and thin film devices
10/02/2003US20030186139 Optical functional element and method of producing the same
10/02/2003US20030186138 Resolution of a stepper
10/02/2003US20030186137 Disposable hard mask for phase shift photomask plasma etching
10/02/2003US20030186136 Separated beam multiple degree of freedom interferometer
10/02/2003US20030186134 Interferometrically measuring first and second optical path lengths to a measurement object along respective first and second paths; compensating the first measured optical path length for time-varying optical properties of gas
10/02/2003US20030186133 Electrical field alignment vernier
10/02/2003US20030186132 Optical alignment test structure patterns on photomasks used to determine field-to-field alignment of a stepper in lithography
10/02/2003US20030186057 Capable of image-forming, on which images can be recorded by scanning exposure based on digital signals and the recorded images can be mounted on a press without development processing for printing
10/02/2003US20030185996 Epoxy resin composition, surface treating method, ink-jet recording head, and ink-jet recording apparatus
10/02/2003US20030184903 Transducers for sub-wavelength optical spots
10/02/2003US20030184832 Exposure apparatus, exposure method, recording and/or reproducing apparatus, and recording and/or reproducing method
10/02/2003US20030184823 Image recorder
10/02/2003US20030184759 Interferometer with dynamic beam steering element
10/02/2003US20030184749 Birefringence measurement apparatus and method
10/02/2003US20030184724 Stage assembly including a damping assembly
10/02/2003US20030184720 Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby
10/02/2003US20030184719 Exposure apparatus
10/02/2003US20030184707 Process for producing reflection type liquid crystal display device
10/02/2003US20030184254 Electromagnetic alignment and scanning apparatus
10/02/2003US20030184253 Electromagnetic alignment and scanning apparatus
10/02/2003US20030183960 Composition for producing ultraviolet blocking lenses
10/02/2003US20030183832 Semiconductor substrate, method of manufacturing the semiconductor substrate, semiconductor device and pattern forming method
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