Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/14/2003US6633362 Projection exposure apparatus
10/14/2003US6633048 High output extreme ultraviolet source
10/14/2003US6633024 Scan line to scan line feedforward in an autofocus system of an imaging system
10/14/2003US6632903 Chemical and etching resistance
10/14/2003US6632744 Manufacturing method of semiconductor integrated circuit device
10/14/2003US6632692 Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same
10/14/2003US6632593 Pattern-forming method using photomask, and pattern-forming apparatus
10/14/2003US6632592 Resist pattern forming method
10/14/2003US6632590 Enhance the process window of memory cell line/space dense pattern in sub-wavelength process
10/14/2003US6632588 Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates
10/14/2003US6632587 Method of enhancing photoresist anti-etching ability
10/14/2003US6632586 Irradiation acid generator and resin which decomposed on acidification; increasing solubility in alkaline developing solution
10/14/2003US6632585 Copolymer of partially deuterated and/or halogenated vinyl siloxanes; heat, water and chemical resistance; high transmission at communication wavelength ranges
10/14/2003US6632582 Using an organosilicon compounds
10/14/2003US6632581 Improved resist performance-sensitivity and resolution using resin derived from alicyclic unsaturated carboxylic acid ester and acid generator suitable for excimer laser lithography using argon/krypton fluoride; semiconductor processing
10/14/2003US6632574 Mask having pattern areas whose transmission factors are different from each other
10/14/2003US6632476 Spreading thin liquid film, semiconductors
10/09/2003WO2003083914A1 Position detection mark, mark identification method, position detection method, exposure method, and position information detection method
10/09/2003WO2003083913A1 Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method, and mask
10/09/2003WO2003083909A1 Stage device for a vacuum chamber
10/09/2003WO2003083889A1 Method for patterning thick-film paste material layer, method for manufacturing cold-cathode field electron emission device, and method for manufacturing cold-cathode field electron emission display
10/09/2003WO2003083582A1 Ph buffered compositions for cleaning semiconductor substrates
10/09/2003WO2003083581A1 Resist releasing agent
10/09/2003WO2003083580A1 System for optically treating surfaces
10/09/2003WO2003083579A1 Collector unit comprising a reflective element for lighting systems having a wavelength of less than 193 nm
10/09/2003WO2003083578A1 Processless digitally imaged printing plate using microspheres
10/09/2003WO2003083577A2 Solvent resistant copolymers
10/09/2003WO2003083525A1 Micro-lens array substrate and production method therefor, and projection type liquid crystal display unit using those
10/09/2003WO2003083408A1 Fizeau lens, interference measuring device, interference measuring method, method of manufacturing projective optical system, and projective exposure device
10/09/2003WO2003083032A1 Thinner composition for removing photosensitive resin
10/09/2003WO2003082937A2 Polymerisable composition
10/09/2003WO2003082933A1 Process for the production of high-molecular compounds for photoresist
10/09/2003WO2003082929A1 Photoinitiator, novel compound, and photocurable composition
10/09/2003WO2003082486A1 Removal of contaminants using supercritical processing
10/09/2003WO2003082481A1 Nanoporous coatings
10/09/2003WO2003050619A3 A method for producing a mask for high resolution lithography, a mask obtained thereby and a multi-layer element for high resolution lithography
10/09/2003WO2003036767A3 Parallel, individually addressable probes for nanolithography
10/09/2003WO2003036359A3 Optical element with an optical axis
10/09/2003WO2003025678A3 Method and device for control of the data flow on application of reticles in a semiconductor component production
10/09/2003WO2003012549A3 Lithograph comprising a moving cylindrical lens system
10/09/2003WO2002101466A3 Exposure control for phase shifting photolithographic masks
10/09/2003WO2002099500A3 Correction of birefringence in cubic crystalline projection lenses and optical systems
10/09/2003WO2002065215A3 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
10/09/2003WO2002012927A3 Method and device for producing an optically antireflective surface
10/09/2003US20030192015 Method and apparatus to facilitate test pattern design for model calibration and proximity correction
10/09/2003US20030191268 Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
10/09/2003US20030191259 Novel polymers for photoresist and photoresist compositions using the same
10/09/2003US20030190822 Charged particle beam adjusting method, pattern transfer method and device manufacturing method using the same method
10/09/2003US20030190820 Titanium carbonate films for use in semiconductor processing
10/09/2003US20030190818 Enhanced processing of performance films using high-diffusivity penetrants
10/09/2003US20030190811 Elimination of resist footing on tera hardmask
10/09/2003US20030190803 System and method for analog replication of microdevices having a desired surface contour
10/09/2003US20030190762 Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process
10/09/2003US20030190555 Image forming method
10/09/2003US20030190554 Photopolymerization; development using alkalinity developer
10/09/2003US20030190553 Support with hydrophilic surface; multilayer; latex layer and ink receiver
10/09/2003US20030190550 Mixture of modified polyvinylphenol and acid generator; high resolution photoresist pattern
10/09/2003US20030190549 High speed photopolymerization; laser printing plates
10/09/2003US20030190548 Light-sensitive composition
10/09/2003US20030190536 Three-dimensional multilayer structure; photolithography; generating ultraviolet light; forming pattern
10/09/2003US20030190535 Maskless photolithography using plasma displays
10/09/2003US20030190534 Method and apparatus for producing a photomask blank, and apparatus for removing an unnecessary portion of a film
10/09/2003US20030190533 Manufacture of masks and electronic parts
10/09/2003US20030190427 Microelectronics; photoresist masking; photolithography; image resolution
10/09/2003US20030190225 Plate cassette loader for platesetter
10/09/2003US20030190071 Multi-layer printed circuit board fabrication system and method
10/09/2003US20030190070 Pattern forming method
10/09/2003US20030190012 Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma
10/09/2003US20030189746 Photo apparatus comprising substrates having photosensitive multilayers on the surfaces, pulsed radiation source, acoustic and optical modulators, and scanners, having improve image quality and accuracy
10/09/2003US20030189696 Projection optical system, exposure apparatus and method using the same
10/09/2003US20030189635 Method for calibrating spatial light modulator against profile
10/09/2003US20030189634 Method and system for calibrating spatial light modulator of imaging engine
10/09/2003US20030189632 Method and system for focus control in imaging engine with spatial light modulator
10/09/2003US20030189285 Image recorder
10/09/2003US20030189273 Imprint method and device
10/09/2003US20030189255 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same
10/09/2003US20030189177 Isolated frame caster
10/09/2003US20030188990 Composite kinematic coupling
10/09/2003US20030188686 Semiconductor manufacturing apparatus and manufacturing method for semiconductor device
10/09/2003US20030188657 Method, apparatus and supply device for moving printing plates
10/09/2003US20030188654 Actuation system in an imaging system
10/09/2003US20030188652 Liquid transfer articles and method for producing the same using digital imaging photopolymerization
10/09/2003DE10164529C1 Einrichtung zur Aufbewahrung und zum Transport von mindestens einem optischen Bauelement Means for storing and transporting at least one optical component
10/09/2003CA2381128A1 Plasma polymerized electron beam resist
10/08/2003EP1351231A2 Master disc manufacturing apparatus
10/08/2003EP1351096A2 Process, device and installation for moving printing plates
10/08/2003EP1350814A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index
10/08/2003EP1350633A2 Presensitized plate for making lithographic printing plate
10/08/2003EP1350321A2 Method and system for efficient and accurate filtering and interpolation
10/08/2003EP1350264A1 Method for forming a pattern and a semiconductor device
10/08/2003EP1350141A1 Illumination system with vacuum chamber wall having transparent structure
10/08/2003EP1350140A2 Positive type photosensitive epoxy resin composition and printed circuit board using the same
10/08/2003EP1349969A1 Semiconductor stripping composition containing 1,3-dicarbonyl compounds
10/08/2003EP1349877A1 Surface-active photoinitiators
10/08/2003EP1144119B1 Trace metal ion reduction by ion exchange pack
10/08/2003EP1140761B1 Benzophenones and the use thereof as photoinitiators
10/08/2003EP1004936B1 Resist resin, resist resin composition, and process for patterning therewith
10/08/2003EP0868741B1 Shape memory alloy lift pins for a semiconductor processing equipment
10/08/2003CN2578864Y Anti-weld single face exposure device
10/08/2003CN1447981A Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices
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