Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/16/2003WO2003033127A3 Methods of patterning a monolayer
10/16/2003WO2002095498A3 Lithographic method of manufacturing a device
10/16/2003WO2002079881A3 Lithography apparatus comprising a mobile lens for producing digital holograms
10/16/2003US20030196185 Mask/wafer control structure and algorithm for placement
10/16/2003US20030196178 Trough adjusted optical proximity correction for vias
10/16/2003US20030194873 Structure having recesses and projections, method of manufacturing structure, and functional device
10/16/2003US20030194715 Photoactivatable silane compounds and methods for their synthesis and use
10/16/2003US20030194656 Method of producing compound semiconductor device
10/16/2003US20030194654 Method for treating photosensitive lithographic printing plate
10/16/2003US20030194653 Imagewise light-exposing to infrared radiation, a presensitized plate and developing with an alkaline liquid developer comprising a polyhydric alcohol-type alkylene oxide adduct.
10/16/2003US20030194652 Charged-particle-beam microlithography apparatus and methods for exposing a segmented reticle
10/16/2003US20030194651 Multicolor imaging using multiphoton photochemical processes
10/16/2003US20030194650 Fluorine group- containing resin, which is substituted with a group that is decomposed by the action of an acid to increase solubility in an alkali developer; and an acid generator capable of generating an acid upon irradiation
10/16/2003US20030194649 Difluoroboronoxy-complex sensitizing dye having laser light sensitivity
10/16/2003US20030194648 Aluminum substrate with a photopolymerizable light-sensitive layer comprising an ethylenically unsaturated bond-containing compound having at least three methacryloyl or acryloyl groups; medium waved grained structure
10/16/2003US20030194647 Composite photoresist for pattern transferring
10/16/2003US20030194645 Polymers, resist compositions and patterning process
10/16/2003US20030194644 Blend of polymer formed by radical ring closing polymerization of 4-(trifluoromethyl)-4-hydroxy- or substituted hydroxy-1,1,2,3,3-pentafluoro-1,6-heptadiene and a polymer with acid labile groups
10/16/2003US20030194643 Good adhesion and resistance to dry etching
10/16/2003US20030194642 Surface of aluminum support has a grained structure with medium undulation with a specified aperture diameter and a grained structure with small undulation with a specified aperture diameter are superimposed.
10/16/2003US20030194641 Resin, which is decomposed by the action of an acid to increase solubility in an alkali developing solution
10/16/2003US20030194640 Positive resist composition
10/16/2003US20030194639 Resin having a structural unit having a halogenated, especially fluorinated alicyclic hydrocarbon skeleton and having groups rendering the resin soluble in an alkali aqueous solution by the action of an acid
10/16/2003US20030194636 Photoresist compositions comprising acetals and ketals as solvents
10/16/2003US20030194635 Isocyanate crosslinked imageable compositions
10/16/2003US20030194634 Novel anthracene derivative and radiation-sensitive resin composition
10/16/2003US20030194633 Solvent resistant polymers with improved bakeability features
10/16/2003US20030194632 Imageable layer comprises a negative working imageable composition; and the underlayer is soluble or dispersible in a developer.
10/16/2003US20030194631 Polyamic acid polymer; a phenolic hydroxyl-group-containing thermally crosslinkable compound containing a substituted methylolurea group; esterified quinone diazide compound.
10/16/2003US20030194630 Bistable molecules that undergo redox reactions, such as rotaxanes and catenanes, or that undergo an electric field induced band gap change that causes the molecules to change from a fully conjugated to a less conjugated state
10/16/2003US20030194621 Polyamic acid or a polyimide which has substituents having a cis-diene structure at the side chains, e.g., cyclopentadiene-, furan- or thiophene-groups
10/16/2003US20030194620 Mask blank and method of fabricating phase shift mask from the same
10/16/2003US20030194619 Irradiating in a pattern manner with an electron beam a substrate having a chemical amplification-type resist layer and a conductive film formed on the resist layer that releases an acid by heating
10/16/2003US20030194617 Method of producing pattern-formed structure and photomask used in the same
10/16/2003US20030194614 Lower fabrication cost and enhanced fabrication throughput
10/16/2003US20030194545 Systems and methods for filling voids and improving properties of porous thin films
10/16/2003US20030193656 Photomask for measuring lens aberration, method of manufacturing the same, and method of measuring lens aberration
10/16/2003US20030193655 Exposure apparatus and method
10/16/2003US20030193624 Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device
10/16/2003US20030192856 Method for removing photoresist and etch residues
10/16/2003US20030192567 Method of making foreign matter harmless
10/16/2003US20030192428 Hollow fiber membrane contactor
10/16/2003DE20312837U1 Roller with rotation drive e.g. for printing plates, roller has holding/retaining magnets on outer face in addition to recesses subject to low pressure
10/16/2003CA2482155A1 Method and device for imaging a mask onto a substrate
10/15/2003EP1353235A1 Method for making lithographic printing plate
10/15/2003EP1353234A1 Device manufacturing method, device manufactured thereby and computer program
10/15/2003EP1353233A2 Lithographic apparatus and device manufacturing method
10/15/2003EP1353232A2 Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
10/15/2003EP1353231A2 Method and system for focus control in imaging engine with spatial light modulator.
10/15/2003EP1353230A1 Device manufacturing method and computer programs
10/15/2003EP1353229A1 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/15/2003EP1353228A1 Method for depositing a very thick photoresist layer on a substrate and metal plating method
10/15/2003EP1353227A2 Photosensitive plate
10/15/2003EP1353226A2 Method for manufacturing resist pattern
10/15/2003EP1353225A2 Radiation sensitive composition and compound
10/15/2003EP1353224A1 Cleaning of a pellicle-mask assembly
10/15/2003EP1353221A1 Package structure of planographic printing plates and interleaf paper for packaging the same
10/15/2003EP1352904A1 (meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
10/15/2003EP1352295A2 Template for room temperature, low pressure micro- and nano-imprint lithography
10/15/2003EP1352009A2 Optical devices made from radiation curable fluorinated compositions
10/15/2003EP1351806A1 Protective film peeling machine for printed circuit boards
10/15/2003EP1195811B1 Semiconductor device
10/15/2003EP1105950B1 Laser repetition rate multiplier
10/15/2003EP1043628B1 Method of developing photosensitive resin plate and developing device
10/15/2003EP0888576B1 Production of water-less lithographic plates
10/15/2003EP0836628B1 Process for preparing polyhydroxystyrene with a novolak type structure
10/15/2003CN1449577A Method and apparatus for performing final critical dimension control
10/15/2003CN1449574A Post etch photoresist strip with hydrogen for organosilicate glass low-kappa etch applications
10/15/2003CN1449510A Fabrication of nanoelectronic circuits
10/15/2003CN1449379A 锍盐化合物 Sulfonium salt compound
10/15/2003CN1449333A Pretreated sheet product for lithographic plates
10/15/2003CN1448994A Device for treating substrate
10/15/2003CN1448989A Photomask supply system capable of shortening photomask manufacturing cycle
10/15/2003CN1448798A Liquid spraying method for preventing drop relict
10/15/2003CN1448797A 曝光装置 Exposure device
10/15/2003CN1448796A Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby
10/15/2003CN1448795A Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element
10/15/2003CN1448794A Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
10/15/2003CN1448793A Positive chemically magnifying photoresist composition
10/15/2003CN1448792A 光敏膏 Photosensitive paste
10/15/2003CN1448791A Novel photosensitive compound, resin and composition
10/15/2003CN1448790A Lithographic apparatus and device manufacturing method
10/15/2003CN1448789A Lithographic apparatus and device manufacturing method
10/15/2003CN1448786A A few light shield installable light shield support and micro-image exposure system
10/15/2003CN1448785A Large-area light shield and exposure system with the same large-area light shield
10/15/2003CN1448784A Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
10/15/2003CN1448783A Method for correcting defect of grey part in grey mask
10/15/2003CN1448275A Image recorder
10/15/2003CN1124521C Thermal treatment process of positive photoresist composition
10/15/2003CN1124520C Water-dispersible negative photosensitive composition
10/15/2003CN1124292C Polymeric films having controlled viscosity response to temp. and shear
10/15/2003CN1124280C Novel monomer and polymer for photoresist, and photoresist using the same
10/15/2003CN1124271C Process for preparing coumarin sulfonates
10/14/2003US6634018 Optical proximity correction
10/14/2003US6633831 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen
10/14/2003US6633390 Focus measurement in projection exposure apparatus
10/14/2003US6633366 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/14/2003US6633365 Projection optical system and exposure apparatus having the projection optical system
10/14/2003US6633364 Exposure apparatus, exposure method, and device manufacturing method
10/14/2003US6633363 Scanning exposure apparatus and method
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