Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/23/2003US20030196987 Ultra fine patterning process for multi-layer substrate
10/23/2003US20030196748 Process of fabricating a precision microcontact printing stamp
10/23/2003US20030196685 Cleaning composition and method
10/23/2003US20030196683 Substrate processing method and substrate processing apparatus
10/23/2003US20030196678 Introducing ozone into a process chamber; activating a water spray; deactivating the water spray for a second predetermined amount of time, thereby controlling a thickness of the water layer; re-activating and re-deactivating water spray
10/23/2003CA2481474A1 Holographic sensor based on a volume hologram in a porous medium
10/23/2003CA2481048A1 Light modulating engine
10/23/2003CA2479515A1 On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
10/22/2003EP1355304A1 Optical recording medium, master disc for manufacturing optical recording medium, and device and method for manufacturing master disc for manufacturing optical recording medium
10/22/2003EP1355195A1 Particle filter for radiation source
10/22/2003EP1355194A2 Projection exposure apparatus and device manufacturing method
10/22/2003EP1355193A2 Photo-curable resin composition
10/22/2003EP1355192A2 Array structure for charged particle beam exposure apparatus and device manufacturing method
10/22/2003EP1355140A1 Imaging characteristics measuring method, imaging characteriatics adjusting method, exposure method and system, program and recording medium, and device producing method
10/22/2003EP1354897A1 Polymer for photoresist and resin compositions therefor
10/22/2003EP1354720A2 Heat-sensitive lithographic printing plate precursor
10/22/2003EP1354325A2 Collector with an unused area for lighting systems having a wavelength inferior or equal of 193 nm
10/22/2003EP1354245A2 Multilayer elements containing photoresist compositions and their use in microlithography
10/22/2003EP1353959A1 Surface-active photoinitiators
10/22/2003EP1353802A2 Method for the production of thermally cross-linked laser engravable flexographic elements
10/22/2003EP1205009B1 Aperture coupled slot array antenna
10/22/2003EP1127293B1 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
10/22/2003EP1105369B1 Unsaturated oligophenol cyanates
10/22/2003EP0831963B1 Microfabricated porous membranes with bulk support
10/22/2003CN1451227A Multiple-beam diode-pumped imaging system
10/22/2003CN1451102A Method of increasing the conductivity of a transparent conductive layer
10/22/2003CN1450596A Method for mfg of wire in semiconductor component
10/22/2003CN1450595A Composite photoresist layer structure
10/22/2003CN1450413A Photoresist removing method and apparatus thereof
10/22/2003CN1450412A Lighographic apparatus, alignment method and device mfg method
10/22/2003CN1450411A Method and apparatus for porforming rule-based gate shrink utilizing dipole illumination
10/22/2003CN1450410A Lighographic apparatus and device mfg method
10/22/2003CN1450409A Method for eliminating wire end shortening effection in photolithography and used mask set
10/22/2003CN1450408A Method for improving photolithography analyticity
10/22/2003CN1450407A Method for correcting mask distribution pattern
10/22/2003CN1450406A Method and apparatus for definiting mask pattern by doubling space frequency technology
10/22/2003CN1450403A Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
10/22/2003CN1450393A Mask, substrate with light reflection film, method for making light-reflection film, display device and electric appliance
10/22/2003CN1450387A Substrate for electrooptical screen and making method and electrooptical screen and relative electric appliance
10/22/2003CN1125376C Development system for manufacturing semiconductor device and controlling method thereof
10/22/2003CN1125375C Waterless lithographic plate
10/22/2003CN1125352C Method for making microlens array
10/21/2003USRE38282 chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation- sensitive acid generator and a vinyl polymer having an acid-cleavable
10/21/2003US6636676 Particle guidance system
10/21/2003US6636413 Electrostatic chucks and process for producing the same
10/21/2003US6636367 Projection exposure device
10/21/2003US6636350 Microlithographic reduction projection catadioptric objective
10/21/2003US6636349 Reflection and refraction optical system and projection exposure apparatus using the same
10/21/2003US6636313 Making a bump on a substrate using a unique method of measuring photoresist semiconductor device having a plurality of misalignment ruler markers formed therein for measuring removable layer opening misalignment in the X and Y directions
10/21/2003US6636312 Pitch comprises slits which cannot produce image on the wafer, such that a simultaneous pattern with the conventional pattern on the wafer is formed. Accordingly, the alignment accuracy can be accurately checked
10/21/2003US6636303 Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus
10/21/2003US6636295 Exposure apparatus and device manufacturing method
10/21/2003US6636294 Microdevice and structural components of the same
10/21/2003US6636293 Exposure method and apparatus having a decreased light intensity distribution
10/21/2003US6635887 Positioning system for use in lithographic apparatus
10/21/2003US6635884 Method for directing an electron beam onto a target position on a substrate surface
10/21/2003US6635881 Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same
10/21/2003US6635689 Such as benzoic acid, salicylic acid, o-anisic acid, cyclohexanecarboxylic acid, phenylacetic acid or methyl salicylate; modifying rate and temperature
10/21/2003US6635585 Method for forming patterned polyimide layer
10/21/2003US6635582 Method of manufacturing semiconductor device
10/21/2003US6635574 Method of removing material from a semiconductor substrate
10/21/2003US6635549 Method of producing exposure mask
10/21/2003US6635412 Method for fabricating 3-D structures with smoothly-varying topographic features in photo-sensitized epoxy resists
10/21/2003US6635409 Method of strengthening photoresist to prevent pattern collapse
10/21/2003US6635408 Resist pattern forming method, frame plating method and manufacturing method of thin-film magnetic head
10/21/2003US6635406 Integrated circuits, consisting substantially of organic insulators and conductors
10/21/2003US6635405 Print quality test structure for lithographic device manufacturing
10/21/2003US6635403 Lithography apparatus, lithography method and method of manufacturing master print for transfer
10/21/2003US6635402 Electron beam microlithography; resolution; improved measuring and adjusting the distribution of current density
10/21/2003US6635401 Resist compositions with polymers having 2-cyano acrylic monomer
10/21/2003US6635400 Resist composition and patterning process
10/21/2003US6635399 One base photosensitive imaging system
10/21/2003US6635395 Method for exposing a layout comprising multiple layers on a wafer
10/21/2003US6635392 Computer corrected pattern
10/21/2003US6635388 Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask
10/21/2003US6635311 Microfabrication and nanofabrication, atomic force microscope imaging
10/21/2003US6635117 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system
10/21/2003US6635112 Fabrication apparatus for fabricating an object as a plurality of successive laminae
10/21/2003US6634806 Substrate processing method and substrate processing apparatus
10/21/2003US6634805 Applying a developer to a photoresist material wafer disposed on a semiconductor substrate. The developer system and method employ a developer plate having a plurality of a apertures for dispensing developer. The developer plate has a bottom with
10/21/2003US6634289 Screen printing stencil production
10/16/2003WO2003085708A1 Exposure method, exposure device, and device manufacturing method
10/16/2003WO2003085707A1 Extreme ultraviolet light source
10/16/2003WO2003085586A1 Metrology diffraction signal adaptation for tool-to-tool matching
10/16/2003WO2003085457A1 Exposure head, exposure apparatus, and its application
10/16/2003WO2003085456A2 Method and device for imaging a mask onto a substrate
10/16/2003WO2003085455A2 Photoresist compositions comprising acetals and ketals as solvents
10/16/2003WO2003085362A1 A mask blank and a method for producing the same
10/16/2003WO2003085045A1 Novolak resin mixtures and photosensitive compositions comprising the same
10/16/2003WO2003085028A1 Novel polyether compound containing acid group and unsaturated group, process for producing the same, and resin composition
10/16/2003WO2003085005A1 Photopolymerizable composition
10/16/2003WO2003084863A1 A method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
10/16/2003WO2003084680A1 Enhanced processing of performance films using high-diffusivity penetrants
10/16/2003WO2003073165A3 Self-aligned pattern formation using dual wavelengths
10/16/2003WO2003057784A3 Modified pigment products and black matrixes comprising same
10/16/2003WO2003052790A3 Lens array with a laterally movable optical axis for corpuscular rays
10/16/2003WO2003040830A3 Optical spot grid array printer
10/16/2003WO2003040829A3 Maskless printer using photoelectric conversion of a light beam array
10/16/2003WO2003038858A3 A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor
10/16/2003WO2003034153A3 Lithographic apparatus and device manufacturing method
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