Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/28/2003US6638899 Solution which comprises salt of hydrofluoric acid with base free from metal ions, water soluble organic solvent, basic substance and water, and which has pH value of from 8.5 to 10.0
10/28/2003US6638875 Oxygen free plasma stripping process
10/28/2003US6638864 Removal photoresist; applying pressure sensitive adhesive; releasing
10/28/2003US6638700 Ambient condition sensor for a photosensitive media cartridge
10/28/2003US6638694 Resist stripping agent and process of producing semiconductor devices using the same
10/28/2003US6638689 Photoresist compositions and flexible printed wiring boards with protective layer
10/28/2003US6638688 Selective electroplating method employing annular edge ring cathode electrode contact
10/28/2003US6638687 Method for preparing lithographic printing plate
10/28/2003US6638685 Resolution, sensitivity and smoothness on side surfaces of a transferred pattern; photolithography
10/28/2003US6638684 Photosensitive laminate, process for forming resist pattern using same and positive resist composition
10/28/2003US6638683 Mixtures of polyhydroxystyrenes and/or copolymers, acid generators and solvents used for masking high resolution patterns on semiconductor integrated circuits, printed circuit or liquid crystal panels
10/28/2003US6638682 Providing a transfer sheet comprising a support and coating capable of receiving image; imaging coating; dry peeling the coating; positioning dry peeled coating on a receptor element, positioning a non-stick sheet; heating
10/28/2003US6638681 X-ray printing personalization technique
10/28/2003US6638680 Material and method for making an electroconductive pattern
10/28/2003US6638679 Polyvinyl acetal binder
10/28/2003US6638678 Method for improving sensitometric response of photosensitive imaging media employing microcapsules
10/28/2003US6638672 Exposure apparatus, coating/developing apparatus, method of transferring a substrate, method of producing a device, semiconductor production factory, and method of maintaining an exposure apparatus
10/28/2003US6638671 Determiantion adjustment defects in integrated circuits; lithography calibration
10/28/2003US6638669 Thermal transfer film comprising a reactive polymer composition for laser-induced coating
10/28/2003US6638663 Glass, quartz, silicon oxyfluoride or metal fluorides having patterns comprising radiation transparent and transluscence regions used for photolithography
10/28/2003US6637329 Method for improving registration of images on opposing sides of a printing medium
10/28/2003US6637327 Image exposure control apparatus in multicolor printing press
10/23/2003WO2003088337A1 Resist removing apparatus and method of removing resist
10/23/2003WO2003088336A1 Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter
10/23/2003WO2003088330A1 Projection optical system, exposure system and exposure method
10/23/2003WO2003088329A1 Reticle and optical characteristic measuring method
10/23/2003WO2003088235A1 Stamper original and its manufacturing method, stamper and its manufacturing method, and optical disk
10/23/2003WO2003087946A2 Imaging method
10/23/2003WO2003087945A2 Interferometric measuring device and projection illumination installation comprising one such measuring device
10/23/2003WO2003087944A2 Device for the low-deformation mounting of a rotationally asymmetric optical element
10/23/2003WO2003087943A2 Method for producing a mask adapted to a lighting device
10/23/2003WO2003087942A1 Multi-layer negative working imageable element
10/23/2003WO2003087941A1 Positively photosensitive resin composition and method of pattern formation
10/23/2003WO2003087940A2 Printing elements and method for producing the same using digital imaging photopolymerization
10/23/2003WO2003087939A2 On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
10/23/2003WO2003087938A2 Plasma polymerized electron beam resist
10/23/2003WO2003087937A2 Waterborne printed circuit board coating compositions
10/23/2003WO2003087936A1 Method of treatment of porous dielectric films to reduce damage during cleaning
10/23/2003WO2003087935A2 Nanoimprint resist
10/23/2003WO2003087934A2 Interferometry system error compensation in twin stage lithography tools
10/23/2003WO2003087915A1 Light modulating engine
10/23/2003WO2003087867A2 Extreme ultraviolet light source
10/23/2003WO2003087797A1 Sample surface inspection apparatus and method
10/23/2003WO2003087789A1 Holographic sensor based on a volume hologram in a porous medium
10/23/2003WO2003087710A2 Method and apparatus for stage mirror mapping
10/23/2003WO2003087233A2 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
10/23/2003WO2003087187A1 Actinic radiation hardenable resin composition and hardening product thereof
10/23/2003WO2003087186A1 Unsaturated polybranched compounds, curable compositions containing the same and cured articles thereof
10/23/2003WO2003087166A2 Photoactivatable silane compounds and methods for their synthesis and use
10/23/2003WO2003086959A2 Transfer method for the production of microstructured substrates
10/23/2003WO2003035411A3 Laser-transfer film for permanently labeling components
10/23/2003WO2003021351A3 Phase-shift mask
10/23/2003WO2002093209A3 Lens system consisting of fluoride crystal lenses
10/23/2003WO2002065513A3 Photoresist strip with 02 and nh3 for organosilicate glass applications
10/23/2003WO2001011666A8 Method of etching a wafer layer using multiple layers of the same photoresistant material and structure formed thereby
10/23/2003US20030199659 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
10/23/2003US20030199602 Photo-curable resin composition
10/23/2003US20030199407 Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution
10/23/2003US20030199406 A cleaning composition composed of a non-chelating organic acid, salt or ester thereof, and a chelating organic acid, salt or ester thereof that may be used to clean residue and scum from a substrate. The cleaning composition is suitable
10/23/2003US20030199163 Microelectroforming mold using a preformed metal as the substrate and the fabrication method of the same
10/23/2003US20030199124 Photomask and pattern forming method
10/23/2003US20030198948 Synthetic nucleic acid double strands of optional sequence
10/23/2003US20030198900 Developing solvent for photopolymerizable printing plates
10/23/2003US20030198897 Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
10/23/2003US20030198896 Method of fabricating patterns with a dual damascene process
10/23/2003US20030198895 Method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising
10/23/2003US20030198894 Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation.
10/23/2003US20030198893 Photosensitive layer containing a photopolymerization initiator, a compound having an ethylenically unsaturated double bond and a polymer binder, and a protective layer provided in this order on a hydrophilic support, wherein an
10/23/2003US20030198891 An ester compound of the following formula (1) is provided and resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution and etching
10/23/2003US20030198890 A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, infrared
10/23/2003US20030198889 Sulfonium salt compounds represented by the following general formula (2) wherein R1 and R2 represent each an alkyl group optionally having oxo, or R1 and R2 may be cyclized together to form an alkylene group optionally having oxo group for
10/23/2003US20030198877 Chromophore moieties and transparent moieties
10/23/2003US20030198874 Reflection photomasks with a capping layer and methods for manufacturing the same
10/23/2003US20030198873 Photomask and method for qualifying the same with a prototype specification
10/23/2003US20030198872 Method for setting mask pattern and illumination condition
10/23/2003US20030198824 Photocurable compositions containing reactive polysiloxane particles
10/23/2003US20030198791 Semiconductor device, manufacturing method thereof, and semiconductor manufacturing system
10/23/2003US20030198787 Device manufacturing method, device manufactured thereby and lithographic apparatus therefor
10/23/2003US20030198468 Apparatus and method for developing an LCD
10/23/2003US20030197946 Projection optical system, fabrication method thereof, exposure apparatus and exposure method
10/23/2003US20030197923 High NA system for multiple mode imaging
10/23/2003US20030197922 Catadioptric projection system for 157 nm lithography
10/23/2003US20030197914 Lithographic apparatus and device manufacturing method
10/23/2003US20030197907 Hologram print system and holographic stereogram
10/23/2003US20030197906 Optical element, metal mold therefor and optical element producing method
10/23/2003US20030197872 Scatterometric measurement of undercut multi-layer diffracting signatures
10/23/2003US20030197865 Reticle and optical characteristic measuring method
10/23/2003US20030197858 Method and apparatus for article inspection including speckle reduction
10/23/2003US20030197850 Driving apparatus, exposure apparatus, and device manufacturing method
10/23/2003US20030197848 Exposure apparatus, exposure method, and device manufacturing method
10/23/2003US20030197847 Illumination optical system, exposure apparatus having the same, and device fabricating method
10/23/2003US20030197846 System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
10/23/2003US20030197845 Active damping apparatus, exposure apparatus and device manufacturing method
10/23/2003US20030197844 Lithographic apparatus and device manufacturing method
10/23/2003US20030197843 Lithographic apparatus and device manufacturing method
10/23/2003US20030197842 System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
10/23/2003US20030197841 Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
10/23/2003US20030197838 Ilumination optical system and method, and exposure apparatus
10/23/2003US20030197134 Electron beam drawing apparatus
10/23/2003US20030197038 Low volume dispense unit and method of using
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