Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2003
10/30/2003US20030203648 Plasma polymerized electron beam resist
10/30/2003US20030203647 Promoting adhesion of fluoropolymer films to semiconductor substrates
10/30/2003US20030203645 Method for forming thin film heads using a bi-layer anti-reflection coating for photolithographic applications and a structure thereof
10/30/2003US20030203644 Methods for preventing cross-linking between multiple resists and patterning multiple resists
10/30/2003US20030203642 Method for photoresist strip, sidewall polymer removal and passivation for aluminum metallization
10/30/2003US20030203636 Method of fabricating high density sub-lithographic features on a substrate
10/30/2003US20030203621 Method for coating a semiconductor substrate with a mixture containing an adhesion promoter
10/30/2003US20030203458 Polyhydroxyalkanoate synthases; chromogens; liquid crystal displays
10/30/2003US20030203320 Lithography pattern shrink process and articles
10/30/2003US20030203319 Method of fabricating sub-lithographic sized line and space patterns for nano-imprinting lithography
10/30/2003US20030203318 Exposure method based on multiple exposure process
10/30/2003US20030203317 Photosensitive glass paste and method for manufacturing multilayered interconnected circuit board using the same
10/30/2003US20030203316 Capable of forming a high resolution resist pattern with good shape and little film thinning
10/30/2003US20030203313 Planographic printing plate precursor and planographic printing plate precursor laminate
10/30/2003US20030203311 Anti-charging layer for beam lithography and mask fabrication
10/30/2003US20030203310 Radiation sensitive compositions and methods
10/30/2003US20030203309 Radiation-sensitive resin composition
10/30/2003US20030203308 For use in the microlithography
10/30/2003US20030203307 Radiation-sensitive resin composition
10/30/2003US20030203306 For forming photoresist patterns to be used in photolithography
10/30/2003US20030203305 For use in an ultra-micro lithography
10/30/2003US20030203295 Wafer exposure apparatus includes special wafer cooling unit, an air showerhead, for controlling temperature of wafer which is to be transferred from wafer pre-alignment system to wafer stage of photolithography exposure equipmment
10/30/2003US20030203293 Thermal transfer recording material
10/30/2003US20030203288 Method and apparatus capable of accurately measuring overlay shift between overlay measuring pattern used for transfer to lower target transfer film and overlay measuring pattern used for transfer to upper target transfer film
10/30/2003US20030203286 Relates to structure of a high-transmittance halftone phase shift mask used to form a small pattern in a process of manufacturing semiconductor devices; capable of transferring desired pattern to photosensitive resin clearly and precisely
10/30/2003US20030203284 Using holographic technique; particularly relates to method of forming micropores by off-axis exposure process by which a pattern having high resolution can be formed using diagonally applied light
10/30/2003US20030203237 Photoresists; thin film magnetic tape heads
10/30/2003US20030203122 Marking substrates
10/30/2003US20030202792 Substrate processing apparatus and substrate processing method
10/30/2003US20030202546 Femtosecond laser-electron x-ray source
10/30/2003US20030202449 Detection apparatus, detection method and electron beam irradiation apparatus
10/30/2003US20030202260 Apparatus, system, and method for precision positioning and alignment of a lens in an optical system
10/30/2003US20030202244 Self-aligned aperture masks having high definition apertures
10/30/2003US20030202240 Reflective spectral filtering of high power extreme ultra-violet radiation
10/30/2003US20030202239 Reflective spectral filtering of high power extreme ultra-violet radiation
10/30/2003US20030202233 Pattern generator mirror configurations
10/30/2003US20030202182 Management system, apparatus, and method, exposure apparatus, and control method therefor
10/30/2003US20030202174 Method and apparatus for self-referenced projection lens distortion mapping
10/30/2003US20030202167 Stage assembly including a reaction assembly that is connected by actuators
10/30/2003US20030202166 Stage device, method of controlling same, and exposure apparatus
10/30/2003US20030202165 Optical unit, exposure apparatus, and device manufacturing method
10/30/2003US20030201737 Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation
10/30/2003US20030201720 Electron beam, generating device, and testing device
10/30/2003US20030201410 Sensitivity adjusting method for pattern inspection apparatus
10/30/2003US20030201399 Device and method for photoengraving integrated circuits
10/30/2003CA2482901A1 Preparation of homo-, co- and terpolymers of substituted styrenes
10/29/2003EP1357585A2 A method for coating a semiconductor substrate
10/29/2003EP1357434A1 Lithographic apparatus and device manufacturing method
10/29/2003EP1357433A2 Method of fabricating sub-lithographic sized line and space patterns
10/29/2003EP1357432A2 Driving apparatus
10/29/2003EP1357431A2 System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
10/29/2003EP1357430A2 Linewidth control using an angular distribution of radiation depending on position in the illumination field
10/29/2003EP1357429A1 Lithographic apparatus and device manufacturing method
10/29/2003EP1357428A1 Alcoholic hydroxyl group-, aromatic ring- and protolytically leaving group-containing copolymer
10/29/2003EP1357427A2 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method
10/29/2003EP1357426A2 Method for setting mask pattern and its illumination condition
10/29/2003EP1357419A1 Liquid crystal shutter for exposure system
10/29/2003EP1357160A1 Photo-curable coating composition for hard protective coat and coated article
10/29/2003EP1357117A2 Novel aminoketone derivatives and preparation process and uses of the same as photoinitiators
10/29/2003EP1356949A1 Correction fluid for lithographic printing plate
10/29/2003EP1356930A2 Printing press, layered formation and making method thereof, and printing plate and making method thereof
10/29/2003EP1356928A1 Photosensitive lithographic printing plate
10/29/2003EP1356927A2 Plate-making system of light-sensitive lithographic printing plate and plate-making method
10/29/2003EP1356926A1 Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support.
10/29/2003EP1356570A1 Coil with cooling means
10/29/2003EP1356476A2 Narrow-band spectral filter and the use thereof
10/29/2003CN1452731A On-press development of thermosensitive lithographic plates
10/29/2003CN1452564A Thermal transfer of crosslinked materials
10/29/2003CN1452215A Pattern forming method
10/29/2003CN1452019A Corrosion inhibitor stripper composition using conductive material with high equivalent electric conductivity in aqueous bolution
10/29/2003CN1452017A Exposure device and method
10/29/2003CN1452016A Optical projection system, exposure device and method
10/29/2003CN1452015A Optical projection system, exposure device and method
10/29/2003CN1452014A Charge beam exposure device, exposure method by charge beam, charge beam controlling method and method for mfg. semiconductor device
10/29/2003CN1452013A Exposure system
10/29/2003CN1452012A Photosensitive printing original edition
10/29/2003CN1452011A Water- and solvent-resistant diazo screen printing platemaking photoresist
10/29/2003CN1452010A Mask and electroluminescent device and method for mfg. same, and electronic apparatus
10/29/2003CN1452009A Method for forming phase deviation optical mask of microimage mfg. process
10/29/2003CN1451992A Method for mfg. changeable scintilation optical grating
10/29/2003CN1451693A Photocurable resin composition
10/29/2003CN1126157C Method of forming photoresist pattern
10/29/2003CN1126006C Composition of developing liquid
10/29/2003CN1126005C 感光性树脂组成物 The photosensitive resin composition
10/29/2003CN1125836C Polymer for chemically amplified resist
10/28/2003US6639734 Catadioptric imaging system and a projection exposure apparatus provided with said imaging system
10/28/2003US6639732 Projection exposure apparatus and method
10/28/2003US6639677 Position measuring method and position measuring system using the same
10/28/2003US6639676 Method for determining rotational error portion of total misalignment error in a stepper
10/28/2003US6639654 Wafer stage carrier and removal assembly
10/28/2003US6639652 Illumination system for use in exposure apparatus
10/28/2003US6639651 Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
10/28/2003US6639650 Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
10/28/2003US6639333 Linear motor stage system for use in exposure apparatus
10/28/2003US6639232 Pattern writing method employing electron beam writing device of variable-shaped vector scan system
10/28/2003US6639225 Six-axis positioning system having a zero-magnetic-field space
10/28/2003US6639221 Annular illumination method for charged particle projection optics
10/28/2003US6639084 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
10/28/2003US6639036 Acid-labile polymer and resist composition
10/28/2003US6639035 Polymer for chemical amplified photoresist compositions
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