Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2003
11/05/2003EP1359609A2 Method of fabricating a sub-lithographic sized via
11/05/2003EP1359608A1 Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
11/05/2003EP1359602A2 Detection apparatus, detection method and electron beam irradiation apparatus
11/05/2003EP1359470A2 Management system and apparatus, method therefor, and device manufacturing method
11/05/2003EP1359469A1 Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method
11/05/2003EP1359468A2 Management system
11/05/2003EP1359467A2 Arrangement and method for transferring a pattern from a mask to a wafer
11/05/2003EP1359466A1 Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method
11/05/2003EP1359465A2 Acid generator and thin film composition containing the same
11/05/2003EP1359464A2 A method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
11/05/2003EP1359172A1 Ultraviolet-curable resin composition and photosolder resist ink containing the composition
11/05/2003EP1359008A1 Radiation-sensitive mixture and recording material using this mixture
11/05/2003EP1358670A2 Process and apparatus for removing residues from the microstructure of an object
11/05/2003EP1358623A2 Method and apparatus for inspecting a substrate
11/05/2003EP1090268B1 High accuracy interferometer with light conductors
11/05/2003EP1021856B1 Narrow band excimer laser
11/05/2003EP1000387B1 Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer
11/05/2003EP0942331B1 Antireflection or light-absorbing coating composition and polymer therefor
11/05/2003EP0815579B1 Black matrix in colour picture tubes and method of producing the black matrix
11/05/2003CN2585281Y Environmental-protection and water-soluble soft printing plate exposure and developing machine
11/05/2003CN1454392A Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
11/05/2003CN1454334A Photoresist remover composition comprising ammonium fluoride
11/05/2003CN1454333A Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
11/05/2003CN1454314A X-ray measuring and testing system
11/05/2003CN1453845A Manufacture of deep-channel capacitor
11/05/2003CN1453823A Pattern forming method and method for producing semiconductor device
11/05/2003CN1453822A Method for coating semiconductor substrate with mixture containing bonding reinforcing agent
11/05/2003CN1453648A Apparatus and method using developing liquid crystal display device
11/05/2003CN1453647A Film opaque for lithographic printing plate
11/05/2003CN1453646A Offset printing equipment, device producing method and produced device thereby
11/05/2003CN1453645A Projection optical system, exposure apparatus with the same system and exposure method
11/05/2003CN1453644A System and method for improving line width control in photoetching apparatus
11/05/2003CN1453643A System and method for improving line width control in use of photoetching apparatus of illuminating system with prenumerical value aperture control
11/05/2003CN1453642A Projection optical system, its producing method, exposure apparatus and exposure method
11/05/2003CN1453641A Photosensitive lithographic printing plate
11/05/2003CN1453640A Method for producing sub-photoetching size passage
11/05/2003CN1453639A Novolac resin solution photoresist composition and its preparing method
11/05/2003CN1453638A Method for producing sub-photoetching dimensional line and space pattern of pressing & printing nano-photoetching
11/05/2003CN1453637A Driving apparatus, exposuring apparatus and device producing method
11/05/2003CN1453635A Apparatus and system for improving phase-shift mask image performance and its method
11/05/2003CN1453610A Manufacture of light-conducting board mold
11/05/2003CN1453597A Optical elements, it metal mould and method for processing optical elements
11/05/2003CN1127204C Planar resist structure esp encapsulation for electric components with planar anti-corrosion structure and thermomechanical method for prodn thereof
11/05/2003CN1126966C Process for producing zero slot directional coupling light switch
11/05/2003CN1126609C Process and apparatus for treating workpiece of semiconductor wafer
11/04/2003US6643616 Integrated device structure prediction based on model curvature
11/04/2003US6643596 System and method for controlling critical dimension in a semiconductor manufacturing process
11/04/2003US6643049 Compact imaging head and high speed multi-head laser imaging assembly and method
11/04/2003US6643017 Method and system for controlling the photolithography process
11/04/2003US6643008 Detecting residual photoresist on wafers using light reflec-tion
11/04/2003US6642997 Substrate conveying system in exposure apparatus
11/04/2003US6642996 Exposure apparatus
11/04/2003US6642994 Optical exposure apparatus and photo-cleaning method
11/04/2003US6642853 Movable wireless sensor device for performing diagnostics with a substrate processing system
11/04/2003US6642675 Charged particle beam exposing apparatus
11/04/2003US6642664 Method of producing a screen for a color display tube
11/04/2003US6642531 Contamination control on lithography components
11/04/2003US6642530 Multiple pass write method and reticle
11/04/2003US6642528 Alignment mark detection method, and alignment method, exposure method and device, and device production method, making use of the alignment mark detection method
11/04/2003US6642525 Particle-optical component and system comprising a particle-optical component
11/04/2003US6642336 Photosensitive polymer
11/04/2003US6642152 Method for ultra thin resist linewidth reduction using implantation
11/04/2003US6642129 Parallel, individually addressable probes for nanolithography
11/04/2003US6641986 Acetylenic diol surfactant solutions and methods of using same
11/04/2003US6641985 Method for making element
11/04/2003US6641984 Method of frame plating and method of forming magnetic pole of thin-film magnetic head
11/04/2003US6641981 Exposure method, exposure apparatus, and device manufacturing method
11/04/2003US6641980 Exposing substrates having coating mixtures of light sensitive compounds and photoinitiators, then developing using metal silicates and nonionic surfactants
11/04/2003US6641979 Technique of exposing a resist using electron beams having different accelerating voltages
11/04/2003US6641978 Coating substrates with thin films consisting of metals such as bismuth and/or indium, then alloying, etching and stripping to form patterns, used for masking integrated circuits
11/04/2003US6641977 Lithographic printing plate precursor
11/04/2003US6641975 Resist composition and patterning process
11/04/2003US6641974 Copolymer
11/04/2003US6641972 Positive photoresist composition for the formation of thick films, photoresist film and method of forming bumps using the same
11/04/2003US6641971 Resist compositions comprising silyl ketals and methods of use thereof
11/04/2003US6641970 UV-sensitive imaging element for making lithographic printing plates comprising an aryldiazosulfonate polymer and a compound sensitive to UV light
11/04/2003US6641963 System and method for in situ control of post exposure bake time and temperature
11/04/2003US6641961 For producing color filter having pixels or black matrices with rectangular or forward-tapered cross section formed when colored photosensitive composition has high concentration of pigment
11/04/2003US6641960 Mixture of colorant, binder, photoactive material and solvent color filter; liquid crystals
11/04/2003US6641899 Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same
11/04/2003US6641268 Interferometric projection system
11/04/2003US6640704 Method and device for balancing rotating bodies
11/04/2003US6640452 Bi-directional planar slide mechanism
10/2003
10/30/2003WO2003090270A1 Method for removing photoresist and etch residues
10/30/2003WO2003090265A1 Support apparatus, optical apparatus, light exposure apparatus, and method for producing device
10/30/2003WO2003089992A1 Antireflective sio-containing compositions for hardmask layer
10/30/2003WO2003089991A2 Photocurable compositions containing reactive particles
10/30/2003WO2003089964A1 Reflection element of exposure light and production method therefor, mask, exposure system, and production method of semiconductor device
10/30/2003WO2003089888A2 Scatterometric measurement of undercut multi-layer diffracting structures
10/30/2003WO2003089482A1 Preparation of homo-, co- and terpolymers of substituted styrenes
10/30/2003WO2003032381A3 Method for measuring a characteristic dimension of at least one structure on a disk-shaped object in a measuring appliance
10/30/2003WO2003003072A3 Optical element and manufacturing method therefor
10/30/2003WO2002066252A8 Thermally convertible lithographic printing precursor comprising an organic base
10/30/2003WO2002019033A3 Photoacid generators and photoresists comprising same
10/30/2003WO2000064572A3 Epoxy-functional polymeric microbeads
10/30/2003US20030204488 Management system, management method and apparatus, and management apparatus control method
10/30/2003US20030204326 Real time analysis of periodic structures on semiconductors
10/30/2003US20030204282 Management system and apparatus, method therefor, and device manufacturing method
10/30/2003US20030203994 Solventless photo-sensitive thermosetting-type ink
10/30/2003US20030203651 Develop processing method for reduced processing time and reduced defect density
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