Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2003
11/13/2003US20030212966 Optimization of die placement on wafers
11/13/2003US20030212525 Overlay measurements using periodic gratings
11/13/2003US20030212234 Cross-linked networks from multifunctional hyperbranched polymers
11/13/2003US20030212162 Polymerizable composition
11/13/2003US20030211761 Low cost integrated out-of-plane micro-device structures and method of making
11/13/2003US20030211751 Combined e-beam and optical exposure semiconductor lithography
11/13/2003US20030211749 Gas assisted method for applying resist stripper and gas-resist stripper combinations
11/13/2003US20030211734 Resist resin, chemical amplification type resist, and method of forming of pattern with the same
11/13/2003US20030211729 Method of fabricating a sub-lithographic sized via
11/13/2003US20030211700 Methods for critical dimension and focus mapping using critical dimension test marks
11/13/2003US20030211429 Method and apparatus for refreshment and reuse of loaded developer
11/13/2003US20030211427 Prevent impurities on semiconductor wafers; immersion baths
11/13/2003US20030211426 Method of treating photoresists using electrodeless UV lamps
11/13/2003US20030211425 Aqueous acid solubility; crosslinking
11/13/2003US20030211423 Process for preparing a flexographic printing plate
11/13/2003US20030211422 Amplification
11/13/2003US20030211421 Optically active compound and photosensitive resin composition
11/13/2003US20030211420 Aluminum substrate; photosensitive polyurethane binder; laser beam development
11/13/2003US20030211419 Process for making a flexographic printing plate
11/13/2003US20030211418 Mixture containing phenolic resin and heat,light converting compound
11/13/2003US20030211417 Using polymer containing unsaturated nitrile and unsaturated ether
11/13/2003US20030211411 Masking; overcoating wafer with photoresist; various exposure zones
11/13/2003US20030211410 Exposure method, exposure apparatus, and method of production of device
11/13/2003US20030211407 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
11/13/2003US20030211406 Process for thick film circuit patterning
11/13/2003US20030211404 Liquid crystal display; photolithography; radiation transparent substrate, adjustment of masking patterns
11/13/2003US20030211403 Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask
11/13/2003US20030211400 Method of improving photomask geometry
11/13/2003US20030211297 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/13/2003US20030211232 Rotating substrate; positioning barriers; forming photoresists
11/13/2003US20030210484 Mask, substrate with light reflecting film, method for manufacturing light reflecting film, optical display device, and electronic apparatus
11/13/2003US20030210459 Exposure apparatus and method
11/13/2003US20030210458 Method and device for decontaminating optical surfaces
11/13/2003US20030210404 Method and apparatus for stage mirror mapping
11/13/2003US20030210388 Projection exposure apparatus using wavefront detection
11/13/2003US20030210385 Projection optical system, a projection exposure apparatus provided with the same, as well as a device manufacturing method
11/13/2003US20030210384 Multiple image photolithography system and method
11/13/2003US20030210383 Maskless conformable lithography
11/13/2003US20030210382 Matrix light relay system and method
11/13/2003US20030209836 Flash curing in selective deposition modeling
11/13/2003US20030209819 Process for making micro-optical elements from a gray scale etched master mold
11/13/2003US20030209726 Array substrate used for a display device and a method of making the same
11/13/2003US20030209677 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography
11/13/2003US20030209673 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
11/13/2003US20030209515 adhesive film contains a polycarbodiimide copolymer with butadiene and optionally acrylonitrile units, and maintains a high thermal resistance and also has a low elastic modulus; use as a sealing resin layer between the wiring circuit board and the semiconductor element
11/13/2003US20030209514 Etching composition and use thereof with feedback control of HF in BEOL clean
11/13/2003US20030209190 Method for making an oriented optical fluoride crystal blank
11/13/2003US20030209097 Sensor device for non-intrusive diagnosis of a semiconductor processing system
11/13/2003DE19962160C2 Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung Means for generating extreme ultraviolet and soft X-rays from a gas discharge
11/13/2003CA2483637A1 Photo-crosslinkable multi-coating system having improved gas-barrier properties
11/12/2003EP1361600A2 Substrate treating apparatus
11/12/2003EP1361486A2 Moving member mechanism and control method therefor
11/12/2003EP1361480A1 Residue reducing stable concentrate
11/12/2003EP1361479A1 Control of a lithographic apparatus
11/12/2003EP1361208A1 Amino group containing phenol derivative
11/12/2003EP1361207A1 Process for preparing alkyladamantyl esters and compositions
11/12/2003EP1360881A1 Method for producing wirings with rough conducting structures and at least one area with fine conducting structures
11/12/2003EP1360831A1 Plate handling system
11/12/2003EP1360728A1 Integrated-circuit technology photosensitive sensor
11/12/2003EP1360712A2 Post chemical-mechanical planarization (cmp) cleaning composition
11/12/2003EP1360554A1 Process control for micro-lithography
11/12/2003EP1360553A2 Dry multilayer inorganic alloy thermal resist film for lithographic processing and image creation
11/12/2003EP1360552A1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography
11/12/2003EP1360077A1 Compositions for cleaning organic and plasma etched residues for semiconductor devices
11/12/2003EP1079972B1 Ir-sensitive composition and use thereof for the preparation of printing plate precursors
11/12/2003EP0799439B2 Positioning device with a force actuator system for compensating centre-of-gravity displacements
11/12/2003CN1456032A Method for generating conductive structure on non-plane surface and use thereof
11/12/2003CN1455950A Integrated shallow trench isolation process
11/12/2003CN1455889A Ultraviolet-curing resin composition and photo solder resist ink containing the same
11/12/2003CN1455888A Method and system of automatic fluid dispensing for imprint lithography processes
11/12/2003CN1455440A Method for processing hidh-precision sub-photoetched pattern on substrate
11/12/2003CN1455439A Mask making method and method for making semiconductor integrated circuit device
11/12/2003CN1455438A Substrate board processing apparatus
11/12/2003CN1454889A Novel acid-generator and film composition comprising same
11/12/2003CN1127474C Photocurable halofluorinated acrylates
11/12/2003CN1127381C Apparatus and method for providing pulsed fluids
11/11/2003US6647147 Method for measuring fine pattern, apparatus for measuring fine pattern, and record medium that can store therein program to measure fine pattern and can be read by using computer
11/11/2003US6647137 Characterizing kernel function in photolithography based on photoresist pattern
11/11/2003US6647088 Production of a dense mist of micrometric droplets in particular for extreme UV lithography
11/11/2003US6647087 Exposure method
11/11/2003US6647086 X-ray exposure apparatus
11/11/2003US6646797 Exposure apparatus and method
11/11/2003US6646729 Method of measuring aberration in an optical imaging system
11/11/2003US6646722 Improvement in dimensions of circuitry and other structures formed on the semiconductor wafer; optical lithographic techniques used in the formation of integrated circuits
11/11/2003US6646721 Lithographic projection apparatus positioning system, method of manufacturing, device manufactured thereby and computer program
11/11/2003US6646720 Used in semiconductor manufacturing; extreme ultraviolet (EUV)
11/11/2003US6646719 Support assembly for an exposure apparatus
11/11/2003US6646718 Projection objective having adjacently mounted aspheric lens surfaces
11/11/2003US6646717 Projection exposure apparatus and device manufacturing method using the same
11/11/2003US6646715 Scanning exposure apparatus and method with run-up distance control
11/11/2003US6646714 Exposure apparatus, imaging performance measurement method, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
11/11/2003US6646713 Projection exposure apparatus and device manufacturing method
11/11/2003US6646662 Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template
11/11/2003US6646358 Device for transferring and supporting panels
11/11/2003US6646281 Differential detector coupled with defocus for improved phase defect sensitivity
11/11/2003US6646279 Apparatus for exposing a face of a printed circuit panel
11/11/2003US6646274 Lithographic projection apparatus
11/11/2003US6646260 Measurement technique for determining the width of a structure on a mask
11/11/2003US6646243 Fixing biopolymers to substrate; obtain substrate, incubate with nucleotide sequences, expose to activator, recover product
11/11/2003US6646089 Hyperbranched polymers with latent functionality and methods of making same
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