Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2003
11/20/2003US20030214060 Method and apparatus for manufacturing plastic optical lenses molds and gaskets
11/20/2003US20030213968 Imageable bottom anti-reflective coating for high resolution ligthography
11/20/2003US20030213931 Comprises hex-5-enyl glyoxalate as photoinitiator; stable scratch-resistance; for use in paints, varnishes, powder coating, composites, and/or glass fiber cable coatings
11/20/2003US20030213921 Device manufacturing method, device manufactured thereby and computer programs
11/20/2003US20030213916 VUV-attenuating windows
11/20/2003US20030213889 Non-contacting holding devices for an optical component, and optical systems and lithographic exposure systems comprising same
11/20/2003US20030213768 Method of forming holographic grating
11/20/2003US20030213613 Lithography correction method and device
11/20/2003US20030213612 For electrostatic discharge protection; comprising first ring on substrate having plurality of electrically connected lightening bars and second ring concentric to first and having lightening bars electrically isolated from one another
11/20/2003US20030213561 Atmospheric pressure plasma processing reactor
11/20/2003US20030213431 Substrate treating apparatus
11/20/2003US20030213382 Microcontact printing
11/19/2003EP1363321A2 Post-CMP washing liquid composition
11/19/2003EP1363167A2 Method of producing compound semiconductor device
11/19/2003EP1363166A2 Apparatus and method for writing a lithographic pattern
11/19/2003EP1363165A1 Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same
11/19/2003EP1362709A2 Image-forming material and image formation method
11/19/2003EP1362364A2 Semiconductor package and method of preparing same
11/19/2003EP1362262A1 Semiconductor developing agent
11/19/2003EP1362261A1 Method for exposing at least one or at least two semiconductor wafers
11/19/2003EP1361961A2 Forming a mark on a gemstone or industrial diamond
11/19/2003EP1030784B1 Lithographic printing plates for use with laser imaging apparatus
11/19/2003EP0958326B1 Method for gluing a surface to a component
11/19/2003CN1457510A Apparatus and method of inspecting semiconductor wafer
11/19/2003CN1457505A Fluid pressure imprint lithography
11/19/2003CN1457504A Method of making electronic materials
11/19/2003CN1457502A Process and apparatus for removing residues from microstructure of object
11/19/2003CN1457454A Precursor composition for positive photosensitive resin and display made with the same
11/19/2003CN1457349A Radiation-sensitive composition capable of having refractive index distribution
11/19/2003CN1457300A Use of electronically active primer layers in thermal patterning of meterials
11/19/2003CN1456940A Photoetching device, component manufacturing method and component therefrom
11/19/2003CN1456939A Substrate processing method and processor
11/19/2003CN1456938A System and method for protecting templates by two-piece cover
11/19/2003CN1456937A Component manufacturing method, component therefrom and computer programm
11/19/2003CN1456936A Offset press and component manufacturing method
11/19/2003CN1456933A Sucker, photoetching projective apparatus, method for producing sucker and component producing method
11/19/2003CN1456904A Exposuring device for illuminating sensitive substrate
11/19/2003CN1456711A Electroplating method
11/19/2003CN1456580A Photosensitive polymer and amplified chemical photoresist agent composition containing it
11/18/2003USRE38320 Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
11/18/2003US6651226 Process control using three dimensional reconstruction metrology
11/18/2003US6650679 Preionization arrangement for gas laser
11/18/2003US6650678 Laser oscillating apparatus
11/18/2003US6650666 Laser wavelength control unit with piezoelectric driver
11/18/2003US6650421 Method and apparatus for inspecting optical device
11/18/2003US6650419 Interferometric apparatus for precision measurement of altitude to a surface
11/18/2003US6650399 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations
11/18/2003US6650398 Wavefront aberration measurement method and projection exposure apparatus
11/18/2003US6650353 Method and system for focus control in imaging engine with spatial light modulator
11/18/2003US6650135 Measurement chuck having piezoelectric elements and method
11/18/2003US6649920 Cell projection using an electron beam
11/18/2003US6649859 Electron beam irradiation system and electron beam irradiation method
11/18/2003US6649529 Method of substrate processing and photoresist exposure
11/18/2003US6649525 Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process
11/18/2003US6649452 Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer
11/18/2003US6649444 Stereolithographic method and apparatus for fabricating spacers for semiconductor devices and resulting structures
11/18/2003US6649328 Coating a photoresist on the Fresnel lens surfaces and rise surfaces, and forming a layer of a light-diffusing material or a light-absorbing material on the rise surfaces by exposing the photoresist at different light exposure doses
11/18/2003US6649327 Applying electroconductive polymer; masking; exposure to radiation; etching
11/18/2003US6649326 Photolithographic method and UV transmitting fluoride crystals with minimized spatial dispersion
11/18/2003US6649324 High throughput with no sludge formation
11/18/2003US6649323 Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer
11/18/2003US6649322 Acid generator and terpolymer, e.g. of p-tert-butoxystyrene, p-hydroxystrene and tert-butyl (alpha-isobornyloxymethyl) acrylate; dry-etching resistance, forms a patterned resist with a good sectional shape
11/18/2003US6649321 Styrene-anhydride copolymer containing amido group, the process for producing the same and use thereof
11/18/2003US6649320 Donor sheet for thin-film formation, process for production thereof and organic electroluminescent device
11/18/2003US6649319 Simultaneously developing and gumming the imaged element with an aqueous solution comprising one or more water-soluble polyhydroxy compounds that contain 4 or more contiguous CHOH groups, e.g., mannitol, glucamine or gulonic acid
11/18/2003US6649318 Image quality; consistent sensitometric response to pressure development
11/18/2003US6649311 Color changing composition and coloring polymeric articles made therefrom
11/18/2003US6649310 Calibration pattern
11/18/2003US6649309 Computer simulation program
11/18/2003US6649230 Orientation layers for liquid crystals; excellent alignment; very high pretilt angles; easily be coated with liquid crystal polymers without wetting problems;
11/18/2003US6649093 Method of manufacturing an optically scannable information carrier
11/18/2003US6649018 System for removal of photoresist using sparger
11/18/2003US6648509 Friction-drive stage
11/18/2003US6647994 Method of resist stripping over low-k dielectric material
11/13/2003WO2003094582A2 A system and method for manufacturing printed circuit boards employing non-uniformly modified images
11/13/2003WO2003094213A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
11/13/2003WO2003094212A1 Alignment system, alignment method and production method for semiconductor device
11/13/2003WO2003093905A1 Photodetector and exposure system
11/13/2003WO2003093904A1 Projection lens comprising an extremely high aperture
11/13/2003WO2003093903A2 Projection method comprising pupillary filtration and a projection lens therefor
11/13/2003WO2003093902A2 Lighting system, particularly for use in extreme ultraviolet (euv) lithography
11/13/2003WO2003093901A1 Radiation curable resin composition and rapid prototyping process using the same
11/13/2003WO2003093880A1 Method for producing an optical element from a quartz substrate
11/13/2003WO2003093329A1 Photo-crosslinkable multi-coating system having improved gas-barrier properties
11/13/2003WO2003077033A3 Photosensitive material and process of making same
11/13/2003WO2003075097A3 Refractive projection lens with a middle part
11/13/2003WO2003075096A3 Refractive projection lens
11/13/2003WO2003050587A3 Catadioptrical reduction lens
11/13/2003WO2003046961A3 Photolithographic method for forming a structure in a semiconductor substrate
11/13/2003WO2003014833A3 Collector with fastening devices for fastening mirror shells
11/13/2003WO2003009063A3 Real time analysis of periodic structures on semiconductors
11/13/2003WO2002101468A3 Design and layout of phase shifting photolithographic masks
11/13/2003WO2002101465A3 Phase conflict resolution for photolithographic masks
11/13/2003WO2002069390A3 Grating test patterns and methods for overlay metrology
11/13/2003WO2002065215A8 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
11/13/2003WO2002061191A8 Fibrous structure having increased surface area and process for making same
11/13/2003WO2002023274A9 Photoresist composition
11/13/2003WO2002013226A8 Spatial light modulator driven photocathode source electron beam pattern generator
11/13/2003WO2002012948A9 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
11/13/2003WO2001035440A8 Method and apparatus for electron beam column assembly with precise alignment using displaced semi-transparent membranes
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