Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2003
11/25/2003US6653644 Pattern exposure method and apparatus
11/25/2003US6653639 Chuck for mounting reticle to a reticle stage
11/25/2003US6653486 Spiroorthocarbonates containing epoxy groups
11/25/2003US6653418 Dissolving 4-acetoxystyrene monomer and dimethyl-2,2*-azobiscarboxylate ester in solvent; addition polymerization using alkali catalyst; hydrolysis, washing; heat resistance, sensitivity and resolution
11/25/2003US6653244 Monolithic three-dimensional structures
11/25/2003US6653177 Patterning method, thin film transistor matrix substrate manufacturing method, and exposure mask
11/25/2003US6653058 Forming polymer layer over patterned photoresist mask, then plasma etching to remove both polymer layer and mask
11/25/2003US6653056 Process for patterning non-photoimagable ceramic tape
11/25/2003US6653055 Forming printed circuits by selectively etching copper lamination by exposing photoresists and electrodeposited coatings to light
11/25/2003US6653054 Semiconductor substrate etching masking layer to which a pattern to be etched can be transferred by photolithography at EUV wavelengths that is resistant to plasma etching
11/25/2003US6653052 Electron device manufacturing method, a pattern forming method, and a photomask used for those methods
11/25/2003US6653050 Used to form planographic printing plates which have excellent resistance to printing and recording layers with high strength image areas
11/25/2003US6653049 High conformality antireflective coating compositions
11/25/2003US6653048 High silicon content monomers and polymers suitable for 193 nm bilayer resists
11/25/2003US6653047 Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same
11/25/2003US6653046 Infrared sensitive coating liquid
11/25/2003US6653045 Radiation sensitive silicon-containing negative resists and use thereof
11/25/2003US6653044 Chemical amplification type resist composition
11/25/2003US6653043 Active particle, photosensitive resin composition, and process for forming pattern
11/25/2003US6653032 Exposure method
11/25/2003US6653031 Photosensitive coloring composition, and color filter and liquid crystal display panel using the same
11/25/2003US6653030 Optical-mechanical feature fabrication during manufacture of semiconductors and other micro-devices and nano-devices that include micron and sub-micron features
11/25/2003US6653027 Attenuated embedded phase shift photomask blanks
11/25/2003US6653025 Mask producing method
11/25/2003US6653024 Photomask, aberration correction plate, exposure apparatus, and process of production of microdevice
11/25/2003US6652956 X-ray printing personalization technique
11/25/2003US6652911 Rotation; scanning with spray nozzle
11/25/2003US6652781 By forming a thin film on a mold, bonding a substrate to the thin film, and separating the thin film and substrate from the mold; optical element used for an exposure apparatus, photo-taking apparatus, or an illumination apparatus
11/25/2003US6652666 Exposing said wafer to heated etchant solution; cooling wafer; rinsing with water without exposing to buffer solvent for removing surface layer on wafer
11/25/2003US6652653 Coating apparatus, method for producing color filter substrate by use of the coating apparatus, and liquid-crystal display apparatus using the color filter substrate produced by the method
11/25/2003US6652631 A glycol monoether and a dihydroxy dimethylbutyne derivative; soybean oil ink
11/25/2003US6652342 Wiring board and gas discharge type display apparatus using the same
11/20/2003WO2003096497A1 High power deep ultraviolet laser with long life optics
11/20/2003WO2003096492A2 Automatic gas control system for a gas discharge laser
11/20/2003WO2003096387A2 High efficiency solid-state light source and methods of use and manufacture
11/20/2003WO2003096234A2 Optimization of die placement on wafers
11/20/2003WO2003096124A1 Lens consisting of a crystalline material
11/20/2003WO2003096123A1 Reversal imprint technique
11/20/2003WO2003096122A2 Method for producing a unit comprising three-dimensional surface structuring and use of said method
11/20/2003WO2003095554A1 Photo-induced cation curable epoxy resin composition
11/20/2003WO2003095505A1 Fluorinated polymers
11/20/2003WO2003079401A3 Directed assembly of functional heterostructures
11/20/2003WO2003069286A3 Method and apparatus to measure fiber optic pickup errors in interferometry systems
11/20/2003WO2003064977A3 Multiple degree of freedom interferometer
11/20/2003WO2003023082A3 System and process for automated microcontact printing
11/20/2003WO2003016976A3 Device for adjusting an optical element
11/20/2003WO2003007341A3 Tunable radiation source providing a planar irradiation pattern for processing semiconductor wafers
11/20/2003WO2002103455A3 Method and apparatus for imaging with fiber optic arrays on non-flat surfaces
11/20/2003WO2002095510A3 Enhanced fieldbus device alerts in a process control system
11/20/2003WO2002012960A8 Method of laminating a photoresist sheet to a substrate
11/20/2003US20030216514 Photocurable and thermosetting resin composition
11/20/2003US20030216495 Acid generator and thin film composition containing the same
11/20/2003US20030216270 Mixture of an aliphatic polycarboxylic acid and one or two of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose; pH of less than 3.0.
11/20/2003US20030216053 Method and device for processing substrate
11/20/2003US20030216051 Method for reducing dimensions between patterns on a photoresist
11/20/2003US20030215965 Method and apparatus for position measurement of a pattern formed by a lithographic exposure tool
11/20/2003US20030215964 Method of inter-field critical dimension control
11/20/2003US20030215962 Integration of multiple processes within a single chamber
11/20/2003US20030215758 Photosensitive polymer and chemically amplified resist composition comprising the same
11/20/2003US20030215755 Residue and scum reducing composition and method
11/20/2003US20030215754 Residue reducing stable concentrate
11/20/2003US20030215753 Forming semiconductors by applying multilayer photoresists and antireflective coatings on substrates, then controlling exposure intensity for development
11/20/2003US20030215752 Masking dielectric and photoresist films on semiconductor substrates, then forming patterns, for miniaturized electrical and electronic apparatus
11/20/2003US20030215751 Rinsing etching by-products from substrates by irradiating using excimer lamps, then applying ozonized, alkaline or acidic water
11/20/2003US20030215749 Pattern forming method and method for manufacturing semiconductor device
11/20/2003US20030215748 Mixtures of alkaline soluble terpolymers and acid generators used to form films for transfering images to substrates
11/20/2003US20030215747 Mixtures of binders, acrylated polyurethanes, silver powders, frit glass and photoinitiators, used to form defect free terminals
11/20/2003US20030215746 Carboxyl group-containing photosensitive resin, alkali-developable, photocurable and thermosetting composition containing the same, and cured products thereof
11/20/2003US20030215745 Curable acrylic copolymers used as image forming materials
11/20/2003US20030215743 Image forming material
11/20/2003US20030215742 Novel copolymers and photoresist compositions comprising same
11/20/2003US20030215741 Package structure of planographic printing plates and interleaf paper for packaging the same
11/20/2003US20030215740 Polymers, resist compositions and patterning process
11/20/2003US20030215739 Comprises fluorinated sulfonate-based polymer; high transmittance to vacuum ultraviolet radiation; radiation transparency; for microlithography
11/20/2003US20030215738 Comprises arylsulfonyloxime; for integrated circuits
11/20/2003US20030215737 Radiation sensitive composition for forming an insulating film, insulating film and display device
11/20/2003US20030215736 Negative-working photoimageable bottom antireflective coating
11/20/2003US20030215735 Copolymers for photoresists and processes therefor
11/20/2003US20030215734 Such as 2,2'-methylenebis(4-methyl-6-hydroxymethylphenol) for production of photosensitive polyimides
11/20/2003US20030215725 Method for determining depth of focus
11/20/2003US20030215724 Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
11/20/2003US20030215723 Comprises photocatalytic semiconductor or photosensitizer
11/20/2003US20030215664 Method for providing an arbitrary three-dimensional microstructure in silicon using an anisotropic deep etch
11/20/2003US20030215626 Nanoporous coatings
11/20/2003US20030215616 Facilitating optical proximity effect correction through pupil filtering
11/20/2003US20030215577 Photolithography process for creating high resolution patterns, using a template, applying a polymerizable composition, electrochemical polymerization, etching to form a pattern
11/20/2003US20030215574 Photolithographic forming a multi-color pattern filter, hardening the surface by irradiating with light, heating to curing, follow by baking at higher temperature, simultaneously hardening all of the coated colored resist
11/20/2003US20030215573 Film forming apparatus and film forming method
11/20/2003US20030215567 A blends comprising an adduct of epoxidized phenolic resins with (meth)acrylic acid, a (meth)acrylates, a liquid epoxy resins and curing agents; noncracking, solder-resistance, corrosion resistance, durability
11/20/2003US20030215053 Interferometer system and method of manufacturing projection optical system using same
11/20/2003US20030214911 Data based node penalties
11/20/2003US20030214735 Optical element, and light source unit and exposure apparatus having the same
11/20/2003US20030214723 Scanning angle expander and a method for expanding a scanning beam angle
11/20/2003US20030214704 Ultraviolet and vacuum ultraviolet antireflection substrate
11/20/2003US20030214644 Pattern writing apparatus and pattern writing method
11/20/2003US20030214643 Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
11/20/2003US20030214642 Method for detecting flare noise of semiconductor device
11/20/2003US20030214641 Method of and apparatus for recording image by exposure to light beams
11/20/2003US20030214611 Programmable mask and method for fabricating biomolecule array using the same
11/20/2003US20030214571 Exposure head, exposure apparatus, and application thereof
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