| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/19/2013 | US20130335717 Immersion exposure apparatus and device manufacturing method with measuring device |
| 12/19/2013 | US20130334929 Resonator electrodes and related methods and apparatus |
| 12/19/2013 | US20130334679 Metal conservation with stripper solutions containing resorcinol |
| 12/19/2013 | DE102013203746A1 Reflective optical element for optical system for extreme ultraviolet lithography apparatus, has multilayer system whose substrate side is provided with two layers made from amorphous silicon, silicon nitride, ruthenium and molybdenum |
| 12/19/2013 | DE102012210071A1 Projektionsbelichtungsanlage sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage Projection exposure apparatus and method for controlling a projection exposure apparatus |
| 12/18/2013 | EP2674969A1 Substrate having etching mask and method for producing same |
| 12/18/2013 | EP2674815A1 Photosensitive resin and process for producing microlens |
| 12/18/2013 | EP2673856A2 Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light |
| 12/18/2013 | EP2673675A1 Underlayer coating composition and process for manufacturing a microelectronic device |
| 12/18/2013 | EP2535771B1 Pattern forming method |
| 12/18/2013 | EP2527380B1 Photosensitive compositions |
| 12/18/2013 | EP2041624B1 Correction of spatial instability of an euv source by laser beam steering |
| 12/18/2013 | EP1664934B1 Immersion lithography method and device for illuminating a substrate |
| 12/18/2013 | EP1602982B1 Planographic printing method |
| 12/18/2013 | EP1300932B1 Linear motor, stage apparatus, and exposure apparatus |
| 12/18/2013 | EP1292968B1 Displacement device |
| 12/18/2013 | EP1184895B1 Substrate processing apparatus and substrate inspection method |
| 12/18/2013 | CN203350468U Color microlens array |
| 12/18/2013 | CN103460138A Polymer-containing developer |
| 12/18/2013 | CN103460137A 放电灯 Discharge lamps |
| 12/18/2013 | CN103460136A Upper surface antireflective film forming composition and pattern forming method using same |
| 12/18/2013 | CN103460135A Photo-patternable and developable silesquioxane resins for use in device fabrication |
| 12/18/2013 | CN103460134A Positive-tone photosensitive resin composition, dry film, cured product, and printed wiring board |
| 12/18/2013 | CN103460133A Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| 12/18/2013 | CN103460132A Photosensitive composition, hardened coating films therefrom, and printed wiring boards using same |
| 12/18/2013 | CN103460131A Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device |
| 12/18/2013 | CN103460130A Systems and methods for micro-contact stamping |
| 12/18/2013 | CN103459986A Lithography apparatus |
| 12/18/2013 | CN103459443A Copolymer, resin composition and photosensitive resin composition each containing said copolymer, and color filter |
| 12/18/2013 | CN103458620A PCB circuitous pattern development exposure method |
| 12/18/2013 | CN103458618A Method for forming circuit with laser irradiation |
| 12/18/2013 | CN103456671A Wafer table and photoetching system |
| 12/18/2013 | CN103456670A Method of switching wafers in photoetching device |
| 12/18/2013 | CN103454866A Optical patterning imaging device based on surface plasma wave illumination and optical patterning imaging method |
| 12/18/2013 | CN103454865A Deep ultra-violet lithography illuminating system |
| 12/18/2013 | CN103454864A Coarse-fine motion integrated magnetic-levitation mask platform system |
| 12/18/2013 | CN103454863A Flexible-joint-equipped cable table for worktable of photoetching machine |
| 12/18/2013 | CN103454862A Workpiece table position error compensation method for photoetching equipment |
| 12/18/2013 | CN103454861A Overlay measuring mark and method |
| 12/18/2013 | CN103454860A Exposure method |
| 12/18/2013 | CN103454859A Colored curable resin composition |
| 12/18/2013 | CN103454858A Color filter and photo-sensitive coloring composition therefor |
| 12/18/2013 | CN103454857A 光致抗蚀剂组合物 The photoresist composition of |
| 12/18/2013 | CN103454856A Photosenstive material and method of lithography |
| 12/18/2013 | CN103454855A Imprint lithography apparatus and method |
| 12/18/2013 | CN103454854A Yield rate improving method of photolithographic mask |
| 12/18/2013 | CN103454852A Mask and overlay precision measuring method |
| 12/18/2013 | CN103454851A Photomask, method for manufacturing the photomask and pattern transfer method |
| 12/18/2013 | CN103454812A Method for forming spacers in liquid crystal panels and liquid crystal panels produced by method |
| 12/18/2013 | CN103454804A Liquid crystal display panel, preparation method thereof, and liquid crystal display |
| 12/18/2013 | CN103454769A Optical system, exposure apparatus, and method for manufacturing a device |
| 12/18/2013 | CN103454065A Scattering measurement focusing device and method used for lithographic equipment |
| 12/18/2013 | CN103450389A New polymer and coloring composition comprising the same |
| 12/18/2013 | CN102981359B Photoetching method |
| 12/18/2013 | CN102707586B Prebaking device and exhaust method of prebaking device |
| 12/18/2013 | CN102537520B Wire cable auxiliary support mechanism and wire cable platform |
| 12/18/2013 | CN102468129B Method for surface planarization in preparation process of semiconductor |
| 12/18/2013 | CN102455601B Four-degree-of-freedom precision positioning device |
| 12/18/2013 | CN102432841B Naphthalene-backbone polymer and antireflective hardmask composition containing polymer and patterning method of material layer |
| 12/18/2013 | CN102375200B Radial adjusting device of adjustable optical element |
| 12/18/2013 | CN102221737B Fine adjuster for projection photoetching objective |
| 12/18/2013 | CN102216400B Radiation curable coating materials |
| 12/18/2013 | CN102129180B Micro-mirror device screening method, micro-mirror device screening device and no-mask exposure device |
| 12/18/2013 | CN102047183B Multilayer mirror and lithographic apparatus |
| 12/18/2013 | CN102017071B Methods of patterning conductor on substrate |
| 12/18/2013 | CN101424889B Method for regenerating stripping solution from stripping waste liquid and regeneration device |
| 12/18/2013 | CN101419404B Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device |
| 12/18/2013 | CN101241260B Optical film and process for manufacture thereof, and substrate structure using same and display panel |
| 12/17/2013 | US8610875 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 12/17/2013 | US8610093 Direct write lithography system |
| 12/17/2013 | US8609891 Photoacid generators and photoresists comprising same |
| 12/17/2013 | US8609889 Photoacid generator, resist composition, and patterning process |
| 12/17/2013 | US8609327 Forming sub-lithographic patterns using double exposure |
| 12/17/2013 | US8609325 Method of lithography |
| 12/17/2013 | US8609324 Method of forming pitch multiplied contacts |
| 12/17/2013 | US8609322 Process of making a lithographic structure using antireflective materials |
| 12/17/2013 | US8609321 Radiation-sensitive resin composition, polymer and compound |
| 12/17/2013 | US8609320 Resist composition, method of forming resist pattern, polymeric compound and compound |
| 12/17/2013 | US8609319 Radiation-sensitive resin composition and resist film formed using the same |
| 12/17/2013 | US8609318 Radiation-sensitive resin composition, method for forming resist pattern and polymer |
| 12/17/2013 | US8609317 Salt and photoresist composition containing the same |
| 12/12/2013 | WO2013184693A1 Focus monitoring method using asymmetry embedded imaging target |
| 12/12/2013 | WO2013183689A1 Active light-sensitive or radiation-sensitive resin composition, and pattern-formation method using same |
| 12/12/2013 | WO2013183686A1 Overlay film forming composition and resist pattern formation method using same |
| 12/12/2013 | WO2013183426A1 Radiation-sensitive composition, color filter, and method of manufacturing color filter |
| 12/12/2013 | WO2013182615A1 Method for the production of micromechanical parts that are difficult to reproduce, and resulting micromechanical parts |
| 12/12/2013 | WO2013182562A1 Optical writer for flexible foils |
| 12/12/2013 | WO2013182367A1 Lithography apparatus and device manufacturing method |
| 12/12/2013 | WO2013182328A1 A lithographic printing plate precursor |
| 12/12/2013 | WO2013182269A1 Neutral layer polymer composition for directed self assembly and processes thereof |
| 12/12/2013 | WO2013153183A3 Composite resin composition and use thereof, method for producing dental components by means of stereo-lithography |
| 12/12/2013 | WO2013113634A3 Lithographic apparatus component and lithographic apparatus |
| 12/12/2013 | WO2013113568A3 Substrate holder and lithographic apparatus |
| 12/12/2013 | WO2013107686A3 Source-collector device, lithographic apparatus, and device manufacturing method |
| 12/12/2013 | WO2013107684A3 Method of loading a flexible substrate and lithography apparatus |
| 12/12/2013 | US20130332894 System and method for lithography simulation |
| 12/12/2013 | US20130330927 Cleaning liquid for lithography and method for forming wiring |
| 12/12/2013 | US20130330674 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material |
| 12/12/2013 | US20130330672 Method for enhancing lithographic imaging of isolated and semi-isolated features |
| 12/12/2013 | US20130330671 Surface switchable photoresist |