Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2003
11/27/2003WO2003011595A3 Laser spectral engineering for lithographic process
11/27/2003WO2003003122A3 Method of measuring critical dimension and overlay in single step
11/27/2003WO2002065513B1 Photoresist strip with 02 and nh3 for organosilicate glass applications
11/27/2003US20030220754 Semiconductor production system
11/27/2003US20030220431 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
11/27/2003US20030219992 Replication and transfer of microstructures and nanostructures
11/27/2003US20030219988 Ashable layers for reducing critical dimensions of integrated circuit features
11/27/2003US20030219980 Pattern forming method, method of making microdevice, method of making thin-film magnetic head, method of making magnetic head slider, method of making magnetic head apparatus, and method of making magnetic recording and reproducing apparatus
11/27/2003US20030219920 Fabrication method of liquid crystal display device
11/27/2003US20030219683 Exposing pattern to low pressure, high density, inductively coupled plasma which generates ultraviolet radiation while the substrate cools, simultaneously hardening as etching takes place; for production of integrated circuits/semiconductors
11/27/2003US20030219682 Comprises (meth)acrylate monomers and perfluoroalkylcarboxylic acid compound; for semiconductors/integrated circuits
11/27/2003US20030219681 Photobleachable compounds for use in flexographic printing plates
11/27/2003US20030219680 Radiation-sensitive resin composition
11/27/2003US20030219679 For use in microlithography; improved photosensitivity and contrast; for integrated circuits
11/27/2003US20030219678 Novel esters, polymers, resist compositions and patterning process
11/27/2003US20030219677 For lithography by ultraviolet radiation, electron beams, x-rays, or radiation light; semiconductors, integrated circuits
11/27/2003US20030219676 Processes for producing silane monomers and polymers and photoresist compositions comprising same
11/27/2003US20030219675 For manufacturing reticles and microelectromechanical systems (MEMS) processing
11/27/2003US20030219673 Such as 2-methoxy-4-(phenylamino)-benzenediazonium dodecyl sulfate (MSDS), which does not contain ozone depletion elements (fluorine, heavy metals); pollution control; lithography
11/27/2003US20030219661 Detectors used in printers for detection of humidity, for improved print quality
11/27/2003US20030219660 Pattern forming method
11/27/2003US20030219659 Processor unit with provision for automated control of processing parameters
11/27/2003US20030219658 Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
11/27/2003US20030219656 Waterborne printed circuit board coating compositions
11/27/2003US20030219655 Photomask having a focus monitor pattern
11/27/2003US20030219603 Photoresist compositions
11/27/2003US20030219572 Direct write lithography system
11/27/2003US20030219541 Comprises vapor phase polymerization of 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene; integrated circuits; microelectronics, optoelectronics
11/27/2003US20030219189 Exposure head
11/27/2003US20030219154 Quality measurement of an aerial image
11/27/2003US20030219096 Apparatus and system for improving phase shift mask imaging performance and associated methods
11/27/2003US20030219095 X-ray mask and semiconductor device manufatured through x-ray exposure method
11/27/2003US20030219094 Excimer or molecular fluorine laser system with multiple discharge units
11/27/2003US20030219056 High power deep ultraviolet laser with long life optics
11/27/2003US20030218751 Gas supply unit, gas supply method and exposure system
11/27/2003US20030218735 Stent manufacturing apparatus
11/27/2003US20030218734 Illumination apparatus
11/27/2003US20030218733 Method and apparatus for enhancing image contrast using intensity filtration
11/27/2003US20030218732 Stage assembly including a reaction assembly
11/27/2003US20030218731 Optical stop apparatus and exposure apparatus having the same
11/27/2003US20030218730 Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same
11/27/2003US20030218729 Projection optical system, exposure apparatus, and exposure method
11/27/2003US20030218728 System and method for using a two part cover for protecting a reticle
11/27/2003US20030218727 Apparatus for patterning a semiconductor wafer
11/27/2003US20030218703 Color filter for a liquid crystal display and a liquid crystal display using the same
11/27/2003US20030218182 Strees-controlled dielectric integrated circuit
11/27/2003US20030218141 Lithographic apparatus, device manufacturing method, and device manufactured thereby
11/27/2003US20030218140 Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method
11/27/2003US20030217804 Polymer micro-ring resonator device and fabrication method
11/27/2003US20030217764 Pressurized carbon dioxide and additives; removal photoresists from semiconductors
11/27/2003US20030217695 Substrate processing apparatus
11/27/2003US20030217694 Supporting apparatus having a plurality of magnets that generate a floating force and method, stage apparatus, and exposure apparatus
11/27/2003US20030217460 Semiconductor manufacturing apparatus
11/27/2003CA2485516A1 Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
11/26/2003EP1365636A1 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method
11/26/2003EP1365441A1 Process and composition for removing residues from the microstructure of an object
11/26/2003EP1365290A1 Resist composition
11/26/2003EP1365289A1 Precursor composition for positive photosensitive resin and display made with the same
11/26/2003EP1365288A1 Photo mask, production method of the same, pattern forming method using the photo mask
11/26/2003EP1365264A2 Objective with polarisation compensation
11/26/2003EP1365263A1 Optical element, and light source unit and exposure apparatus having the same
11/26/2003EP1365228A2 System for detecting amine and other basic molecular contamination in a gas
11/26/2003EP1364779A2 Actuation system in an imaging system
11/26/2003EP1364257A1 Simultaneous imaging of two reticles
11/26/2003EP1364256A2 Method of uniformly coating a substrate
11/26/2003EP1364255A2 Method for uniformly coating a substrate
11/26/2003EP1364254A2 Antireflective layer for use in microlithography
11/26/2003EP1364253A2 Lithographic template
11/26/2003EP1364245A1 A method and apparatus for spatial light modulation
11/26/2003EP1364231A2 A self-cleaning optic for extreme ultraviolet lithography
11/26/2003EP1363777A1 Thermally convertible lithographic printing precursor comprising an organic base
11/26/2003EP1046185B1 Projection lithography device utilizing charged particles
11/26/2003CN1459124A Exposure system, exposure method, and production method for device
11/26/2003CN1459050A Negative photosensitive resin composition and display device using the same
11/26/2003CN1459049A Ultraviolet-curable resin composition and photosolder resist ink contaning the composition
11/26/2003CN1459048A Dual layer reticle bland and manufacturing process
11/26/2003CN1459019A 位置测量装置 Position measuring means
11/26/2003CN1458938A Polymerizable composition
11/26/2003CN1458927A Process for producing epoxy compound, epoxy resin composition and use thereof, ultraviolet-curable can coating composition
11/26/2003CN1458648A Original disc producing method for optical disc and optical disc producing method
11/26/2003CN1458256A Cleaning liquid composition after chemical and mechanical grinding
11/26/2003CN1458178A Copolymer containing alcohol type hydroxy, aryl ring and proton leaving group
11/26/2003CN1129172C Aperture apparatus used for photo litho-graphy and munafacturing method thereof
11/26/2003CN1129166C Photoresist polymer, composition and its preparing method
11/26/2003CN1129036C Stripping process for anti-corrosion layer
11/26/2003CN1129035C Polymerizable alkylene compounds containing tetrahydrofuran methyloxycarbonyl radical and photoresist containing it
11/26/2003CN1128799C Photoactivatable nitrogen-containing alkali based on alpha-amino alkenes
11/25/2003US6654660 Photolithography system comprising irradiation source and mask whereby heat accumulates; inspection system to monitor gratings; data processing
11/25/2003US6654403 Flow shaping electrode with erosion pad for gas discharge laser
11/25/2003US6654183 System for converting optical beams to collimated flat-top beams
11/25/2003US6654164 Photolithography lens
11/25/2003US6654107 Stepper lens aberration measurement pattern and stepper lens aberration characteristics evaluating method
11/25/2003US6654106 Methods and apparatus for determining blur of an optical system
11/25/2003US6654101 Exposure apparatus and device manufacturing method including changing a photo-intensity distribution of a light source and adjusting an illuminance distribution on a substrate in accordance with the change
11/25/2003US6654100 Movable stage to hold object, reference member having movement reference surface supporting movable stage and used as reference when stage moves, second reference member having different movement reference surface, switching device
11/25/2003US6654099 Scanning exposure apparatus, scanning exposure method and mask
11/25/2003US6654098 Stage apparatus, exposure apparatus, and device production method
11/25/2003US6654097 Projection exposure apparatus
11/25/2003US6654096 Exposure apparatus, and device manufacturing method
11/25/2003US6654095 Apparatus comprising room having short optical path between light source and substrate and predetermined level of chemical cleanliness, second room having longer optical path and higher degree of cleanliness, each having conditioning gas supplier
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