Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2003
12/04/2003US20030224081 Convection cooling techniques in selective deposition modeling
12/04/2003US20030223630 Overlay metrology and control method
12/04/2003US20030223544 High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems
12/04/2003US20030223543 Linear filament array sheet for EUV production
12/04/2003US20030223541 Target steering system for EUV droplet generators
12/04/2003US20030223535 Lithography device for semiconductor circuit pattern generator
12/04/2003US20030223127 Projection aligner and optical system therefor
12/04/2003US20030223126 Optical reduction system with elimination of reticle diffraction induced bias
12/04/2003US20030223125 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
12/04/2003US20030223079 Interferometry system error compensation in twin stage lithography tools
12/04/2003US20030223076 Interferometer, exposure apparatus, exposure method and interference length measurement method
12/04/2003US20030223066 Overlay metrology using scatterometry profiling
12/04/2003US20030222970 Device for producing a printing form
12/04/2003US20030222969 Apparatus for producing a printing form
12/04/2003US20030222966 Pattern writing apparatus and pattern writing method
12/04/2003US20030222635 Movement actuator/sensor systems
12/04/2003US20030222345 Stabilization of resist material through ion implantation
12/04/2003US20030222225 High reflectivity to incident X-radiation independently of the angle of incidence and without significantly compromising optical performance. Also disclosed are X-ray optical systems and microlithography apparatus comprising such mirrors.
12/03/2003EP1367871A2 Wiring forming system and wiring forming method for forming wiring on wiring board
12/03/2003EP1367867A1 Target steering system for a droplet generator in a EUV plasma source
12/03/2003EP1367636A2 Supporting apparatus having a plurality of magnets and method therefor
12/03/2003EP1367605A1 Multilayer-film reflective mirrors and optical systems comprising same
12/03/2003EP1367447A2 Projection exposure device and position alignment device and position alignment method
12/03/2003EP1367446A1 Lithographic apparatus
12/03/2003EP1367445A1 Linear filament array sheet for EUV production
12/03/2003EP1367444A2 Catadioptric lithography system with stages for reticle and wafer in mutually orthogonal planes
12/03/2003EP1367443A2 Exposure apparatus
12/03/2003EP1367442A2 Illumination device
12/03/2003EP1367441A2 Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
12/03/2003EP1367440A2 Positive-working resist composition
12/03/2003EP1367439A1 Radiation-sensitive composition
12/03/2003EP1367438A2 Insulating resin film and method of forming fine patterns of insulating resin film
12/03/2003EP1366926A1 Photosensitive composition
12/03/2003EP1366390A2 Method and device for vibration control
12/03/2003EP1365930A2 Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof
12/03/2003EP1144476B1 Coating agents which can be hardened by the addition of isocyanate groups as well as by the radiation-induced addition of activated c-c double covalent bonds
12/03/2003EP1046184B1 Quadrupole device for projection lithography by means of charged particles
12/03/2003EP1015136A4 Method and apparatus for spin-coating chemicals
12/03/2003EP0846681B1 Novel sulfonium salt compounds, polymerization initiator, curable composition, and curing method
12/03/2003EP0832095B1 A method of cross-linking amino acid-containing polymers using photoactivatable chemical cross-linkers
12/03/2003CN1460276A Method of producing screen for color display tube
12/03/2003CN1460200A Photosensitive element, method for forming resist pattern, and method for mfg. printed wiring board
12/03/2003CN1460037A Processes and apparatus for treating electronic components
12/03/2003CN1459671A Exposure method, exposure apparatus and element mfg. method
12/03/2003CN1459670A Focal distance detecting method of micro image making process
12/03/2003CN1459669A Method of improving easy broken base wafer glue coating technology
12/03/2003CN1459668A Method of reducing easy broken base wafer contact exposure broken rate
12/03/2003CN1459662A Pattern recording apparatus and method
12/03/2003CN1459645A Laser device, exposure head, exposure device and optical fibre connecting method
12/02/2003US6658640 Simulation-based feed forward process control
12/02/2003US6658315 Non-synchronous control of pulsed light
12/02/2003US6658084 Illumination system with variable adjustment of the illumination
12/02/2003US6658083 Weight compensation apparatus, stage apparatus using the same, and exposure apparatus
12/02/2003US6657758 Variable spectrum generator system
12/02/2003US6657756 Forming three dimensional images by positioning reflection surfaces, then generating and directing collimated beams through the surfaces; printing/photo
12/02/2003US6657736 Method and system for measuring patterned structures
12/02/2003US6657725 Scanning type projection exposure apparatus and device production method using the same
12/02/2003US6657703 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory
12/02/2003US6657390 Short-arc discharge lamp
12/02/2003US6657370 Microcavity discharge device
12/02/2003US6657215 Apparatus for determining exposure conditions, method for determining exposure conditions and process apparatus
12/02/2003US6657211 Process for electron beam lithography, and electron-optical lithography system
12/02/2003US6657210 Electron beam exposure method, a method of constructing exposure control data, and a computer-readable medium
12/02/2003US6657208 Method of forming optical images, mask for use in this method, method of manufacturing a device using this method, and apparatus for carrying out this method
12/02/2003US6657207 Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures
12/02/2003US6657204 Cooling of voice coil motors in lithographic projection apparatus
12/02/2003US6657203 Misalignment inspection method, charge beam exposure method, and substrate for pattern observation
12/02/2003US6656895 For removing a photoresist; for removing a residue of a semiconductor element generated in semiconductor treatment
12/02/2003US6656860 1x104 irradiation with argon fluoride excimer laser at energy density .1-200 mJ/cm2 middle-dot p, have a loss factor </=.0050 cm-1 at 193.4 nm, a hydrogen concentration of 1 x 1016-2 x 1018 molecules/cm3, a loss factor of </=.002 cm-1
12/02/2003US6656837 Method of eliminating photoresist poisoning in damascene applications
12/02/2003US6656668 Process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array
12/02/2003US6656667 Multiple resist layer photolithographic process
12/02/2003US6656666 Topcoat process to prevent image collapse
12/02/2003US6656665 Photosensitive resin and mineral particle composition
12/02/2003US6656664 Method of forming minute focusing lens
12/02/2003US6656661 Waterless imageable element with crosslinked silicone layer
12/02/2003US6656660 Resist composition
12/02/2003US6656659 Resist composition suitable for short wavelength exposure and resist pattern forming method
12/02/2003US6656646 Fabrication method of semiconductor integrated circuit device
12/02/2003US6656644 Resist film patterns are partly formed over substrate in addition to metal patterns to shorten time required to change or correct mask pattern
12/02/2003US6656575 Multilayer system with protecting layer system and production method
12/02/2003US6656321 Liquid processing apparatus and liquid processing method
12/02/2003US6656308 Temporary rigid immobilization of the printing stamp backplane by glue lamination during curing; silicone rubber printing stamp imprinted with a microcircuit in positive relief
12/02/2003US6656280 Resist recycling apparatus and method for recycling the same
12/02/2003US6655964 Low cost integrated out-of-plane micro-device structures and method of making
12/02/2003US6655891 Substrate treatment system, substrate transfer system, and substrate transfer method
12/02/2003US6655808 Focusing-device for the radiation from a light source
12/02/2003US6655024 Method of manufacturing a circuit board
11/2003
11/28/2003CA2429904A1 Apparatus for producing a printing form
11/27/2003WO2003098670A1 Light-absorbing polymer for forming organic anti-reflective layer, composition including the same, and method for forming semiconductor device pattern using the same
11/27/2003WO2003098351A1 Radiation filter element and manufacturing processes therefore
11/27/2003WO2003098350A2 Method for the targeted deformation of an optical element
11/27/2003WO2003098349A2 Illumination system for microlithography
11/27/2003WO2003098348A1 Imaging process and products providing durable assemblages
11/27/2003WO2003098347A1 Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
11/27/2003WO2003070846A3 Drying resist with a solvent bath and supercritical co2
11/27/2003WO2003062926A8 Method for constructing an optical beam guide system
11/27/2003WO2003052517A3 Photolithography overlay control using feedforward overlay information
11/27/2003WO2003052513A3 Lithographic template
11/27/2003WO2003042759A3 Manufacture of optical devices
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