Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2003
12/10/2003CN1460894A Coated liquid composition for forming antireflection film, photorsist laminated body and photoresist pattern forming method
12/10/2003CN1460893A Method for mfg. liquid crystal display device
12/10/2003CN1130755C Method for correcting photo-adjacency effect in course of production of semiconductor device
12/10/2003CN1130602C Illumination unit for optical system and device for repeatedly imaging mask pattern on substrate
12/10/2003CN1130601C Bottom antireflective coatings through refractive index modification by anomalous dispersion
12/10/2003CN1130600C Printing photosensitive plate and its producing method and application
12/10/2003CN1130599C System for transfering image on photosensitive carrier to digital image
12/10/2003CN1130471C Tunable and removable plasma deposited antireflective coatings
12/10/2003CN1130454C Composition for cleaning photoetching glue in integrated circuit production
12/10/2003CN1130402C Radiation-absorbing polymer, composition for absorbing radiation coating, coating for absorbing radiation and antireflection coating made by using the same
12/09/2003US6662145 Method, equipment, and recording medium for controlling exposure accuracy
12/09/2003US6661826 Laser chamber insulator with sealed electrode feedthrough
12/09/2003US6661522 Interference system and semiconductor exposure apparatus having the same
12/09/2003US6661499 Projection exposure apparatus with a catadioptric projection optical system
12/09/2003US6661498 Projection exposure apparatus and method employing rectilinear aperture stops for use with periodic mask patterns
12/09/2003US6661447 Image-recording device for a printing form having macrooptics of the offner type
12/09/2003US6661410 Capacitive sensing and data input device power management
12/09/2003US6661018 Shroud nozzle for gas jet control in an extreme ultraviolet light source
12/09/2003US6661015 Pattern lock system
12/09/2003US6660700 Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
12/09/2003US6660646 Method for plasma hardening photoresist in etching of semiconductor and superconductor films
12/09/2003US6660641 Method for forming crack resistant planarizing layer within microelectronic fabrication
12/09/2003US6660632 Applying amorphous film of metal complex to substrate, converting to metal or its oxides by thermal, photochemical or electron beam irradiation
12/09/2003US6660542 Method of controlling stepper process parameters based upon optical properties of incoming process layers, and system for accomplishing same
12/09/2003US6660540 Test wafer and method for investigating electrostatic discharge induced wafer defects
12/09/2003US6660462 Suppressing variation in gate length caused by proximity effect
12/09/2003US6660460 Stripper
12/09/2003US6660459 System and method for developing a photoresist layer with reduced pattern collapse
12/09/2003US6660458 Method of optical proximity correction
12/09/2003US6660457 Depositing electroconductive thermoplastic resin then positive photosensitive coating layers, irradiating with oscillating laser and simultaneously developing
12/09/2003US6660455 Pattern formation material, pattern formation method, and exposure mask fabrication method
12/09/2003US6660454 Processing an imagewise exposed printing plate in which the rinse water can be recirculated without a decrease of rinsing efficiency does not require of a separate gumming step
12/09/2003US6660453 Waterless planographic printing plate precursor and production method thereof
12/09/2003US6660450 Resin useful for resist, resist composition and pattern forming process using the same
12/09/2003US6660449 Heat-sensitive compositions and imaging member containing carbon black and methods of imaging and printing
12/09/2003US6660448 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation
12/09/2003US6660447 Copolymers of fluorinated vinyl phenol units and acrylonitrile units has high transmittance to VUV radiation
12/09/2003US6660445 Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
12/09/2003US6660438 A halftone phase-shift pattern on an optically transmissive plate and a resist film outside the pattern formation area, is illuminated, transferring the pattern to a photosensitive film
12/09/2003US6660234 Generation of preferential nucleotide sequences on preferential substrate; obtain substrate, expose to activator, remove terminal groups, recover biopolymer
12/09/2003US6660176 Molecular imprinting of small particles, and production of small particles from solid state reactants
12/09/2003US6660129 Making strong, soft, absorbent fibrous webs, paper webs
12/09/2003US6660091 Apparatus for forming liquid film
12/09/2003CA2092233C Desensitizable record material
12/09/2003CA2092232C Latent image receiving sheet
12/04/2003WO2003100923A2 Production of integrated optical waveguides with solvent extraction
12/04/2003WO2003100838A1 Scanning projection aligner and aligning method
12/04/2003WO2003100826A2 Lithography laser with beam delivery and beam pointing control
12/04/2003WO2003100525A2 Method for determining wavefront aberrations
12/04/2003WO2003100524A1 Radiation-sensitive resin composition, process for producing substrate having patterned resin film, and use of the resin composition
12/04/2003WO2003100523A1 Negative resist composition
12/04/2003WO2003100522A1 Photosensitive resin composition and method for preparing heat-resistant resin film
12/04/2003WO2003100487A1 Polymer micro-ring resonator device and fabrication method
12/04/2003WO2003100479A1 Photocurable resin composition for forming overcoats, rgb pixels, black matrixes or spacers in color filter production, and color filteres
12/04/2003WO2003099782A2 Acetal protected polymers and photoresists compositions thereof
12/04/2003WO2003099536A1 Methods and apparatus of field-induced pressure imprint lithography
12/04/2003WO2003099463A2 Method and device for transferring a pattern from a stamp to a substrate
12/04/2003WO2003090792A3 Method and apparatus for treating a substrate with an ozone-solvent solution iii
12/04/2003WO2003087940A3 Printing elements and method for producing the same using digital imaging photopolymerization
12/04/2003WO2003075042A3 Optical measurements of patterned structures
12/04/2003WO2003050617A3 Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region
12/04/2003WO2003016977A3 Objective with pupil obscuration
12/04/2003US20030226130 Method for making an OPC mask and an OPC mask manufactured using the same
12/04/2003US20030225233 Providing a reaction mixture of an ethylenically unsaturated anhydride monomer, a ethylenically unsaturated non-anhydride monomer, a free radical initiator and an alkyl substituted tetrahydrofuran solvent, polymerizing the reaction mixture
12/04/2003US20030225199 A polymerizable mixture comprising a cyclo-aliphatic epoxide monomer or resins, an acrylates, a polylactones and a silicon diluent; ductility for leveling and coating, nontoxic, low viscosity; forming an addition condensation epoxy resins
12/04/2003US20030225179 Carbocyclic oxo, amines used as photoinitiators, formed by reacting 1-(4-(bis-(2-hydroxyethyl)-amino))-2-methyl-2-morpholino-1-propanone with caprolactone in the presence of catalysts; inks
12/04/2003US20030224623 Insulating resin film and method of forming fine patterns of insulating resin film
12/04/2003US20030224606 Method of photolithographically forming extremely narrow transistor gate elements
12/04/2003US20030224602 Method for reducing dimensions between patterns on a hardmask
12/04/2003US20030224589 Pattern formation method
12/04/2003US20030224586 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
12/04/2003US20030224577 Method for manufacturing thin film semiconductor device and method for forming resist pattern thereof
12/04/2003US20030224560 Method for manufacturing an electronic device
12/04/2003US20030224298 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
12/04/2003US20030224297 Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
12/04/2003US20030224296 Pattern formation method
12/04/2003US20030224295 Transfer method for a mask or substrate, storage box, apparatus adapted for use in such method, and device manufacturing method including such a transfer method
12/04/2003US20030224294 Photopolymerizable composition and recording material using same
12/04/2003US20030224291 Resist composition and patterning process
12/04/2003US20030224290 S-acylmethyl-S,S-oxydiethylenesulfonium salt in which the acyl is substituted by hydrocarbyl, hydrocarbyloxy or hydrocarbylamino; photoacid generator for high resolution for high energy rays of 300 nm or less
12/04/2003US20030224289 Prepared from a vinyloxyalkyl adamantanecarboxylate monomer
12/04/2003US20030224288 Stimulation sensitive composition and compound
12/04/2003US20030224287 Photo acid generator; resin which is insoluble in an alkali and becomes alkali-soluble by an action of an acid; and an acyclic compound having at least three groups selected from a hydroxyl group and a substituted hydroxyl group.
12/04/2003US20030224286 Processes for producing polysiloxanes and photoresist compositions comprising same
12/04/2003US20030224285 Fluorinated aromatic sulfonic acid generator; acid decomposable resin with alicyclic hydrocarbon structures; compound with at least 3 OH groups that may be substituted; onium alkanesulfonate
12/04/2003US20030224284 Diazonium, halonium, sulfonium, phosphonium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium or arsenium sulfonium salt of a polyvinylsulfonate or a sulfonated phenolic resin
12/04/2003US20030224283 Photoresist composition
12/04/2003US20030224282 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
12/04/2003US20030224281 Formed from a phenol and dimethylolurea; planographic printing plate precursors to form plates that exhibit good durability, good exposure visual image property, and good solvent resistance especially to washing oil used in UV ink
12/04/2003US20030224266 High-precision that can perform the design, testing, and formation of wiring easily and at high speed, can reduce the cost involved in the formation and design, can accommodate further miniaturization, and can cope with design changes.
12/04/2003US20030224265 Exposing the photoresist layer to 193 nm radiation while purging the exposure section with a purge gas containing no oxygen to reduce an amount of oxygen species induced by theradiation
12/04/2003US20030224264 Projection exposure device and position alignment device and position alignment method
12/04/2003US20030224261 Due to the symmetry of the structure, the overlay accuracy in the first direction may be determined on the basis of the same reference data as used for the second, so that establishing libraries is simplified.
12/04/2003US20030224260 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs
12/04/2003US20030224255 Image forming method used in liquid crystal display device for both reflection and transmission modes
12/04/2003US20030224254 Method for reducing dimensions between patterns on a photomask
12/04/2003US20030224253 Fabricating process of non-gap 3-D microstructure array mold core
12/04/2003US20030224252 In the manufacture of integrated circuit devices lithography is controlled so that the best focus for imaging is constantly maintained.
12/04/2003US20030224251 Method for photo-imageable lacquer deposition for a display device
12/04/2003US20030224250 Asymmetric acrylate or vinyl ether compound containing sulfide groups, aromatic moieties, and optionally bromine is mixed with a matrix polymer precursor (expecially polyurethane) and reacted; holography recording medium
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