Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2003
12/16/2003US6664028 Photoresist layers are superposed in a way that spaces between the patterns for each photoresist layers overlapped with each other for form openings that expose the underlying wafer layers; exposed wafer layers are etched
12/16/2003US6664027 Methods and apparatus for manufacturing electronic and electromechanical elements and devices by thin-film deposition and imaging
12/16/2003US6664026 Method of manufacturing high aspect ratio photolithographic features
12/16/2003US6664025 Ethylenically unsaturated monomer capable of free radical addition polymerizatio catalysis; binder, photoinitiator and cyanopyidone sensitizer; metallocene and onium coninitiators
12/16/2003US6664024 Photopolymerizable epoxide compound, photoinitiator, photoactivated color changer, and reactive polysilsesquioxane compound; colorimetric analysis; stereolithography
12/16/2003US6664023 Controlled aging of photoresists for faster photospeed
12/16/2003US6664022 Photoacid generators and photoresists comprising same
12/16/2003US6664021 Photosensitive polymide precursor resin composition
12/16/2003US6664020 Transfer imaging elements
12/16/2003US6664019 Aluminum printing plates and method of making
12/16/2003US6664013 Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same
12/16/2003US6664011 Improving DOF and MEF performance for creation of holes by adding extra holes to a given pattern, thus densifying the pattern of holes on the first mask and reducing the range of the hole-diameter to hole separation ratio.
12/16/2003US6663916 Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
12/16/2003US6663761 Fine pattern forming method, developing/washing device used for the same, plating method using the same, and manufacturing method of thin film magnetic head using the same
12/16/2003US6663723 Washing semiconductor substrates using alcohols, then evaporating to remove the cleaning compounds
12/16/2003US6663253 Molded optical panel and mold therefore
12/16/2003US6662718 Screening mask having a stress-relieving area
12/16/2003US6662466 Method for two dimensional adaptive process control of critical dimensions during spin coating process
12/11/2003WO2003103030A1 Substrate processing device, substrate processing method, and nozzle
12/11/2003WO2003102959A1 Holographic data storage media comprising an aluminum salt compound and an asymetric acrylate compound
12/11/2003WO2003102695A1 Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes
12/11/2003WO2003102694A1 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask
12/11/2003WO2003102693A1 High reflective index photoactive compound for optical applications
12/11/2003WO2003102692A1 Radiation-sensitive compositions containing polymeric sulfonate acid generators and their use in imaging
12/11/2003WO2003102691A1 Patterning method
12/11/2003WO2003102690A2 Method for producing photoresist masks for structuring semiconductor substrates by means of optical lithography
12/11/2003WO2003102529A1 Method of evaluating refractive index homogeneity of opical member
12/11/2003WO2003101590A1 Integrated photochemical treatment of gases
12/11/2003WO2003071353A3 An image forming method and apparatus
12/11/2003WO2003065119A3 Overlay measurements using periodic gratings
12/11/2003WO2003054475A3 Parametric profiling using optical spectroscopic systems
12/11/2003WO2003033500B1 Photoactivable nitrogen bases
12/11/2003WO2003032085A3 Determination of center of focus by cross-section analysis
12/11/2003WO2003017004A3 Optical array
12/11/2003WO2002101464A3 Optical proximity correction for phase shifting photolithographic masks
12/11/2003WO2002073309A3 Packaged radiation sensitive coated workpiece process for making and method of storing same
12/11/2003WO2002056114A3 Projection system for euv lithography
12/11/2003WO2002039489A3 Method for removing etch residue resulting from a process for forming a via
12/11/2003US20030229234 Hydrophilic polymers; bonding strength, chemical resistance
12/11/2003US20030228990 Using aqueous solution of 2-ethylaminoethyl-2-ethanol
12/11/2003US20030228758 Semiconductor device and manufacturing method thereof
12/11/2003US20030228740 Method of fabricating semiconductor device, and developing apparatus using the method
12/11/2003US20030228543 Exposure, discharging, scanning; high speed forming patterns
12/11/2003US20030228541 Controlling light source; lauout of liquid crystals; masking structure for photolithography
12/11/2003US20030228538 Organosilicon polymer
12/11/2003US20030228537 Mixture of fluoropolymer and acid generator
12/11/2003US20030228532 Calibration time for cutting patterned masking; etching; determination width
12/11/2003US20030228531 Detection of lens anti-reflective coating decay by undesired residue detection
12/11/2003US20030228527 Method for compensating for scatter/reflection effects in particle beam lithography
12/11/2003US20030228526 Self-aligned alternating phase shift mask patterning process
12/11/2003US20030228474 Silicon oxynitride overcoated with polymeric photoresists
12/11/2003US20030227954 Line-narrowed gas laser system
12/11/2003US20030227693 Projection optical system and projection exposure device which uses same
12/11/2003US20030227684 Diffractive optical element, refractive optical element, illuminating optical apparatus, exposure apparatus and exposure method
12/11/2003US20030227670 Optical element equipped with lanthanum fluoride film
12/11/2003US20030227657 Synchrotron-based EUV lithography illuminator simulator
12/11/2003US20030227624 Non-invasive wafer transfer position diagnosis and calibration
12/11/2003US20030227609 Advanced illumination system for use in microlithography
12/11/2003US20030227608 Exposure device
12/11/2003US20030227607 Exposure apparatus and an exposure method
12/11/2003US20030227606 Condenser for photolithography system
12/11/2003US20030227605 System and method for using a two part cover for protecting a reticle
12/11/2003US20030227604 Lithographic apparatus, alignment method and device manufacturing method
12/11/2003US20030227603 Lithographic apparatus and device manufacturing method
12/11/2003US20030227536 Pattern writing apparatus, pattern writing method and substrate
12/11/2003US20030227530 Ink receptor sheet and it's process of use
12/11/2003US20030227087 Semiconductor device and method of manufacturing the same
12/11/2003US20030227005 Dissolving using mixture of ketone, ester and lactone
12/11/2003US20030226980 Exposure method
12/11/2003US20030226976 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same
12/11/2003US20030226951 System and method for lithography process monitoring and control
12/11/2003US20030226687 Method of manufacturing printed wiring board and printed wiring board obtained by the manufacturing method
12/11/2003US20030226463 Variable data lithographic printing device and method
12/10/2003EP1369913A2 Method of patterning inter-metal dielectric layers
12/10/2003EP1369745A1 Lihographic apparatus and device manufaturing method
12/10/2003EP1369744A1 Lithographic apparatus and device manufacturing method
12/10/2003EP1369743A2 Characterisation of lithography apparatus
12/10/2003EP1369731A2 Exposure head and exposure apparatus
12/10/2003EP1369708A1 Optical member and method of producing the same, and projection aligner
12/10/2003EP1369459A1 Radiation-sensitive composition capable of having refractive index distribution
12/10/2003EP1369250A2 Method and system for calibrating a spatial light modulator of an imaging engine
12/10/2003EP1369232A1 Planographic printing plate precursor
12/10/2003EP1369231A2 Infrared photosensitive composition and image recording material for infrared exposure
12/10/2003EP1368824A1 Method and evaporating solution for rinsing a developed photoresist layer
12/10/2003EP1368711A1 Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
12/10/2003EP1368710A2 Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
12/10/2003EP1368709A2 Anti-reflective coating material, semiconductor product with an arc layer and methods
12/10/2003EP1368413A1 Two-layer imageable element comprising thermally reversible polymers
12/10/2003EP1368412A1 Imageable element and composition comprising thermally reversible polymers
12/10/2003EP1368140A1 Method and apparatus for texturing a metal sheet or strip
12/10/2003EP1368136A1 Methods for cleaning microelectronic structures
12/10/2003EP1290496B1 Modification of mask layout data to improve mask fidelity
12/10/2003EP0890136B9 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
12/10/2003CN1461427A Machine for treatment of printing plates
12/10/2003CN1461426A EUV-transparent interface structure
12/10/2003CN1461318A Carboxylated photosensitive resin, alkali-developable photocurable/heat-curable composition containing the same, and cured article obtained therefrom
12/10/2003CN1461040A Pattern forming method
12/10/2003CN1460897A Scanning exposure method and device
12/10/2003CN1460896A Energy beam exposure method and device
12/10/2003CN1460895A Processing method, mfg. method and processing device for semiconductor
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