| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/18/2003 | WO2002097486A3 Hybrid optical component for x ray applications and method associated therewith |
| 12/18/2003 | WO2002052344A3 Manufacturing integrated circuits using phase-shifting masks |
| 12/18/2003 | US20030233630 To correct for optical proximity and other effects in generating patterns on workpieces; workpieces include lithographic masks and integrated circuits produced by direct writing |
| 12/18/2003 | US20030233629 Mask manufacturing method |
| 12/18/2003 | US20030233528 Modified photolithography movement system |
| 12/18/2003 | US20030232940 For producing polymer having transparency and low refractive index in a wide wavelength region from vacuum ultraviolet region to optical communication wavelength region, adhesion to the substrate, film forming property, etching resistance |
| 12/18/2003 | US20030232287 Covering a sheet of collagen with photoresist, irradiating through a mask, stripping away photoresist not hardened by the light to leave microstrand pattern; implanting collagen scaffold during LASIK to improve vision or prevent ectasia |
| 12/18/2003 | US20030232286 Forming a photosensitive layer including solvent and polysiloxane on a substrate, forming a latent image, contacting with a metal colloid solution where exposed parts adsorb metal colloid; optical filters, catalyst films |
| 12/18/2003 | US20030232283 Method for forming a photoresist pattern on a semiconductor substrate |
| 12/18/2003 | US20030232282 Microelectronic substrate edge bead processing apparatus and method |
| 12/18/2003 | US20030232281 Deposition of development scum on the plate surface occurred in the processing by automatic development processor can be prevented by adjusting pH of the finishing solution at the feed to 4.5 or more |
| 12/18/2003 | US20030232280 Planographic printing plate precursor |
| 12/18/2003 | US20030232279 Negative resist composition comprising base polymer having epoxy ring and Si-containing crosslinker and patterning method for semiconductor device using the same |
| 12/18/2003 | US20030232277 Positive resist composition |
| 12/18/2003 | US20030232276 Fluorinated molecules and methods of making and using same |
| 12/18/2003 | US20030232274 Photoacid-labile polymers and photoresists comprising same |
| 12/18/2003 | US20030232273 For imaging short wavelengths; acetal group deblocks in the presence of a photoacid; for example a tetrapolymer of tert-butyl acrylate, p-vinylphenol and its 1-tert-butyoxyethyl ether and 1-(trimethylnorborn-2-yl)oxyethyl ether |
| 12/18/2003 | US20030232270 Chemical amplified photoresist compositions |
| 12/18/2003 | US20030232259 Dye-containing curable composition, color filter, and producing process thereof |
| 12/18/2003 | US20030232257 Apertures connecting to each other, exposing at a predetermined distance; exposing a single crystal semiconductor wafer, a glass substrate for a liquid crystal display |
| 12/18/2003 | US20030232255 Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane |
| 12/18/2003 | US20030232253 Techniques to characterize iso-dense effects for microdevice manufacture |
| 12/18/2003 | US20030232252 Multi-tiered lithographic template and method of formation and use |
| 12/18/2003 | US20030232251 An adjacent opaque part area with a transmission part area, by reducing the amount of exposing radiation transmitted through the area, improve the geometrical shape and dimensional accuracy of a photoresist pattern |
| 12/18/2003 | US20030232193 Dry film resist and printed circuit board producing method |
| 12/18/2003 | US20030232131 Changing fluid photosensitive material into a photosensitive material having a band form, having length longer than width, applying such material to the first surface to stabilize photosensitive material |
| 12/18/2003 | US20030231663 Ultraviolet laser apparatus and exposure apparatus using same |
| 12/18/2003 | US20030231415 Method and apparatus for managing actinic intensity transients in a lithography mirror |
| 12/18/2003 | US20030231412 Apparatus for positioning an optical element in a structure |
| 12/18/2003 | US20030231290 Method and apparatus for exposure |
| 12/18/2003 | US20030231289 Exposure apparatus, substrate processing unit and lithographic system, and device manufacturing method |
| 12/18/2003 | US20030231172 Liquid crystal display device |
| 12/18/2003 | US20030230967 Visible image receiving material, conductive pattern material and organic electroluminescence element, using member having surface hydrophilicity |
| 12/18/2003 | US20030230730 Semiconductor exposure apparatus, control method therefor, and semiconductor device manufacturing method |
| 12/18/2003 | US20030230729 Positioning stage with stationary and movable magnet tracks |
| 12/18/2003 | CA2489246A1 Multimer forms of mono- and bis-acylphosphine oxides |
| 12/18/2003 | CA2488737A1 Microelectronic cleaning and arc remover compositions |
| 12/18/2003 | CA2488735A1 Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 12/17/2003 | EP1372200A2 Oled display having color filters for improving contrast |
| 12/17/2003 | EP1372191A2 Method for depositing a device feature on a substrate |
| 12/17/2003 | EP1372185A2 Method of applying a treating solution |
| 12/17/2003 | EP1372041A2 Control of an apparatus for exposing a semiconductor device |
| 12/17/2003 | EP1372040A2 Lithographic apparatus and device manufacturing method |
| 12/17/2003 | EP1372039A2 Lithographic apparatus and device manufacturing method |
| 12/17/2003 | EP1372038A1 Lithographic apparatus and device manufacturing method |
| 12/17/2003 | EP1372037A2 Exposure apparatus and stage device and device manufacturing method |
| 12/17/2003 | EP1372036A1 Lithographic apparatus and device manufacturing method |
| 12/17/2003 | EP1372035A2 Lithographic projection apparatus and device manufacturing method |
| 12/17/2003 | EP1372034A2 Advanced illumination system for use in microlithography |
| 12/17/2003 | EP1372033A1 Pattern forming material and method of pattern formation |
| 12/17/2003 | EP1372032A1 Mask manufacturing method |
| 12/17/2003 | EP1372009A1 Method and apparatus for compensating transients heat loads in a lithography mirror |
| 12/17/2003 | EP1372005A2 Optical integrated circuit and method of fabrication |
| 12/17/2003 | EP1371500A1 Lithographic printing plate precursor |
| 12/17/2003 | EP1371484A2 Planographic printing plate precursor and its fixing method on plate cylinder |
| 12/17/2003 | EP1371086A1 Method of etching organic antireflection coating (arc) layers |
| 12/17/2003 | EP1370910A1 Thermosetting anti-reflective coatings comprising aryl urethanes of hydroxypropyl cellulose |
| 12/17/2003 | EP1370828A1 Line profile asymmetry measurement using scatterometry |
| 12/17/2003 | CN1462471A Method of measuring image characteristics and exposure method |
| 12/17/2003 | CN1462378A Image materials comprising electrically conductive polymer particle layers |
| 12/17/2003 | CN1462298A Radiation-sensitive composition changing in refractive index and utilization thereof |
| 12/17/2003 | CN1462284A Photosensitive resin compositions for color filter applications |
| 12/17/2003 | CN1462239A Lithographic imaging with printing members having multphase laser-responsive layers |
| 12/17/2003 | CN1462065A Wiring forming system and wiring forning method for wiring on wiring board |
| 12/17/2003 | CN1462062A Insulation resin film and fine pattern forming method of insulation resin film |
| 12/17/2003 | CN1461977A Projection exposure device, position alignment device and position alignment method |
| 12/17/2003 | CN1461976A Photoetching device, device manufacturing, performance testing and calibration method and computer program |
| 12/17/2003 | CN1461975A Exposure method and exposure device |
| 12/17/2003 | CN1461974A Assembling optical element external member and method, optical element, offset press, device manufacturing method |
| 12/17/2003 | CN1461973A Lighting optical device, exposure device and exposure method |
| 12/17/2003 | CN1461972A Graphic writer and graphic write method |
| 12/17/2003 | CN1461971A Exposure method, exposure device and manufacture method of device |
| 12/17/2003 | CN1461970A Heating device |
| 12/17/2003 | CN1461962A 液晶显示器 LCD Monitor |
| 12/17/2003 | CN1461726A Fragile sheel transporting device and fragile sheet processing |
| 12/17/2003 | CN1131545C Manufacturing method of semiconductor device |
| 12/17/2003 | CN1131461C Photosensitive compounds, photosensitive resin compositions and method for pattern formation making use of compounds and compositions |
| 12/17/2003 | CN1131428C Process for preparing capillary electrophoresis chip used in chemical analysis |
| 12/16/2003 | US6665858 Manufacturing method of semiconductor device |
| 12/16/2003 | US6665856 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 12/16/2003 | US6665326 Light source device |
| 12/16/2003 | US6665126 Projection exposure lens with aspheric elements |
| 12/16/2003 | US6665054 Two stage method |
| 12/16/2003 | US6665053 Supporting system in exposure apparatus |
| 12/16/2003 | US6665052 Illumination optical system and projection exposure apparatus |
| 12/16/2003 | US6665051 Illumination system and exposure apparatus and method |
| 12/16/2003 | US6665050 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis |
| 12/16/2003 | US6665049 Photomask, method for manufacturing the same, projection aligner using the photomask, and projection exposing method |
| 12/16/2003 | US6665046 Exposure apparatus and device manufacturing method |
| 12/16/2003 | US6665014 Microlens and photodetector |
| 12/16/2003 | US6664554 Self-cleaning optic for extreme ultraviolet lithography |
| 12/16/2003 | US6664551 Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same |
| 12/16/2003 | US6664549 Wafer chuck, exposure system, and method of manufacturing semiconductor device |
| 12/16/2003 | US6664346 To protect the film resist |
| 12/16/2003 | US6664201 Method of manufacturing anti-reflection layer |
| 12/16/2003 | US6664194 Photoexposure method for facilitating photoresist stripping |
| 12/16/2003 | US6664183 Shadow mask a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 12/16/2003 | US6664121 Method and apparatus for position measurement of a pattern formed by a lithographic exposure tool |
| 12/16/2003 | US6664031 Process for forming photoresist pattern by using gas phase amine treatment |
| 12/16/2003 | US6664029 Method of forming pattern |