| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/25/2003 | US20030235785 Negative photoresists for short wavelength imaging |
| 12/25/2003 | US20030235784 Organic anti-reflective coating composition and method for forming photoresist patterns using the same |
| 12/25/2003 | US20030235782 Useful for imaging negative and positive patterns in the production of semiconductor devices |
| 12/25/2003 | US20030235781 Used in manufacturing a semiconductor device |
| 12/25/2003 | US20030235780 Photosensitive plate |
| 12/25/2003 | US20030235779 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method |
| 12/25/2003 | US20030235778 Photoresist compositions for short wavelength imaging |
| 12/25/2003 | US20030235777 Mixing resin obtained by polymerizing 1-vinyl-3-esterphenyl compound with one or more monomers and treating the polymer to provide meta-hydroxyphenyl repeat units with photoactive component |
| 12/25/2003 | US20030235775 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| 12/25/2003 | US20030235768 Aqueous dispersions for color imaging |
| 12/25/2003 | US20030235766 Method of designing phase grating pattern for use in modifying illumination in an exposure process, and method of manufacturing a photo mask system having the phase grating pattern |
| 12/25/2003 | US20030235682 Method and device for controlling thermal distortion in elements of a lithography system |
| 12/25/2003 | US20030235383 Planar optical waveguide assembly and method of preparing same |
| 12/25/2003 | US20030234993 Adaptive optic off-axis metrology |
| 12/25/2003 | US20030234989 Optical-element mountings exhibiting reduced deformation of optical elements held thereby |
| 12/25/2003 | US20030234981 Correction of birefringence in cubic crystalline optical systems |
| 12/25/2003 | US20030234970 Deformable mirror actuation system |
| 12/25/2003 | US20030234939 Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 12/25/2003 | US20030234919 Full-contact type exposure device |
| 12/25/2003 | US20030234918 Adjustable soft mounts in kinematic lens mounting system |
| 12/25/2003 | US20030234917 Kinematic lens mount with reduced clamping force |
| 12/25/2003 | US20030234916 Soft supports to reduce deformation of vertically mounted lens or mirror |
| 12/25/2003 | US20030234915 Device and method of correcting exposure defects in photolithography |
| 12/25/2003 | US20030234912 Projection optical system, exposure apparatus and exposure method |
| 12/25/2003 | US20030234854 Laser beam source control method and unit, exposure method and apparatus, and device manufacturing method |
| 12/25/2003 | US20030234458 Planar optical waveguide assembly and method of preparing same |
| 12/25/2003 | US20030234387 Anti-reflective coating compositions for use with low k dielectric materials |
| 12/25/2003 | US20030234348 Polarization state detecting system, light source, and exposure apparatus |
| 12/25/2003 | US20030233955 Planographic printing plate precursor and its fixing method on plate cylinder |
| 12/24/2003 | WO2003107434A1 A method of forming a metal pattern and a method of fabricating tft array panel by using the same |
| 12/24/2003 | WO2003107398A2 Techniques to characterize iso-dense effects for microdevice manufacture |
| 12/24/2003 | WO2003107096A2 Method for filtering radiation |
| 12/24/2003 | WO2003107095A1 Device for positioning an optical element in a structure |
| 12/24/2003 | WO2003107092A1 Method for producing flexo printing forms by means of laser direct engraving |
| 12/24/2003 | WO2003106693A2 Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof |
| 12/24/2003 | WO2003106005A1 Monolithic filter body and fabrication technique |
| 12/24/2003 | WO2003105802A1 Method for fabricating three dimensional sturctures |
| 12/24/2003 | WO2003089991A3 Photocurable compositions containing reactive particles |
| 12/24/2003 | WO2003077029A9 Negative photoresists for short wavelength imaging |
| 12/24/2003 | WO2003075041A3 Optical measurements of line edge roughness |
| 12/24/2003 | WO2003067332A3 Sulfonate derivatives and the use therof as latent acids |
| 12/24/2003 | WO2003056611A3 Resistless lithography method for producing fine structures |
| 12/24/2003 | WO2003046664A3 Lithography process for transparent substrates |
| 12/24/2003 | WO2003040076A3 Novel difunctional photoinitiators |
| 12/24/2003 | WO2003036386A3 Method for forming elliptical and rounded mask features using beam shaping |
| 12/24/2003 | WO2003017006A3 A method of substrate processing and photoresist exposure |
| 12/24/2003 | WO2002079880A9 Method for adjusting the overlay of two masking planes in a photolithographic process |
| 12/24/2003 | CN1463390A Photoimageable compsn. |
| 12/24/2003 | CN1463286A UV curing intaglo ink |
| 12/24/2003 | CN1463256A Quartz glass member and projection aligner |
| 12/24/2003 | CN1462910A Method fo baking photoresistive in multistage in order to improve photoetching quality |
| 12/24/2003 | CN1462909A Chemical amplification light resistance agent compsn. |
| 12/24/2003 | CN1462757A High molecular polymer of chemical amplification type light resistance agent compsn. |
| 12/24/2003 | CN1462747A High molecular monomer of chemical amplification type light resistance agent compson. |
| 12/24/2003 | CN1132224C Optical mask and method of preparing electronic element |
| 12/24/2003 | CN1131883C Epoxy resin compsn. adhesive film and preimpregnatel blank and multilayer printing circuit board |
| 12/23/2003 | US6668099 Method of measuring an angle of inclination of trapezoidal micro object side faces |
| 12/23/2003 | US6668075 Position detection apparatus and method |
| 12/23/2003 | US6668037 X-ray projection exposure apparatus and a device manufacturing method |
| 12/23/2003 | US6667806 Process and apparatus for manufacturing semiconductor device |
| 12/23/2003 | US6667796 Exposure method and apparatus |
| 12/23/2003 | US6667484 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 12/23/2003 | US6667469 Direct gear driven carriage assembly for an imaging system |
| 12/23/2003 | US6667415 Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same |
| 12/23/2003 | US6667394 Printing oligonucleotide arrays |
| 12/23/2003 | US6667244 Method for etching sidewall polymer and other residues from the surface of semiconductor devices |
| 12/23/2003 | US6667212 Alignment system for planar charge trapping dielectric memory cell lithography |
| 12/23/2003 | US6667145 Resist composition comprising as a base resin a polymer having highly adherent, highly rigid units and especially suited as micropatterning material for VLSI fabrication, and (2) a patterning process using the resist |
| 12/23/2003 | US6667144 Laser-induced thermal transfer ink sheet, production method of the same, and image recording method |
| 12/23/2003 | US6667143 Wherein active primer is disposed between thermal transfer donor sheet and receptor to assist selective thermal transfer; binder improves adhesion |
| 12/23/2003 | US6667142 Recording material having a pigment-coloured radiation-sensitive layer |
| 12/23/2003 | US6667139 Setting the exposure amount and the focus value in forming a pattern by transferring a circuit pattern on a mask onto a resist film. |
| 12/23/2003 | US6667137 Polymers and their use in imageable products and image-forming methods |
| 12/23/2003 | US6666917 Apparatus for coating of a semiconductor wafer |
| 12/23/2003 | US6666611 Three degree of freedom joint |
| 12/23/2003 | US6666560 Reflection type demagnification optical system, exposure apparatus, and device fabricating method |
| 12/18/2003 | WO2003105547A1 Plotting device and plotting method |
| 12/18/2003 | WO2003105203A1 Exposure system and exposure method |
| 12/18/2003 | WO2003105202A1 Wave aberration measuring instrument, exposure apparatus, semiconductor device manufacturing system, and method for manufacturing same |
| 12/18/2003 | WO2003105201A1 Substrate processing device, substrate processing method, and developing device |
| 12/18/2003 | WO2003105145A1 Production method for photoresist master, production method for optical recording medium-producing stamper, stamper, phtoresist master, stamper intermediate element and optical recroding medium |
| 12/18/2003 | WO2003104929A2 Use of overlay diagnostics for enhanced automatic process control |
| 12/18/2003 | WO2003104901A2 Microelectronic cleaning and arc remover compositions |
| 12/18/2003 | WO2003104900A2 Microelectronic cleaning compositions containing oxidizers and organic solvents |
| 12/18/2003 | WO2003104899A1 Method of forming surface indent and use thereof |
| 12/18/2003 | WO2003104898A1 Method for transferring a pattern |
| 12/18/2003 | WO2003104897A2 Objective, especially a projection objective for microlithography |
| 12/18/2003 | WO2003104296A1 Actinic radiation curable compositions and their use |
| 12/18/2003 | WO2003104245A1 Multimer forms of mono- and bis-acylphosphine oxides |
| 12/18/2003 | WO2003104185A1 Semiconductor process residue removal composition and process |
| 12/18/2003 | WO2003104182A1 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same |
| 12/18/2003 | WO2003103963A1 Variable data lithographic printing device and method |
| 12/18/2003 | WO2003087867A3 Extreme ultraviolet light source |
| 12/18/2003 | WO2003087710A3 Method and apparatus for stage mirror mapping |
| 12/18/2003 | WO2003073169A3 Fluorinated molecules and methods of making and using same |
| 12/18/2003 | WO2003073164A3 Novel planarization method for multi-layer lithography processing |
| 12/18/2003 | WO2003050586A3 Mirror facet and facetted mirror |
| 12/18/2003 | WO2003046663A3 Characterization of the illumination angle distribution of a projection lighting system |
| 12/18/2003 | WO2003038523A3 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
| 12/18/2003 | WO2003003446A3 Control of solid state dimensional features |