Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2004
01/01/2004US20040001188 Lithographic apparatus, device manufacturing method, and device manufactured thereby apparatus
01/01/2004US20040000649 Electron beam exposure apparatus, electron beam method, semiconductor device manufacturing method, mask, and mask manufacturing method
01/01/2004US20040000627 Method for focus detection and an imaging system with a focus-detection system
01/01/2004US20040000322 Point-of-use mixing with H2SO4 and H2O2 on top of a horizontally spinning wafer
12/2003
12/31/2003WO2004001841A2 Method and system for realtime critical dimention microloading control
12/31/2003WO2004001834A1 Composition for removing sidewall residues
12/31/2003WO2004001821A1 Optical unit and x-ray exposure system
12/31/2003WO2004001820A1 Exposure apparatus and method
12/31/2003WO2004001797A2 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing
12/31/2003WO2004001510A1 Process for preventing development defect and composition for use in the same
12/31/2003WO2004001509A1 Adjustable soft mounts in kinematic mounting system for deformable lens
12/31/2003WO2004001508A2 Method and apparatus for maskless photolithography
12/31/2003WO2004001507A1 Compositions comprising a benzophenone photoinitiator
12/31/2003WO2004001506A2 Antireflective coatings for high-resolution photolithographic synthesis of dna array
12/31/2003WO2004001502A1 Developer-soluble metal alkoxide coatings for microelectronic applications
12/31/2003WO2004001480A2 Catadioptric reduction objective
12/31/2003WO2004001479A1 Soft support to reduce deformation of vertically mounted lens or mirror
12/31/2003WO2004001478A1 Kinematic lens mount with reduced clamping force and lithography system
12/31/2003WO2004001458A1 Planar optical waveguide assembly and method of preparing same
12/31/2003WO2004001372A2 Fabrication of high resolution biological molecule detection device
12/31/2003WO2004000942A1 Planar optical waveguide assembly and method of preparing same
12/31/2003WO2004000928A2 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
12/31/2003WO2004000853A1 Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids
12/31/2003WO2004000567A1 Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
12/31/2003WO2004000566A1 Method and device for transferring a pattern
12/31/2003WO2003014831A3 Photosensitive, flexo printing element and method for the production of newspaper flexo printing plates
12/31/2003WO2002093257A8 Microlithographic projection illumination system
12/31/2003CN1464996A Resist curable resin composition and cured article thereof
12/31/2003CN1464846A Multicolor image forming material and multicolor image forming method using the same
12/31/2003CN1464845A Laser thermal transfer recording method
12/31/2003CN1464535A Process for preventing heavy duty optical resistance from collapsing
12/31/2003CN1464524A A method for forming plat structure
12/31/2003CN1464344A Organic electroluminescent display panel developing apparatus and method thereof
12/31/2003CN1464343A Etching process capable of controlling contact window microspur
12/31/2003CN1464342A Process for making double lineage structure for preventing positioning error
12/31/2003CN1464341A Process for pattern transfer
12/31/2003CN1464340A Process for forming pattern and method for making LCD apparatus using the process
12/31/2003CN1464339A Process for making active system organic electroluminescent display
12/31/2003CN1464338A Grey mask and method for making same
12/31/2003CN1132889C Ultraviolet-curing adhesive composition and its article
12/31/2003CA2490122A1 Antireflective coatings for high-resolution photolithographic synthesis of dna array
12/30/2003USRE38372 Narrow band excimer laser and wavelength detecting apparatus
12/30/2003US6671396 Method to monitor stepper lens quality in color filter process
12/30/2003US6671294 Laser spectral engineering for lithographic process
12/30/2003US6671098 Scanning angle expander and a method for expanding a scanning beam angle
12/30/2003US6671088 Reflective spectral filtering of high power extreme ultra-violet radiation
12/30/2003US6671054 Interferometric patterning for lithography
12/30/2003US6671048 Method for determining wafer misalignment using a pattern on a fine alignment target
12/30/2003US6671036 Balanced positioning system for use in lithographic apparatus
12/30/2003US6671035 Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
12/30/2003US6671034 Optical device; evanescent(proximity)-field-assisted two dimensional micropatterning
12/30/2003US6671033 Optical device, method of cleaning the same, projection aligner, and method of producing the same
12/30/2003US6670979 Imaging apparatus, imaging method, and printing apparatus
12/30/2003US6670977 Image-recording method and image-recording system
12/30/2003US6670695 Method of manufacturing anti-reflection layer
12/30/2003US6670646 Mask and method for patterning a semiconductor wafer
12/30/2003US6670620 Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus
12/30/2003US6670616 Ultraviolet-light irradiation apparatus
12/30/2003US6670498 Norbornene and dimethanonaphthalenes substituted with a branched or cyclic tertiary alkoxycarbonyl hydrocarbyleneoxycarbonyl group
12/30/2003US6670425 Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings
12/30/2003US6670286 Photopolymerization-based fabrication of chemical sensing films
12/30/2003US6670276 Plasma processing method
12/30/2003US6670109 Photolithographic methods of using a single reticle to form overlapping patterns
12/30/2003US6670107 Method of reducing defects
12/30/2003US6670106 Formation method of pattern
12/30/2003US6670105 Method of manufacturing diffractive optical element
12/30/2003US6670104 Pattern forming method and method of manufacturing thin film transistor
12/30/2003US6670100 Non-actinic ray-curable substrate having on surface solid urethane resin layer formed from composition containing ether linkage-containing olefinically unsaturated compound, acid group-containing urethane resin, and photo-acid generator
12/30/2003US6670099 Support for lithographic printing plate and method of manufacturing the same
12/30/2003US6670098 Image forming material and method for forming thereof
12/30/2003US6670097 Presensitized printing plate with pigmented back coating
12/30/2003US6670095 Sensitivity; eliminates edge roughness on pattern and provides an excellent resist pattern profile
12/30/2003US6670094 Polymer, resist composition and patterning process
12/30/2003US6670093 Includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit
12/30/2003US6670092 For production of offset printing plates having a web- or plate-form support
12/30/2003US6670091 Photosensitive transfer material
12/30/2003US6670090 Composition comprising partially diazonaphthoquinone capped polyamic ester, photosensitive agent, and solvent
12/30/2003US6670081 Forming making; transferring lithography pattern; adjustment vertical, horizontal spacings
12/30/2003US6670080 Mask pattern creating method and mask pattern creating apparatus
12/30/2003US6669995 Directly exposing exposed antireflective coating to dosage of ultraviolet radiation sufficient to result in direct removal of at least portion of exposed coating
12/30/2003US6669982 Method for forming a liquid film on a substrate
12/30/2003US6669920 Fluoride crystal with a 157 nm transmission > 85% and a refractive index wavelength dispersion dn/d lambda < -0.003
12/30/2003US6669809 Apparatus for removing a coating film
12/30/2003US6669808 Substrate processing apparatus and substrate processing method
12/30/2003US6669779 Yield and line width performance for liquid polymers and other materials
12/30/2003CA2237719C Process and device for coating disc-shaped data storage media
12/25/2003WO2003107494A2 Gas discharge ultraviolet wavemeter with enhanced illumination
12/25/2003WO2003107094A1 Multi-tiered lithographic template
12/25/2003WO2003107093A2 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
12/25/2003WO2003106582A1 Adhesive for sealing organic electroluminescent element and use thereof
12/25/2003US20030236653 Simulation method and system for design of aperture in exposure apparatus and recording medium in which the simulation method is recorded
12/25/2003US20030236351 For F2 excimer laser photolithography comprising a alkali-insoluble protected hydroxy-containing fluoropolymer, an epoxy compound and an onium acid generator; deprotection; sensitivity, resolution; durability; dry etching resistance
12/25/2003US20030235998 Method for eliminating standing waves in a photoresist profile
12/25/2003US20030235996 Non-corrosive cleaning compositions for removing etch residues
12/25/2003US20030235853 Solid phase synthesis; for drug screening
12/25/2003US20030235824 Antireflective coatings for high-resolution photolithographic synthesis of DNA array
12/25/2003US20030235789 Photolithography process for Mask ROM coding
12/25/2003US20030235788 Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same
12/25/2003US20030235787 For forming a cross-linked polymer upon exposure to radiation
12/25/2003US20030235786 Developer-soluble metal alkoxide coatings for microelectronic applications
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